| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 01/31/2007 | CN1904739A Well photoresist pattern of semiconductor device and method for forming the same |
| 01/31/2007 | CN1904738A Method for expressing side intersecting with area by selecting sub-pixel bar chart |
| 01/31/2007 | CN1904737A Method and device of generating pattern, method of determining the position, measurement device, and lithographic apparatus |
| 01/31/2007 | CN1904735A Painted photosensitive resin composition |
| 01/31/2007 | CN1904729A Phase shift mask design for exposure to generate micro-through-hole pattern |
| 01/31/2007 | CN1904728A Method for generating dense and isolated contact hole pattern by identical energy twice exposures |
| 01/31/2007 | CN1904727A Cluster tool and method for process integration in manufacturing of a photomask |
| 01/31/2007 | CN1904726A Method and system for designing optical shield layout and producing optical shield pattern |
| 01/31/2007 | CN1904725A Mask for manufacturing a display substrate capable of improving image quality |
| 01/31/2007 | CN1297854C Optical mask transfering method |
| 01/30/2007 | US7171038 Method and apparatus for inspecting a substrate |
| 01/30/2007 | US7171034 Method and system for phase/amplitude error detection of alternating phase shifting masks in photolithography |
| 01/30/2007 | US7170683 Reflection element of exposure light and production method therefor, mask, exposure system, and production method of semiconductor device |
| 01/30/2007 | US7170682 Projection aligner, aberration estimating mask pattern, aberration quantity estimating method, aberration eliminating filter and semiconductor manufacturing method |
| 01/30/2007 | US7170030 Method and apparatus for repair of reflective photomasks |
| 01/30/2007 | US7169515 A data processing system containing a machine readable data storage medium with instructions for laying out a photolithographic mask, coupled to a processor; integrated circuits; electromagnetic waveform computer program for assigning phase shifting regions |
| 01/30/2007 | US7169514 Extreme ultraviolet mask with molybdenum phase shifter |
| 01/30/2007 | US7169513 Halftone type phase shift mask blank and phase shift mask thereof |
| 01/30/2007 | US7168936 Light transparent substrate imprint tool with light blocking distal end |
| 01/25/2007 | WO2007010935A1 Photo mask blank, photo mask, and their fabrication method |
| 01/25/2007 | WO2007010866A1 Blanks for gray tone mask, gray tone mask using said blanks, and process for producing said blanks |
| 01/25/2007 | WO2007010864A1 Blanks for gray tone mask, gray tone mask using said blanks, and process for producing said blanks |
| 01/25/2007 | WO2007010621A1 Method of preparing photomask pattern data, photomask produced by using that photomask pattern data, and method of producing semiconductor device using that photomask |
| 01/25/2007 | WO2007009543A1 Pellicle for use in a microlithographic exposure apparatus |
| 01/25/2007 | US20070022402 High transport rates of hormones delivered across cell membranes, facilitating more efficient delivery of drugs and diagnostic agents by using a viscous fluid comprising a polysaccharide a form of hydrogel, lipogel or sols; drug delivery to mucous membranes; gastrointesinal systems |
| 01/25/2007 | US20070022401 Method of correcting mask pattern and correcting apparatus thereof |
| 01/25/2007 | US20070020536 Laser beam pattern mask and crystallization method using the same |
| 01/25/2007 | US20070020535 single reticle photolithography system suitable for exposing regions of the reticle having distinct patterns under different illumination conditions optimal for each respective region |
| 01/25/2007 | US20070020534 highly precise photomask pattern that can reduce the burden on the photoresist; use with short wavelength for which high resolution is required; chromium-containing light-shielding film also serves as an anti-reflection film |
| 01/25/2007 | US20070020533 Method of manufacturing rim type of photomask and photomask made by such method |
| 01/25/2007 | US20070020532 Method for designing photomask |
| 01/25/2007 | US20070020531 Phase shift mask for patterning ultra-small hole features |
| 01/25/2007 | US20070019058 Lithography simulation method, mask pattern preparation method, semiconductor device manufacturing method and recording medium |
| 01/25/2007 | DE10230675B4 Verfahren zur Herstellung von Phasenschiebermasken A process for producing phase shift masks |
