| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 03/29/2006 | CN1248050C Base board for optical mask and its mfg. method, optical mask blank and optical mask |
| 03/29/2006 | CN1248049C Mask mfg. method |
| 03/29/2006 | CN1248048C Process for preparing light mask |
| 03/28/2006 | US7020866 Mask data processor |
| 03/28/2006 | US7020323 Pattern defect inspection apparatus and method |
| 03/28/2006 | US7020321 Pattern data converting method and apparatus |
| 03/28/2006 | US7019835 Method and system to measure characteristics of a film disposed on a substrate |
| 03/28/2006 | US7019313 Methods and devices for evaluating beam blur in subfields projection-exposed by a charged-particle-beam microlithography apparatus |
| 03/28/2006 | US7018943 Method of uniformly coating a substrate |
| 03/28/2006 | US7018934 Methods and apparatus for etching metal layers on substrates |
| 03/28/2006 | US7018788 Phase shifting lithographic process |
| 03/28/2006 | US7018753 Variable mask field exposure |
| 03/28/2006 | US7018750 Exposing the silicon layer to a laser beam through a mask having a phase shift layer; stripes having a first width separated by slits, and an overlapping blocking layer having stripes having a narrower width and parallel to the first |
| 03/28/2006 | US7018747 Photomask having line end phase anchors |
| 03/28/2006 | US7018746 Defining a unique image property linked to the accurate placement of the assist features, and combines that with in-situ image simulation of the individual layout; individual device on the photomask layout are marked with error marker shapes to be subsequently corrected; computer readable media |
| 03/28/2006 | US7018556 removing chrome from the surface of a calcium fluoride (CaF2) object by etching the chrome a first amount in a first chrome etchant, and etching the chrome a second amount beyond the first amount in second selective chrome etchant, such that the CaF2 object maintains a micro-roughness. |
| 03/23/2006 | WO2006030627A1 Reflective mask blank for euv lithography and method for producing same |
| 03/23/2006 | US20060063384 Mask patterns for semiconductor device fabrication and related methods and structures |
| 03/23/2006 | US20060063077 Mask patterns including gel layers for semiconductor device fabrication and methods of forming the same |
| 03/23/2006 | US20060063076 Pseudo low volume reticle (PLVR) design for asic manufacturing |
| 03/23/2006 | US20060063075 Layout of a vertical pattern used in dipole exposure apparatus |
| 03/23/2006 | US20060062445 Methods, systems, and carrier media for evaluating reticle layout data |
| 03/23/2006 | US20060062348 Multilayer film reflector and X-ray exposure system |
| 03/23/2006 | US20060061756 Exposure method for correcting a focal point, and a method for manufacturing a semiconductor device |
| 03/23/2006 | DE102005035144A1 Belichtungsmaskenherstellungsverfahren, Zeichnungsvorrichtung, Halbleitereinrichtungsherstellungsverfahren und Maskenrohlingsprodukt Exposure mask manufacturing process, drawing device, semiconductor device manufacturing method and mask blank product |
| 03/23/2006 | DE102005023662A1 Wärmebehandlungseinrichtung und Wärmebehandlungsverfahren Heat treatment device and heat treatment process |
| 03/22/2006 | EP1636655A2 Method of designing a reticle and forming a semiconductor device therewith |
| 03/22/2006 | EP1636653A2 Adhesion method using gray-scale photolithography |
| 03/22/2006 | EP1248963B1 Mitigation of substrate defects in reticles using multilayer buffer layers |
| 03/22/2006 | EP1240557A4 Imaging method using phase boundary masking with modified illumination |
| 03/22/2006 | CN1749861A Apparatus, method and program product for suppressing waviness of features to be printed using photolithographic systems |
| 03/22/2006 | CN1749854A Hot melt |
| 03/22/2006 | CN1749853A Transparent substrate for mask blank and mask blank |
| 03/22/2006 | CN1749852A Method for making chrome photo mask |
| 03/22/2006 | CN1749851A Mask plate supply system, method for producing mask plate and mask plate transparent substrate |
| 03/21/2006 | US7017141 Integrated verification and manufacturability tool |
| 03/21/2006 | US7016387 Windows, electrode masking segments; measurement adjustment pattern segments |
| 03/21/2006 | US7016025 Method and apparatus for characterization of optical systems |
| 03/21/2006 | US7015489 Collector having unused region for illumination systems using a wavelength less than or equal to 193 nm |
| 03/21/2006 | US7015487 Apparatus and method for exposing a radiation sensitive layer by means of charged particles as well as a mask for this purpose |
| 03/21/2006 | US7014963 Photolithography mask with reduced thermally induced distortion; dielectric lands having alternating layers of higher and lower refractive index |
| 03/21/2006 | US7014962 Half tone alternating phase shift masks |
| 03/21/2006 | US7014961 Comprising a photomask substrate, a porous frame, and a pellicle; the porous frame is permeable to oxygen or nitrogen gas, specified pore size and coefficient of thermal expansion; allows the pellicle space to be purged with an inert gas to clean |
| 03/21/2006 | US7014960 Chelation cleaning process for repairing photomasks |
| 03/21/2006 | US7014959 CD uniformity of chrome etch to photomask process |
| 03/21/2006 | US7014958 Method for dry etching photomask material |
| 03/21/2006 | US7014956 Masking to reduce pattern deformation; semiconductors |
| 03/21/2006 | US7014955 System and method for indentifying dummy features on a mask layer |
| 03/16/2006 | WO2006028228A1 Glass substrate storage case, glass substrate exchange device, glass substrate management device, glass substrate distribution method, seal member, and seal structure using the seal member |
