Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
11/2010
11/18/2010DE102009002684A1 Power supplying method for plasma load, involves immediately supplying produced alternating signal to load without intermediate switching of oscillation circuit and extinguishing arc by controlling switching elements during detection of arc
11/17/2010EP2251893A2 Multi-beam deflector array means with bonded electrodes
11/17/2010EP2250660A1 Projection lens arrangement
11/17/2010EP1925015B1 System for plasma treatment of endless materials
11/17/2010EP0914496B1 Microwave applicator for an electron cyclotron resonance plasma source
11/17/2010CN101887836A Method and device for regulating current distribution and plasma process equipment
11/17/2010CN101887829A Preparation method of transmission electron microscope micro-grid
11/17/2010CN101473405B Insert piece for an end-block of a sputtering installation
11/16/2010US7834554 Dual mode ion source for ion implantation
11/16/2010US7834327 Self-biasing active load circuit and related power supply for use in a charged particle beam processing system
11/16/2010US7833587 in which discharge electrode and substrate are disposed opposite each other in vacuum film formation chamber into which gas for forming film containing substance has been introduced, and high-frequency electric power generated by feeding circuit through adjustable external cables
11/16/2010US7833429 Plasma processing method
11/16/2010US7833401 Electroplating an yttrium-containing coating on a chamber component
11/11/2010WO2010129783A1 Apparatus and method for plasma treatment of containers
11/11/2010WO2010127845A1 Method for the production of oxide and nitride coatings and its use
11/11/2010WO2008113571A9 Gas distribution system
11/11/2010US20100283132 ECR-plasma source and methods for treatment of semiconductor structures
11/11/2010DE102009010774A1 Verfahren und Vorrichtung zur Bildkontrasterzeugung durch Phasenschiebung Method and apparatus for generating image contrast by phase shift
11/10/2010EP2249378A1 Stage device and method for cleaning stage
11/10/2010EP2249372A1 Method for controlling ion energy in radio frequency plasmas
11/10/2010EP2248153A2 Ion source cleaning in semiconductor processing systems
11/10/2010EP2248145A1 Ion source gas reactor
11/10/2010EP1333475B1 Method for forming an insulation film and substrate processing apparatus therefore
11/10/2010CN1950922B Apparatus for metal plasma vapor deposition and re-sputter with source and bias power frequencies applied through the workpiece
11/10/2010CN101884086A Method and device for plasma treatment of moving substrates
11/10/2010CN101884016A Lithography system, method of clamping and wafer table
11/10/2010CN101882647A Movable holder for silicon-based film solar cells
11/10/2010CN101882646A Deposition clamp of film solar cell
11/10/2010CN101882567A Plasma processing apparatus and high frequency short-circuit apparatus
11/10/2010CN101882551A Ion sources, systems and methods
11/10/2010CN101405830B High sensitivity slitless ion source mass spectrometer for trace gas leak detection
11/10/2010CN101366095B Ion sources, systems and methods
11/10/2010CN101322955B Production method of nano material
11/10/2010CN101308776B Normal pressure plasma cleaning device
11/10/2010CN101151703B Plasma processing apparatus
11/10/2010CN101083868B Preionization igniting device based atmosphere pressure discharging cold plasma generators
11/10/2010CN101051595B Carbon nano tube field transmitting electronic source
11/10/2010CN101048029B Microwave plasma processing apparatus, method for manufacturing microwave plasma processing apparatus and plasma processing method
11/10/2010CN101035405B Plasma treatment device
11/09/2010US7829871 Sheet beam-type testing apparatus
11/09/2010US7829870 Method and apparatus for in-situ sample preparation
11/09/2010US7829853 Sample surface observation method
11/09/2010US7828946 Arc evaporator with a powerful magnetic guide for targets having a large surface area
11/09/2010US7828927 Plasma processing device
11/09/2010US7827931 Plasma processor electrode and plasma processor
11/04/2010WO2010126958A1 Voltage contrast imaging
11/04/2010WO2010126806A1 Detecting and preventing instabilities in plasma processes
11/04/2010WO2010126698A2 Modeling critical-dimension (cd) scanning-electron-microscopy (cd-sem) cd extraction
11/04/2010WO2010126470A1 System and method of performing uniform dose implantation under adverse conditions
11/04/2010WO2010125919A1 Method for displaying error factor extraction and system for displaying the same
