G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
11/2006
11/02/2006	EP1297384B1 Device and method for cleaning articles used in the production of semiconductor components
11/01/2006	CN1856747A Spatial-heterodyne interferometry for transmission (shift) measurements
11/01/2006	CN1856746A Spatial-heterodyne interferometry for transmission (SHIRT) measurements
11/01/2006	CN1856740A Method and apparatus for protecting a reticle used in chip production from contamination
11/01/2006	CN1856739A Method and apparatus for compensating for the effects of gravity on a pellicle used for protecting a reticle from contamination
11/01/2006	CN1856738A Method and apparatus for protecting a reticle used in chip production from contamination
11/01/2006	CN1854906A Method for compensating the different responses between the individual micro lens in the micro lens array
11/01/2006	CN1854905A Method for compensating the energy differences in height comparison layer and step radiation of the workpiece
11/01/2006	CN1854904A Method for adjusting the geometric pictures in the grating images
11/01/2006	CN1854903A Method for computing values related to parts of multi-value picture element of the polygon brims
11/01/2006	CN1854902A Method for representing
11/01/2006	CN1854893A Photomask
11/01/2006	CN1854892A Photomask, method of generating mask pattern, and method of manufacturing semiconductor device
11/01/2006	CN1854891A Pellicle frame
11/01/2006	CN1854890A Method for sectionalizing the micro lens array
11/01/2006	CN1854889A System and method for manufacturing a mask for semiconductor processing
11/01/2006	CN1854888A Alternative phase-shifting light mask and its solution for phase conflict
10/2006
10/31/2006	US7131106 Integrated circuit pattern designing method, exposure mask manufacturing method, exposure mask, and integrated circuit device manufacturing method
10/31/2006	US7131104 Fast and accurate optical proximity correction engine for incorporating long range flare effects
10/31/2006	US7131102 Full sized scattering bar alt-PSM technique for IC manufacturing in sub-resolution era
10/31/2006	US7131101 Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effects
10/31/2006	US7131100 Identifying phantom images generated by side-lobes
10/31/2006	US7129565 Semiconductor device, method of manufacturing the same, and phase shift mask
10/31/2006	US7129484 Method for pattern recognition in energized charge particle beam wafer/slider inspection/measurement systems in presence of electrical charge
10/31/2006	US7129157 Method for fabricating an integrated circuit
10/31/2006	US7129010 Substrates for in particular microlithography
10/26/2006	WO2006113859A2 Photomask assembly incorporating a metal/scavenger pellicle frame
10/26/2006	WO2006113146A2 Systems and methods for modifying a reticle's optical properties
10/26/2006	WO2006113145A2 Systems and methods for mitigating variances on a patterned wafer using a prediction model
10/26/2006	WO2006113135A2 Method for determining and correcting reticle variations
10/26/2006	WO2006113126A2 Method for monitoring a reticle
10/26/2006	US20060240342 ion-conducting region comprises substrate having one or more ion-conducting passageways that extend through substrate; each passageway comprises ion-conducting material that is relatively more ion conductive than substrate; for fuel cells, electrolysis cells, chlor-alkali plants; mechanical properties
10/26/2006	US20060240341 Mask, manufacturing method for mask, and manufacturing method for semiconductor device
10/26/2006	US20060240340 Prevention of photoresist scumming
10/26/2006	US20060240339 photolithography structure comprising substrates, multilayer mirrors, phase shifting layers, intensity balancer layers and capping layers, used to form semiconductor integrated circuit chips
10/26/2006	US20060240338 decreases the number of the steps by performing the process under a dry condition, reducing the cost and the environmental burden
10/26/2006	US20060240337 Method of exposure and attenuated type phase shift mask
10/26/2006	US20060240336 femto-second laser, is applied to the reticle at a plurality of embedded positions, and the optical beam is configured to form specific volumes of altered optical properties within the transparent material of the reticle at the specified positions
10/26/2006	US20060240335 Mask blank and process for producing and process for using the same, and mask and process for producing and process for using the same
10/26/2006	US20060240334 forming a 180 degrees phase-shift region by etching a first portion of reflective region, changing the physical structure of a second portion of the reflective region such that the second portion reflects extreme ultra-violet (EUV) light with the same intensity as the first portion
10/26/2006	US20060240333 Includes transparent substrate, partially shielded mesa line pattern of first phase formed on substrate, and 100% clear recessed line pattern of second phase etched into substrate and disposed right next to partially shielded mesa line pattern; for equal line/space, small pitched, dense line pattern
10/26/2006	US20060240332 Includes transparent substrate, partially shielded mesa line pattern of first phase formed on substrate and clear recessed line pattern of second phase etched into substrate and disposed right next to mesa line pattern; suited for equal line/space, small pitched, dense line pattern
10/26/2006	US20060240331 Modifying merged sub-resolution assist features of a photolithographic mask
10/26/2006	US20060240330 Exposure method, mask, semiconductor device manufacturing method, and semiconductor device
10/26/2006	US20060240222 Pellicle and novel fluoropolymer
10/26/2006	US20060240199 Pellicle frame
10/26/2006	US20060239129 Nanometer scale data storage device and associated positioning system
10/26/2006	US20060238752 Particle inspection apparatus and method, exposure apparatus, and device manufacturing method
10/26/2006	US20060238728 Optical error minimization in a semiconductor manufacturing apparatus
10/26/2006	US20060237639 Scanning probe microscope assembly and method for making spectrophotometric, near-filed, and scanning probe measurements
10/26/2006	US20060236921 Method of cleaning a substrate surface from a crystal nucleus
