G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
11/2006
11/22/2006	CN1867457A Laser-generated ultraviolet radiation mask
11/22/2006	CN1866131A Method for defining edges of polygon in region with edges
11/22/2006	CN1866130A Method for reducing critical dimension
11/22/2006	CN1285973C Method for executing optical near correction based on model
11/22/2006	CN1285967C Method for modifying charactristie pattern of regular polygon mask by use optical proximity effect
11/21/2006	US7139998 Photomask designing method, pattern predicting method and computer program product
11/21/2006	US7139996 Mask pattern correction apparatus and mask pattern correction method and mask preparation method and method of production of a semiconductor device
11/21/2006	US7138212 Method and apparatus for performing model-based layout conversion for use with dipole illumination
11/16/2006	WO2006121741A2 Computer readable mask shrink control processor
11/16/2006	US20060259893 Photomask, photomask set, photomask design method, and photomask set design method
11/16/2006	US20060259886 Computer readable mask shrink control processor
11/16/2006	US20060257763 Colorant-containing curable negative-type composition, color filter using the composition, and method of manufacturing the same
11/16/2006	US20060257762 polymerizable acrylate, azomethine dye and tetraazaporphyrin dye; photoresists, photomasks; photostability, heat resistance
11/16/2006	US20060257760 Near-infrared absorbing film, and process for production the same, near-infrared absorbing film roll, process for producing the same and near-infrared absorbing filter
11/16/2006	US20060257758 Methods of eliminating pattern collapse on photoresist patterns
11/16/2006	US20060257757 Methods for converting reticle configurations
11/16/2006	US20060257756 Method for repairing a photomask, method for inspecting a photomask, method for manufacturing a photomask, and method for manufacturing a semiconductor device
11/16/2006	US20060257755 Phase-shift photomask-blank, phase-shift photomask and fabrication method thereof
11/16/2006	US20060257754 Pellicles having low adhesive residue
11/16/2006	US20060257753 Photomask and method thereof
11/16/2006	US20060257752 Phase shift mask for preventing haze
11/16/2006	US20060257751 Photo mask and method to form a self-assembled monolayer and an inorganic ultra thin film on the photo mask
11/16/2006	US20060257750 Reticle alignment and overlay for multiple reticle process
11/16/2006	US20060257749 Method for reducing critical dimension
11/16/2006	US20060257630 Method and device for wetting a substrate with a liquid
11/16/2006	US20060256315 Simulator of optical intensity distribution, computer implemented method for simulating the optical intensity distribution, method for collecting mask pattern, and computer program product for the simulator
11/16/2006	US20060256310 Method of forming optical images, apparatus for carrying out said method and process for manufacturing a device using said method
11/16/2006	US20060254348 Scanning probe device and processing method of scanning probe
11/16/2006	US20060254347 Scanning probe device and processing method by scanning probe
11/16/2006	DE10206143B4 Reflektierender Maskenrohling und reflektierende Maske für EUV-Belichtung und Verfahren zum Herstellen der Maske Reflective mask blank and reflective mask for EUV exposure and method of manufacturing the mask
11/16/2006	DE102006018074A1 Photomaske Photomask
11/15/2006	EP1722271A2 Phase-shift photomask-blank, phase-shift photomask and fabrication method thereof
11/15/2006	EP1721215A1 Method for the production of masks used in photolithography, and use of such masks
11/15/2006	EP1720714A1 Lightweight offset plates, preparation and use thereof
11/15/2006	CN1862388A Graphics engine for high precision lithography
11/15/2006	CN1862385A Photomask structures providing improved photolithographic process windows and methods of manufacturing same
11/15/2006	CN1862378A Pellicles having low adhesive residue
11/15/2006	CN1862377A Phase-shift photomask-blank, phase-shift photomask and fabrication method thereof
11/15/2006	CN1862376A Mask blank transparent substrate manufacturing method, mask blank manufacturing method, and exposure mask manufacturing method
11/15/2006	CN1285112C Method and device for checking mask pattern
11/15/2006	CN1285012C Optical proximity correcting method
11/15/2006	CN1285010C 膜结构 Membrane structure
11/15/2006	CN1285009C Method of enhancing clear field phase shift masks with border regions around phase 0 and phase 180 regions
11/15/2006	CN1284978C Optical element and method for its manufacture as well as lightography apparatus and method for manufacturing a semiconductor device
11/15/2006	CN1284720C Lamination and picture composition method utilizing chemical self-assembly process
11/14/2006	US7137092 Layout method of semiconductor integrated circuit, layout structure thereof, and photomask for forming the layout structure
11/14/2006	US7136166 Position sensor, method for detecting horizontal and vertical position, alignment apparatus including position sensor, and method for horizontal and vertical alignment
11/14/2006	US7136145 Pattern-forming apparatus using a photomask
11/14/2006	US7135344 Design-based monitoring
11/14/2006	US7135272 Method for forming a photoresist pattern and method for forming a capacitor using the same
11/14/2006	US7135257 Multi-step phase shift mask and methods for fabrication thereof
11/14/2006	US7135256 Forming a layer of a chemically amplified photoresist over a substrate;baking the photoresist, then forming a non-conductive, DUV transmissive, environmental barrier layer; shelf life of one week or greater
