| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 01/26/2006 | US20060019177 Lithographic mask and manufacturing method thereof |
| 01/26/2006 | US20060019176 Chromeless phase shift mask and method of fabricating the same |
| 01/26/2006 | US20060019175 Method of manufacturing membrane mask, method of manufacturing semiconductor device, and membrane mask |
| 01/26/2006 | US20060019174 Photo mask and method of correcting the transmissivity of a photo mask |
| 01/26/2006 | US20060019173 Method of designing charged particle beam mask, charged particle beam mask, and charged particle beam transfer method |
| 01/26/2006 | US20060018530 Pattern inspecting method |
| 01/26/2006 | US20060018529 Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure |
| 01/25/2006 | EP1619552A2 Method of designing charged particle beam mask, charged particle beam mask and charged particle beam transfer method |
| 01/25/2006 | EP1619551A2 Method of manufacturing membrane mask, method of manufacturing semiconductor device, and membrane mask |
| 01/25/2006 | CN1726432A Laser exposure of photosensitive masks for DNA microarray fabrication |
| 01/25/2006 | CN1726431A Nanometer-scale engineered structures, methods and apparatus for fabrication thereof, and applications to mask repair, enhancement, and fabrications |
| 01/25/2006 | CN1726427A Liquid crystal displays with post spacers, and their manufacture |
| 01/25/2006 | CN1726424A Manufacture of shaped structures in LCD cells, and masks therefor |
| 01/25/2006 | CN1726136A Method for producing a partially metallised film-type element |
| 01/25/2006 | CN1238767C Optical recorder and recording method thereof |
| 01/25/2006 | CN1238764C Method for producing photomask, photomark , image transfer method |
| 01/24/2006 | US6990225 Inspection method of photo mask for use in manufacturing semiconductor device |
| 01/24/2006 | US6989544 Lithographic apparatus, device manufacturing method, device manufactured thereby, and computer program |
| 01/24/2006 | US6989229 radiating photoresists/photomasks, transferring patterns without transferring tile, absorption; semiconductors; integrated circuits; improved uniformity |
| 01/24/2006 | US6989219 transparent substrate, opaque layer, tungsten/tantalum layer, and photoresist layer; comprises chromium oxynitrides; improved minimum resolution/image quality |
| 01/19/2006 | WO2006007258A2 Comprehensive front end method and system for automatically generating and processing photomask orders |
| 01/19/2006 | WO2006006540A1 Photomask blank, photomask manufacturing method and semiconductor device manufacturing method |
| 01/19/2006 | WO2004013693A3 Scatterometry alignment for imprint lithography |
| 01/19/2006 | US20060014381 Method for forming interconnection line in semiconductor device using a phase-shift photo mask |
| 01/19/2006 | US20060014086 Method for manufacturing pattern formed structure |
| 01/19/2006 | US20060014085 Anisotropic light diffusion adhesive layer, anisotropic light diffusion adhesive laminate, and illuminating device having anisotropic light diffusion adhesive laminate |
| 01/19/2006 | US20060014084 Method for providing nano-structures of uniform length |
| 01/19/2006 | US20060014083 Methods and systems for fabricating electronic and/or microfluidic structures on elastomeric substrates |
| 01/19/2006 | US20060014082 Method of correcting mask pattern |
| 01/19/2006 | US20060012762 Method for cleaning semiconductor device |
| 01/19/2006 | US20060012050 Semiconductor device, designing method thereof, and recording medium storing semicondcutor designing program |
| 01/19/2006 | DE102004032677A1 Verfahren zum Herstellen einer Maske auf einem Substrat A method for manufacturing a mask on a substrate |
| 01/19/2006 | DE102004031079A1 Reflexionsmaske, Verwendung der Reflexionsmaske und Verfahren zur Herstellung der Reflexionsmaske Reflection mask, use of the reflection mask and method of manufacturing the reflection mask |
| 01/19/2006 | DE102004028849A1 Production of phase-shifting photomasks for photolithographic processing of semiconductor wafers involves a self-justification process |
