| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 01/27/2015 | US8940464 Oxime ester photoinitiators |
| 01/27/2015 | US8940463 Method and apparatus for EUV mask having diffusion barrier |
| 01/27/2015 | US8940462 Photomask blank, photomask, method of manufacturing the same, and method of manufacturing a semiconductor device |
| 01/22/2015 | WO2015007557A1 Optical component |
| 01/22/2015 | US20150024308 Flexible nanoimprint mold, method for fabricating the same, and mold usage on planar and curved substrate |
| 01/22/2015 | US20150024307 Method for Manufacturing EUV Masks Minimizing the Impact of Substrate Defects |
| 01/22/2015 | US20150024306 Mask overlay control |
| 01/22/2015 | US20150024305 Extreme ultraviolet light (euv) photomasks and fabrication methods thereof |
| 01/22/2015 | DE102014202132A1 Vergrößernde abbildende Optik sowie EUV-Maskeninspektionssystem mit einer derartigen abbildenden Optik Magnifying imaging optics and EUV mask inspection system with such imaging optics |
| 01/21/2015 | CN104299974A 阵列基板、掩膜板、显示装置 Array substrate, mask, a display device |
| 01/21/2015 | CN104298080A 一种无掩膜激光直写叠加曝光方法 A non-laser direct writing mask overlay exposure method |
| 01/21/2015 | CN104298069A 一种掩膜框架、掩膜板及其制作方法 One kind of mask frame, mask and fabrication method thereof |
| 01/21/2015 | CN104298068A 一种用于大数值孔径的极紫外光刻掩模结构 Extreme ultraviolet lithography mask structure for a large numerical aperture |
| 01/21/2015 | CN104298011A 一种掩模板及使用掩模板制作光阻间隔物的方法 One kind of mask making and using the photoresist mask spacer approach |
| 01/21/2015 | CN104297989A 基板、掩膜板及液晶显示装置 Substrate, mask and liquid crystal display device |
| 01/21/2015 | CN102944973B 表膜构件框体、表膜构件和表膜构件框体的使用方法 Table frame member using the film method, surface membrane member and the pellicle frame body member |
| 01/21/2015 | CN102736401B 防尘薄膜组件框架、其制造方法以及防尘薄膜组件 Pellicle frame, and its manufacturing method, and pellicle |
| 01/21/2015 | CN102566299B 包括通过投影光学装置的光操纵的依赖图案的邻近匹配/调节 Including the manipulation of light through adjacent matching projection optical apparatus dependent pattern / adjustment |
| 01/21/2015 | CN102169260B Tft-lcd像素电极层结构、制备方法及其掩膜板 Tft-lcd pixel electrode layer structure, preparation method and the mask |
| 01/20/2015 | US8938699 Multivariable solver for optical proximity correction |
| 01/20/2015 | US8938694 Three-dimensional mask model for photolithography simulation |
| 01/20/2015 | US8936901 Laser-markable compositions |
| 01/20/2015 | US8936889 Method and apparatus for EUV mask having diffusion barrier |
| 01/15/2015 | US20150017575 Photomasks, Methods Of Forming A Photomask, And Methods Of Photolithographically Patterning A Substrate |
| 01/15/2015 | US20150017574 Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication method |
| 01/15/2015 | US20150017573 Reflective original, exposure method, and device manufacturing method |
| 01/15/2015 | US20150017572 Method for generating pattern, storage medium, and information processing apparatus |
| 01/15/2015 | US20150017571 Photolithogrpahy scattering bar structure and method |
| 01/15/2015 | US20150017389 Mask, glass substrate and manufacturing method thereof |
| 01/15/2015 | DE102005063624A1 Substrat für Maskenrohling, Maskenrohling, Belichtungsmaske und Herstellungsverfahren für Maskenrohlingssubstrat Substrate for mask blank, mask blank exposure mask and manufacturing method of mask blank substrate |
| 01/14/2015 | EP2824511A1 The use of surfactants having at least three short-chain perfluorinated groups in formulations for photo mask cleaning |
| 01/14/2015 | EP2824510A1 Mask and method for forming the same |
