| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
|---|
| 03/23/2010 | US7683350 Ion implantation method |
| 03/23/2010 | US7683347 Technique for improving ion implantation throughput and dose uniformity |
| 03/23/2010 | US7683320 Transmission electron microscope |
| 03/23/2010 | US7683319 Charge control apparatus and measurement apparatus equipped with the charge control apparatus |
| 03/23/2010 | US7683318 Laser atom probe |
| 03/23/2010 | US7682984 Interferometer endpoint monitoring device |
| 03/23/2010 | US7682982 Plasma processing apparatus and control method thereof |
| 03/23/2010 | US7682954 Method of impurity introduction, impurity introduction apparatus and semiconductor device produced with use of the method |
| 03/18/2010 | WO2010029929A1 Ion irradiation device |
| 03/18/2010 | WO2010029725A1 Magnetic shield system and magnetic shield method |
| 03/18/2010 | WO2010029708A1 Method and device for synthesizing panorama image using scanning charged-particle microscope |
| 03/18/2010 | WO2010029700A1 Charged particle beam device |
| 03/18/2010 | WO2010029270A1 Device for generating an ion beam with cryogenic trap |
| 03/18/2010 | WO2010029269A1 Device for generating an ion beam with magnetic filter |
| 03/18/2010 | WO2010008467A3 System and method for reducing particles and contamination by matching beam complementary aperture shapes to beam shapes |
| 03/18/2010 | WO2009155272A3 Cross-section systems and methods |
| 03/18/2010 | WO2009155166A3 Techniques for measuring ion beam emittance |
| 03/18/2010 | WO2009000933A9 Method and device for the treatment of a semiconductor substrate |
| 03/18/2010 | US20100067809 Structure determination system, structure determination method, and program |
| 03/18/2010 | US20100065761 Adjustable deflection optics for ion implantation |
| 03/18/2010 | US20100065741 Method For The Production Of Multiplayer Electrostatic Lens Array |
| 03/18/2010 | US20100065214 Showerhead electrode assembly for plasma processing apparatuses |
| 03/18/2010 | DE102006030555B4 Driftkorrigiertes Verfahren zum Schreiben auf einem Werkstück unter Verwendung eines Elektronenstrahls Drift-corrected method of writing on a workpiece using an electron beam |
| 03/17/2010 | EP2164091A2 Method for manufacturing sputter-coated substrates, magnetron source and sputtering chamber with such source |
| 03/17/2010 | EP2162899A1 Multitarget sputter source and method for the deposition of multi-layers |
| 03/17/2010 | EP2162733A1 Method for quantitative analysis of a material |
| 03/17/2010 | CN101675495A Method and apparatus for measuring process parameters of a plasma etch process |
| 03/17/2010 | CN101675494A Method and system for ion beam profiling |
| 03/17/2010 | CN101675493A Ion acceleration column connection mechanism with integrated shielding electrode and related methods |
| 03/17/2010 | CN101673661A Method for changing concentration distribution of plasma |
| 03/17/2010 | CN101673655A Microwave plasma resonant cavity used for depositing diamond film |
| 03/17/2010 | CN101672920A Method for calibrating immersion injecting dosage of plasma body |
| 03/17/2010 | CN100594577C System and method for analyzing power flow in semiconductor plasma generation systems |
| 03/17/2010 | CN100594257C Apparatus and method for partial implantation using wide beam |
| 03/16/2010 | US7679071 Electron beam drawing apparatus |
| 03/16/2010 | US7679070 Arc chamber for an ion implantation system |
| 03/16/2010 | US7679054 Double stage charged particle beam energy width reduction system for charged particle beam system |
| 03/16/2010 | US7678705 Plasma semiconductor processing system and method |
| 03/16/2010 | US7678430 Method and device for microwave plasma deposition of a coating on a thermoplastic container surface |
| 03/16/2010 | US7678385 irradiating a bone composition consisting of demineralized human bone, the bone composition having no osteoinductivity prior to irradiating, at a temperature less than 0 degrees C., at dose of radiation sufficient to increase osteoinductivity of bone composition to Osteoinduction Grading Scale score of 2 |
| 03/16/2010 | US7678240 Method for controlling plasma density or the distribution thereof |
| 03/16/2010 | US7678239 Sliding anode magnetron sputtering source |
| 03/16/2010 | US7678226 Method and apparatus for an improved bellows shield in a plasma processing system |
| 03/16/2010 | US7678225 Focus ring for semiconductor treatment and plasma treatment device |
| 03/11/2010 | WO2010027959A1 Low pressure high frequency pulsed plasma reactor for producing nanoparticles |
| 03/11/2010 | WO2010026867A1 Electron beam device |
| 03/11/2010 | WO2010026833A1 Scanning type charged particle microscope device and method for processing image acquired with scanning type charged particle microscope device |
| 03/11/2010 | WO2010026425A1 Gas discharge electron source |
| 03/11/2010 | US20100062349 Stencil, Stencil Design System and Method for Cell Projection Particle Beam Lithography |
| 03/11/2010 | DE102008045336A1 System zur Bearbeitung einer Probe mit einem Laserstrahl und einem Elektronenstrahl oder einem Ionenstrahl The system for processing a sample with a laser beam and an electron beam or an ion beam |