| 01/18/2006 | EP1617287A1 Method of manufacturing mask blank |
| 01/18/2006 | EP1616222A2 Arrangement for inspecting objects, especially masks in microlithography |
| 01/18/2006 | CN1723416A Picture dimension correcting unit and method, photomask and test used photomask |
| 01/18/2006 | CN1722366A Method for manufacturing semiconductor device |
| 01/18/2006 | CN1722361A Substrate processing device and method, and pattern forming method |
| 01/18/2006 | CN1721988A Gray mask and method for manufacturing gray mask |
| 01/18/2006 | CN1721987A Method and apparatus for inspecting a mura defect, and method of manufacturing a photomask |
| 01/18/2006 | CN1721986A Mask pattern for manufacturing semiconductor device and its forming method, method for manufacturing coating composition for forming micropattern, and method for manufacturing semiconductor device |
| 01/18/2006 | CN1721962A Gray mask and manufacturing method thereof |
| 01/18/2006 | CN1721960A Gray mask and method for manufacturing gray mask |
| 01/18/2006 | CN1237574C Mfg. method for semiconductor device |
| 01/18/2006 | CN1237396C Light mark, focusing monitoring method, light exposure monitoring method, and manufacturing method of semiconductor device |
| 01/18/2006 | CN1237395C Thin film and producing method of thin film, and adhesive for thin film |
| 01/18/2006 | CN1237394C Producing method for lithographic printing plate originals |
| 01/17/2006 | US6988260 Method and apparatus for optimizing fragmentation of boundaries for optical proximity correction (OPC) purposes |
| 01/17/2006 | US6988259 semiconductor layout is first processed by a rule-based optical proximity correction system and then subsequently processed by a model-based optical proximity correction system |
| 01/17/2006 | US6987599 Pattern generator mirror configurations |
| 01/17/2006 | US6986974 Attenuated phase shift mask for extreme ultraviolet lithography and method therefore |
| 01/17/2006 | US6986973 Test photomask, flare evaluation method, and flare compensation method |
| 01/17/2006 | US6986971 Reflective mask useful for transferring a pattern using extreme ultraviolet (EUV) radiation and method of making the same |
| 01/17/2006 | US6986850 Partial edge bead removal to allow improved grounding during e-beam mask writing |
| 01/12/2006 | WO2006003912A1 Method for forming quartz glass |
| 01/12/2006 | WO2005038527A3 Enhancing photoresist performance using electric fields |
| 01/12/2006 | US20060010417 Apparatus, method and program product for suppressing waviness of features to be printed using photolithographic systems |
| 01/12/2006 | US20060009957 Method for determining a matrix of transmission cross coefficients in an optical proximity correction of mask layouts |
| 01/12/2006 | US20060008749 Method for manufacturing of a mask blank for EUV photolithography and mask blank |
| 01/12/2006 | US20060008729 Photosensitive layer contains a water-soluble or -dispersible resin and an ultraviolet-curable monomer; water-insoluble heat-sensitive mask layer containing an infrared-absorbing material; mass transfer between layers prevented; improved scratch resistance |
| 01/12/2006 | US20060008712 Exposure method, mask fabrication method, fabrication method of semiconductor device, and exposure apparatus |
| 01/12/2006 | US20060008711 Mirror for exposure system, reflection mask for exposure system, exposure system and pattern formation method |
| 01/12/2006 | US20060008710 Forming a first layer of attenuating material over a portion of the substrate;forming a another layer of material over a portion of the first layer;forming a second layer of attenuating material over a portion of the another layer of material;forming an opaque layer, etching substrate |
| 01/12/2006 | US20060008709 Mask and method for determining mask pattern line length |
| 01/12/2006 | US20060008708 For properly evaluating the line width of a pattern by considering the amount of a determination error caused by charge-up |
| 01/12/2006 | US20060008707 Mask and inspection method therefor and production method for semiconductor device |