11/04/2010WO2010125754A1 Composite charged particle radiation device
11/04/2010WO2010125526A1 Charged particle optical system comprising an electrostatic deflector
11/04/2010WO2010124836A1 Method for producing a plasma jet and plasma source
11/04/2010US20100276611 High-intensity electromagnetic radiation apparatus and methods
11/04/2010US20100276606 Charged particle optical system comprising an electrostatic deflector
11/04/2010US20100276592 Compact Scanning Electron Microscope
11/04/2010US20100276283 Vacuum coating unit for homogeneous PVD coating
11/04/2010DE102009019422A1 Generating plasma by magnetron, comprises supplying electrical energy in pulse form to magnetron, changing strength of electric field maintaining magnetron discharge, and changing strength of magnetic field penetrating through magnetron
11/03/2010EP2246170A1 Manufacturing method for seamless mold
11/03/2010EP2245736A1 Radio frequency power delivery system
11/03/2010EP2245647A1 Plasma treatment apparatus and method for treatment of a substrate with atmospheric pressure glow discharge electrode configuration
11/03/2010EP2245646A1 A method for performing electron beam lithography
11/03/2010CN201622996U Cylindrical plasma resonant cavity
11/03/2010CN1938812B Method of correction for wafer crystal cut error in semiconductor processing
11/03/2010CN1802450B Target/backing plate constructions, and methods of forming them
11/03/2010CN1739185B End point detection in time division multiplexed etch processes
11/03/2010CN101878514A Sputter coating device and coating method
11/03/2010CN101878321A Control of arbitrary scan path of a rotating magnetron
11/03/2010CN101877300A Sputter magnetron device
11/03/2010CN101552182B Marginal ring mechanism used in semiconductor manufacture technology
11/03/2010CN101421815B Ion beam angle measurement systems and methods employing varied angle slot arrays for ion implantation systems
11/03/2010CN101317245B Ion implantation beam angle calibration
11/03/2010CN101273430B Apparatus for the removal of film from a substrate bevel edge and methods therefor
11/03/2010CN101261206B Material nanometer dynamic performance test two freedom degree loading unit
11/03/2010CN101199036B Confined plasma with adjustable electrode area ratio
11/03/2010CN101057310B Impedance matching of a capacitively coupled RF plasma reactor suitable for large area substrates
11/03/2010CN101014222B Generator of cleaning the surface of a material coated with an organic substance
11/02/2010US7825386 System and method for a charged particle beam
11/02/2010US7825378 Method for obtaining a scanning transmission image of a sample in a particle-optical apparatus
11/02/2010US7825377 Electron beam apparatus with aberration corrector
11/02/2010US7825015 Method for implanting ions in semiconductor device
11/02/2010US7824520 Plasma treatment apparatus
11/02/2010US7823537 Plasma generator
10/2010
10/28/2010WO2010123007A1 Cold-cathode field-emission electron source including rare-earth hexaboride
10/28/2010WO2010122717A1 Sample holder, method for use of the sample holder, and charged particle device
10/28/2010WO2010122450A2 A magnetic bearing, a rotary stage, and a reflective electron beam lithography apparatus
10/28/2010WO2010122331A1 Rf-plasma glow discharge sputtering
10/28/2010WO2010121775A1 Method and device for monitoring the intensity of an electron beam
10/28/2010US20100272617 Falling film plasma reactor
10/28/2010US20100270477 Vessel sterilization apparatus
10/28/2010US20100270475 Drift measuring method, charged particle beam writing method, and charged particle beam writing apparatus
10/28/2010US20100270474 Particle-Optical System
10/28/2010US20100270468 System and method for a charged particle beam
10/28/2010US20100270144 High Power Pulse Magnetron Sputtering For High Aspect-Ratio Features, Vias, and Trenches
10/28/2010DE10320805B4 Vorrichtung zur Bearbeitung von zylindrischen, zumindest eine elektrisch leitende Ader aufweisenden Substraten Device for machining cylindrical, at least one electrically conductive wire having substrates
10/27/2010EP2243859A1 Thin film forming method and thin film stack
10/27/2010EP2243149A1 Multiple grooved vacuum coupling
10/27/2010EP2243148A2 Apparatus, carrier and method for the plasma treatment of molds
10/27/2010EP1415015B1 Method and device for the coating and blow moulding of a body
10/27/2010EP0906589B1 Apertured nonplanar electrodes and forming methods
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