Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
09/2010
09/01/2010CN101488446B Plasma processing apparatus and gas dispensing apparatus thereof
09/01/2010CN101467228B Ion beam irradiating apparatus, and method of producing semiconductor device
09/01/2010CN101320675B Plasma processing device, electrode temperature adjusting device and method
09/01/2010CN101266909B Information acquisition apparatus, cross section evaluating apparatus and cross section evaluating method
09/01/2010CN101221882B Adapter of transmission electron microscope example bench, its substrate and manufacturing method thereof
09/01/2010CN101124650B Ion beam scanning control methods and systems for ion implantation uniformity
09/01/2010CN101120430B Plasma treating apparatus and electrode member therefor and electrode member manufacturing and recycling method
09/01/2010CN101080802B Systems and methods for ion beam focusing
09/01/2010CN101076875B Ion beam implantation current, point width and position regulation
08/2010
08/31/2010US7786437 Pattern inspection method and pattern inspection system
08/31/2010US7786431 Magnetically modulated, spin vector correlated beam generator for projecting electrically right, neutral, or left beams
08/31/2010US7785672 Plasma enhanced chemical vapor deposition; better control over surface standing wave effects and film thickness uniformity for silicon-containing films such as silicon nitride and silicon oxide
08/31/2010US7785486 Method of etching structures into an etching body using a plasma
08/31/2010US7785441 Plasma generator, plasma control method, and method of producing substrate
08/31/2010US7785417 Gas injection system for plasma processing
08/31/2010US7784426 Plasma reactor for the treatment of large size substrates
08/26/2010WO2010095392A1 Sample observing method and scanning electron microscope
08/26/2010WO2010095011A1 Process to deposit diamond like carbon as protective coating on inner surface of a shaped object.
08/26/2010WO2010094972A1 Plasma reactor
08/26/2010WO2010094969A1 Plasma reactor
08/26/2010WO2010094804A1 Lithography machine and substrate handling arrangement
08/26/2010WO2010094801A1 A method and arrangement for realizing a vacuum in a vacuum chamber
08/26/2010WO2010094800A1 Substrate support structure, clamp preparation unit, and lithography system
08/26/2010WO2010094724A1 Charged particle lithography apparatus and method of generating vacuum in a vacuum chamber
08/26/2010WO2010094719A1 Charged particle lithography apparatus and method of generating vacuum in a vacuum chamber
08/26/2010US20100213393 Charged particle beam processing method
08/26/2010US20100213384 Irradiation Field Forming Device
08/26/2010US20100213371 Scanning electron microscope
08/26/2010US20100213370 Electron Beam Apparatus
08/26/2010DE102007010463B4 Vorrichtung zur Feldemission von Teilchen Apparatus for field emission of particles
08/26/2010DE102004052994C5 Multistrahlmodulator für einen Partikelstrahl und Verwendung des Multistrahlmodulators zur maskenlosen Substratsstrukturierung Multibeam modulator for a particle beam and using the multibeam modulator for maskless patterning substrate
08/25/2010EP2221850A1 Plasma power supply apparatus
08/25/2010EP2221849A2 Charged particle beam processing method
08/25/2010EP1636819B1 Particle detector suitable for detecting ions and electrons
08/25/2010EP1520290B1 Device for coating substrates by physical vapour deposition, using a hollow cathode discharge method
08/25/2010CN201562657U Thin film deposition device
08/25/2010CN201562656U Film depositing apparatus and film photovoltaic device
08/25/2010CN201562655U Protective cover
08/25/2010CN1894767B Fault detection and control methodologies for ion implantation processes, and system for performing same
08/25/2010CN101812675A Vacuum processing apparatus
08/25/2010CN101388317B Scanning electronic microscope
08/24/2010US7783213 Method and device for measuring surface potential distribution, method and device for measuring insulation resistance, electrostatic latent image measurement device, and charging device
08/24/2010US7781748 Particle-beam exposure apparatus with overall-modulation of a patterned beam
08/24/2010US7781745 Apparatus and method for sterilization of food products
08/24/2010US7781743 Charged particle beam system and method for evacuation of the system
08/24/2010US7781742 Corrector
08/24/2010US7780786 Internal member of a plasma processing vessel
08/24/2010US7779784 Apparatus and method for plasma assisted deposition
08/24/2010US7779783 Plasma processing device
08/24/2010CA2476510C Method for the plasma cleaning of the surface of a material coated with an organic substance and the installation for carrying out said method
08/19/2010WO2010092747A1 Electron beam device and sample holding device for electron beam device
08/19/2010WO2010092433A1 Apparatus for large area plasma processing
08/19/2010WO2010092301A1 Discharge lamp for gds with an axial magnetic field
