| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
|---|
| 01/04/2007 | US20070004147 Semiconductor integrated circuit, standard cell, standard cell library, semiconductor integrated circuit designing method, and semiconductor integrated circuit designing equipment |
| 01/04/2007 | US20070003846 Addressing a defective pixel by forming a black resin film on LCD panel; operating the LCD panel to selectively harden a portion of the black resin film corresponding to a spot where a defective pixel is present; removing the black resin film, except for the hardened portion of the black resin film |
| 01/04/2007 | US20070003844 Method for adjusting dimensions of photomask features |
| 01/04/2007 | US20070003843 Defect inspection method for a glass substrate for a mask blank, glass substrate for a mask blank, mask blank, exposure mask, method of producing a glass substrate for a mask blank, method of producing a mask blank, and method of producing an exposure mask |
| 01/04/2007 | US20070003842 Software sequencer to dynamically adjust wafer transfer decision |
| 01/04/2007 | US20070003841 Forms first and second patterns on a cell region and a peripheral circuit region of a wafer; The double exposure method uses the single photomask together with different illuminating systems, exposure time so there is a decrease in exposure time and the exposure numbers; simplification |
| 01/04/2007 | US20070003840 Focus determination method, device manufacturing method, and mask |
| 01/04/2007 | US20070003839 $M(c)method for producing inclined flank patterns by photolithography |
| 01/04/2007 | US20070003127 Semiconductor device pattern creation method, pattern data processing method, pattern data processing program, and semiconductor device manufacturing method |
| 01/04/2007 | US20070002516 Container and method of transporting substrate using the same |
| 01/04/2007 | DE19825043B4 Maske für die Herstellung integrierter Schaltungen A mask for the fabrication of integrated circuits |
| 01/04/2007 | DE102005030122A1 Mask e.g. hybrid mask, for lithographic projection on e.g. semiconductor wafer, for producing integrated circuit, has structures, each with two distances to structure units, such that structures are asymmetrically arranged in interspaces |
| 01/04/2007 | DE10156143B4 Verfahren zur Herstellung von photolithographischen Masken Process for the preparation of photolithographic masks |
| 01/03/2007 | EP1739735A1 Container and method of transporting substrates using the same |
| 01/03/2007 | EP1739481A1 Levenson type phase shift mask and production method therefor |
| 01/03/2007 | EP1738226A1 A method for error reduction in lithography |
| 01/03/2007 | EP1738224A1 Low-expansion glass substrate for a reflective mask and reflective mask |
| 01/03/2007 | EP1737676A2 Edge cure prevention process |
| 01/03/2007 | EP1175660B1 Method and apparatus for inspecting reticles implementing parallel processing |
| 01/03/2007 | CN1890603A Methods and devices for fabricating three-dimensional nanoscale structures |
| 01/03/2007 | CN1293639C Memory array with loop line pattern structure and fabricating method thereof |
| 01/03/2007 | CN1293601C Laser device, laser radiation method and semiconductor device and its producing method |
| 01/03/2007 | CN1293426C Method and apparatus for definiting mask pattern by doubling space frequency technology |
| 01/03/2007 | CN1293411C Manufacture for photosensitive insulating film pattern and reflection electrode and its liquid crystal display device |
| 01/02/2007 | US7159197 Shape-based geometry engine to perform smoothing and other layout beautification operations |
| 01/02/2007 | US7158237 Interferometric measuring device and projection exposure installation comprising such measuring device |
| 01/02/2007 | US7157194 Integrated circuits; data processing; electronics |
| 01/02/2007 | US7157192 Square dummy patters uniformize pattern density; dielectrics; plasma enhance chemical vapor deposition; chemical mechanical polishing |
| 01/02/2007 | US7157191 Opaque material replaces defects/pinholes on radiation transparent/patterned substrate; semiconductors; integrated circuits; photolithography |
| 01/02/2007 | US7157190 even small defects in a light-influencing structure can be reliably repaired; Since no carbon film is applied to the defect, a defect repaired according to the invention is not impaired even during a cleaning of the mask |
