| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 02/21/2006 | US7003757 Dissection of edges with projection points in a fabrication layout for correcting proximity effects |
| 02/21/2006 | US7003756 Method and apparatus for controlling rippling during optical proximity correction |
| 02/21/2006 | US7003755 User interface for a networked-based mask defect printability analysis system |
| 02/21/2006 | US7002665 Lithography simulation method, mask pattern correction method, and substrate topography correction method |
| 02/21/2006 | US7001712 Depositing a positive type photoresist film over a semiconductor substrate;exposing a first mask pattern;exposing a second mask pattern; performing development treatment; etching |
| 02/21/2006 | US7001711 Patterning method using a photomask |
| 02/21/2006 | US7001698 forming a fine pattern, which permits the reduction of the dimensional difference due to the coexistence of coarse and dense patterns within a plane, such as a dry-etching using reactive ion etching gas and a reducing gas |
| 02/21/2006 | US7001697 Photolithography |
| 02/21/2006 | US7001696 Near-field light exposure mask with avoidance of overlap of near-field light, method for manufacturing the same, exposure apparatus and method using near-field light exposure mask, and method for manufacturing device |
| 02/21/2006 | US7001695 Multiple alternating phase shift technology for amplifying resolution |
| 02/21/2006 | US7001694 Photomask and method for producing the same |
| 02/21/2006 | US7001693 forming a photolithographic mask layout with Sub-Resolution Assist Feature (SRAF) elements on a mask to improve a pattern image |
| 02/21/2006 | US7001470 Cleaning process for photomasks |
| 02/21/2006 | US7001461 Crystallization apparatus, crystallization method, and phase shifter |
| 02/16/2006 | WO2004097519A3 Method and mark for metrology of phase errors on phase shift masks |
| 02/16/2006 | US20060036979 Computer-implemented methods for generating input for a simulation program or generating a simulated image of a reticle |
| 02/16/2006 | US20060035459 Method of forming narrowly spaced flash memory contact openings and lithography masks |
| 02/16/2006 | US20060035175 Transverse electric-field type liquid crystal display device, process of manufacturing the same,and scan-exposing device |
| 02/16/2006 | US20060035158 Flowing a reference pattern and an inspection pattern with a first line and a number of parallel second lines and a reference pattern in the orthogonal direction to that in which the first line extends by heating the resist; measuring the distance between the centers of the patterns; checking variations |
| 02/16/2006 | US20060035157 Depositing resist on portion of workpiece, transferring pattern on mask by exposing to light from light guiding cable with connector, mask removable by connector, developing, forming pattern by etching |
| 02/16/2006 | US20060035156 Reticle constructions and methods of forming reticles |
| 02/16/2006 | US20060034344 Apparatus and method for forming pattern |
| 02/16/2006 | US20060033900 Exposure method and apparatus |
| 02/16/2006 | US20060033876 Liquid crystal displays with post spacers, and their manufacture |
| 02/16/2006 | US20060033051 Lithographic apparatus, device manufacturing method, device manufactured thereby, and computer program |
| 02/16/2006 | US20060033049 Design pattern data preparing method, mask pattern data preparing method, mask manufacturing method, semiconductor device manufacturing method, and program recording medium |
| 02/15/2006 | CN1735319A Photomask apparatus, photomask manufacturing method, and mask pattern forming method |
| 02/15/2006 | CN1734741A Method for manufacturing semiconductor devices |
| 02/15/2006 | CN1734706A A process for controlling the proximity effect correction |
| 02/15/2006 | CN1734337A 掩模 Mask |
| 02/15/2006 | CN1242452C Image forming method, exposure mask for forming image and its making process |
| 02/15/2006 | CN1242304C A photolithography mask having a subresolution alignment mark window |
| 02/15/2006 | CN1241737C Chemical imaging of a lithographic printing plate |
| 02/14/2006 | US7000216 Exposure pattern forming method and exposure pattern |
| 02/14/2006 | US7000215 Method of and computer program product for designing patterns, and method of manufacturing semiconductor device |
| 02/14/2006 | US7000208 Repetition recognition using segments |
