| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 08/09/2006 | CN1815206A Defect testing method and apparatus for optical elements |
| 08/09/2006 | CN1269205C Topological process of wiring diagram, semiconductor device and optical patter-correcting method |
| 08/09/2006 | CN1268981C Attenuated phase shifting mask having embedded bi-layer structure for and method for making same |
| 08/08/2006 | US7089528 Methods and systems for estimating reticle bias states |
| 08/08/2006 | US7088464 Image processing device |
| 08/08/2006 | US7087947 Semiconductor device with loop line pattern structure, method and alternating phase shift mask for fabricating the same |
| 08/08/2006 | US7087910 Method for detecting and compensating for positional displacements in photolithographic mask units and apparatus for carrying out the method |
| 08/08/2006 | US7087350 Method for combining via patterns into a single mask |
| 08/08/2006 | US7087297 Protective film transfer sheet for photo masks and a method for transferring a protective film using the same |
| 08/03/2006 | WO2006080060A1 Case for housing large-sized pellicle |
| 08/03/2006 | WO2006079529A1 Method for removing defective material from a lithography mask |
| 08/03/2006 | WO2006063268A3 Computer-implemented methods for detecting and/or sorting defects in a design pattern of a reticle |
| 08/03/2006 | US20060172206 Mixture containing acid generator, crosslinking agent and dye; reproduction, photostability, heat resistance |
| 08/03/2006 | US20060172205 Etching, photoresists; latent imaging |
| 08/03/2006 | US20060172204 Systems, masks and methods for printing contact holes and other patterns |
| 08/03/2006 | US20060169896 Pattern specification method and pattern specification apparatus |
| 08/03/2006 | DE10244399B4 Defekt-Reparatur-Verfahren zur Reparatur von Masken-Defekten Defect repair method for repairing mask defects |
| 08/03/2006 | DE102005004070B3 Lithographic mask`s defective material removing method for highly integrated circuit, involves applying absorbing material in outer region after removal of defective material to form transmitting region with desired phase difference on mask |
| 08/03/2006 | DE10048646B4 Element zur Bestrahlung in einer Bearbeitungsvorrichtung mit geladenem Strahl und Elektronenstrahl-Belichtungsvorrichtung Element in a processing apparatus for irradiating with a charged beam, and electron beam exposure apparatus |
| 08/02/2006 | EP1686422A2 Method for photomask plasma etching using a protected mask |
| 08/02/2006 | EP1686421A2 Method for plasma etching a chromium layer suitable for photomask fabrication |
| 08/02/2006 | EP1686420A2 Method for etching a molybdenum layer suitable for photomask fabrication |
| 08/02/2006 | EP1685444A2 Polarized reticle, photolithography system, and method of forming a pattern using a polarized reticle in conjunction with polarized light |
| 08/02/2006 | EP1614009B1 Masking arrangement and method for producing integrated circuit arrangements |
| 08/02/2006 | CN1813338A Focus test mask, focus measureing method, and exposure device |
| 08/02/2006 | CN1811594A Mask, mask forming method, pattern forming method, and wiring pattern forming method |
| 08/02/2006 | CN1811593A Mask for electromagnetic radiation and method of fabricating the same |
| 08/02/2006 | CN1811592A Optical mask pattern structure and array for laser crystal |
| 08/02/2006 | CN1267844C Cover film data processing device |
| 08/02/2006 | CN1267789C Light shield for defining protection ring and method thereof |
| 08/02/2006 | CN1267788C Exposure device detecting mask, exposure device detecting method and exposure device |
| 08/02/2006 | CN1267787C Binary optica device grey scale changing mask method and device for making |
| 08/01/2006 | US7086031 Methods of forming patterned reticles |
| 08/01/2006 | US7085417 Method of efficiently converting-to-array and compressing data in a process for converting mask patterns of a LSI |
| 08/01/2006 | US7085055 Diffractive optical system |
| 08/01/2006 | US7085036 Mask, substrate with light reflection film, manufacturing method for light reflection film, manufacturing method for electro-optical device, and electro-optical device, and electronic apparatus |
| 08/01/2006 | US7084950 Chromeless photomask and exposure apparatus including the chromeless photomask |
| 08/01/2006 | US7084413 Compact design; rotating adjustment of optics; forming image; calibration |
| 08/01/2006 | US7083900 Stacks of thin films; coating photoresist on patterned layer as mask; development; semiconductor |
| 08/01/2006 | US7083881 Attenuation; phase shifting; multilayer; buffer thin film coupling to substrate; etching circuit pattern |
| 08/01/2006 | US7083880 Forming semiconductor devices, microelectronic devices, microelectromechanical devices, microfluidic devices, and photonic devices |
| 08/01/2006 | US7083879 Phase conflict resolution for photolithographic masks |
| 07/27/2006 | WO2006078916A2 Automatic defect repair system |
| 07/27/2006 | WO2006078908A2 Differential alternating phase shift mask optimization |
| 07/27/2006 | WO2006078791A2 Systems, masks and methods for printing contact holes and other patterns |
| 07/27/2006 | WO2006078382A2 Passivating metal etch structures |
| 07/27/2006 | US20060166506 Mask material for reactive ion etching, mask and dry etching method |
| 07/27/2006 | US20060166114 Photosensitive resin composition for black matrix |
| 07/27/2006 | US20060166113 Photosensitive paste composition and plasma display panel manufactured using the same |
| 07/27/2006 | US20060166112 Photomask for nearfield exposure, method for making pattern using the photomask, and apparatus for making pattern including the photomask |
| 07/27/2006 | US20060166111 Mask, mask forming method, pattern forming method, and wiring pattern forming method |
| 07/27/2006 | US20060166110 Method and apparatus for improving depth of focus during optical lithography |
| 07/27/2006 | US20060166109 Method to correct EUVL mask substrate non-flatness |