10/26/2006	DE112004002429T5 Verfahren und Vorrichtung zum Erzeugen von Druckdaten, Programm zum Erzeugen von Druckdaten und computerlesbares Aufzeichnungsmedium, welches das Programm enthält Method and apparatus for generating print data, program for generating print data and computer-readable recording medium containing the program
10/26/2006	DE102005008478B3 Verfahren zur Herstellung von sublithographischen Strukturen A process for producing sublithographic structures
10/25/2006	EP1715329A1 Particle inspection apparatus and method, exposure apparatus, and device manufacturing method
10/25/2006	EP1714191A2 Mask inspection apparatus and method
10/25/2006	CN1282032C Exposure control for phase shifting photolithographic masks
10/24/2006	US7127699 Method for optimizing a number of kernels used in a sum of coherent sources for optical proximity correction in an optical microlithography process
10/24/2006	US7127694 Computer implemented design system, a computer implemented design method, a reticle set, and an integrated circuit
10/24/2006	US7126231 Mask-making member and its production method, mask and its making method, exposure process, and fabrication method of semiconductor device
10/24/2006	US7125755 Method and structure for electrostatic discharge protection of photomasks
10/24/2006	US7125654 Transverse electric-field type liquid crystal display device, process of manufacturing the same, and scan-exposing device
10/24/2006	US7125651 Method of manufacturing semiconductor integrated circuit device optical mask therefor, its manufacturing method, and mask blanks
10/19/2006	WO2006109709A1 Data generating method, data generating device, and program
10/19/2006	WO2005116758A3 Cleaning a mask substrate
10/19/2006	US20060236298 Convergence technique for model-based optical and process correction
10/19/2006	US20060236295 Method for the generation of variable pitch nested lines and/or contact holes using fixed size pixels for direct-write lithographic systems
10/19/2006	US20060236294 Computer-implemented methods for detecting defects in reticle design data
10/19/2006	US20060235663 Method and device for checking lithography data
10/19/2006	US20060234145 Method for determining and correcting reticle variations
10/19/2006	US20060234144 Reticles undergo periodic inspection comprising reticle transmission measurement and/or aerial imaging of the reticle. When such inspection indicates sufficient reticle degradation, the reticle is tagged for correction prior to its subsequent use in a lithography
10/19/2006	US20060234142 Covering with a photoresist mask most but not all of a quartz base coated with a phase shifting material coated with chromium; thinning exposed chromium; removing the first mask; forming second thinner photomask patterned over thinned Cr area; transferring pattern from the second mask to main-field area
10/19/2006	US20060234141 Single trench repair method with etched quartz for attenuated phase shifting mask
10/19/2006	US20060234140 Method and device for checking lithography data
10/19/2006	US20060234139 Providing a map indicating optical property adjustments at a plurality of locations on a reticle; adjusting an optical property of the reticle at each of the plurality of locations based the optical property adjustments of the provided map, wherein adjustment is accomplished by using optical beam
10/19/2006	US20060234138 Hard mask arrangement
10/19/2006	US20060234137 Photomask structures providing improved photolithographic process windows and methods of manufacturing same
10/19/2006	US20060234136 constructing photomasks with test patterns adapted to print test features with critical dimensions that can be measured and analyzed to determine magnitude and direction of defocus from a best focus position of an exposure tool during a lithographic process
10/19/2006	US20060234135 Method for repairing mask-blank defects using repair-zone compensation
10/19/2006	US20060234134 Radiation stability of polymer pellicles
10/19/2006	DE102004044039A9 Verfahren zur Entwicklung und/oder Herstellung von Halbleiter-Chips A method for developing and / or manufacturing of semiconductor chips
10/18/2006	EP1712954A1 A method, program product and apparatus for performing double exposure lithography
10/18/2006	EP1218798B1 Method for generating a set of masks for manufacture of an integrated circuit
10/18/2006	CN1849607A System and method for lithography simulation
10/18/2006	CN1849556A Laminated photosensitive relief printing original plate and method for producing the relief printing plate
10/17/2006	USRE39349 Masks for use in optical lithography below 180 nm
10/17/2006	US7124396 Alternating phase-shift mask rule compliant IC design
10/17/2006	US7124395 Automatic optical proximity correction (OPC) rule generation
10/17/2006	US7124389 Automated wiring pattern layout method
10/17/2006	US7124379 Method for communicating a measuring position of a structural element that is to be formed on a mask
10/17/2006	US7123346 Projection exposure apparatus with line width calculator controlled diaphragm unit
10/17/2006	US7122453 Methods of patterning radiation, methods of forming radiation-patterning tools, and radiation-patterning tools
10/17/2006	US7122281 Defining critical edge portions of the features with a full phase shifting mask (FPSM) includes a first set of cuts between adjacent phase shifters to resolve phase conflicts; a computer software
10/17/2006	US7122280 Angular substrates
10/12/2006	WO2006107076A1 Computerized form data creation system
10/12/2006	US20060228636 Pattern layout for forming integrated circuit
10/12/2006	US20060228635 positioning patterned surface of form mold in proximity to surface of object on which structure is to be formed, filling space between object and patterned surface with gaseous form of radiation sensitive material, creating radiation interference pattern, exposing material to pattern
10/12/2006	US20060228634 Beam-induced etching
10/12/2006	US20060228633 Method of resolving phase conflicts in an alternating phase shift mask and the alternating phase shift mask
10/12/2006	US20060227314 System and Method for Automatically Mounting a Pellicle Assembly on a Photomask
10/12/2006	DE10245159B4 Photomaske, insbesondere alternierende Phasenmaske, mit Kompensationsstruktur Photomask, especially alternating phase mask, with compensation structure

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