| 01/02/2007 | US7157189 Covering the mask layer with photoresist which contains a film forming polymer containing acid-labile group to be cleaved by an acid for liberating a polymer with increased solubility in alkaline developer |
| 12/28/2006 | WO2006137011A2 Methods and devices for characterizing polarization of illumination system |
| 12/28/2006 | WO2006105460A3 Extreme ultraviolet mask with leaky absorber and method for its fabricatio |
| 12/28/2006 | WO2006078791A3 Systems, masks and methods for printing contact holes and other patterns |
| 12/28/2006 | US20060292886 Method for fabricating semiconductor device |
| 12/28/2006 | US20060292727 Photomask plasma etching apparatus, etching method, and photomask forming method |
| 12/28/2006 | US20060292462 Nir absorption and color compensating compositions |
| 12/28/2006 | US20060292461 Optimized frame system for a liquid crystal display device |
| 12/28/2006 | US20060292460 Etching photomasks, photoresists; excimer lasers |
| 12/28/2006 | US20060292459 EUV reflection mask and method for producing it |
| 12/28/2006 | US20060292458 Method of creating photo mask data, method of photo mask manufacturing, and method of manufacturing semiconductor device |
| 12/28/2006 | US20060292457 Reticle includes an area provided with a conductive metal-based compound coating for electrically grounding the reticle; reticle is suitable for use with a lithography apparatus whereby the reticle pattern is imaged using extreme ultra violet radiation |
| 12/28/2006 | US20060292455 Method for checking phase shift angle of phase shift mask, lithography process and phase shift mask |
| 12/28/2006 | US20060292454 photoresists; photomasks; etching; semiconductors |
| 12/28/2006 | US20060291862 Laser light source device, exposure device, and mask inspection device using this laser light source device |
| 12/28/2006 | DE19817714B4 Verfahren zur Messung der Lage von Strukturen auf einer Maskenoberfläche Method for measuring the position of structures on a mask surface |
| 12/28/2006 | DE10245621B4 Verfahren zur Übergabe einer Meßposition eines auf einer Maske zu bildenden Strukturelementes Method for transferring a measurement position of a forming on a mask to pattern element |
| 12/28/2006 | DE102006027429A1 Photo mask, for the production of integrated circuits on semiconductor wafers, is produced with reduced critical dimension irregularities by passing light of the zero order to a spectrometer to adjust the optical parameters |
| 12/28/2006 | DE102006026248A1 Photo mask for use in photolithography system has polarizing structure that is formed in either peripheral circuit region or memory cell region of substrate |
| 12/28/2006 | DE102005027697A1 Extreme ultraviolet mask e.g. absorber mask having elevated sections and trenches, includes substrate with low coefficient of thermal expansion, multilayer and capping layer, where elevated sections are formed on continuous conductive layer |
| 12/27/2006 | EP1735664A1 Method of producing a relief image |
| 12/27/2006 | EP1222497A4 Uv-absorbing support layers and flexographic printing elements comprising same |
| 12/27/2006 | CN1886697A Method and device for creating print data, program for creating print data, and computer-readable recording medium containing the program |
| 12/27/2006 | CN1886442A Pellicle and novel fluoropolymer |
| 12/27/2006 | CN1885158A Photomask with film member and film member |
| 12/27/2006 | CN1292456C Photomask group of forming multilayer interlconnection line and semiconductor device made by such photomask |
| 12/26/2006 | US7155699 Streamlined IC mask layout optical and process correction through correction reuse |
| 12/26/2006 | US7153634 Dual layer workpiece masking and manufacturing process |
| 12/26/2006 | US7153615 Extreme ultraviolet pellicle using a thin film and supportive mesh |
| 12/26/2006 | US7153614 Mask for photolithography, method of forming thin film, liquid crystal display device, and method of producing the liquid crystal display device |
| 12/26/2006 | US7153613 Process for the fabrication of a phase mask for optical fiber processing, optical fiber-processing phase mask, optical fiber with a Bragg grating, and dispersion compensating device using the optical fiber |
