| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 09/21/2006 | US20060210891 Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same |
| 09/21/2006 | US20060210890 Overcoming conventional disadvantage, so that dimension correction for gate structures with different conductivity types can be incorporated into optical simulation in generating mask data for semiconductor integrated circuit device including dual gate structures different in conductivity types |
| 09/21/2006 | US20060210889 Reduces the optical proximity effect by the light interference, and reduce the aberration of a projection lens such as the coma aberration; enhances the resolution limit |
| 09/21/2006 | US20060210888 Semiconductors; liquid crystal displays; birefringence |
| 09/21/2006 | US20060210887 Lithography mask and methods for producing a lithography mask |
| 09/21/2006 | US20060210886 Method for making grayscale photo masks and optical grayscale elements |
| 09/21/2006 | US20060210885 In photolithography process on a photoresist coated substrate, determining the effect of flare on line shortening; measure misalignments; measuring the degree of flare distortion; semiconductor processing |
| 09/21/2006 | US20060209289 Exposure apparatus, and device manufacturing method |
| 09/21/2006 | US20060209287 Positioning apparatus, exposure apparatus, and device manufacturing method |
| 09/21/2006 | US20060207633 Device and method for cleaning photomask |
| 09/21/2006 | DE102005009554A1 Exposure device`s e.g. projector, focus correcting method for semiconductor manufacturing system, involves executing focus correction of illuminating devices based on focus values of devices for correcting dimensional accuracy of image |
| 09/20/2006 | EP1454112A4 Interferometry system having a dynamic beam-steering assembly for measuring angle and distance |
| 09/20/2006 | EP1272903B1 Apparatus for generating a laser pattern on a photomask and associated methods |
| 09/20/2006 | CN1834782A Mask data generation method |
| 09/20/2006 | CN1276305C Exposure method and exposure apparatus |
| 09/20/2006 | CN1276302C Structure of phase shifting mask |
| 09/19/2006 | US7111277 System and method for lithography simulation |
| 09/19/2006 | US7111276 Correcting 3D effects in phase shifting masks using sub-resolution features |
| 09/19/2006 | US7110195 Monolithic hard pellicle |
| 09/19/2006 | US7110116 Alignment apparatus, exposure apparatus using same, and method of manufacturing devices |
| 09/19/2006 | US7110066 Color-filter substrate, method and apparatus for manufacturing color-filter substrate, and liquid crystal display and method for manufacturing liquid crystal display |
| 09/19/2006 | US7109751 Methods of implementing phase shift mask compliant static memory cell circuits |
| 09/19/2006 | US7109500 Mask pattern correction method, semiconductor device manufacturing method, mask manufacturing method and mask |
| 09/19/2006 | US7109484 Sheet beam-type inspection apparatus |
| 09/19/2006 | US7108945 Photomask having a focus monitor pattern |
| 09/19/2006 | US7108798 Defect repair method, in particular for repairing quartz defects on alternating phase shift masks |
| 09/19/2006 | US7107826 Scanning probe device and processing method by scanning probe |
| 09/14/2006 | WO2006095892A1 Image processing method, image processor, drawing system, and program |
| 09/14/2006 | WO2005088393A8 Use of mixed bases to enhance patterned resist profiles on chrome or sensitive substrates |
| 09/14/2006 | US20060206853 Method of producing mask inspection data, method of manufacturing a photo mask and method of manufacturing a semiconductor device |
| 09/14/2006 | US20060206491 Mask recovering system and mask recovering method |
| 09/14/2006 | US20060204904 Metal mask and manufacturing method thereof |
| 09/14/2006 | US20060204866 Display device and display apparatus |
| 09/14/2006 | US20060204865 Patterned light-emitting devices |
| 09/14/2006 | US20060204864 Photomask, method for manufacturing the same, and method for measuring optical characteristics of wafer exposure system using the photomask during operation |
