| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 08/31/2006 | US20060191626 Method for forming color filter, method for forming light emitting element layer, method for manufacturing color display device comprising them, or color display device |
| 08/31/2006 | DE10345476B4 Lithographische Maske und Verfahren zum Bedecken einer Maskenschicht Lithographic mask and method for covering a mask layer |
| 08/31/2006 | DE102005009536A1 Process to inspect masks for weak spots uses aerial image simulation to produce a list of critical points or hotspots, which is analyzed using Aerial Imaging Measurement system to compare real with simulated images |
| 08/30/2006 | EP1696270A2 Method and apparatus for determining an improved assist feature configuration in a mask layout |
| 08/30/2006 | EP1696269A2 Identifying a problem area in a layout using a process-sensitivity model |
| 08/30/2006 | EP1695145A2 Method for repairing errors of patterns embodied in thin layers |
| 08/30/2006 | CN1824826A Mask, mask manufacturing method, pattern forming apparatus, and pattern formation method |
| 08/30/2006 | CN1272843C Method and system for phase/amplitude error detection of alternate phase shifting mask in photolithography |
| 08/30/2006 | CN1272673C An integrated circuit using a reflective mask |
| 08/29/2006 | US7100146 Design system of alignment marks for semiconductor manufacture |
| 08/29/2006 | US7100145 Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs |
| 08/29/2006 | US7099733 Semiconductor production system |
| 08/29/2006 | US7099005 System for scatterometric measurements and applications |
| 08/29/2006 | US7098996 Optical error minimization in a semiconductor manufacturing apparatus |
| 08/29/2006 | US7098995 Apparatus and system for improving phase shift mask imaging performance and associated methods |
| 08/29/2006 | US7097957 Photosensitive resin laminate |
| 08/29/2006 | US7097949 Phase edge phase shift mask enforcing a width of a field gate image and fabrication method thereof |
| 08/29/2006 | US7097948 Method for repair of photomasks |
| 08/29/2006 | US7097947 Method for correcting local loading effects in the etching of photomasks |
| 08/29/2006 | US7097946 For use insemiconductor manufacturing; lithography |
| 08/29/2006 | US7097945 by forming the virtual pattern around the isolation pattern, the flare effect of the isolation pattern is close to that of the dense pattern, thus the CD bias between a dense pattern and an isolation pattern is reduced, and the process windows of both patterns are not reduced |
| 08/29/2006 | CA2365948C Creating a mask for producing a printing plate |
| 08/24/2006 | WO2006088041A1 Light-transmitting object examining method |
| 08/24/2006 | US20060190921 Manufacturing Method of Semiconductor Device |
| 08/24/2006 | US20060190920 Optical proximity correction performed with respect to limited area |
| 08/24/2006 | US20060190875 Pattern extracting system, method for extracting measuring points, method for extracting patterns, and computer program product for extracting patterns |
| 08/24/2006 | US20060190850 Method for optimizing the geometry of structural elements of a circuit design pattern and method for producing a photomask |
| 08/24/2006 | US20060189717 Modified pigments having improved dispersion properties |
| 08/24/2006 | US20060188796 Performing OPC on structures with virtual edges |
| 08/24/2006 | US20060188794 Color conversion film and multicolor light-emitting device provided with the same |
| 08/24/2006 | US20060188793 Adjustable Transmission Phase Shift Mask |
| 08/24/2006 | US20060188792 Printing of design features using alternating PSM technology with double mask exposure strategy |
| 08/24/2006 | US20060188791 Merging sub-resolution assist features of a photolithographic mask |
| 08/24/2006 | US20060187524 Pattern generator diffractive mirror methods and systems |
| 08/24/2006 | US20060187440 Apparatus and method for mounting a hard pellicle |
| 08/24/2006 | US20060186411 Thin film transistor array substrate, manufacturing method thereof, and mask |
| 08/24/2006 | US20060185558 Color filter, image display device and information communication equipment; pigment dispersing ability, transparency, fluidity and storage stability |
| 08/24/2006 | DE10349764B4 Hartmaske zur Strukturierung einer Schicht und Verfahren zur Generierung einer Hartmaske für die Strukturierung einer Schicht Hard mask for patterning a layer and method for generating a hard mask for patterning a layer |
| 08/23/2006 | EP1218796A4 Extreme ultraviolet soft x-ray projection lithographic method and mask devices |
| 08/23/2006 | EP1214718A4 Extreme ultraviolet soft x-ray projection lithographic method system and lithography elements |
| 08/23/2006 | CN1821868A Photomask and manufacturing method thereof |
| 08/23/2006 | CN1821867A Method of manufacture grey mask and grey mask |
| 08/23/2006 | CN1271474C Method and device of transferring optical enclosure picture and method of manufacturing optical enclosure |
| 08/22/2006 | US7096452 Method and device for checking lithography data |
| 08/22/2006 | US7094686 Contact hole printing by packing and unpacking |
| 08/22/2006 | US7094507 Method for determining an optimal absorber stack geometry of a lithographic reflection mask |
| 08/22/2006 | US7094505 Photomask assembly and method for protecting the same from contaminants generated during a lithography process |
| 08/22/2006 | US7094504 Faster, lower cost production of phase shift device |
| 08/22/2006 | US7094503 Nanopastes for use as patterning compositions |