| 01/24/2007 | EP1746460A2 Photomask blank, photomask and fabrication method thereof |
| 01/24/2007 | EP1539386B1 Device for cleaning and inspecting reticles |
| 01/24/2007 | EP1159652B1 Image receptor medium containing ethylene vinyl acetate carbon monoxide terpolymer |
| 01/24/2007 | CN2862120Y Producing device for thin film transistor and light shield employed |
| 01/24/2007 | CN1902501A Method and apparatus for calibrating a metrology tool |
| 01/24/2007 | CN1900826A Mask formation over an integrated electronic circuit |
| 01/24/2007 | CN1900819A Photomask blank, photomask and fabrication method thereof |
| 01/23/2007 | US7167582 Detecting pattern defects; transferring pattern; lithography |
| 01/23/2007 | US7167310 Microscope, especially microscope used for inspection in semiconductor manufacture |
| 01/23/2007 | US7166393 Projectors comprising quartz substrates having light diversion and absorption stacks, and electroconductive layers, that can be chucked to substrate holders to which an electrostatic potential is applied |
| 01/23/2007 | US7166392 Halftone type phase shift mask blank and halftone type phase shift mask |
| 01/18/2007 | WO2007008711A2 Synthetic nanoparticle soil materials |
| 01/18/2007 | US20070015088 Method for lithographically printing tightly nested and isolated hole features using double exposure |
| 01/18/2007 | US20070015069 mask includes multiple transmissive areas having a plurality of first slits for adjusting energy of the laser illumination passing through the mask; and an opaque area; for laser illumination to convert amorphous silicon into polysilicon |
| 01/18/2007 | US20070015068 Method for producing transmissive screen, apparatus for producing transmissive screen, and transmissive screen |
| 01/18/2007 | US20070015067 Filter exposure apparatus, and device manufacturing method |
| 01/18/2007 | US20070015066 Mask for sequential lateral solidification (SLS) process and a method for crystallizing amorphous silicon by using the same |
| 01/18/2007 | US20070015065 Euv exposure mask blanks and their fabrication process, and euv exposure mask |
| 01/18/2007 | US20070015064 chromeless phase lithography (CPL), particularly to methods for making photomask useful in CPL applications; mask is utilized to impart pattern to a layer of photoresist disposed on a semiconductor substrate |
| 01/18/2007 | DE112004002782T5 Verfahren zum Herstellen eines Photomasken-Rohlings A method for manufacturing a photomask blank |
| 01/17/2007 | EP1743217A2 Method for imprint lithography at constant temperature |
| 01/17/2007 | CN1898603A Extreme ultraviolet mask with molybdenum phase shifter |
| 01/17/2007 | CN1896869A Substrate, lithographic multiple exposure method, machine readable medium |
| 01/17/2007 | CN1896868A Halftone phase shift mask blank, halftone phase shift mask, and manufacturing method thereof |
| 01/17/2007 | CN1295749C Semiconductor integrated circuit device and mfg. method of multichip module |
| 01/17/2007 | CN1295563C Method of manufacturing device |
| 01/16/2007 | US7165235 Exposure pattern forming method and exposure pattern |
| 01/16/2007 | US7165234 shifters on a phase shifting mask can be assigned their corresponding phase through the use of a simulation engine of the type normally used for model-based optical proximity correction |
| 01/16/2007 | US7165233 Test ket layout for precisely monitoring 3-foil lens aberration effects |
| 01/16/2007 | US7164960 Apparatus for correcting a plurality of exposure tools, method for correcting a plurality of exposure tools, and method for manufacturing semiconductor device |
| 01/16/2007 | US7162881 Thermophoretic wand to protect front and back surfaces of an object |
| 01/11/2007 | WO2007004681A1 Method for producing photosensitive laminate original printing plate for letterpress printing, photosensitive laminate original printing plate for letterpress printing, and method for producing letterpress printing plate |
| 01/11/2007 | US20070011648 Fast systems and methods for calculating electromagnetic fields near photomasks |
| 01/11/2007 | US20070011638 Computer implemented design system, a computer implemented design method, a reticle set, and an integrated circuit |
| 01/11/2007 | US20070009836 Method of manufacturing semiconductor device |
| 01/11/2007 | US20070009812 Low-expansion glass substrate for a reflective mask and reflective mask |