| 12/21/2006 | WO2006134855A1 Large glass substrate for photomask and method for producing same, computer readable recording medium, and method for exposing mother glass |
| 12/21/2006 | US20060286488 Methods and devices for fabricating three-dimensional nanoscale structures |
| 12/21/2006 | US20060286465 Film type filter and display apparatus comprising the same |
| 12/21/2006 | US20060286464 Liquid crystal display |
| 12/21/2006 | US20060286463 Manufacturing method of display device |
| 12/21/2006 | US20060286461 high contrast ratio |
| 12/21/2006 | US20060286460 Photomask, method of making a photomask and photolithography method and system using the same |
| 12/21/2006 | US20060285739 Evaluation pattern generating method and computer program product |
| 12/21/2006 | US20060284120 Method for correcting electron beam exposure data |
| 12/21/2006 | DE102004003341B4 Halbtonphasenmaske mit mehreren Transmissionen und Verfahren zu ihrer Herstellung Halbtonphasenmaske with several transmissions and processes for their preparation |
| 12/20/2006 | EP1488284B1 Photomask and method for photolithographic patterning of a substrate by use of phase shifted assist features |
| 12/20/2006 | CN1882876A Polarized reticle, photolithography system, and method of forming a pattern using a polarized reticle in conjunction with polarized light |
| 12/20/2006 | CN1881086A Photomask, method of making a photomask and photolithography method and system using the same |
| 12/20/2006 | CN1881076A Levenson phase transfer mask and preparation method thereof, and method for preparing semiconductor element |
| 12/20/2006 | CN1291268C Mask, substrate with light reflection film, method for making light-reflection film, display device and electric appliance |
| 12/19/2006 | US7152219 Reference image generation from subject image for photolithography mask analysis |
| 12/19/2006 | US7151593 Method for imaging wafers using a projection mask aligner |
| 12/19/2006 | US7151239 Heat treating apparatus and heat treating method |
| 12/19/2006 | US7150958 Splitting using laser radiation |
| 12/19/2006 | US7150948 Faster wafer fabrication without wasting exposure area; simultaneous evaluation |
| 12/19/2006 | US7150946 Method for the repair of defects in photolithographic masks for patterning semiconductor wafers |
| 12/19/2006 | US7150945 Polarized reticle, photolithography system, and method of forming a pattern using a polarized reticle in conjunction with polarized light |
| 12/14/2006 | WO2006132425A1 Near-field exposure mask, method of producing that mask, near-field exposure apparatus having that mask, and resist pattern forming method |
| 12/14/2006 | WO2006074198A3 Methods for repairing an alternating phase-shift mask |
| 12/14/2006 | WO2005108914A3 Apparatus and methods for measurement of critical dimensions of features and detection of defects in uv, vuv, and euv lithography masks |
| 12/14/2006 | US20060281019 Photomask and method of manufacturing the same |
| 12/14/2006 | US20060281018 Light modulation device |
| 12/14/2006 | US20060281017 a photoresist layer formed on a silicon wafer can be precisely patterned in a shape substantially identical to a pattern formed on a reflection mask |
| 12/14/2006 | US20060281016 Modifying sub-resolution assist features according to rule-based and model-based techniques |
| 12/14/2006 | US20060281015 Verifying a process margin of a mask pattern using intermediate stage models |
| 12/14/2006 | US20060281014 Method and apparatus for protecting a reticle used in chip production from contamination |
| 12/14/2006 | US20060279837 High NA system for multiple mode imaging |
| 12/13/2006 | EP1732107A1 Method for correcting electron beam exposure data |
| 12/13/2006 | EP1730596A2 Projection objective, projection exposure apparatus and reflective reticle for microlithography |
| 12/13/2006 | EP1730595A2 Method involving a mask or a reticle |
| 12/13/2006 | EP1730477A1 Embedded attenuated phase shift mask with tunable transmission |
| 12/13/2006 | EP1438633B1 Method for forming elliptical and rounded features using beam shaping |
| 12/13/2006 | EP1226469B1 Trimming mask with semitransparent phase-shifting regions |
| 12/13/2006 | EP1007969A4 Lithographic mask design and synthesis of diverse probes on a substrate |