| 01/14/2015 | EP2823355A1 Reticle defect inspection with systematic defect filter |
| 01/14/2015 | EP2823354A1 Detection of thin lines for selective sensitivity during reticle inspection using processed images |
| 01/14/2015 | CN104281014A 掩模板、曝光设备及紫外掩模基板的制备方法 Preparation mask, exposure apparatus and the mask substrate UV |
| 01/14/2015 | CN104281011A 一种高数值孔径成像系统偏振像差的检测方法 A method for detecting a high numerical aperture imaging system polarization aberration |
| 01/14/2015 | CN104281008A 曝光图像补偿方法 Exposure image compensation method |
| 01/14/2015 | CN104281001A 膜掩模校正装置 Membrane mask correction device |
| 01/14/2015 | CN104281000A 一种掩膜板 One kind of mask |
| 01/14/2015 | CN104280999A 用于连接装置的层间贯孔的光学邻近校正 Interlayer coupling device for optical proximity correction through hole |
| 01/14/2015 | CN104280998A 光掩模坯料的制造方法及光掩模坯料 Photomask manufacturing method and photomask blank blank |
| 01/14/2015 | CN104280997A 掩模板及其制造方法、利用掩模板构图的方法 Mask and its manufacturing method, a method utilizing a patterned mask |
| 01/14/2015 | CN104280805A 用半色调掩膜改善画素端差高度的彩色滤光片制造方法 Improve end-pixel halftone mask poor color filter manufacturing method height |
| 01/13/2015 | US8932958 Device manufacturing and cleaning method |
| 01/13/2015 | US8932945 Wafer alignment system and method |
| 01/13/2015 | US8932785 EUV mask set and methods of manufacturing EUV masks and integrated circuits |
| 01/08/2015 | WO2015001906A1 Storage container |
| 01/08/2015 | US20150010855 Actinic ray-sensitive or radiation-sensitive composition, and resist film, resist-coated mask blanks, resist pattern forming method and photomask each using the composition |
| 01/08/2015 | US20150010854 Reflective Photomask Blanks and Reflective Photomasks |
| 01/08/2015 | US20150010853 Method of manufacturing photomask blank and photomask blank |
| 01/08/2015 | US20150010852 Photomask and method of manufacturing the same |
| 01/08/2015 | US20150010851 Methods involving color-aware retargeting of individual decomposed patterns when designing masks to be used in multiple patterning processes |
| 01/08/2015 | US20150009482 Extreme ultraviolet lithography mask |
| 01/07/2015 | EP2821853A1 Method of manufacturing photomask blank and photomask blank |
| 01/07/2015 | CN104272185A 使用系统性缺陷过滤器的光罩缺陷检验 Use systemic flaws filter mask defect inspection |
| 01/07/2015 | CN104272184A 在光罩检验期间使用经处理图像对用于选择性灵敏度的细线检测 Using the processed image on the thin mask inspection during selective sensitivity for the detection of |
| 01/07/2015 | CN104271468A 基板箱、基板搬运箱、箱覆盖体、基板搬运系统及基板搬运方法 Board boxes, board totes, boxes covering the body, substrate handling system and a substrate transfer method |
| 01/07/2015 | CN104267576A 掩膜板、柱状隔垫物的制作方法和基板的制作方法 Mask plate, columnar spacers production method thereof and a substrate manufacturing method |
| 01/07/2015 | CN104267575A 光掩模储放装置 Photomask stock unit |
| 01/07/2015 | CN104267574A 一种掩膜板 One kind of mask |
| 01/07/2015 | CN102955373B 接近式曝光装置及接近式曝光方法 Close proximity type exposure apparatus and exposure method |
| 01/07/2015 | CN102955354B 一种掩膜板及其制备方法 One kind of mask and its preparation method |
| 01/07/2015 | CN102782857B 半导体装置 Semiconductor device |
| 01/07/2015 | CN101770161B 移相掩膜板的制造方法及其结构 Phase shift manufacturing method and structure of the mask |
| 01/06/2015 | US8930859 Method of decomposing layout of semiconductor device |
| 01/06/2015 | US8930857 Mask data verification apparatus, design layout verification apparatus, method thereof, and computer program thereof |
| 01/06/2015 | US8930172 Methods and systems for parameter-sensitive and orthogonal gauge design for lithography calibration |