| 01/11/2007 | US20070009811 Irradiating the sample of the pattern in an electrically conductive state with an electron beam to detect a secondary electron, a reflected electron and a backscattered electron generated from the surface of the sample; acquiring an image of the sample surface and inspecting the mask pattern image |
| 01/11/2007 | US20070009810 Halftone masking, phase shifter film is formed by using a reactive long throw sputtering |
| 01/11/2007 | US20070009809 Synthetic Nanoparticle Soil Materials |
| 01/11/2007 | US20070009808 Systems, masks, and methods for manufacturable masks |
| 01/11/2007 | US20070009147 Mask pattern inspecting method, inspection apparatus, inspecting data used therein and inspecting data generating method |
| 01/11/2007 | US20070007534 Optical mask, method of manufacturing thin film transistor array substrate, and thin film transistor array substrate manufactured by the method |
| 01/11/2007 | DE102004010902B4 Verfahren zum Übertragen eines kritischen Layouts einer Ebene einer integrierten Schaltung auf ein Halbleitersubstrat Method for transferring a layout of a critical level of an integrated circuit on a semiconductor substrate |
| 01/11/2007 | DE10156366B4 Reflexionsmaske und Verfahren zur Herstellung der Reflexionsmaske Reflection mask and method of manufacturing the reflection mask |
| 01/10/2007 | EP1337838B1 Method and device for determining the properties of an integrated circuit |
| 01/10/2007 | CN1893074A Semiconductor integrated circuit, standard cell, standard cell library, semiconductor integrated circuit designing method, and semiconductor integrated circuit designing equipment |
| 01/10/2007 | CN1892442A Method of manufacturing semiconductor device |
| 01/10/2007 | CN1892440A Focus determination method, device manufacturing method, and mask |
| 01/10/2007 | CN1892420A Mask for continuously transverse solidifying technology and method for forming polycrystal silicon layer |
| 01/10/2007 | CN1892419A Mask pattern inspection method, exposure condition verification method, and manufacturing method of semiconductor device |
| 01/10/2007 | CN1892418A Method for verifying phase-shift angle of phase-shift photomask, photoengraving technology and phase-shift photomask |
| 01/10/2007 | CN1294623C Method for obtaining elliptical and rounded shapes using beam shaping |
| 01/10/2007 | CN1294456C Method for executing photoetching correction based on model |
| 01/10/2007 | CN1294454C Vortex phase-shift mask in photoetching technique |
| 01/09/2007 | US7161684 Apparatus for optical system coherence testing |
| 01/09/2007 | US7160673 Illuminating the master element to make a first diffractive pattern on the target surface at a first location by interfering first and third order diffracted beams from the master element; moving the master element to a second location on the target surface and illuminating to produce a second pattern |
| 01/09/2007 | US7160672 Forming a thin ceramic protective coating applied at relatively low temperature by selective coating of ceramic on an electrical or magnetic biocompatible implant; metallization; photolithographic polyamide coating; scribing and dissolving away polymerized polyamide and a ceramic mask; batch processing |
| 01/09/2007 | US7160652 Hologram element |
| 01/09/2007 | US7160651 Enabling the pitch of features on the mask to be decreased by removing the chrome line between features, and thus remove the limit based on the size of the chrome line; may include primary features surrounded by a boundary region including sub resolution features; high precision lithography |
| 01/09/2007 | US7160650 Method of inspecting a mask |
| 01/09/2007 | US7160649 Gray level imaging masks, optical imaging apparatus for gray level imaging masks and methods for encoding mask and use of the masks |
| 01/09/2007 | US7159418 Method of producing synthetic quartz glass |
| 01/04/2007 | WO2007002856A2 Software sequencer to dynamically adjust wafer transfer decision |
| 01/04/2007 | US20070006118 Displacing Edge Segments On A Fabrication Layout Based On Proximity Effects Model Amplitudes For Correcting Proximity Effects |
| 01/04/2007 | US20070006115 Method for verifying mask pattern data, method for manufacturing mask, mask pattern verification program, and method for manufacturing semiconductor device |
| 01/04/2007 | US20070005280 Such as (6,7-dimethoxyquinazolin-4-yl)-(3-ethynylphenyl)-amine for treatment of hyperproliferative diseases |