| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 06/01/2006 | DE19825039B4 Verfahren zum Strukturieren eines chemisch verstärkten Photoresists A method for patterning a chemically amplified photoresists |
| 06/01/2006 | DE10115888B4 Verfahren zur Einzelmaskenkalibrierung Process for individual calibration mask |
| 05/31/2006 | EP1662324A2 Reticle-carrying container |
| 05/31/2006 | EP1660944A2 Method of forming optical images, apparatus for carrying out said method and process for manufacturing a device using said method |
| 05/31/2006 | EP1660941A2 Multilayer reflective extreme ultraviolet lithography mask blanks |
| 05/31/2006 | CN1779920A Method of Processing semiconductor components with dense processing fluids and ultrasonic energy |
| 05/31/2006 | CN1779567A Large pellicle |
| 05/31/2006 | CN1779566A Mask for depositing thin film of flat panel display and method of fabricating the mask |
| 05/31/2006 | CN1258118C Method for correcting defect of and grey mask grey part in grey mask |
| 05/30/2006 | US7055127 Mask data preparation |
| 05/30/2006 | US7055126 Renesting interaction map into design for efficient long range calculations |
| 05/30/2006 | US7053017 Reduced striae extreme ultraviolet elements |
| 05/30/2006 | US7052821 Sacrificial compositions, methods of use thereof, and methods of decomposition thereof |
| 05/30/2006 | US7052810 exposing and developing a testing photoresist layer using a test photo mask to form hole patterns corresponding to first hole patterns; measuring photoresist critical dimensions (pCDs) of the second hole patterns on the test photoresist layer; determining correction of mask critical dimention (mCDs) |
| 05/30/2006 | US7052809 Membrane and reticle-pellicle apparatus with purged pellicle-to-reticle gap using same |
| 05/30/2006 | US7052808 Transmission mask with differential attenuation to improve ISO-dense proximity |
| 05/30/2006 | US7052807 Uniformity |
| 05/30/2006 | US7052806 Exposure controlling photomask and production method therefor |
| 05/25/2006 | US20060110693 Exposure method and apparatus, exposure mask, and device manufacturing method |
| 05/25/2006 | US20060110684 Photomask for forming small contact hole array and methods of fabricating and using the same |
| 05/25/2006 | US20060110667 Method of fabrication of semiconductor integrated circuit device and mask fabrication method |
| 05/25/2006 | US20060110664 Large pellicle |
| 05/25/2006 | US20060110663 Mask for depositing thin film of flat panel display and method of fabricating the mask |
| 05/25/2006 | US20060109486 Method of deciding measurement value |
| 05/25/2006 | US20060109449 Reticle-carrying container |
| 05/25/2006 | US20060108541 Alignment method, alignment substrate, production method for alignment substrate, exposure method, exposure system and mask producing method |
| 05/25/2006 | US20060108524 Dimension measuring SEM system, method of evaluating shape of circuit pattern and a system for carrying out the method |
| 05/24/2006 | EP1658647A2 Integrated circuit comprising an organic semiconductor, and method for the production of an integrated circuit |
| 05/24/2006 | CN1776695A Method for verification of resolution enhancement techniques and optical proximity correction in lithography |
| 05/24/2006 | CN1776527A Pneumatic method and apparatus for nano print lithography |
| 05/24/2006 | CN1776525A Mask assembly and mask frame assemble using same |
| 05/24/2006 | CN1776524A Method of descaling a mask |
| 05/24/2006 | CN1776523A Low cost simple method for making photo etched mask |
| 05/23/2006 | US7050144 Light exposure; multilayer, radiation transparent substrates, shade with masking patterns; controlling width of apertures |
| 05/23/2006 | US7049609 Method of verifying proximity effect correction in electron beam lithography |
| 05/23/2006 | US7049585 Sheet beam-type testing apparatus |
| 05/23/2006 | US7049185 Semiconductor device having dummy gates and its manufacturing method |