| 03/16/2006 | WO2006028227A1 Adhesive |
| 03/16/2006 | WO2006028168A1 Photomask blank and photomask |
| 03/16/2006 | WO2006027928A1 Photomask blank, photomask and method for producing those |
| 03/16/2006 | US20060058489 Silicon-containing compositions for spin-on arc/hardmask materials |
| 03/16/2006 | US20060057857 Aperture masks for circuit fabrication |
| 03/16/2006 | US20060057478 Panel for display device and manufacturing method thereof |
| 03/16/2006 | US20060057476 Antireflective coating; making semiconductors at lower wavelengths using reflective masks that can be effectively inspected at multiple wavelengths; wide bandwidth inspection contrast for extreme ultra-violet reticles |
| 03/16/2006 | US20060057475 Binary optical proximity correction; forming a photolithographic mask layout with Sub-Resolution Assist Feature; computer programs; process control |
| 03/16/2006 | US20060057474 Photomasks; optics |
| 03/16/2006 | US20060057473 photomasks; phase shifting |
| 03/16/2006 | US20060057472 Method for making chrome photo mask |
| 03/16/2006 | US20060057471 Lithographic apparatus and device manufacturing method |
| 03/16/2006 | US20060057470 Method for producing mask blank and method for producing transfer mask |
| 03/16/2006 | US20060057469 Photomask blank, photomask, and pattern transfer method using photomask |
| 03/16/2006 | US20060057468 Method of pattern formation using ultrahigh heat resistant positive photosensitive composition |
| 03/16/2006 | US20060054836 Mask blanks inspection method and mask blank inspection tool |
| 03/16/2006 | DE102005043338A1 Lichtdurchlässiges Substrat für Maskenrohling und Maskenrohling The light transmissive substrate for mask blank and mask blank |
| 03/16/2006 | DE102004038548A1 Mask blank manufacturing method for photolithography processing, involves designing handling portion so that multilayered layer on front surface of substrate is exposed in each handling portion and pressed by mechanical clamp |
| 03/15/2006 | EP1635222A2 A method for performing full-chip manufacturing reliability checking and correction |
| 03/15/2006 | EP1635217A1 Process for fabricating semiconductor device and method for generating mask pattern data |
| 03/15/2006 | EP1364231B1 A self-cleaning optic for extreme ultraviolet lithography |
| 03/15/2006 | CN1748288A Mask processing device, mask processing method, program, and mask |
| 03/15/2006 | CN1747917A Radiation durable organic compounds with high transparency in the vaccum ultraviolet, and method for preparing |
| 03/15/2006 | CN1746769A Lithographic apparatus, method and a computer program product for generating a mask pattern on an addressable mask and device manufacturing method using same |
| 03/15/2006 | CN1245662C Optical hood for reducing lens aberration and pattern shifting and method |
| 03/15/2006 | CN1245661C Method for preparing contact hole and combined optical mask |
| 03/14/2006 | US7013453 Full sized scattering bar alt-PSM technique for IC manufacturing in sub-resolution ERA |
| 03/14/2006 | US7013439 Contrast based resolution enhancing technology |
| 03/14/2006 | US7012753 Optical device with enhanced mechanical stability operating in the extreme ultraviolet and lithography mask comprising such a device |
| 03/14/2006 | US7012674 Maskless optical writer |
| 03/14/2006 | US7012671 Exposure apparatus and method |
| 03/14/2006 | US7012031 Photoresist pattern, method of fabricating the same, and method of assuring the quality thereof |
| 03/14/2006 | US7011936 Photomask and method of structuring a photoresist by double exposure with imaging auxiliary structures and different exposure tools |
| 03/14/2006 | US7011926 Gap forming pattern fracturing method for forming optical proximity corrected masking layer |
| 03/14/2006 | US7011912 Rapid, error free semiconductor batch production |
| 03/14/2006 | US7011910 Halftone-type phase-shift mask blank, and halftone-type phase-shift mask |
| 03/14/2006 | US7011909 Radiation phase shifting partially transparent layer; producing semiconductors |
| 03/09/2006 | US20060053402 Pattern data correcting method, photo mask manufacturing method, semiconductor device manufacturing method, program and semiconductor device |
| 03/09/2006 | US20060051974 Mask and manufacturing method using mask |
| 03/09/2006 | US20060051936 Mask and production method therefor and production for semiconductor device |
| 03/09/2006 | US20060051705 Method of imaging |
| 03/09/2006 | US20060051685 Negative dye-containing curable composition, color filter and method of producing the same |
| 03/09/2006 | US20060051684 Photo-mask having exposure blocking region and methods of designing and fabricating the same |
| 03/09/2006 | US20060051683 Method of manufacturing mask for exposure, mask for exposure, and package body of mask for exposure |
| 03/09/2006 | US20060051682 Methods for simulating reticle layout data, inspecting reticle layout data, and generating a process for inspecting reticle layout data |
| 03/09/2006 | US20060051681 Method of repairing a photomask having an internal etch stop layer |
| 03/09/2006 | US20060051680 Combining image imbalance compensation and optical proximity correction in designing phase shift masks |
| 03/09/2006 | US20060051679 Lithographic method for wiring a side surface of a substrate |
| 03/09/2006 | US20060050967 Image processing apparatus and program |
| 03/09/2006 | US20060050371 Antireflection coating for ultraviolet light at large angles of incidence |
| 03/09/2006 | US20060049838 Pattern evaluation method, manufacturing method of semiconductor device, correction method of mask pattern and manufacturing method of exposure mask |