| 01/12/2006 | US20060008528 Fullerences to increase radiation resistance in polymer-based pellicles |
| 01/12/2006 | US20060008135 Semiconductor integrated circuit pattern verification method, photomask manufacturing method, semiconductor integrated circuit device manufacturing method, and program for implementing semiconductor integrated circuit pattern verification method |
| 01/12/2006 | US20060007530 Mask, substrate with light reflection film, manufacturing method for light reflection film, manufacturing method for electro-optical device, and electro-optical device, and electronic apparatus |
| 01/12/2006 | DE112004000235T5 Fotomasken-Rohling, Fotomaske und Bild-Übertragungsverfahren unter Verwendung einer Fotomaske Photomask blank photo mask and image transmission method using a photomask |
| 01/12/2006 | DE10344048A1 Producing halftone phase mask by providing mask on chromium oxide or chromium mask layer, etching chromium oxide or chromium mask layer, and selectively etching refractory metal silicon nitride phase shifter layer using hard mask in plasma |
| 01/11/2006 | EP1615071A1 Mask blank, mask blank manufacturing method, transfer mask manufacturing method, and semiconductor device manufacturing method |
| 01/11/2006 | EP1615067A1 Optical element, optical system, laser device, exposure device, mask testing device, and high polymer crystal processing device |
| 01/11/2006 | EP1615063A1 Imaging system for emulating high aperture scanner systems |
| 01/11/2006 | EP1614009A2 Masking arrangement and method for producing integrated circuit arrangements |
| 01/11/2006 | CN1720483A Local flare correction |
| 01/10/2006 | US6985211 photolithography apparatus comprising reflection multilayer stacks of molybdenum, rhodium, palladium, platinum, ruthenium, silicon and/or yttrium, and light sources, used for focussing patterned radiation beams on target substrates |
| 01/10/2006 | US6985196 Mask for manufacturing a substrate with light reflecting film having random light transmitting parts and non-light transmitting parts |
| 01/10/2006 | US6984474 Reticle barrier system for extreme ultra-violet lithography |
| 01/10/2006 | US6984473 Method of patterning a mask blank |
| 01/10/2006 | US6984472 Exposure method and apparatus |
| 01/10/2006 | CA2116805C Mask and method for manufacturing the same |
| 01/05/2006 | WO2006001520A1 Exposure apparatus, exposure method, and exposure mask |
| 01/05/2006 | WO2005108077A3 Edge cure prevention process |
| 01/05/2006 | US20060003237 Transparent amorphous carbon structure in semiconductor devices |
| 01/05/2006 | US20060003236 Photomask and near-field exposure method |
| 01/05/2006 | US20060003235 Semiconductor manufacturing method and an exposure mask |
| 01/05/2006 | US20060003234 multiple exposure patterning to provide mark; photoresists; integrated circuits |
| 01/05/2006 | US20060003233 Exposure mask, method of designing and manufacturing the same, exposure method and apparatus, pattern forming method, and device manufacturing method |
| 01/05/2006 | DE102004019861B3 Verfahren zum Herstellen einer Maske für eine lithographische Abbildung A method of manufacturing a mask for a lithographic imaging |
| 01/04/2006 | EP1612834A1 A process for controlling the proximity effect correction |
| 01/04/2006 | EP1611484A2 Photoactive component comprising organic layers |
| 01/04/2006 | EP1611268A2 Apparatus and method for non-contact cleaning of a surface |
| 01/04/2006 | CN1717626A Method of pattern formation using ultrahigh heat resistant positive photosensitive composition |
| 01/04/2006 | CN1717624A Method of forming a rim phase shifting mask and using the rim phase shifting mask to form a semiconductor device |
| 01/04/2006 | CN1716535A Semiconductor manufacturing method and an exposure mask |
| 01/04/2006 | CN1716090A System for coloring a partially colored design in an alternating phase shift mask |
| 01/04/2006 | CN1235091C Inert gas displacement method and device, exposure device and graticule sheet device |
| 01/04/2006 | CN1235087C Mask pattern correction device and mask pattern correction method, mask manufacturing method and semiconductor device manufacturing method |