| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 10/12/2006 | DE102005003905A1 Anordnung zur Projektion eines Musters in eine Bildebene Arrangement for projecting a pattern in an image plane |
| 10/12/2006 | DE10160458B4 Maske mit programmierten Defekten und Verfahren zu deren Herstellung Mask programmed with defects and process for their preparation |
| 10/11/2006 | EP1710624A2 Methods of fabricating nano-scale and micro-scale mold for nano-imprint, and mold usage on nano-imprinting equipment |
| 10/11/2006 | EP1710623A1 Method of cleaning a substrate surface from a crystal nucleus |
| 10/11/2006 | EP1710327A2 Method of selective etching by using a focused ion beam, an electron beam or a laser beam |
| 10/11/2006 | EP1709488A1 Photosensitive printing sleeves and method of forming the same |
| 10/11/2006 | EP1709487A2 Reticle fabrication using a removable hard mask |
| 10/11/2006 | EP1709484A2 Protected pattern mask for reflection lithography in the extreme uv or soft x-ray range |
| 10/11/2006 | CN1846319A Integrated circuit comprising an organic semiconductor, and method for the production of an integrated circuit |
| 10/11/2006 | CN1846174A Photomask and method for maintaining optical properties of the same |
| 10/11/2006 | CN1846171A 衰减相移掩模坯体和光掩模 Attenuated phase shift mask blanks and photomasks |
| 10/11/2006 | CN1846170A Methods and systems for inspection of wafers and reticles using designer intent data |
| 10/11/2006 | CN1845008A Method of exposure and attenuated type phase shift mask |
| 10/11/2006 | CN1845007A Substrate and a method for polishing a substrate |
| 10/10/2006 | US7120895 Evaluating design pattern on photolithographicmask; generating simulated image on wafer using a pixel-based bitmap; computers, data processing |
| 10/10/2006 | US7120886 Device for determining the mask version utilized for each metal layer of an integrated circuit |
| 10/10/2006 | US7120884 Mask revision ID code circuit |
| 10/10/2006 | US7120285 Method for evaluation of reticle image using aerial image simulator |
| 10/10/2006 | US7119905 Spatial-heterodyne interferometry for transmission (SHIFT) measurements |
| 10/10/2006 | US7119346 Lithographic apparatus and device manufacturing method |
| 10/10/2006 | US7118835 Having inverted patterns of transmission regions positioned on a circumference of each of intended patterns of a resist film; for forming a pattern for capacitors of dynamic random access memories needed to be increased in capacity but in a limited occupied area |
| 10/10/2006 | US7118833 Forming partial-depth features in polymer film |
| 10/10/2006 | US7118832 Having antireflective coating on absorber layer |
| 10/05/2006 | WO2006105460A2 Extreme ultraviolet mask with leaky absorber and method for its fabricatio |
| 10/05/2006 | WO2006104244A1 Mask pattern designing method using optical proximity correction in optical lithography, designing device, and semiconductor device manufacturing method using the same |
| 10/05/2006 | WO2006104011A1 Shot shape measuring method, mask |
| 10/05/2006 | WO2006065670A3 Kit for making relief images |
| 10/05/2006 | WO2006065474A3 Method for patterning by surface modification |
| 10/05/2006 | WO2006007258A3 Comprehensive front end method and system for automatically generating and processing photomask orders |
| 10/05/2006 | US20060223224 Substrate for reticle and method of manufacturing the substrate, and mask blank and method of manufacturing the mask blank |
| 10/05/2006 | US20060222971 Display apparatus substrate and manufacturing method, and a display apparatus thereof |
| 10/05/2006 | US20060222968 For semiconductors, microelectronic and microelectromechanical devices, and microfluidic and photonic devices; eliminating image distorting charging effects during electron beam patterning of the template and charging effects during scanning electron microscope inspection |
| 10/05/2006 | US20060222967 Reticle, method for manufacturing magnetic disk medium using reticle, and magnetic disk medium |
| 10/05/2006 | US20060222966 Mask layout and method of forming contact pad using the same |
| 10/05/2006 | US20060222965 Mask, Method for Producing Mask, and Method for Producing Wired Board |
| 10/05/2006 | US20060222964 Method for manufacturing photomask and method for manufacturing semiconductor device using photomask |
| 10/05/2006 | US20060222963 Methods of forming patterns in substrates |
| 10/05/2006 | US20060222962 Masking of repeated overlay and alignment marks to allow reuse of photomasks in a vertical structure |
| 10/05/2006 | US20060222961 Leaky absorber for extreme ultraviolet mask |
| 10/05/2006 | US20060222235 Defect inspection method |
| 10/05/2006 | US20060222233 Pattern defect inspection method and apparatus using image correction technique |
| 10/05/2006 | US20060219913 Length measurement pattern, semiconductor device, and method of manufacturing a semiconductor device |
| 10/05/2006 | US20060219909 Detecting apparatus and device manufacturing method |
| 10/05/2006 | DE102005063118A1 Capacitor fabricating method for dynamic random access memory, comprises forming capacitor lower electrode by patterning conductive layer using pattern as mask such that lower electrode includes cylindrical or donut-shaped pattern |
| 10/04/2006 | EP1446283A4 Providing an image on an organic product |
| 10/04/2006 | EP1208349A4 Interferometers utilizing polarization preserving optical systems |
| 10/04/2006 | EP1012584A4 Object inspection and/or modification system and method |
| 10/04/2006 | CN1842747A Method of forming optical images, apparatus for carrying out said method and process for manufacturing a device using said method |
| 10/04/2006 | CN1841388A Method for manufacturing photomask and method for manufacturing semiconductor device using photomask |
