Patents
Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
02/2007
02/21/2007CN1301441C Staggered phase displacement mask
02/20/2007US7181722 Method of dividing circuit pattern, method of manufacturing stencil mask, stencil mask and method of exposure
02/20/2007US7179570 Chromeless phase shift lithography (CPL) masks having features to pattern large area line/space geometries
02/20/2007US7179569 Method for manufacturing a semiconductor device, stencil mask and method for manufacturing the same
02/20/2007US7179568 Microelectronics; coating mask with photoresist containing fluorescent dye; exposure to radiation; development
02/20/2007US7179567 Phase shift mask blank, phase shift mask, and method of manufacture
02/20/2007US7179545 Halftone phase shift mask blank, and method of manufacture
02/15/2007WO2007017963A1 Receiving container for pellicle
02/15/2007WO2007017947A1 Exposure mask, method for producing same, and method for transferring pattern
02/15/2007WO2006121741A3 Computer readable mask shrink control processor
02/15/2007US20070037075 Inkjet printhead and method of fabricating color filter
02/15/2007US20070037074 Use of alternative polymer materials for "soft" polymer pellicles
02/15/2007US20070037073 Providing a target containing a metal and silicon, and carrying out reactive sputtering in an atmosphere containing a reactive gas ( nitrogen, oxygen, fluorine) to form half-tone film on said transparent substrate
02/15/2007US20070037072 Levenson type phase shift mask and manufacturing method thereof
02/15/2007US20070037071 Method for removing defect material of a lithography mask
02/15/2007US20070037070 Light exposure mask and method for manufacturing semiconductor device using the same
02/15/2007US20070037069 Exposure mask
02/15/2007US20070037068 Barrier coating compositions for photoresist and methods of forming photoresist patterns using the same
02/15/2007US20070037067 Optical pellicle with a filter and a vent
02/15/2007US20070037066 Method for correcting and configuring optical mask pattern
02/15/2007US20070035031 Sub-resolution assist feature to improve symmetry for contact hole lithography
02/15/2007US20070034499 Phase shift mask blank, photo mask blank, and manufacturing apparatus and method of blanks
02/15/2007DE112005000943T5 Lichtempfindliche Originaldruckplatte für den Reliefdruck, Verfahren zur Herstellung der Reliefdruckplatte und Lichtschutztinte zur Durchführung des Verfahrens The photosensitive original printing plate for relief printing, process for producing the relief printing plate and light-shielding ink for performing the method
02/14/2007EP1752897A1 Mechanismus for making and inspecting reticles
02/14/2007EP1752825A2 Lithography Masks and Methods
02/14/2007EP1752824A2 An improved CPL mask and a method and program product for generating the same
02/14/2007EP1751683A2 Intermediate layout for resolution enhancement in semiconductor fabrication
02/14/2007EP1750943A2 Method for making tools for micro replication
02/14/2007EP1516745B1 Photosensitive resin composition for forming a laser engravable printing element
02/14/2007CN1914562A Reticle fabrication using a removable hard mask
02/14/2007CN1914558A Use of mixed bases to enhance patterned resist profiles on chrome or sensitive substrates
02/14/2007CN1912740A Exposure mask
02/14/2007CN1912739A Light exposure mask and method for manufacturing semiconductor device using the same
02/14/2007CN1912738A Substrate with light-shielding film, color filter substrate, method of manufacture of both, and display device having substrate with light-shielding film
02/14/2007CN1300639C Method for extending the range of lithographic simulation integrals
02/14/2007CN1300634C Light shield and method for forming polycrystalline silicon layer applying the same
02/13/2007US7178128 Alternating phase shift mask design conflict resolution
02/13/2007US7177718 Semiconductor production system
02/13/2007US7176486 Structure of test element group wiring and semiconductor substrate
02/13/2007US7175952 Method of generating mask distortion data, exposure method and method of producing semiconductor device
02/13/2007US7175947 surface for reflecting external light to be utilized, and a cured resin layer serving as a carrier for the reflection layer
02/13/2007US7175945 Phase shifting zones for separation of light source used to determine the quality of photolithographic prints
02/13/2007US7175944 a first hard mask layer with an acid additive over a substrate. A photoresist layer is deposited over the first hard mask layer. The photoresist layer is patterned to form a pattern. The pattern is transferred to the first hard mask layer after the photoresist layer is patterned
02/13/2007US7175943 Multilayer photomasking; circuit patterns; connecting opacity zones; adjustment of pattern using photomasking
02/13/2007US7175942 can be automated to quickly and easily avoid phase shifting segment conflict;
02/13/2007US7175941 alternate phase shift mask suitable for projecting images of isolated holes, densely packed holes, and arbitrary mixes of isolated and densely packed holes
02/13/2007US7175940 Generating photolithography masks; calibration patterns
02/08/2007WO2007014451A1 Method and system for vertically aligning tile images of an area of interest of an integrated circuit
02/08/2007US20070031744 Lithography process optimization and system
02/08/2007US20070031741 EUVL reflection device, method of fabricating the same, and mask, projection optics system and EUVL apparatus using the EUVL reflection device
02/08/2007US20070031740 Method, program product and apparatus for performing mask feature pitch decomposition for use in a multiple exposure process
02/08/2007US20070031739 Test mask for optical and electron optical systems.
