| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
|---|
| 06/14/2006 | DE10134231B4 EUV-Reflektionsmaske EUV reflection mask |
| 06/14/2006 | CN1786969A Data generating system, patterning data generating apparatus, method of generating patterning data and storage medium carrying patterning data |
| 06/14/2006 | CN1786826A Lithographic apparatus, reticle exchange unit and device manufacturing method |
| 06/14/2006 | CN1786742A Process for mfg. unidimensional X ray refracted diffraction micro structural component of aluminium material |
| 06/14/2006 | CN1786698A Apparatus and method of inspecting mura-defect and method of fabricating photomask |
| 06/14/2006 | CN1259597C Light cover combination and exposure method for forming threadlet pattern therewith |
| 06/13/2006 | US7062748 System and method of correcting mask rule violations after optical proximity correction |
| 06/13/2006 | US7062747 Method and apparatus for prepareing patterns used for manufacture of semiconductor device |
| 06/13/2006 | US7062396 Apparatus for optical proximity correction, method for optical proximity correction, and computer program product for optical proximity correction |
| 06/13/2006 | US7062010 Method for adjusting gap between two objects and exposure method using the same, gap adjusting apparatus, and exposure apparatus |
| 06/13/2006 | US7061591 Maskless lithography systems and methods utilizing spatial light modulator arrays |
| 06/13/2006 | US7061590 Pellicle distortion reduction |
| 06/13/2006 | US7061589 Conduit for pumping light transmission into interior cavity between pellicle and masking structure |
| 06/13/2006 | US7060996 Mask, method of producing mask, and method of producing semiconductor device |
| 06/13/2006 | US7060623 Method of deforming a pattern and semiconductor device formed by utilizing deformed pattern |
| 06/13/2006 | US7060519 Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server |
| 06/13/2006 | US7060403 In-situ pellicle monitor |
| 06/13/2006 | US7060400 Method to improve photomask critical dimension uniformity and photomask fabrication process |
| 06/13/2006 | US7060399 a multilayer optical mirror of a substrate and reflective layers, and a capping layer on which an artificial oxide layer forms in air and is doped to improve optical properties during a lithographic exposure of semiconductor products |
| 06/13/2006 | US7060398 photomask for forming a small pattern used for producing a semiconductor integrated circuit device; reducing size of circuit patterns for high integration of a large-scale integrated circuit |
| 06/13/2006 | US7060397 Using a charged particle beam to eliminate attached particles from the result of splashing, correcting defects; semiconductor wafer |
| 06/13/2006 | US7060396 Random layout of concave and convex zones |
| 06/13/2006 | US7060395 Light shield zones; chromium film and phase shifting mask on radiation transparent substrate; design masking pattern |
| 06/13/2006 | US7060394 Photoresist comprises both low and high transmission layers for improved resolution |
| 06/08/2006 | WO2006060620A2 Reticles and methods of forming reticles |
| 06/08/2006 | WO2006060562A2 Method for designing an overlay mark |
| 06/08/2006 | WO2006060504A2 Tri-tone trim mask for alternating phase-shift photolithography |
| 06/08/2006 | WO2006059388A1 Method of housing large pellicle |
| 06/08/2006 | WO2006059377A1 Semiconductor device, manufacturing method thereof and photomask |
| 06/08/2006 | US20060123381 Data generating system, patterning data generating apparatus, method of generating patterning data and storage medium carrying patterning data |
| 06/08/2006 | US20060123380 Computer automated method for designing an integrated circuit, a computer automated system for designing an integrated circuit, and a method of manufacturing an integrated circuit |
| 06/08/2006 | US20060121396 Method for exposing a substrate with a beam |
| 06/08/2006 | US20060121389 Melts |
| 06/08/2006 | US20060121372 Restricted access display system |
| 06/08/2006 | US20060121369 Mask and method for crystallizing amorphous silicon |