| 05/23/2006 | US7049047 that absorbs both infrared and ultraviolet radiation; masking layer may be imaged and developed to form an integral photomask; those with a photosensitive layer are useful as flexographic printing plate precursors |
| 05/23/2006 | US7049035 electrochemically depositing an additive material on exposed sidewalls of an etched first layer of the mask whose top remains covered by a hardmask used during the etching of the first layer; a second layer beneath the etched first layer is resistant to the electrochemical deposition of the additive |
| 05/23/2006 | US7049034 Photomask having an internal substantially transparent etch stop layer |
| 05/23/2006 | US7049033 direct modulation in complex-valued reflectance of the multilayer; a spatially localized energy source writes a reticle pattern onto the reflective multilayer coating; interdiffusion causes the multilayer period to contract in the exposed region |
| 05/23/2006 | US7047984 Device and method for cleaning articles used in the production of semiconductor components |
| 05/18/2006 | US20060107248 Generating mask patterns for alternating phase-shift mask lithography |
| 05/18/2006 | US20060105476 Photoresist pattern, method of fabricating the same, and method of assuring the quality thereof |
| 05/18/2006 | US20060105251 Substrate having a titanium oxide layer, a Ni plating layer, and a Ni/Pd alloy layer; no additional front-surface blackening is required |
| 05/18/2006 | US20060105250 Test photomask and compensation method using the same |
| 05/18/2006 | US20060105249 Exposure mask and method of manufacturing the same |
| 05/18/2006 | US20060105248 Method of reducing the average process bias during production of a reticle |
| 05/18/2006 | US20060105247 Microstructure comprising an adhesive layer and method of fabrication of said microstructure |
| 05/18/2006 | US20060104413 Mask repeater and mask manufacturing method |
| 05/18/2006 | US20060103914 Pattern generator |
| 05/18/2006 | US20060103825 Focus test mask, focus measurement method and exposure apparatus |
| 05/18/2006 | US20060102587 supplying plasma excitation power to a dry etching gas comprising Cl2 and O2 to excite plasma in chamber so that a chemical species is generated, etching a light-shielding film; add He to the dry etching gas in order to stabilize the plasma; used in semiconductor device |
| 05/18/2006 | US20060102194 Method of descaling a mask |
| 05/18/2006 | DE102005048380A1 Vorrichtung zum Belichten eines Substrats, Photomaske und modifiziertes Beleuchtungssystem der Vorrichtung und Verfahren zum Bilden eines Musters an einem Substrat unter Verwendung der Vorrichtung An apparatus for exposing a substrate, photomask and modified illumination system of the apparatus and method for forming a pattern on a substrate using the apparatus |
| 05/17/2006 | EP1657592A2 Method of depositing a material providing a specified attenuation and phase shift |
| 05/17/2006 | EP1656588A2 Phototool coating |
| 05/17/2006 | EP1656385A1 Perfluoropolyether amide-linked phosphonates, phosphates, and derivatives thereof |
| 05/17/2006 | CN1774823A Photoactive component comprising organic layers |
| 05/17/2006 | CN1774674A Masking arrangement and method for producing integrated circuit arrangements |
| 05/17/2006 | CN1773374A Half tone mask, method for fabricating the same, and flat panel display using the same |
| 05/17/2006 | CN1773373A Mosaic method used for multi-transmissivity photomask structure and gained structure |
| 05/17/2006 | CN1256753C Method of forming and testing phase shift mask |
| 05/17/2006 | CN1256622C Active optical close correction method |
| 05/16/2006 | US7047516 Proximity effect correction apparatus, proximity effect correction method, storage medium, and computer program product |
| 05/16/2006 | US7047094 large scale integrated (LSI); stores performance information of a lithography unit, connected to a network, in a lithography unit database with host and user terminals; use with computer-aided design (CAD) system; computer program |
| 05/16/2006 | US7046715 Method for suppressing energy spikes of a partially-coherent beam using triangular end-regions |