02/08/2007US20070031738 Method and system for printing lithographic images with multiple exposures
02/08/2007US20070031737 semiconductors; patterning photoresists; increased resolution for main features, improved critical dimension control, and increased process windows
02/08/2007US20070031736 Method and apparatus for compensating for the effects of gravity on pellicle used for protecting a reticle from contamination
02/08/2007US20070031585 Providing an image on an organic product
02/08/2007DE102006036296A1 Stencil mask for defining the irradiation region of charged particles on a substrate, comprises primary and secondary layers, and a number of holes
02/08/2007DE102006033450A1 Substrate for production of photomask, e.g. for integrated circuit production, has alignment markers formed from material of structured conductive layer and kept at specified potential by conductive connecting lines
02/08/2007DE102005034669A1 Mask for lithographic projection on substrate, has arrangement with auxiliary structures and having space for structural components, where space is larger than another space having adjacent auxiliary structures
02/07/2007EP1750172A1 Wavelength converting optical system, laser light source, exposure apparatus, mask examining apparatus, and macromolecular crystal lens machining device
02/07/2007CN1910517A Adaptive real time control of a reticle/mask system
02/07/2007CN1910516A Computer-implemented methods for detecting defects in reticle design data
02/07/2007CN1908816A Positive-type radiation-sensitive resin composition for producing a metal-plating formed material, transcription film and production method of a metal-plating formed material
02/07/2007CN1908814A Method for mask design
02/07/2007CN1908813A Method for preparation of X-lay photoetching mask plate
02/07/2007CN1908812A A method, program product and apparatus for performing double exposure lithography
02/07/2007CN1908702A Euvl reflection device, method of fabricating the same
02/07/2007CN1299170C Scanning exposuring device
02/07/2007CN1299164C Method for eliminating key size deviation of dense pattern and single pattern
02/06/2007US7174531 Creating photolithographic masks
02/06/2007US7174520 Characterization and verification for integrated circuit designs
02/06/2007US7173716 Alignment apparatus, exposure apparatus using the same, and method of manufacturing devices
02/06/2007US7172853 Method of manufacturing semiconductor integrated circuit devices
02/06/2007US7172841 Arranged before a laser device through beam expander, homogenizer and mirror; vacuum or electrostatic chuck holds position; image of light beam having inverse peak pattern
02/06/2007US7172840 Photomask features with interior nonprinting window using alternating phase shifting
02/06/2007US7172839 Preventing surface damage; coarse focused ion etching followed by gas assisted electron beam removal of thin film contaminated with gallium
02/06/2007US7172838 Obtaining data for at least one feature from a layout database; assigning lithographic size identifier to feature; associating twin phase-edge pattern data with the at least one feature; exporting twin phase-edge pattern data to layout
02/06/2007US7172788 Optical element and method for its manufacture as well as lithography apparatus and method for manufacturing a semiconductor device
02/01/2007WO2007013540A1 Mask blank fabrication method and exposure mask fabrication method
02/01/2007WO2007013162A1 Photomask, method for manufacturing such photomask and method for manufacturing electronic device
02/01/2007WO2006113135A3 Method for determining and correcting reticle variations
02/01/2007WO2005076935A3 Wavelength filtering in nanolithography
02/01/2007US20070028205 Data processing method in semiconductor device, program of the same, and manufacturing method of semiconductor device
02/01/2007US20070026648 Sequential lateral solidification mask
02/01/2007US20070026543 Method for forming misalignment inspection mark and method for manufacturing semiconductor device
02/01/2007US20070026324 Substrate with light-shielding film, color filter substrate, method of manufacture of both, and display device having substrate with light-shielding film
02/01/2007US20070026323 silicon nitride antireflective coatings on EUV light absorber layer; defect inspection of mask with DUV light; eliminate the interference effect may cause reflectance oscillation near the absorber edges, increase the defect inspection sensitivity
02/01/2007US20070026322 Integration system and the method for operating the same
02/01/2007US20070026321 forming first conductive layer, forming composition layer over first conductive layer by discharging a composition in which nanoparticles comprising conductive material covered with organic material are dispersed in solvent, drying the composition layer; and decomposing organic material
02/01/2007US20070026320 Phase shift photomask performance assurance method
02/01/2007US20070025610 Method and apparatus for inspecting a substrate
02/01/2007US20070023393 polysilicon layer has at least one doped region, is provided, substrate is placed in a processing chamber, an etchant gas is provided into the processing chamber comprises N2, SF6, and at least one of CHF3 and CH2F2. The etching gas is transformed to a plasma to etch the polysilicone
02/01/2007US20070022949 High-pressure processing apparatus
02/01/2007US20070022804 Scanning probe microscopy inspection and modification system
02/01/2007DE112005000548T5 Verfahren zur Unterstützung der Maskenherstellung, Verfahren zur Bereitstellung von Maskenrohlingen und Verfahren zur Handhabung von Maskenrohlingen A method for supporting the mask fabrication, method of providing mask blanks and methods of handling mask blanks
02/01/2007DE112004002199T5 Verfahren zur Herstellung einer Extrem-Ultraviolettstrahlung reflektierenden Maske unter Verwendung von Rasterkraftmikroskop-Lithographie A process for producing extreme ultra-violet radiation of a reflective mask using atomic force microscope lithography
02/01/2007DE10243559B4 Photolithographie-Belichtungsvorrichtung und Photolithographie-Belichtungsverfahren Photolithography exposure apparatus and photolithography exposure method
01/2007
01/31/2007EP1747520A2 Integrated circuit layout design methodology with process variation bands
01/31/2007EP1586008A4 Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same
01/31/2007CN1906538A Photosensitive printing sleeves and method of forming the same