| 09/14/2006 | US20060204863 photoresists; liquid crystal display panels |
| 09/14/2006 | US20060204862 Methods, systems and computer program products for correcting photomask using aerial images and boundary regions |
| 09/14/2006 | US20060204861 Optical mask for all-optical extended depth-of-field for imaging systems under incoherent illumination |
| 09/14/2006 | US20060204860 first layer of light transmissive material, layer of etch stop material and 2nd layer of light transmissive material have thicknesses such that light of the given wavelength directed from a light source through etched portions of the substrate to pattern a photosensitive surface will be shifted in phase |
| 09/14/2006 | US20060204859 An extra dose trim mask, method of manufacture, and lithographic process using the same |
| 09/14/2006 | US20060203233 Dual stage defect region identification and defect detection method and apparatus |
| 09/14/2006 | US20060203064 Photomask, manufacturing method thereof, and manufacturing method of electronic device |
| 09/14/2006 | DE4324325B4 Verfahren zur Herstellung eines Bauelementes, optisches Bauelement, Verwendung desselben und Vakuumbehandlungsanlage zu seiner Herstellung A method for producing a component, an optical component, using the same and vacuum treatment plant for its production |
| 09/14/2006 | DE19529170B4 Verfahren zum Bilden einer Fotolithographiemaske A method of forming a photolithography mask |
| 09/14/2006 | DE102005009805A1 Lithographiemaske und Verfahren zum Erzeugen einer Lithographiemaske Lithography mask and method for generating a lithography mask |
| 09/13/2006 | EP1700161A2 Methods and devices for fabricating three-dimensional nanoscale structures |
| 09/13/2006 | EP1700160A2 Lithography system using a programmable electro-wetting mask |
| 09/13/2006 | EP1597631A4 Multiple exposure method for circuit performance improvement |
| 09/13/2006 | EP1483628A4 Full phase shifting mask in damascene process |
| 09/13/2006 | CN1831651A Method for providing layout design and photomask |
| 09/13/2006 | CN1831643A Method for forming dual damascene with improved etch profiles |
| 09/13/2006 | CN1831642A Photomask, manufacturing method thereof, and manufacturing method of electronic device |
| 09/13/2006 | CN1275098C Deposited mask of display device and its manufacturing method |
| 09/13/2006 | CN1275092C Method for making patterns of phase shift transformation light shield used in semiconductor chips manufacturing and structure thereof |
| 09/13/2006 | CN1275075C Thin film transistor array substrate and manufacturing method thereof |
| 09/12/2006 | US7107573 Method for setting mask pattern and illumination condition |
| 09/12/2006 | US7107572 Methods of forming patterned reticles |
| 09/12/2006 | US7107571 Visual analysis and verification system using advanced tools |
| 09/12/2006 | US7106895 Method and apparatus for inspecting reticles implementing parallel processing |
| 09/12/2006 | US7106495 Mask, substrate with light reflection film, manufacturing method for light reflection film, manufacturing method for electro-optical device and electro-optical device, and electronic apparatus |
| 09/12/2006 | US7106417 Tiling of modulator arrays |
| 09/12/2006 | US7105873 Semiconductor device and method for patterning |
| 09/12/2006 | US7105841 Photolithographic techniques for producing angled lines |
| 09/12/2006 | US7105278 Exposing a photosensitive surface to light through a mask with a transmissivity to light and a plurality of features in a dense nonuniform repetitive pattern for forming structures in a semiconductor pattern; symmetry is broken without altering the semiconductor features that are formed |
| 09/12/2006 | US7105255 EUV reflection mask and lithographic process using the same |
| 09/08/2006 | WO2004114024A3 Exposure method and exposure apparatus |
| 09/07/2006 | US20060199375 Structure applied to a photolithographic process |
| 09/07/2006 | US20060199325 Semiconductor integrated circuit device advantageous for microfabrication and manufacturing method for the same |