| 02/14/2006 | US6999178 Spatial-heterodyne interferometry for reflection and transmission (SHIRT) measurements |
| 02/14/2006 | US6999157 Illumination optical system and method, and exposure apparatus |
| 02/14/2006 | US6998217 Gray scale lithography; accurate, uniform reticle writing smaller features |
| 02/14/2006 | US6998206 coating a photomask substrate with a chemically amplified photoresist containing a modified phenolic polymer, and an onium salt-containing chemical amplifier; coating ; baking such chemically amplified photoresist on said photomask substrate |
| 02/14/2006 | US6998205 Optical proximity correction method |
| 02/14/2006 | US6998204 patterning the non-transparent film using the etch stop layer to expose areas of the transparent substrate, forming a mask on the non-transparent film to protect selected areas of the transparent substrate and forming a phase shift oxide |
| 02/14/2006 | US6998203 Proximity correcting lithography mask blanks |
| 02/14/2006 | US6998202 mask formed of a multilayered stack covered by a spacer layer, such as silicon or boron carbide, in turn covered by a thin layer to prevent inter-diffusion, and finally covered by a capping layer of ruthenium |
| 02/14/2006 | US6998201 Masks dividing patterns of a certain section and placing the parts on a plurality of masks or on different areas of the same mask and able to form the patterns of that section as before division by overlaying the masks or different areas |
| 02/14/2006 | US6998200 Reflection layer on a substrate, an absorber pattern on the reflection layer, and a capping layer on the reflection layer. The capping layer may be selected to decrease a reflectivity of the reflection photomask by less than about |
| 02/14/2006 | US6998199 Alternating phase shifting masking; generating destructive interference |
| 02/14/2006 | US6998198 Contact hole printing by packing and unpacking |
| 02/09/2006 | WO2005015311A3 Near-field exposure method and apparatus, near-field exposure mask, and device manufacturing method |
| 02/09/2006 | US20060031809 Method for interlayer and yield based optical proximity correction |
| 02/09/2006 | US20060029867 Device and method for controlling close contact of near-field exposure mask, and near-field exposure mask for the same |
| 02/09/2006 | US20060029866 EUV magnetic contrast lithography mask and manufacture thereof |
| 02/09/2006 | US20060027325 Method and apparatus for photomask fabrication |
| 02/09/2006 | DE112004000591T5 Herstellungsverfahren für Photomaske und Photomaskenrohling Manufacturing process for photomask and photomask blank |
| 02/09/2006 | DE10341467A1 Kristallisationsapparat, Kristallisationsverfahren und Phasenschieber Crystallization apparatus, crystallization method and phase shifter |
| 02/09/2006 | DE102004031398A1 Verfahren zur photolithographischen Projektion eines Musters auf einen Halbleiterwafer mit einer alternierenden Phasenmaske Photolithographic process for projecting a pattern on a semiconductor wafer with an alternating phase mask |
| 02/08/2006 | EP1624480A1 Exposure method, mask, semiconductor device manufacturing method, and semiconductor device |
| 02/08/2006 | EP1624467A2 Lithographic apparatus and device manufacturing method |
| 02/08/2006 | EP1624338A2 Photomask, pattern formation method using photomask and mask data creation method for photomask |
| 02/08/2006 | EP1623449A2 Methods and systems for estimating reticle bias states |
| 02/08/2006 | CN1731278A EUV magnetic contrast lithography mask and manufacture thereof |
| 02/08/2006 | CN1731249A Mask, thin film transistor substrate, method of manufacturing the thin film transistor substrate using the mask, and display apparatus using the thin film transistor substrate |
| 02/08/2006 | CN1241063C X-ray mask and quartz ring ultraviolet solidifying apparatus and method for using |
| 02/07/2006 | US6995898 Mask, substrate with light reflecting film, method for forming light reflecting film, method for manufacturing electro-optical device, electro-optical device, and electronic apparatus |
| 02/07/2006 | US6995831 Lithographic apparatus with alignment subsystem, device manufacturing method, using alignment, and alignment structure |
| 02/07/2006 | US6994940 Phase shift mask, method for forming pattern using phase shift mask and manufacturing method for electronic device |
| 02/07/2006 | US6994938 Exposure method for producing a hologram mask |
