| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 07/18/2006 | US7079220 Illumination optical system and method, and exposure apparatus |
| 07/18/2006 | US7078150 Photosensitive resin print plate material and production method for photosensitive resin print plate |
| 07/18/2006 | US7078136 Thermally-generated mask pattern |
| 07/18/2006 | US7078135 Mask can be used independently of its height tolerances and of the membrane holder to be mounted thereon for a distortion-free lithographic imaging |
| 07/18/2006 | US7078134 A protective layer for protecting the wafer from cleaning, without damaging the image structure regions |
| 07/18/2006 | US7078133 Photolithographic mask |
| 07/18/2006 | US7077973 Methods for substrate orientation |
| 07/18/2006 | US7077915 Removal surface impurities from surface of mask using aqueous solution |
| 07/18/2006 | US7077533 Reflecting device for electromagnetic waves |
| 07/13/2006 | WO2006074198A2 Methods for repairing an alternating phase-shift mask |
| 07/13/2006 | WO2006073155A1 Pattern defect inspection device, method thereof, and computer-readable recording medium containing program for the same |
| 07/13/2006 | US20060156270 Injecting collagenase into a fibrous Dupuytren's cord in a patients hand, immobilizing the hand immediately after injection, and for several hours; best results when patient is in residual stage of the disease |
| 07/13/2006 | US20060155414 Semiconductor manufacturing apparatus |
| 07/13/2006 | US20060154157 Distortions of the developed photosensitive film pattern are compensated for; more accurate target photosensitive film pattern; the depth of focus of the photolithography process is increased; uniformity |
| 07/13/2006 | US20060154156 Interferometric imaging with reduced aperture |
| 07/13/2006 | US20060154155 Photoresists; photomasks |
| 07/13/2006 | US20060154154 Mask and method of manufacturing a poly-silicon layer using the same |
| 07/13/2006 | US20060154153 Anti-ESD photomask blank |
| 07/13/2006 | US20060154152 Flare reduction in photolithography |
| 07/13/2006 | US20060154151 Method for quartz photomask plasma etching |
| 07/13/2006 | US20060154150 Arrangement for the production of photomasks |
| 07/13/2006 | US20060152723 Complementary division mask having alignment mark, method for forming alignment mark of the complementary division mask, semiconductor device manufactured by using the complementary division mask, and its manufacturing method |
| 07/13/2006 | US20060152703 Method of detecting relative position of exposure mask and object to be exposed, alignment method, and exposure method using the same |
| 07/13/2006 | US20060151008 Cleaning method, method for removing foreign particle, cleaning apparatus, and cleaning liquid |
| 07/13/2006 | DE4107762B4 Verfahren zum Herstellen von Master- und Arbeitsmusterplatten für den Ätzprozess A method for producing master and work pattern plates for the etching process |
| 07/13/2006 | DE102005056916A1 Verfahren zum Gestalten einer Überlagerungs-Markierung A method of designing an overlay mark |
| 07/12/2006 | EP1679741A1 Method of quartz etching |
| 07/12/2006 | EP1679548A1 Apparatus and method for measuring etch depth of a substrate |
| 07/12/2006 | EP1678075A1 Etch masks based on template-assembled nanoclusters |
| 07/12/2006 | EP1550002B1 Photomask assembly incorporating a porous frame and method for making it |
| 07/12/2006 | CN1802605A Photomask and video device manufacturing method |
| 07/12/2006 | CN1801462A Device for fabricating a mask by plasma etching a semiconductor substrate |
| 07/12/2006 | CN1800991A Scanning exposure apparatus and method |
| 07/12/2006 | CN1800987A A method of generating a mask having optical proximity correction features and parts manufacturing method |
| 07/12/2006 | CN1800985A Method for correcting mask pattern, photomask, method for fabricating photomask, semiconductor device, and method for fabricating semiconductor device |
| 07/12/2006 | CN1800973A Flexible optical mask for lithographic and method producing same and patterning method |
| 07/12/2006 | CN1800972A Semiconductor device and its manufacturing method and phase-shift mask |
| 07/12/2006 | CN1800971A Method for performing full-chip manufacturing reliability checking and correction |
| 07/12/2006 | CN1800970A Forming method of mask pattern |
| 07/12/2006 | CN1264198C Optical masks, manufacture method thereof and manufacture method of electronic elements |
| 07/12/2006 | CN1264196C Method for manufacturing exposure mask and its application |
| 07/12/2006 | CN1264063C Method for forming photoresist layer without side vanes |
| 07/11/2006 | US7076761 Method for creating charged-particle-beam exposure data, method for manufacturing semiconductor device, and program |
| 07/11/2006 | US7076394 Method and device for inspecting an object using a time delay integration sensor |
| 07/11/2006 | US7075639 Method and mark for metrology of phase errors on phase shift masks |
| 07/11/2006 | US7075072 Detecting apparatus and device manufacturing method |
| 07/11/2006 | US7074547 Photomask and method of fabricating semiconductor device by use of same |
| 07/11/2006 | US7074530 Continuous gray levels, the change in light intensity between each gray level is both finite and linear, produces a smoother and more linear profile on the object being made, meets the sub-resolution requirements of most optical tools |
| 07/11/2006 | US7074529 Phase-shift mask |
| 07/11/2006 | US7074528 Photomasks having offset aperatures that mitigates anisotropic optical diffraction, improves illumination and focusing, photolithography |