| 08/17/2006 | WO2006085663A1 Mask blanks |
| 08/17/2006 | US20060184908 Method and program for generating layout data of a semiconductor integrated circuit and method for manufacturing a semiconductor integrated circuit with optical proximity correction |
| 08/17/2006 | US20060183310 Process for fabricating semiconductor device and method for generating mask pattern data |
| 08/17/2006 | US20060183036 Method of forming film pattern, method of manufacturing device, electro-optical device, and electronic apparatus |
| 08/17/2006 | US20060183035 For forming a fine pattern used for producing a semiconductor integrated circuit device; combination of a desired phase change and a desired transmittance can be selected arbitrarily for the phase shift film |
| 08/17/2006 | US20060183034 Photomask |
| 08/17/2006 | US20060183033 For semiconductor integrated circuits; improved contrast; forming a small pattern under the same exposure conditions without depending on the shape and the density of the pattern |
| 08/17/2006 | US20060183032 Improved contrast; forming a small pattern under the same exposure conditions without depending on the shape and the density of the pattern; semiconductors, integrated circuits |
| 08/17/2006 | US20060183031 Optical proximity correction method |
| 08/17/2006 | US20060183030 Photomask, method of generating mask pattern, and method of manufacturing semiconductor device |
| 08/17/2006 | US20060183029 Method for producing a mask arrangement and use of the mask arrangement |
| 08/17/2006 | US20060183028 Method for producing a mask layout avoiding imaging errors for a mask |
| 08/17/2006 | US20060183026 Masking for wafer fabrication |
| 08/17/2006 | US20060183025 Methods of forming mask patterns, methods of correcting feature dimension variation, microlithography methods, recording medium and electron beam exposure system |
| 08/17/2006 | US20060181691 Apparatus for projecting a pattern into an image plane |
| 08/17/2006 | US20060180881 Probe head and method of fabricating the same |
| 08/17/2006 | DE10330467B4 Verfahren zur Erstellung von alternierenden Phasenmasken Process for the preparation of alternating phase masks |
| 08/16/2006 | EP1690883A1 Pellicle and novel fluorinated polymer |
| 08/16/2006 | EP1558446B1 Thermal generation of a mask for flexography |
| 08/16/2006 | CN1818792A Method and apparatus for a reticle with purged pellicle-to-reticle gap |
| 08/15/2006 | US7093228 Method and system for classifying an integrated circuit for optical proximity correction |
| 08/15/2006 | US7093227 Methods of forming patterned reticles |
| 08/15/2006 | US7093226 Method and apparatus of wafer print simulation using hybrid model with mask optical images |
| 08/15/2006 | US7092073 Semiconductor lithography |
| 08/15/2006 | US7092068 Reticle, exposure monitoring method, exposure method and manufacturing method for semiconductor device |
| 08/15/2006 | US7092063 Method for designing mask and fabricating panel |
| 08/15/2006 | US7091476 Scanning probe microscope assembly |
| 08/15/2006 | US7091295 Amorphous perfluorinated polymers |
| 08/15/2006 | US7090949 Method of manufacturing a photo mask and method of manufacturing a semiconductor device |
| 08/15/2006 | US7090948 Reflection mask and method for fabricating the reflection mask |
| 08/15/2006 | US7090947 Phase shifter film and process for the same |
| 08/15/2006 | US7089860 Providing customized text and imagery on organic products |
| 08/15/2006 | US7089766 Method of forming optical fiber preforms |
| 08/15/2006 | CA2121865C Laser imaged printing plate |
| 08/10/2006 | WO2005109095A3 Method for imprint lithography at constant temperature |
| 08/10/2006 | US20060177778 single mask with two or more focus planes to accommodate different exposures |
| 08/10/2006 | US20060177771 Laminated photosensitive relief printing original plate and method for producing the relief printing plate |
| 08/10/2006 | US20060177747 Semiconductors, liquid crystal displays; patterning any size or shape by exposure using only one photomask; the mask pattern has a light-shielding film and a phase shifter |
| 08/10/2006 | US20060177746 Half-tone stacked film, photomask-blank, photomask and fabrication method thereof |
| 08/10/2006 | US20060177745 Phase shift masks |
| 08/10/2006 | US20060177744 Method for producing a mask layout avoiding imaging errors for a mask |
| 08/10/2006 | US20060177743 Photomask, photomask fabrication method, and semiconductor device fabrication method |
| 08/10/2006 | DE112004000465T5 Retikelsubstrat, Verfahren zum Herstellen des Substrats, Maskenrohling und Verfahren zum Herstellen des Maskenrohlings Reticle substrate, method of manufacturing the substrate, mask blank and methods of producing the mask blank |
| 08/10/2006 | DE10228546B4 Verfahren zur Strukturierung einer Lithographiemaske Method for structuring a lithography mask |
| 08/10/2006 | DE102006003422A1 Muster-Festlegungsverfahren und Muster-Festlegungsvorrichtung Pattern determination method and pattern-setting device |
| 08/09/2006 | EP1688794A2 Method of manufacturing a photolithography pattern and method of determining the position of an image of an alignment mark |
| 08/09/2006 | EP1688789A2 Half-tone stacked film, photomask-blank, photomask and fabrication method thereof |
| 08/09/2006 | EP1599762A4 Optical lithography using both photomask surfaces |
| 08/09/2006 | CN1816771A Exposure station for film webs |
| 08/09/2006 | CN1815592A Disc original edition making method |
| 08/09/2006 | CN1815361A Half-tone stacked film, photomask-blank, photomask and fabrication method thereof |