| 09/07/2006 | US20060199114 Negates effect of fine dust causing defects; locating an exposure mask at a predetermined position with respect to a wafer, exposing a resist film, then displacing the exposure mask relative to the wafer by a predetermined dimension, and further exposing the resist film; semiconductors |
| 09/07/2006 | US20060199109 Phase Shift Photomask and Method for Improving Printability of a Structure on a Wafer |
| 09/07/2006 | US20060199085 Method and device for adjusting an alignment microscope by means of a reflective alignment mask |
| 09/07/2006 | US20060199084 Chromeless phase shifting mask for integrated circuits |
| 09/07/2006 | US20060199083 Method and apparatus for identifying and correcting phase conflicts |
| 09/07/2006 | US20060199082 Mask repair |
| 09/07/2006 | US20060197935 Processing unit, exposure apparatus having the processing unit, and protection unit |
| 09/07/2006 | DE102005009018A1 Testing a photolithographic imaging mechanism relating to generation of scattered light used in manufacture of microelectronic circuits, involves using measuring and neighboring structures formed on photomask to evaluate scattered light |
| 09/07/2006 | DE10143515B4 Maskenanordnung für einen Abbildungsprozess, Verfahren zu deren Herstellung sowie Verfahren zum optischen Abbilden bzw. zum Herstellen eines Kompensationsbauelements A mask assembly for a mapping process, a process for their preparation and methods for optical imaging or for producing a compensation device |
| 09/06/2006 | EP1698940A2 Exposure method and apparatus |
| 09/06/2006 | CN1828614A Method for optimizing the geometry of structural elements of a circuit design pattern and use thereof |
| 09/06/2006 | CN1828410A Mask, method of manufacturing mask, device for manufacturing mask, method of manufacturing layer of luminescent material |
| 09/06/2006 | CN1828409A Lithography mask and methods for producing a lithography mask |
| 09/06/2006 | CN1274013C Semiconductor device and process for designing mask |
| 09/06/2006 | CN1273873C Multi-tone photomask and method for manufacturing the same |
| 09/05/2006 | US7103209 Method for extracting objective image |
| 09/05/2006 | US7102734 Exposure apparatus |
| 09/05/2006 | US7102243 Mask-making member and its production method, mask and its making method, exposure process, and fabrication method of semiconductor device |
| 09/05/2006 | US7102127 Mechanized retractable pellicles and methods of use |
| 09/05/2006 | US7100322 Method of manufacturing an alternating phase shift mask |
| 08/31/2006 | WO2006091888A1 Locating sub-resolution assist features in semiconductor device fabrication |
| 08/31/2006 | WO2006091881A2 Merging sub-resolution assist features of a photolithographic mask |
| 08/31/2006 | WO2006089630A1 Method for mask inspection for mask design and mask production |
| 08/31/2006 | WO2006060620A3 Reticles and methods of forming reticles |
| 08/31/2006 | US20060195815 Exposure data generator and method thereof |
| 08/31/2006 | US20060194126 Mask blank transparent substrate manufacturing method, mask blank manufacturing method, and exposure mask manufacturing method |
| 08/31/2006 | US20060194125 Used for exposure of a resist film in a fabrication process of a semiconductor device; liquid immersion lithography technique which achieves a high resolution |
| 08/31/2006 | US20060194124 Semiconductor device, method of manufacturing the same, and phase shift mask |
| 08/31/2006 | US20060194123 Method of generating a photolithography patterning device, computer program, patterning device, method of determining the position of a target image on or proximate a substrate, measurement device, and lithographic apparatus |
| 08/31/2006 | US20060193432 Method for adjusting gap between two objects and exposure method using the same, gap adjusting apparatus, and exposure apparatus |
| 08/31/2006 | US20060192972 Spatial-heterodyne interferometry for transmission (SHIFT) measurements |
| 08/31/2006 | US20060192302 Self-compensating mark design for stepper alignment |