| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 06/29/2006 | US20060141369 Correction is made to pattern data affected by a proximity effect when a pattern is formed on a photomask or wafer for a semiconductor device, by detecting, according to the design data, a space portion being placed on a photomask or wafer and having a specified size, detecting an edge to be corrected |
| 06/29/2006 | US20060141368 Designing the database patterns of the photo mask according to a design rule of a semiconductor element; performing optical proximity correction of the designed database patterns; detecting failure of the database patterns by obtaining a plurality of bias values based on at least two space width |
| 06/29/2006 | US20060141367 Lithographic apparatus, device manufacturing method, and optical component |
| 06/29/2006 | US20060141366 Method and system for optimization of transistor sizing based on layout density |
| 06/29/2006 | US20060141365 Designing method and device for phase shift mask |
| 06/29/2006 | US20060141209 Pellicle for photolithography and pellicle frame |
| 06/29/2006 | US20060138682 Substrate provided with an alignment mark in a substantially transmissive process layer, mask for exposing said mark, device manufacturing method, and device manufactured thereby |
| 06/29/2006 | US20060138462 Method of making a semiconductor device |
| 06/29/2006 | US20060138343 Sheet beam-type testing apparatus |
| 06/29/2006 | US20060138338 Mask blanks inspection tool |
| 06/29/2006 | US20060138083 Patterning and alteration of molecules |
| 06/29/2006 | US20060138078 Semiconductor device fabrication method |
| 06/29/2006 | DE112004001662T5 Laminierte fotoempfindliche Reliefdruckoriginalplatte und Verfahren zur Erzeugung der Reliefdruckplatte Laminated photosensitive relief printing original plate and method for producing the relief printing plate |
| 06/29/2006 | DE10261035B4 Fotomasken-Reparaturverfahren und Vorrichtung Photomask repair method and apparatus |
| 06/28/2006 | EP1311637B8 Fluoroalkyl (meth)acrylate copolymer coating compositions |
| 06/28/2006 | CN1795283A Mask-retaining device |
| 06/28/2006 | CN1794418A Method of making a semiconductor device |
| 06/28/2006 | CN1794085A Multi-transmission phase mask and exposure method using the same |
| 06/28/2006 | CN1792742A Reticle-carrying container |
| 06/28/2006 | CN1261994C Optical mask testing, optical spot evaluating method and optical spot compensation |
| 06/28/2006 | CN1261823C Method of checking exposure device, correcting focus position and manufacturing semiconductor device |
| 06/28/2006 | CN1261820C Photoetching equipment having vacuum mask plate store connected with vacuum chamber |
| 06/28/2006 | CN1261819C Gray mask defect checking method and image forming method |
| 06/28/2006 | CN1261818C Gray mask defect correction method |
| 06/28/2006 | CN1261817C K fraction fractal masking method for preparing material chips |
| 06/28/2006 | CN1261334C Graticule chip transfer system and method for photoetching, chip transfer box and method |
| 06/27/2006 | US7069535 Optical proximity correction method using weighted priorities |
| 06/27/2006 | US7069155 Real time analytical monitor for soft defects on reticle during reticle inspection |
| 06/27/2006 | US7068364 Pattern inspection apparatus |
| 06/27/2006 | US7068347 Apparatus for reducing pellicle darkening |
| 06/27/2006 | US7067931 Self-compensating mark design for stepper alignment |
| 06/27/2006 | US7067764 Mask for light exposure and method for manufacturing liquid crystal display apparatus employing same |
| 06/27/2006 | US7067227 Sensitized chemically amplified photoresist for use in photomask fabrication and semiconductor processing |
| 06/27/2006 | US7067224 forming layers of red, green and blue photosensitive layers on substrates, then positioning photomasks comprising light shielding patterns on the layers, exposing and developing to form panels having color reproducibility, light transmissivity and response speeds |
| 06/27/2006 | US7067223 coating masking layers comprising inorganic phosphates having a nonlinear refractive index, to radiation transparent substrates, then applying photoresist, developing, etching to form miniature patterns and stripping the photoresists; integrated circuits; photolithography |
| 06/27/2006 | US7067222 Pellicle for lithography |
| 06/27/2006 | US7067221 Designing method and device for phase shift mask |
| 06/27/2006 | US7067220 Pattern compensation techniques for charged particle lithographic masks |
| 06/27/2006 | US7066566 Print inspection apparatus, printing system, method of inspecting print data and program |
| 06/27/2006 | US7065894 Apparatus for kinematic registration of a reticle |
| 06/22/2006 | WO2006065474A2 Method for patterning by surface modification |
| 06/22/2006 | WO2006064679A1 Phase shift mask, phase shift mask manufacturing method, and semiconductor element manufacturing method |
| 06/22/2006 | US20060136862 Pattern data verification method, pattern data creation method, exposure mask manufacturing method, semiconductor device manufacturing method, and computer program product |
| 06/22/2006 | US20060134534 Photomask and method for maintaining optical properties of the same |
| 06/22/2006 | US20060134533 Method of fabricating one-way transparent optical system |
| 06/22/2006 | US20060134532 lithography; photoresists; etching |
| 06/22/2006 | US20060134531 Mask for electromagnetic radiation and method of fabricating the same |
| 06/22/2006 | US20060134530 Multi-transmission phase mask and exposure method using the same |
| 06/22/2006 | US20060134529 Optimization to avoid sidelobe printing |
| 06/22/2006 | US20060133660 Apparatus and method for detecting defect existing in pattern on object |
| 06/22/2006 | US20060131578 Structure of semiconductor substrate including test element group wiring |
| 06/22/2006 | US20060131266 Large area electronic device with high and low resolution patterned film features |
