G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
12/2006
12/13/2006	CN1879005A Method of inspecting unevenness defect of pattern and device therefor
12/13/2006	CN1877586A Evaluation pattern generating method and computer program product
12/13/2006	CN1877446A Photomask used for color filter technology
12/13/2006	CN1290168C System and method of providing mask defect printablity analysis
12/13/2006	CN1289968C Photoetching mask, its making method and making appts.
12/13/2006	CN1289963C Pellicle for lithography
12/12/2006	US7149998 Lithography process modeling of asymmetric patterns
12/12/2006	US7149340 Mask defect analysis for both horizontal and vertical processing effects
12/12/2006	US7148973 Position detecting method and apparatus, exposure apparatus and device manufacturing method
12/12/2006	US7148959 Test pattern, inspection method, and device manufacturing method
12/12/2006	US7148496 System and method for proximity effect correction in imaging systems
12/12/2006	US7147976 Binary OPC for assist feature layout optimization
12/12/2006	US7147975 For forming a fine pattern in fabrication of semiconductor integrated circuit devices
12/12/2006	US7147974 Methods for converting reticle configurations
12/12/2006	US7147973 Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect
12/07/2006	WO2006128379A1 Filter array for liquid crystal display and manufacturing method thereof
12/07/2006	US20060277522 Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs
12/07/2006	US20060277521 Method, program product and apparatus for performing double exposure lithography
12/07/2006	US20060277520 Method of locating areas in an image such as a photo mask layout that are sensitive to residual processing effects
12/07/2006	US20060275678 Phase difference specifying method
12/07/2006	US20060275675 Method for determining an optimal absorber stack geometry of a lithographic reflection mask
12/07/2006	US20060275674 Apparatus and method for fabricating flat panel display device
12/07/2006	US20060275673 Phase shifter for laser annealing
12/07/2006	US20060275672 Photomask with controllable patterns
12/07/2006	US20060274934 Apparatus and method for improving measuring accuracy in the determination of structural data
12/07/2006	US20060274230 Filter arrays for liquid crystal displays and methods of making the same
12/07/2006	US20060273405 Semiconductor device and method for patterning
12/07/2006	DE102005025535A1 Vorrichtung und Verfahren zur Verbesserung der Messgenauigkeit bei der Bestimmung von Strukturdaten Apparatus and method for improving the accuracy in the determination of structural data
12/06/2006	EP1729169A1 Display device, method of manufacturing the same and mask for manufacturing the same
12/06/2006	CN1874629A Mask, method of manufacturing mask, device for manufacturing mask, and method of manufacturing film of luminescent material
12/06/2006	CN1873530A Display device, method of manufacturing the same and mask for manufacturing the same
12/06/2006	CN1288508C Inspecting method of functions of projection optical system of exposure device and photomask for inspection
12/06/2006	CN1288507C Energy beam exposure method and device
12/06/2006	CN1288503C Method and apparatus for patterning a workpiece
12/06/2006	CN1288496C Method for making sub-wavelength structure
12/05/2006	US7146599 Method for using asymmetric OPC structures on line ends of semiconductor pattern layers
12/05/2006	US7146597 CAD method for arranging via-holes, a CAD tool, photomasks produced by the CAD method, a semiconductor integrated circuit manufactured with photomasks and a computer program product for executing the CAD method
12/05/2006	US7146035 Pattern image comparison method, pattern image comparison device, and program
12/05/2006	US7145633 Apparatus and method of exposing light to a semiconductor device having a curved surface
12/05/2006	US7144685 Includes transparent support and shading member having pattern of at least two apertures with different widths not greater than wavelength of light from light source; transferring photoresist pattern onto silicon substrate by etching
12/05/2006	US7144684 Method for forming pattern using photomask
12/05/2006	US7144682 non-polarized exposure light from a light source is projected onto an exposure mask having a light blocking film and a plurality of rectangular openings formed in the light blocking film; small-opening pattern
12/05/2006	US7144178 Mask, method of producing mask, and method of producing semiconductor device
11/2006
11/30/2006	WO2006126457A1 Image processor
11/30/2006	WO2006126444A1 Sensor calibration method, exposure method, exposure device, device fabrication method, and reflection type mask
11/30/2006	WO2005106597A3 Photopolymer plate and method for imaging the surface of a photopolymer plate
11/30/2006	US20060271907 Semiconductor circuit pattern design method for manufacturing semiconductor device or liquid crystal display device
11/30/2006	US20060271906 Centerline-based pinch/bridge detection
11/30/2006	US20060271905 Optical proximity correction using progressively smoothed mask shapes
11/30/2006	US20060270226 Reflective mask blank, reflective mask, and method for manufacturing semiconductor device
