| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 04/18/2006 | US7029805 Imageable element with masking layer comprising betaine-containing co-polymers |
| 04/18/2006 | US7029804 Masking for projecting circuit pattern; radiation transparent substrate, dielectric layer; blocking layer over reflective layer; etching pattern; photolithography |
| 04/18/2006 | US7029803 Lithography; multilayer; substrate, thin films , layer having controlled optical transmission; defect-free |
| 04/18/2006 | US7029802 Embedded bi-layer structure for attenuated phase shifting mask |
| 04/18/2006 | US7029801 Method of manufacturing mask for electron beam lithography and mask blank for electron beam lithography |
| 04/18/2006 | US7029800 Reticle with antistatic coating |
| 04/18/2006 | US7029799 Dividing pattern into zones; drawing |
| 04/18/2006 | US7029593 Method for controlling CD during an etch process |
| 04/13/2006 | WO2005111874A3 Integrated circuit layout design methodology with process variation bands |
| 04/13/2006 | WO2005076077A3 Mask inspection apparatus and method |
| 04/13/2006 | US20060080633 Method for performing full-chip manufacturing reliability checking and correction |
| 04/13/2006 | US20060079091 Mask, method of producing the same, and method of producing semiconductor device |
| 04/13/2006 | US20060078806 Lithographic apparatus and device manufacturing method |
| 04/13/2006 | US20060078805 Lithographic apparatus and device manufacturing method |
| 04/13/2006 | US20060078804 Calibration of optical line shortening measurements |
| 04/13/2006 | US20060078637 Solid immersion lens lithography |
| 04/13/2006 | US20060078407 System and method for reticle protection and transport |
| 04/13/2006 | US20060076491 Mask inspection apparatus, mask inspection method, and electron beam exposure system |
| 04/13/2006 | DE102004044039A1 Rapid development or production of semiconductor chips with an acid scavenger present is effected using lithographic simulation test runs to determine production parameters and product properties |
| 04/12/2006 | EP1644775A2 Method for analysing objects in microlithography |
| 04/12/2006 | CN1758138A Multi-exposure semiconductor fabrication mask sets and methods of fabricating such multi-exposure mask sets |
| 04/12/2006 | CN1251119C Network-based photo-mask data input interface and instruction generator for mfg. photo-mask |
| 04/12/2006 | CN1251024C Method for making micro-structure unit |
| 04/12/2006 | CN1251020C Light mask and making method thereof |
| 04/11/2006 | US7028285 Standard cell design incorporating phase information |
| 04/11/2006 | US7028284 Convergence technique for model-based optical and process correction |
| 04/11/2006 | US7027888 Semiconductor manufacturing apparatus |
| 04/11/2006 | US7026082 Method for determining parameters for lithographic projection, a computer system and computer program therefor, a method of manufacturing a device and a device manufactured thereby |
| 04/11/2006 | US7026081 Optical proximity correction method utilizing phase-edges as sub-resolution assist features |
| 04/11/2006 | US7026078 Method of manufacturing photomask |
| 04/11/2006 | US7026077 Forming pattern on radiation transparent substrate; sputtering in helium environment; heating |
| 04/11/2006 | US7026076 Method of patterning photoresist on a wafer using a reflective mask with a multi-layer ARC |
| 04/11/2006 | US7025865 Manufacturing metal masks using a manufacturing method for electroluminescence (EL) devices; dimensional control, precision |
| 04/11/2006 | US7025280 Adaptive real time control of a reticle/mask system |
| 04/06/2006 | WO2006037027A1 Phase-shift mask providing balanced light intensity through different phase-shift apertures and method for forming such phase-shift mask |
| 04/06/2006 | WO2006035925A1 Measurement method, exposure method, and device manufacturing method |
| 04/06/2006 | WO2006035894A1 Member for supporting thin film coated board, container for storing thin film coated board, mask blank storing body, transfer mask storing body and method for transporting thin film coated board |