| 06/22/2006 | US20060130969 Partial edge bead removal to allow improved grounding during e-beam mask writing |
| 06/21/2006 | EP1672429A2 Reticle-processing system |
| 06/21/2006 | EP1672428A2 Reticle-carrying container |
| 06/21/2006 | CN1791836A Process for fabricating semiconductor device and method for generating mask pattern data |
| 06/21/2006 | CN1790655A Method for detecting new and old mask difference |
| 06/21/2006 | CN1790352A Method for generating pattern, method for manufacturing and control semiconductor device, and semiconductor device |
| 06/21/2006 | CN1790168A Reticle-processing system |
| 06/21/2006 | CN1790167A Pattern forming method, semiconductor device manufacturing method and exposure mask set |
| 06/21/2006 | CN1790162A Method of forming pattern having step difference and method of making thin film transistor and liquid crystal display using the same |
| 06/21/2006 | CN1790161A Polymeric tetrahedral carbon films, methods of forming the same and methods of forming fine patterns using the same |
| 06/21/2006 | CN1790160A Mask and manufacturing method of a semiconductor device and a thin film transistor array panel using the mask |
| 06/21/2006 | CN1260621C Method for removing shading defects of light mask and semiconductor device manufacturing method thereof |
| 06/21/2006 | CN1260616C Method for producing microstructure |
| 06/21/2006 | CN1260614C Thermal-sensitive plate printing-board |
| 06/20/2006 | US7065739 Pattern correction method of semiconductor device |
| 06/20/2006 | US7065735 Method for making an OPC mask and an OPC mask manufactured using the same |
| 06/20/2006 | US7065593 Centralized, double bandwidth, directional, shared bus communication system architecture |
| 06/20/2006 | US7065240 Reticle inspection apparatus |
| 06/20/2006 | US7063939 Nanoimprint lithography; pressing an embossed, transparent mold into a photoresist film applied to substrate to transfer the pattern of protrusions and recesses by deforming the resist; efficient development; nonseparating, dimensional stability if overexposed to developer and/or etchant; semiconductors |
| 06/20/2006 | US7063923 Integrated circuit layout to transfer to a semiconductor wafer includes dense figures and a isolated figure surrounded by dummy patterns to reduce the difference in pattern density; transmitted light provides a phase difference of 0 or 180 degrees relative to a transmitted light of the layout; photomask |
| 06/20/2006 | US7063922 Method and apparatus for dry-etching half-tone phase-shift films, half-tone phase-shift photomasks and method for the preparation thereof, and semiconductor circuits and method for the fabrication thereof |
| 06/20/2006 | US7063921 Photomask, in particular alternating phase shift mask, with compensation structure |
| 06/20/2006 | US7063920 Configuring an array of micro-mirrors in a deep ultraviolet maskless photolithography system by generating an ideal mask layout representative of image characteristics associated with a desired image; next, an equivalent mask is produced in accordance with an average intensity of the ideal mask layout |
| 06/20/2006 | US7063919 Lithographic template having a repaired gap defect method of repair and use |
| 06/20/2006 | US7063478 Crystallization apparatus and crystallization method |
| 06/15/2006 | WO2006063268A2 Computer-implemented methods for detecting and/or sorting defects in a design pattern of a reticle |
| 06/15/2006 | WO2006062099A1 Reflective photomask blank, reflective photomask, and method for manufacturing semiconductor device using same |
| 06/15/2006 | WO2005120791A3 Method for making tools for micro replication |
| 06/15/2006 | US20060129967 System, method and program for generating mask data, exposure mask and semiconductor device in consideration of optical proximity effects |
| 06/15/2006 | US20060128054 Mask and manufacturing method of a semiconductor device and a thin film transistor array panel using the mask |
| 06/15/2006 | US20060127824 Masks dividing patterns of a certain section and placing the parts on a plurality of masks or on different areas of the same mask and able to form the patterns of that section as before division by overlaying the masks or different areas |
| 06/15/2006 | US20060127780 Forming a capping layer for a EUV mask and structures formed thereby |
| 06/15/2006 | US20060127779 Ultra-thin high-precision glass optic and method of manufacturing same |
| 06/15/2006 | US20060126146 Light beam deflector |
| 06/15/2006 | US20060126052 Reticle-carrying container |
| 06/15/2006 | US20060126042 Reticle-processing system |
| 06/15/2006 | US20060125997 Color filter substrate and method for manufacturing the same |
| 06/15/2006 | US20060124865 Energetic neutral particle lithographic apparatus and process |
| 06/15/2006 | US20060124834 Near-field light generating method, near-field exposure mask, and near-field exposure method and apparatus |
| 06/15/2006 | US20060124581 Mask blank for charged particle beam exposure, method of forming mask blank and mask for charged particle beam exposure |
| 06/15/2006 | US20060124055 Mask-retaining device |
| 06/14/2006 | EP1669801A2 Data generating system, patterning data generating apparatus, method of generating patterning data and storage medium carrying patterning data |
| 06/14/2006 | EP1669791A1 Light beam deflector |
| 06/14/2006 | EP1668416A2 Method and apparatus for protecting a reticle used in chip production from contamination |
| 06/14/2006 | EP1668415A2 Method and apparatus for protecting a reticle used in chip production from contamination |
| 06/14/2006 | EP1668414A2 Method and apparatus for compensating for the effects of gravity on a pellicle used for protecting a reticle from contamination |
| 06/14/2006 | EP1668413A2 Phase shift mask blank with increased uniformity |
| 06/14/2006 | DE102004058967A1 Verfahren zur Belichtung eines Substrats mit einem Strahl A method for exposing a substrate with a beam |