| 10/04/2006 | CN1841387A Pattern data creation method, semi-conductor device manufacturing method and computer-readable medium |
| 10/04/2006 | CN1841190A Colored light-sensitive resin composition and hardening element thereof |
| 10/04/2006 | CN1841189A Mask blank glass substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, mask blank glass substrate, mask blank, and mask |
| 10/04/2006 | CN1841054A Defect inspection method |
| 10/04/2006 | CN1841050A Inspecting apparatus, image pickup apparatus, and inspecting method |
| 10/04/2006 | CN1278187C Method and apparatus for image formation |
| 10/04/2006 | CN1278186C UV-absorbing support layers and flexographic printing elements comprising same |
| 10/04/2006 | CN1278182C Mask graphics producing method and mask graphics producing device |
| 10/04/2006 | CN1278181C Method of enhancing phase shift masks |
| 10/03/2006 | US7117478 System and method for lithography simulation |
| 10/03/2006 | US7117477 System and method for lithography simulation |
| 10/03/2006 | US7117475 Method and system for utilizing an isofocal contour to perform optical and process corrections |
| 10/03/2006 | US7117140 Method of evaluating the exposure property of data to wafer |
| 10/03/2006 | US7115523 Etching a molybdenum silicide reticle using hydrogen-free fluorocarbons; limits polymer formation, minimizes defects, and forms features with straight sidewalls, flat, even bottoms, and high profile angles; improved etch selectivity |
| 10/03/2006 | US7115355 Positioning deformable photoresist on substrate; masking; using hydrophilic stamp to print waveguides; polydimethylsiloxane |
| 10/03/2006 | US7115354 Microfabrication of pattern imprinting |
| 10/03/2006 | US7115344 Photomask and pattern forming method employing the same |
| 10/03/2006 | US7115342 Preparation of photomasks |
| 10/03/2006 | US7115341 Halftone phase shift mask blank, halftone phase shift mask, and method of producing the same |
| 10/03/2006 | US7115207 For an integrated circuit chip interconnect solder bump; simultaneously etching both sides of a very thick molybdenum foil coated on each side by a photoresist using a very low etchant spray pressure, and undercutting said photoresist adjacent to opening to form an unsupported edge |
| 09/28/2006 | WO2006101315A1 Device and method for cleaning photomask |
| 09/28/2006 | WO2006047314A3 Optical element with an opaque chrome coating having an aperture and method of making same |
| 09/28/2006 | US20060218520 Mask data preparation |
| 09/28/2006 | US20060216648 Nanopastes for use as patterning compositions |
| 09/28/2006 | US20060216616 Photomask for measuring lens aberration, method of its manufacture, and method of its use |
| 09/28/2006 | US20060216615 Wavefront engineering with off-focus mask features |
| 09/28/2006 | US20060216614 Method of mask making and structure thereof for improving mask ESD immunity |
| 09/28/2006 | US20060215900 Image correction method |
| 09/28/2006 | US20060215146 Exposure process and apparatus using glass photomasks |
| 09/28/2006 | US20060214119 Pattern data creation method, pattern data creation program, computer-readable medium and fabrication process of a semiconductor device |
| 09/28/2006 | US20060213797 Container box for framed pellicle |
| 09/28/2006 | DE102006008734A1 Verfahren zum Herstellen eines transparenten Maskenrohlingsubstrats, Verfahren zum Herstellen eines Maskenrohlings und Verfahren zum Herstellen einer Belichtungsmaske A method for producing a transparent mask blank substrate, method of manufacturing a mask blank and process for producing an exposure mask |
| 09/28/2006 | DE10143723B4 Verfahren zur Optimierung eines Layouts für eine Maske zur Verwendung bei der Halbleiterherstellung Method for the optimization of a layout for a mask for use in the semiconductor manufacturing |
| 09/27/2006 | EP1194731A4 Interferometric apparatus and method that compensate refractive index fluctuations |
| 09/27/2006 | CN1839351A Phototool coating |
| 09/27/2006 | CN1839350A Production method for mask blank-use translucent substrate, production method for mask blank, production method for exposing mask, production method for semiconductor device and production method for |
| 09/27/2006 | CN1839349A Method for high-resolution processing of thin layers with electron beams |
| 09/27/2006 | CN1839141A Perfluoropolyether amide-linked phosphonates, phosphates, and derivatives thereof |
| 09/27/2006 | CN1837956A Graytone mask and film transistor substrate manufacturing method |
| 09/27/2006 | CN1836988A Container box for framed pellicle |
| 09/27/2006 | CN1277288C Testing mask structure |
| 09/27/2006 | CN1277155C Mask used for continuous lateral solidification and crystallization method using same |
| 09/27/2006 | CN1277152C Original negative, exposure method and original negative making method |
| 09/26/2006 | US7114145 System and method for lithography simulation |
| 09/26/2006 | US7114144 Mask pattern inspecting method, inspection apparatus, inspecting data used therein and inspecting data generating method |
| 09/26/2006 | US7112390 Forming, measuring and adjusting photoresist films patterns on wafers, used to from electrical and electronic apparatus; photolithography |
| 09/21/2006 | WO2006098266A1 Mask cleaning method |
| 09/21/2006 | WO2006097916A2 Optical mask for all-optical extended depth-of-field for imaging systems under incoherent illumination |
| 09/21/2006 | US20060211254 Top patterned hardmask and method for patterning |
| 09/21/2006 | US20060211153 Photolithographic techniques for producing angled lines |
| 09/21/2006 | US20060210930 Scanning the photomask which has sub-patterns formed inside rectangular region including all the main patterns; scan target range is regulated by inspecting apparatus; every scan target range in the rectangular region includes a main pattern and a sub-pattern; preventing alignment mixup in target range |