| 05/16/2006 | US7046408 Method of hologram exposure, mask for hologram exposure, semiconductor device, and electronic equipment |
| 05/16/2006 | US7046355 Dual stage defect region identification and defect detection method and apparatus |
| 05/16/2006 | US7045909 Alignment mark structure |
| 05/16/2006 | US7045908 Semiconductor device and method for manufacturing the same |
| 05/16/2006 | US7045801 Charged beam exposure apparatus having blanking aperture and basic figure aperture |
| 05/16/2006 | US7045780 Scanning probe microscopy inspection and modification system |
| 05/16/2006 | US7045260 Post exposure modification of critical dimensions in mask fabrication |
| 05/16/2006 | US7045259 Post exposure modification of critical dimensions in mask fabrication |
| 05/16/2006 | US7045256 Invention uses a focused ion-beam exposure of the surface of the exposure mask to purposely "damage" this surface over the area where the opaque material is required to be present; accuracy, nonpeeling |
| 05/16/2006 | US7045255 For forming a fine pattern used for producing a semiconductor integrated circuit device; combination of a desired phase change and a desired transmittance can be selected arbitrarily for the phase shift film |
| 05/16/2006 | US7045254 A photomask for making a semiconductor, photolithography, phase shifting, a quartz layer with grooves |
| 05/11/2006 | WO2006049243A1 Pattern testing apparatus, pattern testing method, and pattern testing program |
| 05/11/2006 | WO2006049240A1 Mask blank manufacturing method |
| 05/11/2006 | WO2006049022A1 Ion beam sputtering equipment and method for forming multilayer film for reflective mask blank for euv lithography |
| 05/11/2006 | US20060099523 Method for forming pattern using photomask |
| 05/11/2006 | US20060099522 Mask used in manufacturing highly-integrated circuit device, method of creating layout thereof, manufacturing method thereof, and manufacturing method for highly-integrated circuit device using the same |
| 05/11/2006 | US20060099521 Half tone mask, method for fabricating the same, and flat panel display using the same |
| 05/11/2006 | US20060099519 Method of depositing a material providing a specified attenuation and phase shift |
| 05/11/2006 | US20060099518 Resolving the phase conflict region by modifying the elbow region by moving the elbow region away from the first shifter region and the phase conflict region thereby creating a layout for a phase shift mask; optical lithography for manufacturing integrated circuit devices |
| 05/11/2006 | US20060099517 Phase shift mask fabrication method thereof and fabrication method of semiconductor apparatus |
| 05/11/2006 | US20060098183 Exposure system, test mask for monitoring polarization, and method for monitoring polarization |
| 05/11/2006 | US20060097294 Semiconductor device and method for fabricating the same |
| 05/11/2006 | US20060097260 Array substrates for use in liquid crystal displays and fabrication methods thereof |
| 05/11/2006 | US20060097202 Collector having unused region for illumination systems using a wavelength <193 nm |
| 05/11/2006 | DE10359991B4 Phase shift mask for the projection of pattern of structure elements formed on mask into substrate includes first structure elements formed as elevated ridges and second structure elements formed by trenches or ridges |
| 05/10/2006 | CN1770016A Optical mask management method and bar code identification apparatus |
| 05/10/2006 | CN1770008A Method and apparatus for correction of defects in lithography masks |
| 05/10/2006 | CN1255855C Mask base board and its producing method |
| 05/10/2006 | CN1255704C Method for correcting mask distribution pattern |
| 05/09/2006 | US7043712 Method for adaptive segment refinement in optical proximity correction |
| 05/09/2006 | US7042828 Nanometer scale data storage device and associated positioning system |
| 05/09/2006 | US7042554 Removable reticle window and support frame using magnetic force |
| 05/09/2006 | US7042550 Device manufacturing method and computer program |