11/30/2006	US20060270072 Mask forming method and semiconductor device manufacturing method
11/30/2006	US20060269853 Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect
11/30/2006	US20060269852 Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect
11/30/2006	US20060269851 Photomask and method for conveying information associated with a photomask substrate
11/30/2006	US20060269850 Mask, method of producing the same, and method of producing semiconductor device
11/30/2006	US20060269849 Halftone mask and method of fabricating the same, and method of fabricating display device using the same
11/30/2006	US20060269848 photomasks; photoresists; lithography; quartz (transparent) substrate with film formed thereon
11/30/2006	US20060269847 Binding of hard pellicle structure to mask blank and method
11/30/2006	US20060269119 Method and apparatus for inspecting reticles implementing parallel processing
11/30/2006	US20060269117 Method for analysis of objects in microlithography
11/30/2006	US20060266382 Substrate processing method of and substrate processing apparatus for freezing and cleaning substrate
11/30/2006	DE10124736B4 Retikel zur Proximity-Charakterisierung von Scannerlinsen sowie entsprechendes Verfahren Proximity to the reticle characterization of scanner lenses and corresponding method
11/29/2006	EP1656385B1 Perfluoropolyether amide-linked phosphonates, phosphates, and derivatives thereof
11/29/2006	EP1419418A4 Electron beam processing
11/29/2006	EP1269266B1 A method of improving photomask geometry
11/29/2006	CN1871555A Forming partial-depth features in polymer film
11/29/2006	CN1869821A Method for picture area representation using two-stage resolution ratio
11/29/2006	CN1869811A Reflection mask for EUV photolithography and method of fabricating the reflection mask
11/29/2006	CN1869810A Method of correcting defect of graytone mask
11/29/2006	CN1869809A Halftone mask and method of fabricating the same, and method of fabricating display device using the same
11/29/2006	CN1287221C Grey mask and method for making same
11/29/2006	CN1287220C Light shade and manufacturing method thereof
11/28/2006	US7143390 Method for creating alternating phase masks
11/28/2006	US7142282 Device including contacts
11/28/2006	US7141340 Structure has individually addressable pixels selectively configurable to modulate both of an amplitude and a phase of radiation that is incident on the pixel and at least one of which has a layer of solid state electrooptical material with a birefringence that varies according to an applied voltage
11/28/2006	US7141339 Process for manufacturing half-tone phase shifting mask blanks
11/28/2006	US7141338 Reducing corner rounding and image shortening
11/28/2006	US7141337 Can improve the disadvantage of transmission imbalance occurred in the phase shift region and the non-phase shift region of the alternating phase shift mask and simultaneously solve the problem of the selective chromeless phase shift mask failing to transfer a sense pattern
11/28/2006	US7141104 UV-absorbing ink composition for ink-jet printing
11/27/2006	CA2546194A1 Micro-contact-printing engine
11/23/2006	WO2006124879A2 Method and system for printing lithographic images with multiple exposures
11/23/2006	WO2006123857A1 Phase shift mask for preventing haze
11/23/2006	WO2006123630A1 Method for manufacturing phase shift mask blank and method for manufacturing phase shift mask
11/23/2006	US20060265099 Semiconductor production system
11/23/2006	US20060264016 Active mask lithography
11/23/2006	US20060264015 Emits patterned energy flux in response to energy input; photomasks
11/23/2006	US20060263722 Mixture of alkali soluble novolaks and photosensitive naphthoquinone diazide compound
11/23/2006	US20060263705 Color filter and fabrication method thereof
11/23/2006	US20060263704 Semiconductor device manufacturing method and semiconductor manufacturing apparatus
11/23/2006	US20060263703 Pellicle Assembly Including a Molecular Sieve
11/23/2006	US20060263702 Composition for forming intermediate layer containing sylylphenylene-based polymer and pattern-forming method
11/23/2006	US20060263701 Levenson phase shifting mask and method for preparing the same and method for preparing a semiconductor device using the same
11/23/2006	US20060263700 Photo mask used for fabricating semiconductor device
11/23/2006	US20060263698 Apparatus and method of making a grayscale photo mask and an optical grayscale element
11/23/2006	US20060262306 Arrangement for inspecting objects, especially masks in microlithography
11/23/2006	DE102006021505A1 Stripping-Emulsionen mit wenig Haftrest Stripping emulsions with little adhesive residue
11/22/2006	EP1724813A1 Integrated circuit design method, design support program used in the integrated circuit design method, and integrated circuit design system
11/22/2006	EP1724633A1 Laser light source device, exposure apparatus using this laser light source device, and mask examining device
11/22/2006	EP1723568A2 Long range corrections in integrated circuit layout designs
11/22/2006	EP1723470A1 Photomask substrate made of synthetic quartz glass and photomask

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