| 06/08/2006 | US20060121368 Photomask structure and method of reducing lens aberration and pattern displacement |
| 06/08/2006 | US20060121367 Method for producing photomask and method for producing photomask pattern layout |
| 06/08/2006 | US20060121366 Semiconductors, liquid crystal displays; patterning any size or shape by exposure using only one photomask; the mask pattern has a light-shielding film and a phase shifter; light shield zones; chromium film and phase shifting mask on radiation transparent substrate; design masking pattern |
| 06/08/2006 | US20060121365 Mask and exposure device |
| 06/08/2006 | US20060121364 Projection optical system, exposure apparatus, and exposure method |
| 06/08/2006 | US20060121363 Method for bonding a glass cap and mask for curing sealant |
| 06/08/2006 | US20060121362 Accurate manufacturing fine patterns for semiconductor wafers by reducing variation of critical dimensions due to lens aberration; subsidiary patterns added into holes formed through ring gate patterns of vertical symmetrical structures to separate them from the ring gate patterns by a designed distance |
| 06/08/2006 | US20060121361 Reticles and methods of forming reticles |
| 06/08/2006 | US20060121360 Mask, method of manufacturing mask, and lithographic process |
| 06/08/2006 | US20060121359 water-soluble dust-free protective film; photomasks; photoresists |
| 06/08/2006 | US20060119819 Projection exposure mask, projection exposure apparatus, and projection exposure method |
| 06/08/2006 | US20060118838 Photo mask and semiconductor device fabricated using the same |
| 06/08/2006 | DE10233205B4 Verfahren zur Korrektur von lokalen Loading-Effekten beim Ätzen von Photomasken Method of correcting local loading effects during etching photomasks |
| 06/08/2006 | DE102005054401A1 Verfahren zum Treffen einer Entscheidung über einen Messwert A method for making a decision on a reading |
| 06/08/2006 | DE102004058813A1 Maske und Belichtungseinrichtung Mask and exposure apparatus |
| 06/08/2006 | DE102004057759A1 Reducing critical dimension variations caused by scattered light in functional structures formed by photolithographic imaging comprises using two masks, one with a reduced bright-field content |
| 06/08/2006 | DE102004031398B4 Verfahren zur photolithographischen Projektion eines Musters auf einen Halbleiterwafer mit einer alternierenden Phasenmaske Photolithographic process for projecting a pattern on a semiconductor wafer with an alternating phase mask |
| 06/08/2006 | DE10164306B4 Doppelbelichtung mit abbildenden Hilfstrukturen und verschiedenen Belichtungstools Double exposure with imaging auxiliary structures and different exposure tools |
| 06/07/2006 | EP1664936A2 Forming partial-depth features in polymer film |
| 06/07/2006 | EP1664924A2 Method for high-resolution processing of thin layers with electron beams |
| 06/07/2006 | EP1664858A1 Method for production of micro-optics structures |
| 06/07/2006 | EP1579274A4 Method and system for context-specific mask inspection |
| 06/07/2006 | EP1261752A4 Method and apparatus for repairing lithography masks using a charged particle beam system |
| 06/07/2006 | CN1782871A Method of manufacturing photomask |
| 06/07/2006 | CN1782870A Matching glass plate and its producing and applying method |
| 06/07/2006 | CN1782869A Thermal detector of contracted photolithographic mask |
| 06/07/2006 | CN1782868A Photo mask and method for manufacturing patterns using the same |
| 06/07/2006 | CN1782867A Reticle and method of fabricating semiconductor device |
| 06/07/2006 | CN1782866A UV-absorbing support layers and flexographic printing elements comprising same |
| 06/07/2006 | CN1781826A Reticle-carrying container |
| 06/07/2006 | CN1258695C Correction for optical proximity effect of contact holes, mask and manufacturing method for semiconductor device |
| 06/06/2006 | US7058923 Optical proximity effect correcting method and mask data forming method in semiconductor manufacturing process, which can sufficiently correct optical proximity effect, even under various situations with regard to size and shape of design pattern, and space width and position relation between design patterns |