| 03/11/2010 | DE102008038216A1 Verfahren zum Erzeugen von Korpuskularstrahlbildern mit einem Korpuskularstrahlgerät A method for generating a particle beam device with Korpuskularstrahlbildern |
| 03/10/2010 | EP2161724A1 Ion beam control apparatus and method |
| 03/10/2010 | EP1396554B1 Plasma cvd apparatus |
| 03/10/2010 | EP1090407B1 Semiconductor process chamber electrode |
| 03/10/2010 | CN101667520A Method for controlling base plate carrying mechanism, base plate treating device and base plate carrying mechanism |
| 03/10/2010 | CN100593836C Ion implantation device control method, control system thereof, control program thereof, and ion implantation device |
| 03/09/2010 | US7675300 Charged particle beam device probe operation |
| 03/09/2010 | US7675050 Apparatus and method for ion beam implantation using ribbon and spot beams |
| 03/09/2010 | US7675049 Sputtering coating of protective layer for charged particle beam processing |
| 03/09/2010 | US7675048 Wafer holding robot end effecter vertical position determination in ion implanter system |
| 03/09/2010 | US7675047 Technique for shaping a ribbon-shaped ion beam |
| 03/09/2010 | US7675046 Terminal structure of an ion implanter |
| 03/09/2010 | US7675042 Beam optical component for charged particle beams |
| 03/09/2010 | US7674360 Mechanism for varying the spacing between sputter magnetron and target |
| 03/09/2010 | US7673583 Locally-efficient inductive plasma coupling for plasma processing system |
| 03/04/2010 | WO2010025317A2 Single-channel optical processing system for energetic-beam microscopes |
| 03/04/2010 | WO2010025211A2 Ion beam stabilization |
| 03/04/2010 | WO2010024105A1 Charged corpuscular particle beam irradiating method, and charged corpuscular particle beam apparatus |
| 03/04/2010 | WO2010023189A1 Phase plate, in particular for an electron microscope |
| 03/04/2010 | WO2009154954A3 Isotope ion microscope methods and systems |
| 03/04/2010 | US20100055807 Plasma ashing apparatus and endpoint detection process |
| 03/04/2010 | DE10296978B4 Elektrodenteil für eine Plasmabehandlungsvorrichtung, Plasmabehandlungsvorrichtung und Plasmabehandlungsverfahren Electrode member for a plasma processing apparatus, plasma processing apparatus and plasma processing method |
| 03/03/2010 | EP2159821A2 Coating device for coating a substrate and method for same |
| 03/03/2010 | EP2159820A1 A physical vapour deposition coating device as well as a physical vapour deposition method |
| 03/03/2010 | EP2159819A2 Plasma generator |
| 03/03/2010 | EP2159818A1 Phase plate, in particular for an electron microscope |
| 03/03/2010 | EP2159817A1 Fast wafer inspection system |
| 03/03/2010 | EP2159816A2 Particle beam system with anti-contamination shield |
| 03/03/2010 | EP2158977A1 Method and apparatus for manufacturing cleaned substrates or clean substrates which are further processed |
| 03/03/2010 | EP1970464B1 Cathode evaporation machine |
| 03/03/2010 | EP1540695B1 A method and apparatus for the compensation of edge ring wear in a plasma processing chamber |
| 03/03/2010 | EP1110237B1 Device and method for the high-frequency etching of a substrate using a plasma etching installation and device and method for igniting a plasma and for pulsing the plasma output or adjusting the same upwards |
| 03/03/2010 | CN201417740Y Rectangular etching ion gun |
| 03/03/2010 | CN101661863A Plasma processing apparatus and plasma processing method |
| 03/03/2010 | CN101661862A Ion source |
| 03/02/2010 | US7672750 Method and apparatus for monitoring a microstructure etching process |
| 03/02/2010 | US7671333 Apparatus for observing a sample with a particle beam and an optical microscope |
| 03/02/2010 | US7671332 Autofocus method for scanning charged-particle beam instrument |
| 03/02/2010 | US7670857 Inspection method, manufacturing method of piece for analysis, analysis method, analyzer, manufacturing method of SOI wafer, and SOI wafer |
| 03/02/2010 | US7670688 Oxide coating comprising yttrium (preferably yttria or yttria aluminum garnet) disposed over a support; coating and support differ from one another in coefficient of thermal expansion by no more than 5 x 10-6/K |
| 03/02/2010 | US7670455 Magnetically enhanced, inductively coupled plasma source for a focused ion beam system |
| 03/02/2010 | US7670454 Plasma processing apparatus |
| 03/02/2010 | US7670453 Device for treating a container with microwave plasma |
| 02/25/2010 | WO2010021543A1 Charged particle beam lithography system and target positioning device |
| 02/25/2010 | WO2010021012A1 Electron detection device and scanning electron microscope |
| 02/25/2010 | WO2010020345A1 Catalytic oxidation of hydrogen chloride with oxygen in non-thermal plasma |
| 02/25/2010 | WO2010020195A1 Plasma processing apparatus, gas distribution device and gas delivery method |
| 02/25/2010 | WO2009148643A3 Microchannel plate devices with multiple emissive layers |
| 02/25/2010 | US20100048033 Process And Apparatus For Forming Oxide Film, And Electronic Device Material |
| 02/25/2010 | US20100045958 Lithography system |