| 01/06/2015 | US8927945 Drawing apparatus and method of manufacturing article by controlling drawing on shot region side of boundary of shot regions |
| 01/06/2015 | US8927870 Suspension board with circuit and producing method thereof |
| 01/06/2015 | US8927198 Method to print contact holes at high resolution |
| 01/06/2015 | US8927181 Reflective mask blank for EUV lithography |
| 01/06/2015 | US8927180 Method of manufacturing a mask |
| 01/06/2015 | US8927179 Optical member for EUV lithography, and process for production of reflective layer-equipped substrate |
| 01/01/2015 | US20150004790 Photocured product and method for producing the same |
| 01/01/2015 | US20150004532 Photomask Having a Blind Region Including Periodical Clear Portions |
| 01/01/2015 | US20150004531 Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns |
| 01/01/2015 | US20150004530 Method of manufacturing a photomask with flexography |
| 01/01/2015 | US20150002803 Mask |
| 01/01/2015 | US20150001178 Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition |
| 12/31/2014 | CN104254806A 光学材料用永久膜的制造方法、利用所述方法制作的硬化膜、使用所述硬化膜的有机el显示装置及液晶显示装置 Optical material producing method for a permanent film, produced using the method of the hardened film, the cured film using an organic el display device and liquid crystal display device |
| 12/31/2014 | CN104252098A 相移掩膜板及其制作方法、阵列基板及其制作方法 Phase shift mask its production method, array substrate and method of making |
| 12/31/2014 | CN102803939B 用于同时检验具有不同间距的多个阵列区域的方法和装置 Method and apparatus for simultaneously testing a plurality of array regions having different pitches of |
| 12/31/2014 | CN101995408B 检查方法和设备 Inspection method and apparatus |
| 12/30/2014 | US8924897 Mask pattern design method and semiconductor manufacturing method and semiconductor design program |
| 12/30/2014 | US8923600 Methods and systems for utilizing design data in combination with inspection data |
| 12/30/2014 | US8921812 Reticle protection member, reticle carrying device, exposure device and method for carrying reticle |
| 12/30/2014 | US8921017 Multilayer substrate, manufacturing method for multilayer substrate, and quality control method for multilayer substrate |
| 12/30/2014 | US8921016 Methods involving color-aware retargeting of individual decomposed patterns when designing masks to be used in multiple patterning processes |
| 12/30/2014 | US8921015 Mask repair with passivation |
| 12/30/2014 | US8921014 Lithography mask and method of forming a lithography mask |
| 12/30/2014 | US8921013 System and method for test pattern for lithography process |
| 12/30/2014 | US8920666 Etching method and photomask blank processing method |
| 12/30/2014 | US8920588 Method for forming color filter, method for forming light emitting element layer, method for manufacturing color display device comprising them, or color display device |
| 12/30/2014 | US8920153 Apparatus comprising substrate and conductive layer |
| 12/25/2014 | US20140377693 Extreme Ultraviolet Lithography Mask and Multilayer Deposition Method for Fabricating Same |
| 12/25/2014 | US20140377692 Mask for microlithography and scanning projection exposure method utilizing the mask |
| 12/25/2014 | US20140377691 Mask plate and method for detecting exposure defects using the same |
| 12/25/2014 | US20140377690 Manufacturing Method of Mask Plate and Array Substrate |
| 12/24/2014 | CN104246972A 用于光罩的时变强度图的产生 When used to produce varying intensity map of the mask |
| 12/24/2014 | CN104238262A 一种用半导体晶圆片来制备的掩模版 A semiconductor wafer reticle prepared |