| 06/06/2006 | US7057715 Lithography tool test patterns and method |
| 06/06/2006 | US7057711 Lithography tool having a vacuum reticle library coupled to a vacuum chamber |
| 06/06/2006 | US7057300 Mask, method of producing mask, and method of producing semiconductor device |
| 06/06/2006 | US7056962 Having attached at least one nonionic group |
| 06/06/2006 | US7056805 Substrate provided with an alignment mark in a substantially transmissive process layer, mask for exposing said mark, device manufacturing method, and device manufactured thereby |
| 06/06/2006 | US7056777 Thin film transistor array substrate, manufacturing method thereof, and mask |
| 06/06/2006 | US7056645 Use of chromeless phase shift features to pattern large area line/space geometries |
| 06/06/2006 | US7056628 Mask for projecting a structure pattern onto a semiconductor substrate |
| 06/06/2006 | US7056627 forming stress correction film between reflection film for reflecting exposure light on substrates and absorber layers for absorbing exposure light; multilayers used for pattern transfer of semiconductors |
| 06/06/2006 | US7056626 Crystallization apparatus, crystallization method, thin film transistor and display apparatus |
| 06/06/2006 | US7056625 Focus detection structure |
| 06/06/2006 | US7056624 Single side engraving type which comprises a shifter part and a non- shifter part on a substrate; shading layer pattern formed with a shading film which covers continuously including the sidewall part of the recess |
| 06/06/2006 | US7056623 Depositing a first material on a substrate and applying a thermal treatment to the substrate at >300 degrees Celsius before completing the deposition of the first material; stress relieving; dimensional stability; flatness; semiconductors |
| 06/06/2006 | US7055429 Edge cure prevention process |
| 06/06/2006 | CA2347945C Multilayered photosensitive material for flexographic printing plate |
| 06/01/2006 | WO2006058130A2 Restricted access display system |
| 06/01/2006 | WO2006019919A3 Computer-implemented methods for generating input for a simulation program for generating a simulated image of a reticle |
| 06/01/2006 | US20060117293 Method for designing an overlay mark |
| 06/01/2006 | US20060115924 Method of forming a deformed pattern over a substrate |
| 06/01/2006 | US20060115753 Method and apparatus for performing target-image-based optical proximity correction |
| 06/01/2006 | US20060115750 Film for color compensation, multi-functional film for color compensation and near infrared absorption and plasma display panel filter comprising the same |
| 06/01/2006 | US20060115749 Color filter forming method |
| 06/01/2006 | US20060115748 Sidelobe suppression in radiated patterning |
| 06/01/2006 | US20060115747 Photo mask structure used during twice-performed photo process and methods of using the same |
| 06/01/2006 | US20060115746 Focus monitoring masks having multiple phase shifter units and methods for fabricating the same |
| 06/01/2006 | US20060115745 Electron beam exposure mask, electron beam exposure method, and electron beam exposure system |
| 06/01/2006 | US20060115744 Method of producing a mask blank for photolithographic applications, and mask blank |
| 06/01/2006 | US20060115743 Dicing lines extending longitudinally and transversely, and chip areas surrounded by the dicing lines are formed in a resist mask; critical-dimension patterns are formed in the dicing lines so as to be paired while placing the center line in between; for verification of process accuracy |
| 06/01/2006 | US20060115742 Tri-tone trim mask for an alternating phase-shift exposure system |
| 06/01/2006 | US20060115741 Pellicle with small gas generation amount |
| 06/01/2006 | US20060114438 Maskless lithography systems and methods utilizing spatial light modulator arrays |
| 06/01/2006 | US20060113556 Method and apparatus for calibrating a metrology tool |
| 06/01/2006 | US20060113280 Partial edge bead removal to allow improved grounding during e-beam mask writing |