| 04/06/2006 | WO2006035859A1 Method of patterning self-organizing material, patterned substrate of self-organizing material and method of producing the same, and phosomask using patterned substrate of self-organizing material |
| 04/06/2006 | WO2006019416A3 System and method for proximity effect correction in imaging systems |
| 04/06/2006 | US20060075377 Functionalized beads for the immobilization of nucleic acids, wherein the beads are stably associated with a solid support selected from multiwell plates, arrays of pits and multiwell supports |
| 04/06/2006 | US20060075376 System and method for phase shift assignment |
| 04/06/2006 | US20060074510 Network-based photomask data entry interface and instruction generator for manufacturing photomasks |
| 04/06/2006 | US20060073425 Pattern designing method, photomask manufacturing method, resist pattern forming method and semiconductor device manufacturing method |
| 04/06/2006 | US20060073417 Photopolymer plate and method for imaging the surface of a photopolymer plate |
| 04/06/2006 | US20060073397 Masking arrangement and method for producing integrated circuit arrangements |
| 04/06/2006 | US20060073396 Multi-exposure semiconductor fabrication mask sets and methods of fabricating such multi-exposure mask sets |
| 04/06/2006 | US20060073395 Contact material and system for ultra-clean applications |
| 04/06/2006 | US20060073394 Reduced mask count gate conductor definition |
| 04/06/2006 | US20060073273 Method for manufacturing optical elements |
| 04/06/2006 | US20060072806 Method for inspecting photomask |
| 04/06/2006 | US20060072064 Method of manufacturing a liquid crystal display and a mask for use in same |
| 04/06/2006 | US20060071183 Method of manufacturing semiconductor device, semiconductor manufacturing apparatus, and stencil mask |
| 04/05/2006 | EP1643542A1 Focus test mask, focus measureing method, and exposure device |
| 04/05/2006 | EP1643298A1 Method of manufacturing a liquid crystal display and a mask for use in same |
| 04/05/2006 | EP1642742A2 Ink jet recording sheet for plate-making mask film and process for producing flexographic printing plate |
| 04/05/2006 | EP1642174A2 Exposure method and apparatus, exposure mask, and device manufacturing method |
| 04/05/2006 | EP1642171A1 Exposure mask, method of designing and manufacturing the same, exposure method and apparatus, pattern forming method, and device manufacturing method |
| 04/05/2006 | EP1417538B1 Photosensitive, flexo printing element and method for the production of newspaper flexo printing plates |
| 04/05/2006 | EP1311637B1 Fluoroalkyl (meth)acrylate copolymer coating compositions |
| 04/05/2006 | CN1756996A A method of patterning photoresist on a wafer using an attenuated phase shift mask |
| 04/05/2006 | CN1756992A Method of patterning photoresist on a wafer using a reflective mask with a multi-layer ARC |
| 04/05/2006 | CN1755528A Alignment method of exposure mask and manufacturing method of thin film element substrate |
| 04/05/2006 | CN1755527A Method for aligning exposure mask and method for manufacturing thin film device substrate |
| 04/05/2006 | CN1755521A Ink jet recording sheet for plate-making mask film, and process for producing flexographic printing plate |
| 04/05/2006 | CN1755520A Grey mask |
| 04/05/2006 | CN1755519A Mask blank substrate, mask blank, exposure mask, mask blank substrate manufacturing method, and semiconductor manufacturing method |
| 04/05/2006 | CN1755472A Method of manufacturing a liquid crystal display and a mask for use in same |
| 04/04/2006 | US7024655 Mixed-mode optical proximity correction |
| 04/04/2006 | US7023528 Hybrid electronic mask |
| 04/04/2006 | US7022607 Mask and its manufacturing method, and method for manufacturing semiconductor device |
| 04/04/2006 | US7022440 Plurality of non-straight lines that are inwardly arched and are formed from plural segments of plural ellipses that are arranged to surround the pattern; for forming a storage electrode of a capacitor of a semiconductor device |
