| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 05/09/2006 | US7042079 Variable rotational assignment of interconnect levels in integrated circuit fabrication |
| 05/09/2006 | US7041436 Method for the manufacture of micro structures |
| 05/09/2006 | US7041434 Technique for enhancing accuracy of critical dimensions of a gate electrode by using characteristics of an ARC layer |
| 05/09/2006 | US7041416 Photopolymerization of unsaturated monomer; photoinitiator; liquid crystal display |
| 05/09/2006 | US7041229 Patterned product and its manufacturing method |
| 05/09/2006 | US7040011 Wiring substrate manufacturing method |
| 05/04/2006 | WO2006046764A1 Exposure method and apparatus |
| 05/04/2006 | WO2006046682A1 Reticle protective member, reticle carrying apparatus, exposure device, and reticle carrying method |
| 05/04/2006 | WO2006046488A1 Substrate transfer apparatus, substrate transfer method and exposure apparatus |
| 05/04/2006 | WO2006020469A3 Mask for vapor deposition |
| 05/04/2006 | WO2006019446A3 Double inspection of reticle or wafer |
| 05/04/2006 | WO2005109256A3 Methos and apparatus for designing integrated circuit layouts |
| 05/04/2006 | WO2005083516A3 Protected pattern mask for reflection lithography in the extreme uv or soft x-ray range |
| 05/04/2006 | US20060094040 Lithographic mask design and synthesis of diverse probes on a substrate |
| 05/04/2006 | US20060093971 transparent support glass with light attenuators, ultraviolet light exposure of photoresist layer is effectuated in predetermined patterns through exposure photomask having light-transmissive openings |
| 05/04/2006 | US20060093965 Multilayer integrated circuits on substrate; first pattern is imaged using exposure tool; masking; cycles |
| 05/04/2006 | US20060093964 Manufacturing method of microstructure, manufacturing method and manufacturing device of electronic device |
| 05/04/2006 | US20060093961 Method of verifying electron beam data |
| 05/04/2006 | US20060093927 Pattern mask with features to minimize the effect of aberrations |
| 05/04/2006 | US20060093926 Improving the margin by adding an un-transferable auxiliary pattern by preparing mask pattern data including a pair of two line patterns adjacent to each other in a short edge direction; disposing the auxiliary pattern to a resist film at a center of a space between the lines; semiconductors |
| 05/04/2006 | US20060093925 Method for repairing opaque defects in photolithography masks |
| 05/04/2006 | US20060093924 Method and apparatus for correction of defects in lithography masks |
| 05/04/2006 | US20060092426 Apparatus for visual inspection |
| 05/03/2006 | EP1653282A2 Method and apparatus for variable polarization control in a lithography system |
| 05/03/2006 | CN2777600Y Chromium-free film layer phase shift light shade |
| 05/03/2006 | CN1766609A Method for inspecting mask |
| 05/03/2006 | CN1254848C Manufacturing method of photo mask and semiconductor device |
| 05/02/2006 | US7039896 Gradient method of mask edge correction |
| 05/02/2006 | US7039889 Apparatus, method, and program for designing a mask and method for fabricating semiconductor devices |
| 05/02/2006 | US7038992 Mask pattern forming method and device, and method of producing optical disk |
| 05/02/2006 | US7037809 Method of manufacturing semiconductor device using a laser irradiation process |
| 05/02/2006 | US7037639 Methods of manufacturing a lithography template |
| 05/02/2006 | US7037628 Method of a floating pattern loading system in mask dry-etching critical dimension control |
| 05/02/2006 | US7037627 Photomask defect testing method, photomask manufacturing method and semiconductor integrated circuit manufacturing method |
| 05/02/2006 | US7037626 an assembly of lithographic sub-masks together forming a fictitious design mask for configuring a device pattern in a layer of a substrate |
| 05/02/2006 | US7037625 Phase shift mask blank and method of manufacture |
| 05/02/2006 | US7036980 Apparatus and method for forming pattern |
| 04/27/2006 | WO2006043004A1 Lithography mask structure |
| 04/27/2006 | WO2005115743A3 Light scattering euvl mask |
| 04/27/2006 | WO2005082063A3 Long range corrections in integrated circuit layout designs |
| 04/27/2006 | WO2005076075A3 Adaptive real time control of a reticle/mask system |
| 04/27/2006 | US20060088792 Pattern forming method, semiconductor device manufacturing method and exposure mask set |
| 04/27/2006 | US20060088774 Photomask blank, photomask and fabrication method thereof |
| 04/27/2006 | US20060088772 Pattern-Distributed Mask |
| 04/27/2006 | US20060088771 A layer of anti-reflective material is formed on a trenched phase shift having portions of a light-blocking layer mask and then removed on horizontal surfaces of the mask and on the light-blocking portions; eliminates intensity imbalances between the alternating trenched and untrenched areas |
| 04/27/2006 | US20060087649 Defect inspecting apparatus and defect inspection method |
| 04/27/2006 | US20060087639 System and method for using a two part cover for and a box for protecting a reticle |
| 04/27/2006 | US20060087638 Substrate conveyor apparatus, substrate conveyance method and exposure apparatus |
| 04/27/2006 | US20060086371 Particle remover, exposure apparatus having the same, and device manufacturing method |
| 04/27/2006 | DE102005047475A1 Mehrbelichtungs-Halbleiterherstellungsmaskensätze und Verfahren zum Herstellen von solchen Mehrbelichtungsmaskensätzen More exposure semiconductor manufacturing mask sets and processes for preparing such multi-exposure mask sets |
| 04/27/2006 | DE102005046135A1 Substrat für Maskenrohling, Maskenrohling, Belichtungsmaske, Herstellungsverfahren für Maskenrohlingssubstrat und Herstellungsverfahren für Halbleiter Substrate for mask blank, mask blank exposure mask manufacturing method of mask blank substrate and manufacturing method of semiconductor |