11/14/2006	US7135255 Layout impact reduction with angled phase shapes
11/09/2006	WO2006118098A1 Semiconductor device and its manufacturing method, semiconductor manufacturing mask, and optical proximity processing method
11/09/2006	US20060252160 Electron beam exposure device and exposure method
11/09/2006	US20060251976 Photolithography using a monovalent salt of an organic-solvent-soluble monoazo pyridine dye and a monoazo dye pyrazolone dye salt the metal of which has a di- or higher valence; prevention of dye elution during curing and overlaying; liquid crystal display, solid-state imaging; color dye filters
11/09/2006	US20060251975 System and method for retrieving radiographic images
11/09/2006	US20060251974 Reticles
11/09/2006	US20060251973 Reflective-type mask blank for EUV lithography and method for producing the same
11/09/2006	US20060251972 Flexible photomask for photolithography, method of manufacturing the same, and micropatterning method using the same
11/09/2006	US20060251971 Photo-Mask with variable transmission by ion implantation
11/09/2006	US20060251809 Method of manufacturing mask blank
11/09/2006	US20060251317 Local bias map using line width measurements
11/09/2006	DE10249193B4 Verfahren zur Reparatur einer Phasenschiebemaske und mit Hilfe dieses Verfahrens reparierte Phasenschiebemaske A method of repairing a phase shifting mask and using this method repaired phase shift mask
11/09/2006	DE10234464B4 Verfahren zum Erzeugen von Daten für die Maskenlithographie A method for generating data for the mask lithography
11/08/2006	EP1720070A2 Pellicle frame with heightened bonding surfaces
11/08/2006	EP1720062A2 Apparatus, method and computer program product for performing a model based optical proximity correction factoring neighbour influence
11/08/2006	EP1720061A2 Embedded etch stop for phase shift masks and planar phase shift masks to reduce topography induced and wave guide effects
11/08/2006	EP1719018A1 Methods for exposing patterns and emulating masks in optical maskless lithography
11/08/2006	EP1718474A2 Combined ablation and exposure system and method
11/08/2006	CN1858884A Original edition for color display tube shadow mask printing
11/08/2006	CN1284205C Fig. design method of integrated circuit, exposure mask mfg. method and application
11/08/2006	CN1284047C Lithographer comprising mobile lens and method for producing digital holograms in storage medium
11/08/2006	CN1284045C Device for removing protective film of optical mask
11/08/2006	CN1284044C Method for producing grey mask
11/08/2006	CN1284043C Defect correcting method of gray mask
11/07/2006	US7133549 Local bias map using line width measurements
11/07/2006	US7133548 Method and apparatus for reticle inspection using aerial imaging
11/07/2006	US7132225 Methods of inspecting a lithography template
11/07/2006	US7132206 Heating through a filter, controlling the ultraviolet radiation wavelength, applying a consistent heat flux
11/07/2006	US7132204 crystallization characteristics of a beam overlap area are enhanced; use for thin film transistor (TFT) arrays such as for liquid crystal displays
11/07/2006	US7132203 Masking for layers of integrated circuits; automatic detection phase shift zones patterns; controlling; mdel for fitting between exposure pattern and targets; photolithography
11/07/2006	US7132202 Multilayer; substrates, laser beams shield pattern of opaque metallic material, oxidation layer and protective coatings; crystallization amorphous silicon
11/02/2006	WO2006115090A1 Processing method by using focused ion beam and focused ion beam processing apparatus
11/02/2006	WO2006114544A1 Adjustable mask blank structure for an euv phase-shift mask
11/02/2006	WO2006114369A2 Means for transferring a pattern to an object
11/02/2006	WO2006078382A3 Passivating metal etch structures
11/02/2006	WO2006060620B1 Reticles and methods of forming reticles
11/02/2006	US20060246381 System and method for forming serial numbers on hdd wafers
11/02/2006	US20060246364 Colorant-containing curable composition, color filter and production method thereof
11/02/2006	US20060246363 Low birefringence and with which polarized illumination can be employed or immersion exposure can be carried out; semiconductors; excimer lasers
11/02/2006	US20060246362 Mask data creation method
11/02/2006	US20060246361 Irradiating laser light onto glass substrate surface to form a pit used as a marker; preparing substrate information including identification, symbols, unique chemical/physical/optical properties, surface shape, material, and defect; correlation with computers; photoresists
11/02/2006	US20060246360 Flat panel display device with thin film transistors and method of making thereof
11/02/2006	US20060246359 Exposing to electromagnetic radiation; determining slant of image plane of substrate in exposed region by converting sizes of marks into displacements when there is no point in exposed region that meets focusing condition; computer programs
11/02/2006	US20060246358 Device and method to treat blood vessels in the eye
11/02/2006	US20060246357 System and method for manufacturing a mask for semiconductor processing
11/02/2006	US20060246234 Photomask assembly incorporating a metal/scavenger pellicle frame
11/02/2006	US20060243712 Method and apparatus for repair of reflective photomasks
11/02/2006	EP1716450A1 Use of mixed bases to enhance patterned resist profiles on chrome or sensitive substrates

1 ... 104 105 106 107 108 109 110 111 112 113 114 115 116 117 118 119 120 121 122 123 124 ... 249