| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 12/24/2014 | CN104238261A 掩模图案生成方法、记录介质和信息处理装置 A mask pattern generation method, a recording medium and an information processing apparatus |
| 12/24/2014 | CN104238260A 一种改进半导体器件工艺窗口的方法 An improved method for semiconductor device processing window |
| 12/24/2014 | CN103135366B 用于极紫外光刻掩模缺陷探测的双焦斜入射干涉显微装置 For EUVL mask defect detection bifocal oblique incident interference microscopy device |
| 12/24/2014 | CN103086050B 防尘薄膜组件收纳容器 Pellicle container |
| 12/24/2014 | CN102681333B 多吸收层一维光掩模近场分布的计算方法 Multi-absorbing layer one-dimensional field distribution calculation method photomask |
| 12/24/2014 | CN102662303B 多吸收层二维光掩模近场分布的计算方法 Two-dimensional field distribution calculation method photomask more absorbing layer |
| 12/23/2014 | US8918746 Cut mask aware contact enclosure rule for grating and cut patterning solution |
| 12/23/2014 | US8916831 EUV actinic reticle inspection system using imaging sensor with thin film spectral purity filter coating |
| 12/23/2014 | US8916316 Reflecting mask blank, method for manufacturing reflective mask blank and method for quality control for reflective mask blank |
| 12/23/2014 | US8916315 Method for fracturing and forming a pattern using shaped beam charged particle beam lithography |
| 12/23/2014 | US8916314 Reduced lens heating methods, apparatus, and systems |
| 12/18/2014 | US20140370447 Semiconductor device resolution enhancement by etching multiple sides of a mask |
| 12/18/2014 | US20140370424 Substrate with multilayer reflective film, reflective mask blank for euv lithography, method of manufacturing reflective mask for euv lithography and method of manufacturing semiconductor device |
| 12/18/2014 | US20140370423 Extreme ultraviolet (euv) radiation pellicle formation method |
| 12/18/2014 | US20140369593 Detection of thin lines for selective sensitivity during reticle inspection using processed images |
| 12/17/2014 | CN204028559U 一种嵌合式掩膜板 A chimeric type mask |
| 12/17/2014 | CN104216217A 光掩膜基板胶膜层及铬膜层的返工方法 Photomask substrate film layer and the chromium film rework method |
| 12/17/2014 | CN104216216A 涂布装置的洗边腔室和洗边方法 Wash and wash the side edges of the chamber method for coating apparatus |
| 12/17/2014 | CN102736399B 形成标准光掩模的方法及装置与使用检测系统的方法 Standard methods and apparatus for photomask inspection system with the use of a method of forming |
| 12/17/2014 | CN102692820B 一种测量投影物镜畸变的装置及方法 An apparatus and method for measuring the projection lens distortion |
| 12/17/2014 | CN102597873B 焦点测试光罩、焦点测量方法、曝光装置、及曝光方法 Focus test mask, the focus measuring method, an exposure apparatus, and exposure method |
| 12/16/2014 | US8914766 Dose-data generating apparatus |
| 12/16/2014 | US8913120 Method for emulation of a photolithographic process and mask inspection microscope for performing the method |
| 12/16/2014 | US8912501 Optimum imaging position detecting method, optimum imaging position detecting device, photomask manufacturing method, and semiconductor device manufacturing method |
| 12/16/2014 | US8912489 Defect removal process |
| 12/16/2014 | US8911920 Methods for fabricating EUV masks and methods for fabricating integrated circuits using such EUV masks |
| 12/11/2014 | US20140365982 Method for Making a Mask With a Phase Bar in An Integrated Circuit Design Layout |
| 12/11/2014 | US20140363633 Methods of reducing a registration error of a photomask, and related photomasks and methods of manufacturing an integrated circuit |
| 12/10/2014 | CN104204943A 表膜构件和表膜构件框体以及表膜构件的制造方法 Table method for producing a film member and the frame member and the surface membrane surface membrane components |
| 12/10/2014 | CN104199251A 一种掩膜板装置及使用该掩膜板的液晶显示器 One kind of mask plate means and using the mask plate of a liquid crystal display |
| 12/10/2014 | CN104199209A 掩膜板及其制造方法和目标图形的制造方法 The method of manufacturing the mask and its manufacturing method and the target pattern |
| 12/10/2014 | CN103246174B 衬底拓扑可知的光刻模型化 Knowable lithography substrate topology modeling |
| 12/10/2014 | CN103163728B 基于光刻工艺窗口的opc修正方法 Opc correction method based on a photolithography process window |
| 12/10/2014 | CN103026296B Euv光刻用带反射层的基板和euv光刻用反射型掩模底版 Substrate and euv Euv lithography with a reflecting layer lithography reflective photoblank |
| 12/10/2014 | CN102967992B 一种掩膜板及其制造方法、一种阵列基板的制造方法 A mask and its manufacturing method, a method of manufacturing an array substrate |
| 12/10/2014 | CN102830586B 掩膜装置及其制作方法 Mask device and manufacturing method thereof |
| 12/10/2014 | CN102597872B 选择与设计相关的图案子组的方法 Methods associated with the design pattern subgroups |
| 12/10/2014 | CN102540754B 源、掩模和投影光学装置的优化流程 Optimize the flow source, mask and projection optics devices |
| 12/09/2014 | US8910091 Method, program product and apparatus for performing double exposure lithography |
| 12/09/2014 | US8908153 Method to calculate transmission cross coefficient in an exposure apparatus |
| 12/09/2014 | US8908150 Substrate processing method, manufacturing method of EUV mask, and EUV mask |
| 12/09/2014 | US8907345 Photomask and thin-film transistor fabricated using the photomask |
| 12/09/2014 | US8906600 Resist pattern forming method, resist pattern, positive resist composition, nanoimprint mold and photomask |
| 12/09/2014 | US8906595 Method for improving resist pattern peeling |
| 12/09/2014 | US8906584 Photomask and method for forming pattern of semiconductor device using the same |