08/19/2010WO2010091697A1 Method for supplying power to a plasma process and plasma supply device
08/19/2010WO2010051982A8 Method and device for plasma treatment of a flat substrate
08/19/2010WO2010008307A3 Electron detection unit and a scanning electron microscope
08/19/2010WO2009080430A9 Linear electron source, evaporator using linear electron source, and appliccations of electron sources
08/19/2010US20100207041 Method of Smoothing Solid Surface with Gas Cluster Ion Beam and Solid Surface Smoothing Apparatus
08/19/2010DE202010005946U1 Mikrowellenreaktor zur mikrowellenunterstützten katalytischen Stoffumsetzung Microwave reactor for microwave-assisted catalytic material implementation
08/19/2010DE102009008063A1 Teilchenstrahlsystem Particle beam
08/19/2010DE102007006504B4 Ablenkvorrichtung für Gerät zur Elektronenstrahllithographie sowie Gerät zur Elektronenstrahllithographie For deflecting device for electron beam lithography and device for electron beam lithography
08/19/2010DE102006032303B4 Oberflächenbearbeitungsvorrichtung Surface treatment device
08/19/2010DE102004029959B4 Gasdurchlässige Plasmaelektrode, Verfahren zum Herstellen der gasdurchlässigen Plasmaelektrode und Parallelplatten-Reaktor Gas permeable plasma electrode, method of manufacturing the gas-permeable and parallel-plate electrode plasma reactor
08/19/2010CA2752183A1 Apparatus for large area plasma processing
08/18/2010EP2219205A1 A power supply device for plasma processing
08/18/2010EP2219204A1 Arrangement and method for the contrast improvement in a charged particle beam device for inspecting a specimen
08/18/2010EP2219203A1 Method for correcting astigmatism using electron-emitting spectromicroscopic imaging
08/18/2010EP2217366A1 Process and aparatus for atmospheric pressure plasma enhanced chemical vapor deposition
08/18/2010EP1979106B1 Method and device for the continuous plasma treatment of materials, in particular for the descaling of a metal strand
08/18/2010CN201556600U Scanning electronic microscope electronic backscatter diffraction test sample stand
08/18/2010CN1977353B Device and method for atomising with the aid of a displaceable planar target
08/18/2010CN1700404B Highly efficient compact capacitance coupled plasma reactor/generator and method
08/18/2010CN101807509A Plasma treating apparatus and method, and focus ring
08/18/2010CN101807508A Substrate treatment apparatus
08/18/2010CN101807507A Ion implanter system with beam decelerator
08/18/2010CN101276738B Plama processing apparatus
08/18/2010CN101162689B Focus ring and plasma processing apparatus
08/17/2010US7777198 Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiation
08/17/2010US7777185 Method and apparatus for a high-resolution three dimensional confocal scanning transmission electron microscope
08/17/2010US7777179 Two-grid ion energy analyzer and methods of manufacturing and operating
08/12/2010WO2010090794A1 Multiple nozzle gas cluster ion beam system and method
08/12/2010WO2010089960A1 Semiconductor inspection method and device that consider the effects of electron beams
08/12/2010WO2010089958A1 Charged particle radiation device
08/12/2010WO2010089950A1 Method for adjusting optical axis of charged particle radiation and charged particle radiation device
08/12/2010WO2010089175A1 Plasma coating system and method for coating or treating the surface of a substrate
08/12/2010WO2010088947A1 Modifiable magnet configuration for arc vaporization sources
08/12/2010WO2010037832A4 Electrostatic lens structure
08/12/2010US20100203253 Plasma system and method of producing a functional coating
08/12/2010US20100200775 Real Time Monitoring Ion Beam
08/12/2010US20100200774 Multi-sequence film deposition and growth using gas cluster ion beam processing
08/12/2010US20100200750 Particle beam system
08/12/2010US20100200749 Semiconductor Testing Method and Semiconductor Tester
08/12/2010DE202010004773U1 Dichtungselement mit Postionierungsmerkmal für eine festgeklemmte monolithische Gasverteilungselektrode Sealing element with Postionierungsmerkmal for a clamped monolithic gas distribution electrode
08/12/2010DE19838553B4 Faraday-Auffänger zur Messung von Ionenströmen in Massenspektrometern Faraday cup to measure the ionic currents in mass spectrometers
08/12/2010DE102009007770A1 Corrective action determining method for electron beam lithographic mask writer, involves evaluating aerial image by test mask with respect to observation of tolerances based on test structures, and determining corrective action
08/12/2010CA2751811A1 Modifiable magnet configuration for arc vaporization sources
08/12/2010CA2750789A1 Plasma coating system and method for coating or treating the surface of a substrate
08/11/2010EP2216798A2 Particle beam system
08/11/2010EP2216797A1 Electron emitting source and manufacturing method of electron emitting source
08/11/2010EP2216424A1 Techniques for depositing transparent conductive oxide coatings using dual C-MAG sputter apparatuses
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