| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 03/09/2006 | US20060049137 Multi-step process for etching photomasks |
| 03/09/2006 | DE19623450B4 Fotomaske und deren Verwendung Photomask and their use |
| 03/09/2006 | DE10215193B4 Verfahren zur Kompensation von Streu-/Reflexionseffekten in der Teilchenstrahllithographie A method for compensating for scattering / reflection effects in the Teilchenstrahllithographie |
| 03/08/2006 | EP1632812A1 Projection exposure apparatus and method for producing a printed circuit board |
| 03/08/2006 | EP1579273A4 System and method for aerial image sensing |
| 03/08/2006 | CN1745380A System and method for automatically transferring a defect image from an inspection system to a database |
| 03/08/2006 | CN1244958C Mask defect inspection method and use thereof |
| 03/07/2006 | US7010776 Extending the range of lithographic simulation integrals |
| 03/07/2006 | US7010775 Method for creating mask pattern for circuit fabrication and method for verifying mask pattern for circuit fabrication |
| 03/07/2006 | US7010764 Effective proximity effect correction methodology |
| 03/07/2006 | US7010434 Complementary division condition determining method and program and complementary division method |
| 03/07/2006 | US7009753 Pattern generator |
| 03/07/2006 | US7008877 Etching of chromium layers on photomasks utilizing high density plasma and low frequency RF bias |
| 03/07/2006 | US7008758 Photomasks; photolithography; plasma enhanced chemical vapor deposition |
| 03/07/2006 | US7008738 photomask for forming regular and asymmetric arrays of high aspect ratio contact holes in integrated circuits; transparent layer, attenuating phase shifting layer, and light-obstructing layer patterned to form transparent holes; reduced side lobe effect; improved depth of focus |
| 03/07/2006 | US7008737 Gray scale x-ray mask |
| 03/07/2006 | US7008736 exposure light flux is transmitted and inverted through the shifter edge region contacted with the border of the opening region; destructive interference between exposure light fluxes improves resolution; microminiaturization, increased integration; photolithography |
| 03/07/2006 | US7008735 Mask for improving lithography performance by using multi-transmittance photomask |
| 03/07/2006 | US7008734 Phase shift mask |
| 03/07/2006 | US7008733 Method of improving a resolution of contact hole patterns by utilizing alternate phase shift principle |
| 03/07/2006 | US7008732 substrate with main patterns and sub-resolution assistant features, with 180 degree phase differences between assistant features and main pattern; high resolution |
| 03/07/2006 | US7008731 Method of manufacturing a photomask and method of manufacturing a semiconductor device using the photomask |
| 03/07/2006 | US7008730 Application of high transmittance attenuating phase shifting mask with dark tone for sub-0.1 micrometer logic device contact hole pattern in 193 NM lithography |
| 03/07/2006 | US7008729 Method for fabricating phase mask of photolithography process |
| 03/02/2006 | WO2006022913A1 Method of forming narrowly spaced flash memory contact openings |
| 03/02/2006 | WO2005029183A3 Method and apparatus for protecting a reticle used in chip production from contamination |
| 03/02/2006 | US20060048091 Method for correcting position-dependent distortions in patterning of integrated circuits |
| 03/02/2006 | US20060046497 Manufacturing method |
| 03/02/2006 | US20060046361 Stripping composition for removing a photoresist and method of manufacturing tft substrated for a liquid crystal display device using the same |
| 03/02/2006 | US20060046168 Method for designing an illumination light source, method for designing a mask pattern, method for manufacturing a photomask, method for manufacturing a semiconductor device and a computer program product |
| 03/02/2006 | US20060046162 Manufacturing method of semiconductor device |
| 03/02/2006 | US20060046161 Prevention of photoresist scumming |