| 04/04/2006 | US7022439 Receiving the mask layout, and examining the polygon to determine if the polygon includes a hole exit route next to a notch; and if so, moving an exit route from the hole so that a resulting fracturing of the polygon does not create a sliver with a width less than a pre-specified minimum size |
| 04/04/2006 | US7022438 Fine contact aperture; overcoating transparent substrate with opaque pattern; phase shifting; photolithography |
| 04/04/2006 | US7022437 for use in a photolithographic apparatus includes a blank layer, a layer of patterned opaque material on a surface of the blank layer and a pellicle of perfluoropolyether (PFPE) liquid that covers the surface |
| 04/04/2006 | US7022436 alternating and attenuating phase shift masks that provide improved resolution of a photolithographic projection apparatus |
| 04/04/2006 | US7022435 Method for the manufacture of phase shifting masks for EUV lithography |
| 04/04/2006 | US7022247 Process to form fine features using photolithography and plasma etching |
| 03/30/2006 | WO2006033442A1 Reflective mask, reflective mask manufacturing method and exposure apparatus |
| 03/30/2006 | WO2005064399A3 Lithography system using a programmable electro-wetting mask |
| 03/30/2006 | WO2005047976A3 Varying feature size in resist |
| 03/30/2006 | US20060068331 Exposure method |
| 03/30/2006 | US20060068305 Method for aligning exposure mask and method for manufacturing thin film device substrate |
| 03/30/2006 | US20060068304 Reduces an area necessary for alignment marks of an object while maintaining the minimum allowable gap among alignment marks on the same exposure mask |
| 03/30/2006 | US20060068302 Detecting defects in a first mask with features usable to pattern regular elements and redundancy elements of a microelectronic or microelectromechanical substrate; making a second mask including second features usable to pattern interconnections between the regular elements and the redundancy elements |
| 03/30/2006 | US20060068301 Pattern decision method and system, mask manufacturing method, image-forming performance adjusting method, exposure method and apparatus, program, and information recording medium |
| 03/30/2006 | US20060068300 Mask blank substrate, mask blank, exposure mask, mask blank substrate manufacturing method, and semiconductor manufacturing method |
| 03/30/2006 | US20060068299 Multi wavelength multi layer printing |
| 03/30/2006 | US20060068298 Transfer mask blank, transfer mask, and transfer method using the transfer mask |
| 03/30/2006 | US20060068132 Ink jet recording sheet for plate-making mask film, and process for producing flexographic printing plate |
| 03/30/2006 | US20060066844 Optical inspection apparatus and optical inspection method |
| 03/30/2006 | US20060065185 Crystallization apparatus, crystallization method, and phase shifter |
| 03/30/2006 | DE102005046188A1 Mask for irradiating with electron beams in a lithographic process for producing semiconductor components has opening sections for correcting a proximity effect |
| 03/30/2006 | DE102004041921A1 Phase-shift mask for projecting a pattern of structural elements onto a semiconductor wafer comprises a mask substrate, structural elements and a boundary line arranged between surfaces of the mask substrate |
| 03/30/2006 | DE10118409B4 Verfahren zur Strukturierung eines Resists Method for structuring a resist |
| 03/30/2006 | CA2521581A1 Ink jet recording sheet for plate-making mask film, and process for producing flexographic printing plate |
| 03/29/2006 | EP1641034A2 Pattern film repair using a gas assisted focused particle beam system |
| 03/29/2006 | EP1639148A1 Mask retaining device |
| 03/29/2006 | EP1518150B1 Method of reticle fabrication using an amorphous carbon layer |
| 03/29/2006 | CN1754131A Multiple exposure method for circuit performance improvement |
| 03/29/2006 | CN1752844A Mask patterns for semiconductor device fabrication and related methods and structures |