| 02/07/2006 | US6994507 Transport apparatus |
| 02/07/2006 | US6994026 Using an ink jet image as mask for the exposure of a flexo plate precursor; ink jet recording material is multilayer and comprises a binder, a cationic mordant and a spacing agent in its top layer |
| 02/02/2006 | WO2006011977A2 Method of making grayscale mask for grayscale doe production by using an absorber layer |
| 02/02/2006 | WO2005029180A3 Applications of semiconductor nano-sized particles for photolithography |
| 02/02/2006 | US20060024594 Method for exposing a substrate with a structure pattern which compensates for the optical proximity effect |
| 02/02/2006 | US20060024592 Crystallization; photomasks; dielectrics; semiconductors |
| 02/02/2006 | US20060024591 Exposure mask manufacturing method, drawing apparatus, semiconductor device manufacturing method, and mask blanks product |
| 02/02/2006 | US20060024590 Methods of forming patterns in semiconductor constructions, methods of forming container capacitors, and methods of forming reticles configured for imprint lithography |
| 02/02/2006 | US20060023931 System for evaluating a design of a mask, exposure system, method for evaluating a design of a mask, method for manufacturing a semiconductor device and mask |
| 02/02/2006 | US20060023309 Projection aligner, aberration estimating mask pattern, aberration quantity estimating method, aberration eliminating filter and semiconductor manufacturing method |
| 02/02/2006 | US20060022134 Method of removing particle of photomask using atomic force microscope |
| 02/02/2006 | DE102005029499A1 Lithographische Maske und Herstellungsverfahren hierfür Lithographic mask and manufacturing method thereof |
| 02/02/2006 | DE102004063519A1 Verfahren zur Bildung einer Verbindungsleitung in einem Halbleiterbauelement uner Verwendung einer Phasenverschiebungsfotomaske A method of forming a connection line in a semiconductor device using an unwanted phase shift photomask |
| 02/02/2006 | DE102004030961A1 Verfahren zum Bestimmen einer Matrix von Transmissionskreuzkoeffizienten bei einer optischen Näherungskorrektur von Maskenlayouts A method for determining a matrix of the transmission cross coefficient in an optical proximity correction mask layout |
| 02/02/2006 | DE10155112B4 Reflexionsmaske für die EUV-Lithographie und Herstellungsverfahren dafür Reflection mask for EUV lithography and manufacturing method thereof |
| 02/02/2006 | DE10063819B4 Maskenerstellung zur Herstellung einer Druckform Mask creation of producing a printing forme |
| 02/01/2006 | EP1621932A1 Photo mask and focus measuring method using the mask |
| 02/01/2006 | EP1574902A9 Method of pattern formation using ultrahigh heat resistant positive photosensitive composition |
| 01/31/2006 | US6993742 correction tool predicts film edge placement for photoresist/photomask film/pattern; integrated circuits |
| 01/31/2006 | US6993741 Generating mask patterns for alternating phase-shift mask lithography |
| 01/31/2006 | US6993455 comprises reading design data, determining contact holes, then applying photomask/photoresist bias for comparison of light intensity distribution |
| 01/31/2006 | US6992780 Position detecting method and apparatus, exposure apparatus and device manufacturing method |
| 01/31/2006 | US6992754 Lithographic apparatus and device manufacturing method |
| 01/31/2006 | US6991896 comprises photomasks/optical filters for patterning contact-holes; improved resolution |
| 01/31/2006 | US6991878 Photomask repair method and apparatus |
| 01/31/2006 | US6991877 Projection lens exposes pattern to illumination; for fabrication of semiconductor chips, integrated circuits |
| 01/31/2006 | US6991416 System and method for reticle protection and transport |
| 01/28/2006 | CA2513779A1 Method for placing openings in a substrate |
| 01/26/2006 | WO2006009188A1 Image surface measurement method, exposure method, device manufacturing method, and exposure device |
| 01/26/2006 | US20060019183 Imprint alignment method, system, and template |
| 01/26/2006 | US20060019180 Photo mask, focus measuring method using the mask, and method of manufacturing semiconductor device |
| 01/26/2006 | US20060019179 Method of reducing the impact of stray light during optical lithography, devices obtained thereof and masks used therewith |
| 01/26/2006 | US20060019178 Method of repairing phase shift mask |