| 03/02/2006 | US20060046160 bridging the mask gap between the first feature and the second feature; design of a microelectronic device; printing patterns for integrated circuits on semiconductor wafers; computer program product comprising instructions for data processing apparatus to perform operations |
| 03/02/2006 | US20060046159 Methods of manufacturing substrates with multiple images |
| 03/02/2006 | US20060046158 Substrates with multiple images |
| 03/02/2006 | US20060046157 [phase shift photomask] |
| 03/02/2006 | DE202005018237U1 Apparatus for printing a rigid flat substrate, useful in electronics, biotechnology, nanotechnology or medical technology, comprises a laser printer and a movable holder for positioning the substrate |
| 03/02/2006 | DE112004000566T5 Verfahren zum Herstellen eines Maskenrohlings und Verfahren zum Herstellen einer Maske A method for producing a mask blank and method for making a mask |
| 03/01/2006 | EP1630856A1 Mutilayer film reflector and x-ray exposure system |
| 03/01/2006 | EP1630614A1 Method for designing an illumination light source, method for designing a mask pattern, method for manufacturing a photomask, method for manufacturing a semiconductor device and a computer program product |
| 03/01/2006 | EP1630601A2 A mask manufacturing method, a method for optical proximity correction, a device manufacturing method, a computer program and a computer readable storage medium |
| 03/01/2006 | EP1630600A2 Hot melt composition and method involving forming a masking pattern |
| 03/01/2006 | EP0980542A4 Method of patterning sub-0.25 lambda line features with high transmission, "attenuated" phase shift masks |
| 03/01/2006 | CN1742232A Photomask and method for creating a protective layer on the same |
| 03/01/2006 | CN1742231A Patterning layers comprised of spin-on ceramic films |
| 03/01/2006 | CN1740909A Optical mask and producing method thereof |
| 03/01/2006 | CN1740908A Method for producing quartz/Az photoresist ultraviolet photoetched mask |
| 03/01/2006 | CN1740907A Structure for improving optical mask resolution ratio utilizing photon crystal |
| 03/01/2006 | CN1244017C Method of molecular-scale pattern imprinting at surface |
| 03/01/2006 | CN1244016C Exposure controlling light mask and production method thereof |
| 02/28/2006 | US7007265 Method for generating mask data, masks, recording media, and method for manufacturing semiconductor devices |
| 02/28/2006 | US7005649 Mask blanks inspection method and mask blank inspection tool |
| 02/28/2006 | US7005246 Forming antireflective films for liquid crystal displays byshifting a laser or electronic beam against the process target material and simultaneously repeating irradiation in an intermittent mannerto form convex microstructures; accuracy |
| 02/28/2006 | US7005240 Depositing a second layer on first layer; using a lithographic projection for forming elevated structure; conformally depositing a third layer on elevated first structure and on first layer; etching back third layer for forming spacer |
| 02/28/2006 | US7005220 Method for structuring a lithography mask |
| 02/28/2006 | US7005219 Defect repair method employing non-defective pattern overlay and photoexposure |
| 02/28/2006 | US7005218 computers and/or software used for adjustment photomasks during fabrication integrated circuits |
| 02/28/2006 | US7005217 Chromeless phase shift mask |
| 02/28/2006 | US7005216 Krypton fluoride laser lithography; photoresist pattern |
| 02/28/2006 | US7005215 Mask repair using multiple exposures |
| 02/23/2006 | WO2006020469A2 Mask for vapor deposition |
| 02/23/2006 | WO2006020194A2 Imprint alignment method, system, and template |
| 02/23/2006 | WO2006020006A1 Shadow frame with mask panels |
| 02/23/2006 | WO2006019919A2 Computer-implemented methods for generating input for a simulation program for generating a simulated image of a reticle |
| 02/23/2006 | WO2006019446A2 Double inspection of reticle or wafer |
| 02/23/2006 | WO2006019416A2 System and method for proximity effect correction in imaging systems |
| 02/23/2006 | WO2005079470A3 Photomask and method for conveying information associated with a photomask substrate |
| 02/23/2006 | WO2005057438A3 Flagging reticle layout data |