| 04/26/2006 | EP1650600A2 Photomask blank, photomask and fabrication method thereof |
| 04/26/2006 | EP1649323A2 Method for correcting critical dimension variations in photomasks |
| 04/26/2006 | CN1763632A Photomask blank, photomask and fabrication method thereof |
| 04/25/2006 | US7036108 Full sized scattering bar alt-PSM technique for IC manufacturing in sub-resolution era |
| 04/25/2006 | US7035449 Method for applying a defect finder mark to a backend photomask making process |
| 04/25/2006 | US7035448 Method of defect inspection of graytone mask and apparatus doing the same |
| 04/25/2006 | US7035446 Quality measurement of an aerial image |
| 04/25/2006 | US7035001 High NA system for multiple mode imaging |
| 04/25/2006 | US7034986 Pattern generator mirror configurations |
| 04/25/2006 | US7034318 Method of manufacturing semiconductor device, semiconductor manufacturing apparatus, and stencil mask |
| 04/25/2006 | US7033947 Dual trench alternating phase shift mask fabrication |
| 04/25/2006 | US7033925 Pattern transfer mask related to formation of dual damascene structure and method of forming dual damascene structure |
| 04/25/2006 | US7033851 Bump structure of a scattering reflective board and method for manufacturing the bump structure |
| 04/25/2006 | US7033709 masking; selectively coding the spaced regions to define a masked read only memory (ROM) structure that causes optical interference; illumination; development; improved circuit density and reliability; miniaturization; integrated circuits |
| 04/25/2006 | US7033708 Image focus monitor for alternating phase shift masks |
| 04/25/2006 | US7033516 Inexpensive fabrication of large-area pixel arrays for displays and sensors |
| 04/25/2006 | US7032512 Reduce or eliminate ridges at the edges of printing plate, by reducing UV exposure to the edges, spraying masking material, automatic control the spray movement by computer, materials handling |
| 04/20/2006 | WO2006041868A1 System and method for analyzing photomask geometries |
| 04/20/2006 | WO2005059651A3 Method for repairing errors of patterns embodied in thin layers |
| 04/20/2006 | WO2005026837A3 Imprint lithographic method, and device and stamp for use in imprint lithography |
| 04/20/2006 | WO2004073379A3 Optical lithography using both photomask surfaces |
| 04/20/2006 | US20060084261 Interconnect layout method |
| 04/20/2006 | US20060083998 Use of chromeless phase shift features to pattern large area line/space geometries |
| 04/20/2006 | US20060083997 Photomask with wavelength reduction material and pellicle |
| 04/20/2006 | US20060083996 Apparatus for exposing a substrate, photomask and modified illuminating system of the apparatus, and method of forming a pattern on a substrate using the apparatus |
| 04/20/2006 | US20060083995 Method of correcting mask data, method of manufacturing a mask and method of manufacturing a semiconductor device |
| 04/20/2006 | US20060083994 Method and apparatus for removing radiation side lobes |
| 04/20/2006 | US20060083993 Process for the production of photomasks for structuring semiconductor substrates by optical lithography |
| 04/20/2006 | US20060082782 Defect inspecting apparatus |
| 04/20/2006 | US20060082743 Apparatus and method for removing contaminant on original, method of manufacturing device, and original |
| 04/20/2006 | US20060081008 Method for manufacturing synthetic silica glass substrate for photomask and synthetic silica glass substrate for photomask manufactured thereby |
| 04/20/2006 | DE10206188B4 Verfahren zur Herstellung einer alternierenden Phasenmaske A process for producing an alternating phase mask |
| 04/20/2006 | DE102005025398A1 Maskenrohling, Herstellungsverfahren für eine Phasenänderungsmaske und Herstellungsverfahren für eine Form Mask blank manufacturing method of a phase change mask and fabrication method of a mold |
| 04/19/2006 | EP1646913A2 Methods and systems for inspection of wafers and reticles using designer intent data |
| 04/19/2006 | EP1257881B1 Laser imaged printing plates comprising a multi-layer slip film |
| 04/19/2006 | CN1761914A Substrate for reticle and method of manufacturing the substrate, and mask blank and method of manufacturing the mask blank |
| 04/19/2006 | CN1761913A Method of manufacturing mask blank |
| 04/19/2006 | CN1761907A Optical element, optical system, laser device, exposure device, mask testing device and high polymer crystal processing device |
| 04/19/2006 | CN1761036A Method for fabricating semiconductor device using tungsten as sacrificial hard mask |
| 04/19/2006 | CN1760755A Apparatus for exposing a substrate, photomask and modified illuminating system of the apparatus, and method of forming a pattern on a substrate using the apparatus |
| 04/19/2006 | CN1760754A Methods for aligning patterns on a substrate based on optical properties of a mask layer and related devices |
| 04/19/2006 | CN1252539C Reflector utilizing microimage to make exposure and its production method |
| 04/19/2006 | CN1251961C Soft lithography and tearing technology for colloid crystal microprocessing of pattern |
| 04/18/2006 | US7032209 Mask pattern and method for forming resist pattern using mask pattern thereof |
| 04/18/2006 | US7032208 Defect inspection apparatus |
| 04/18/2006 | US7030962 Projection exposure mask, projection exposure apparatus, and projection exposure method |
| 04/18/2006 | US7030467 Method of deforming a pattern and semiconductor device formed by utilizing deformed pattern |
| 04/18/2006 | US7030039 Method of uniformly coating a substrate |
| 04/18/2006 | US7029830 1-10 micrometer thick crystaline membrane surrounded by a frame of a bulk type crystalline material |