| 07/11/2006 | US7074527 Method for fabricating a mask using a hardmask and method for making a semiconductor device using the same |
| 07/11/2006 | US7074526 Prevention damage; isolation patterns of light blocking and light transmission zones; photolithography |
| 07/11/2006 | US7074525 Projecting light through a photomask using an optical projection system, sub-resolution features in clear areas adjacent to lines and spaces reduce transparency of the clear areas reduce light scattering and flare, greater degree of defocus in the pattern, less resist stripping |
| 07/11/2006 | US7074524 Photomask, method for detecting pattern defect of the same, and method for making pattern using the same |
| 07/11/2006 | US7073969 Method for fabricating a photomask for an integrated circuit and corresponding photomask |
| 07/11/2006 | US7073924 Projection exposure apparatus with line width calculator controlled diaphragm unit |
| 07/06/2006 | WO2005096098A3 Projection objective, projection exposure apparatus and reflective reticle for microlithography |
| 07/06/2006 | US20060148274 Device for fabricating a mask by plasma etching a semiconductor substrate |
| 07/06/2006 | US20060147844 Since the light transmissive or non-transmissive portions are randomly arranged, the substrate provided with the light reflective film exhibits excellent light scattering effect and effectively prevents the occurrence of the interference fringe |
| 07/06/2006 | US20060147822 Appartus and method for forming pattern |
| 07/06/2006 | US20060147819 Method of fabricating chrome-less phase shift mask |
| 07/06/2006 | US20060147818 Method of correcting deviations of critical dimensions of patterns formed on a wafer in a EUVL process |
| 07/06/2006 | US20060147817 made by using a negative photoresist includes a transparent substrate defined with a device chip area, an opaque device pattern formed on the transparent substrate in the device chip area, and a dummy opaque pattern provided on the transparent substrate outside of the device chip area |
| 07/06/2006 | US20060147816 Multi-transmission phase mask and method for manufacturing the same |
| 07/06/2006 | US20060147815 Method and apparatus for placing assist features |
| 07/06/2006 | US20060147814 Methods for repairing an alternating phase-shift mask |
| 07/06/2006 | US20060147813 Mask and method to pattern chromeless phase lithography contact hole |
| 07/06/2006 | US20060147812 Method and system for measuring critical dimensions of a mask design pattern |
| 07/06/2006 | US20060147104 Reticle inspecting apparatus and reticle inspecting method |
| 07/06/2006 | US20060145229 Cylinder-type capacitor and storage device, and method(s) for fabricating the same |
| 07/06/2006 | US20060145149 Integrated circuit comprising an organic semiconductor, and method for the production of an integrated circuit |
| 07/05/2006 | EP1677221A2 Method and apparatus for placing assist features in a layout |
| 07/05/2006 | EP1677146A2 Device for manufacturing a mask by plasma etching of a semiconductor substrate |
| 07/05/2006 | EP1025464B1 Composite relief image printing plates |
| 07/05/2006 | CN1799004A Applications of semiconductor nano-sized particles for photolithography |
| 07/05/2006 | CN1797730A Method and system for measuring width of junction in graph of mask designed |
| 07/05/2006 | CN1797215A Pellicle for photolithography and pellicle frame |
| 07/05/2006 | CN1797192A Photomasks and methods of manufacturing the same |
| 07/05/2006 | CN1797191A Method for detecting failure of database patterns of photo mask |
| 07/05/2006 | CN1797190A Multi-transmission phase mask and method for manufacturing the same |
| 07/05/2006 | CN1797189A Optical mask possible to reduce manufacturing cost and design method |
| 07/04/2006 | US7073163 Method of simulating patterns, computer program therefor, medium storing the computer program and pattern-simulating apparatus |
| 07/04/2006 | US7073162 Site control for OPC |
| 07/04/2006 | US7073161 Methods of forming patterned reticles |
| 07/04/2006 | US7072502 Alternating phase-shift mask inspection method and apparatus |
| 07/04/2006 | US7072438 Reflection type mask |
| 07/04/2006 | US7072040 Mask for inspecting an exposure apparatus, a method of inspecting an exposure apparatus, and an exposure apparatus |
| 07/04/2006 | US7071110 Process for the plasma etching of materials not containing silicon |
| 07/04/2006 | US7070907 Substrate having character/symbol section and processing method of character/symbol section |
| 07/04/2006 | US7070906 Photosensitive resin laminate |
| 07/04/2006 | US7070891 Photomask, method for manufacturing the same, and method for measuring optical characteristics of wafer exposure system using the photomask during operation |
| 07/04/2006 | US7070889 Method for repairing a photomask, method for inspecting a photomask, method for manufacturing a photomask, and method for manufacturing a semiconductor device |
| 07/04/2006 | US7070888 Method of selecting photomask blank substrates |
| 07/04/2006 | US7070887 Photolithographic mask |
| 07/04/2006 | US7070832 Sublimating process for cleaning and protecting lithography masks |
| 06/29/2006 | US20060143172 Mask processing device, mask processing method, program and mask |
| 06/29/2006 | US20060141774 Pattern transfer mask related to formation of dual damascene structure and method of forming dual damascene structure |
| 06/29/2006 | US20060141372 Mask pattern and method for forming resist pattern using mask pattern thereof |
| 06/29/2006 | US20060141371 Method for making a photomask assembly incorporating a porous frame |
| 06/29/2006 | US20060141370 Photomasks and methods of manufacturing the same |