| 07/27/2006 | US20060166108 Method for etching a molybdenum layer suitable for photomask fabrication |
| 07/27/2006 | US20060166107 Method for plasma etching a chromium layer suitable for photomask fabrication |
| 07/27/2006 | US20060166106 Including a film stack having a chromium layer and a patterned photoresist; depositing a conforming polymethylene protective layer on the patterned photoresist; etching the polymer to expose chromium and etching the chromium layer; patterns with small features; improves trenches |
| 07/27/2006 | US20060166105 for the treatment and prevention of AIDS |
| 07/27/2006 | US20060163203 Methods and apparatus for etching metal layers on substrates |
| 07/27/2006 | DE60114517T2 Infrarot-empfindliche beschichtungsflüssigkeit The infrared-sensitive coating liquid |
| 07/27/2006 | DE102005003184A1 Tri-tone mask for lithographic manufacturing of semiconductor device, has mask structure in chromium layer, halftone layer or glass layer, where structure is surrounded by strip of halftone layer with predetermined width |
| 07/27/2006 | DE102005002533A1 Final mask layouts producing method, involves assigning main structures of auxiliary mask layout optically to scatter bars which are changed within frame of optical proximity correction process, where main structures remain unchanged |
| 07/27/2006 | DE102005002529A1 Aberration avoiding mask layout producing method for mask, involves arranging optically not resolvable auxiliary structure adjacent to section in one direction that is different and runs transverse to other direction |
| 07/26/2006 | EP1682941A2 Varying feature size in resist |
| 07/26/2006 | CN1809790A Adhesion method using gray-scale photolithography |
| 07/26/2006 | CN1808268A Metal hard mask method and structure for strained silicon MOS transistor |
| 07/26/2006 | CN1808267A Mask, manufacturing method and application thereof |
| 07/26/2006 | CN1808266A Optical mask and manufacturing method of thin film transistor array panel using the optical mask |
| 07/26/2006 | CN1807115A A printing plate |
| 07/26/2006 | CN1266543C Apparatus and system for improving phase-shift mask image performance and its method |
| 07/26/2006 | CN1266542C Corrosion-proof film forming method and photomask making method |
| 07/26/2006 | CN1266527C Reflected light component and its manufacturing method and display device |
| 07/26/2006 | CN1266491C Method for manufacturing microlens array |
| 07/25/2006 | US7082596 Simulation-based selection of evaluation points for model-based optical proximity correction |
| 07/25/2006 | US7081961 Method and apparatus for characterization of optical systems |
| 07/25/2006 | US7081610 System for compensating for dark current in sensors |
| 07/25/2006 | US7081323 Method of making gratings and phase masks for fiber grating fabrication |
| 07/25/2006 | US7081322 Nanopastes as ink-jet compositions for printing plates |
| 07/20/2006 | WO2006075687A1 Pattern defect inspection method and semiconductor device manufacturing method |
| 07/20/2006 | US20060161452 Computer-implemented methods, processors, and systems for creating a wafer fabrication process |
| 07/20/2006 | US20060161254 Method and apparatus for personalization of semiconductor |
| 07/20/2006 | US20060160279 Optical mask and manufacturing method of thin film transistor array panel using the optical mask |
| 07/20/2006 | US20060160036 Near-field exposure method and apparatus, near-field exposure mask, and device manufacturing method |
| 07/20/2006 | US20060160029 Lithographic method of manufacturing a device |
| 07/20/2006 | US20060160001 Systems for determining width/space limits for product mask layouts; mask writer generates first pattern on a test mask, a lithography tool generates a second pattern on a wafer like the first pattern by a lithography process using a preset exposure dose; measures widths; controls according to difference |
| 07/20/2006 | US20060159931 Mask blank providing system, mask blank providing method, mask blank transparent substrate manufacturing method, mask blank manufacturing method, and mask manufacturing method |
| 07/20/2006 | US20060159330 Method and apparatus for inspecting a defect of a pattern |
| 07/20/2006 | US20060158643 Method and system of inspecting mura-defect and method of fabricating photomask |
| 07/20/2006 | US20060158642 Apparatus and method of inspecting mura-defect and method of fabricating photomask |
| 07/20/2006 | DE19709246B4 Phasenverschiebungsmaske und Verfahren zum Herstellen derselben Phase shift mask and method for manufacturing the same |
| 07/20/2006 | DE102005048107A1 Verfahren zum Bestimmen einer optimalen Absorber-Schichtenstapelgeometrie für eine lithographische Reflexionsmaske A method for determining an optimum absorber layer stack geometry for a lithographic reflection mask |
| 07/20/2006 | DE102005005591B3 Integrated circuit design pattern`s structural components geometry optimization method for producing photomask, involves optimizing geometries of structural components and inserting optimized base patterns into circuit design |
| 07/20/2006 | DE102005005102B3 Photolithographic mask for radiation sensitive lacquer layer structure, has auxiliary structures arranged in two rows, where minimum distance exists between structures in each row and deviates by maximum of ten percent from average value |
| 07/19/2006 | EP1395428A4 Chemical imaging of a lithographic printing plate |
| 07/19/2006 | EP1368711A4 Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass |
| 07/19/2006 | CN1804848A Method for improving optical proximity correction |
| 07/19/2006 | CN1804601A Apparatus for marking a defect |
| 07/19/2006 | CN1265245C Method for uniformly coating substrate |
| 07/19/2006 | CN1264887C Method for mfg. water alkaline-soluble resin, photosensitive resin composition, optical mask and electronic device |
| 07/18/2006 | US7079235 Reticle design inspection system |
| 07/18/2006 | US7079223 Fast model-based optical proximity correction |