| 02/23/2006 | WO2005050310A3 Phase shift photomask and method for improving printability of a structure on a wafer |
| 02/23/2006 | WO2005029182A3 Method and apparatus for protecting a reticle used in chip production from contamination |
| 02/23/2006 | WO2005029181A3 Method and apparatus for compensating for the effects of gravity on a pellicle used for protecting a reticle from contamination |
| 02/23/2006 | WO2005022265A3 Method of forming optical images, apparatus for carrying out said method and process for manufacturing a device using said method |
| 02/23/2006 | US20060041851 Renesting interaction map into design for efficient long range calculations |
| 02/23/2006 | US20060040418 Method of correcting amplitude defect in multilayer film of EUVL mask |
| 02/23/2006 | US20060040214 Transverse electric-field type liquid crystal display device, process of manufacturing the same, and scan-exposing device |
| 02/23/2006 | US20060040189 Advanced oriented assist features for integrated circuit hole patterns |
| 02/23/2006 | US20060040188 Method for designing alternating phase shift masks |
| 02/23/2006 | US20060040187 Lithographic apparatus, method, and computer program product for generating a mask pattern and device manufacturing method using same |
| 02/23/2006 | US20060040186 Apparatus for producing a hologram mask |
| 02/23/2006 | US20060039597 Method for correcting a mask pattern, system for correcting a mask pattern, program, method for manufacturing a photomask and method for manufacturing a semiconductor device |
| 02/23/2006 | US20060039596 Pattern measuring method, pattern measuring apparatus, photo mask manufacturing method, semiconductor device manufacturing method, and computer program product |
| 02/23/2006 | US20060039594 Early error detection during fabrication of reticles |
| 02/23/2006 | US20060038974 Implanting a drug delivery device coated with polymer layer prepared from a compound having methylene-based chain reactive functional group(s) (octadecyl isocyanate or 1-octadecanol); becomes less crystalline when exposed to electrical stimulus, increasing rate of drug release |
| 02/23/2006 | US20060038944 Mask, thin film transistor substrate, method of manufacturing the thin film transistor substrate using the mask, and display apparatus using the thin film transistor substrate |
| 02/23/2006 | US20060038746 Low-Cost Lithography |
| 02/23/2006 | US20060038171 Semiconductor integrated circuit design tool, computer implemented method for designing semiconductor integrated circuit, and method for manufacturing semiconductor integrated circuit |
| 02/23/2006 | US20060037939 Method for producing phase shifter masks |
| 02/23/2006 | DE102005035769A1 EUV-Lithographiemaske mit magnetischem Kontrast und deren Herstellung EUV lithography mask with magnetic contrast and their preparation |
| 02/22/2006 | EP1628157A1 Lithographic apparatus, method and a computer program product for generating a mask pattern on an addressable mask and device manufacturing method using same |
| 02/22/2006 | EP1627718A1 Method of decorating surface of mold and mold |
| 02/22/2006 | EP1535116A4 Improved photomask having an intermediate inspection film layer |
| 02/22/2006 | EP1137967B1 Method for mask repair using defect compensation |
| 02/22/2006 | CN2760614Y Optical mask chrome mask laser micro-repair powder sending device |
| 02/22/2006 | CN1739066A Electron beam processing technology for mask repair |
| 02/22/2006 | CN1739065A Method of patterning photoresist on a wafer using a transmission mask with a carbon layer |
| 02/22/2006 | CN1737694A Optical proximity correction using chamfers and rounding at corners |
| 02/22/2006 | CN1737689A Pellicle frame and pellicle for photolithography using the same |
| 02/22/2006 | CN1737680A Advanced oriented assist features for integrated circuit hole patterns |
| 02/22/2006 | CN1243285C Exposure mask for fabricating liquid crystal display and method for exposing substrate in fabricating liquid crystal display using the mask |
| 02/21/2006 | US7003758 System and method for lithography simulation |