| 12/09/2014 | US8906583 Stacked mask |
| 12/09/2014 | US8906582 Blank masks for extreme ultra violet lithography, methods of fabricating the same, and methods of correcting registration errors thereof |
| 12/09/2014 | US8906490 Multicolor mask |
| 12/04/2014 | US20140356770 Reflective mask blank for euv lithography |
| 12/04/2014 | US20140356769 Method of manufacturing a mask |
| 12/04/2014 | US20140356768 Charged beam plasma apparatus for photomask manufacture applications |
| 12/04/2014 | US20140353757 Integrated Circuits and Methods of Design and Manufacture Thereof |
| 12/02/2014 | US8904316 Method and apparatus for printing high-resolution two-dimensional periodic patterns |
| 12/02/2014 | US8903158 Inspection system and inspection method |
| 12/02/2014 | US8901019 Very low CTE slope doped silica-titania glass |
| 12/02/2014 | US8900778 Method for forming circular patterns on a surface |
| 12/02/2014 | US8900777 Apparatus and method for lithography patterning |
| 12/02/2014 | US8900776 Mask plate, fattening method and method for manufacturing array substrate |
| 12/02/2014 | US8899148 Method for printing a material onto a substrate |
| 11/27/2014 | US20140349219 Exposure method, reflection type mask, and semiconductor device manufacturing method |
| 11/27/2014 | US20140345646 Apparatus and method for cleaning photomask |
| 11/25/2014 | US8898599 Gradient-based pattern and evaluation point selection |
| 11/25/2014 | US8895235 Process for production of photoresist pattern |
| 11/25/2014 | US8895214 Optical mask for forming pattern |
| 11/25/2014 | US8895213 Mask |
| 11/25/2014 | US8895212 Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes with different dosages |
| 11/25/2014 | US8895211 Semiconductor device resolution enhancement by etching multiple sides of a mask |
| 11/25/2014 | US8895210 Method for fabricating pellicle, photo mask, and semiconductor device |
| 11/25/2014 | US8895209 Mask for use in photolithography, manufacturing method thereof and manufacturing method of devices by using the mask |
| 11/20/2014 | US20140342564 Photomask With Three States For Forming Multiple Layer Patterns With A Single Exposure |
| 11/20/2014 | US20140342273 Monomer for a hardmask composition, hardmask composition comprising the monomer, and method for forming a pattern using the hardmask composition |
| 11/20/2014 | US20140342272 Method to Define Multiple Layer Patterns With a Single Exposure by E-Beam Lithography |
| 11/18/2014 | US8893067 System and method for lithography simulation |
| 11/18/2014 | US8893060 Optimization of source, mask and projection optics |
| 11/18/2014 | US8893059 Pattern data system for high-performance maskless electron beam lithography |
| 11/18/2014 | US8893058 Methods and system for model-based generic matching and tuning |
| 11/18/2014 | US8891065 Patterning non-planar surfaces |
| 11/18/2014 | US8890539 Method for testing mask articles |
| 11/18/2014 | US8889339 Resist pattern forming method, resist pattern, crosslinkable negative chemical amplification resist composition for organic solvent development, resist film and resist-coated mask blanks |
| 11/18/2014 | US8888086 Apparatus with surface protector to inhibit contamination |
| 11/13/2014 | US20140335447 Composition for hardmask, method of forming patterns using the same, and semiconductor integrated circuit device including the patterns |
| 11/13/2014 | US20140335446 Systems and Methods for Lithography Masks |
| 11/13/2014 | US20140335445 Mask and method of manufacturing the same |
| 11/13/2014 | US20140333914 Reflective Lithography Masks and Systems and Methods |
| 11/13/2014 | US20140333911 Liti mask and laser irradiation device including the same |
| 11/13/2014 | US20140332904 System and methods for converting planar design to finfet design |
| 11/13/2014 | US20140332761 Organic light-emitting display apparatus and photo mask for manufacturing same |
| 11/11/2014 | US8887107 Inspection method and apparatus and lithographic processing cell |
| 11/11/2014 | US8885141 EUV lithography device and method for processing an optical element |
| 11/11/2014 | US8883399 Ablation layer, photosensitive resin structure, and method for producing relief printing plate using the photosensitive resin structure |
| 11/11/2014 | US8883375 Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes |
| 11/11/2014 | US8883374 EUV photoresist encapsulation |
| 11/11/2014 | US8883373 Method for manufacturing photo mask, method for manufacturing semiconductor device, and program |
| 11/11/2014 | US8883372 Reticle with composite polarizer and method of simultaneous optimization of imaging of a set of different patterns |
| 11/11/2014 | US8883050 Curable colored compositions, color filters and processes for preparing them, liquid crystal display devices, solid-state image sensors, and dye compounds |
| 11/06/2014 | US20140331193 Method and device for increasing fin device density for unaligned fins |
| 11/06/2014 | US20140329174 Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication method |
| 11/06/2014 | US20140329173 Reticles for use in forming implant masking layers and methods of forming implant masking layers |
| 11/04/2014 | US8881072 Method for compensating for variations in structures of an integrated circuit |
| 11/04/2014 | US8881071 Photolithography mask design simplification |