| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 02/25/2010 | US20100044595 Race track configuration and method for wafering silicon solar substrates |
| 02/25/2010 | US20100044580 Charged Particle Extraction Device and Method of Design There For |
| 02/25/2010 | US20100044579 Apparatus |
| 02/25/2010 | US20100043974 Plasma processing method and apparatus |
| 02/24/2010 | EP2157205A1 A high-power pulsed magnetron sputtering process as well as a high-power electrical energy source |
| 02/24/2010 | EP2156505A1 Circuit and method for reducing electrical energy stored in a lead inductance for fast extinction of plasma arcs |
| 02/24/2010 | EP1706889B1 Gas distribution plate assembly for plasma reactors |
| 02/24/2010 | EP1699077B1 Plasma processing apparatus |
| 02/24/2010 | EP1377138B1 Device and control method for micro wave plasma processing |
| 02/24/2010 | EP1371271B1 Plasma installation and method for producing a functional coating |
| 02/24/2010 | CN101656200A Multiple frequency plasma etch reactor |
| 02/24/2010 | CN100592461C Detaching device of ion implanter insulating sleeve |
| 02/24/2010 | CN100592460C Semiconductor device manufacturing apparatus and a method of controlling a semiconductor device manufacturing process |
| 02/24/2010 | CN100592459C A hybrid magnetic/electrostatic deflector for ion implantation systems |
| 02/23/2010 | US7667212 Method for depositing a film using a charged particle beam, method for performing selective etching using the same, and charged particle beam equipment therefor |
| 02/23/2010 | US7667209 Focused ION beam apparatus |
| 02/23/2010 | US7667208 Technique for confining secondary electrons in plasma-based ion implantation |
| 02/23/2010 | US7666479 pressurization; cyclic flow |
| 02/23/2010 | US7665416 Apparatus for generating excited and/or ionized particles in a plasma and a method for generating ionized particles |
| 02/18/2010 | WO2010018739A1 Contact detecting device and contact detecting method |
| 02/18/2010 | WO2010018621A1 Bonding device and maintenance method of bonding device |
| 02/18/2010 | US20100041238 Tunable multi-zone gas injection system |
| 02/18/2010 | US20100040802 Method and apparatus for production of metal film or the like |
| 02/18/2010 | US20100038553 System and method of beam energy identification for single wafer ion implantation |
| 02/18/2010 | US20100038535 Sample dimension measuring method and scanning electron microscope |
| 02/18/2010 | DE102008037698A1 Elektronenmikroskop mit ringförmiger Beleuchtungsapertur Electron microscope with an annular illumination |
| 02/17/2010 | EP2154704A1 Plasma source with plurality of out-of-phase electrodes |
| 02/17/2010 | EP1055250B1 Plasma processing apparatus |
| 02/17/2010 | CN101651078A Focus ring, plasma processing apparatus and plasma processing method |
| 02/16/2010 | US7663126 Ion implantation system and method of monitoring implant energy of an ion implantation device |
| 02/16/2010 | US7663125 Ion beam current uniformity monitor, ion implanter and related method |
| 02/16/2010 | US7663102 High current density particle beam system |
| 02/16/2010 | US7663101 System and methods for preparing microscopy samples |
| 02/16/2010 | US7662524 Scanning beam of metallic ions over defect to dope, reducing transparency; implanting gallium atoms to reduce transmission and quartz can be etched |
| 02/16/2010 | US7662237 Method of cleaning the surface of a material coated with an organic substrate and a generator and device for carrying out said method |
| 02/16/2010 | US7661388 Plasma reactor for the treatment of large size substrates |
| 02/16/2010 | US7661386 Film forming device |
| 02/11/2010 | WO2010017065A2 Capacitance displacement and rotation sensor |
| 02/11/2010 | WO2010016505A1 Sample conveying mechanism |
| 02/11/2010 | WO2010016394A1 Charged particle gun, and focused ion beam apparatus using the gun |
| 02/11/2010 | WO2010016211A1 Standard member for correction, scanning electron microscope using same, and scanning electron microscope correction method |
| 02/11/2010 | WO2010015385A1 Device and method for producing dielectric layers in microwave plasma |
| 02/11/2010 | WO2010015235A1 Method for separating two articles that are bonded to each other via at least one adhesive layer |
| 02/11/2010 | WO2009145798A3 Methods for modifying features of a workpiece using a gas cluster ion beam |
| 02/11/2010 | US20100032581 Micro-gripper |
| 02/11/2010 | US20100032563 Method of determining the cuticle scale height of fibers |
| 02/11/2010 | DE102008041070A1 Method for determining maximum altitude of particles on substrate, involves localizing highest point by accommodating substrate with object i.e. particles, in different directions, and determining altitude of highest point |
| 02/11/2010 | DE102008040426A1 Method for examining surface of object using particle beam of particle beam device, involves arranging object in sample chamber, and supplying particle beam to predetermined location on surface of object |
| 02/11/2010 | DE102008037159A1 Vorrichtung und Verfahren zur Plasmabehandlung von Hohlkörpern Apparatus and method for plasma treatment of hollow bodies |
| 02/11/2010 | DE102008035165A1 Electron microscope, particularly scanning electron microscope for use in electron backscatter diffraction process, comprises non-destructive determination unit for non-destructive determining of crystal structure of sample |
| 02/11/2010 | DE102008035163A1 Electron microscope i.e. scanning electron microscope, has deflection device arranged in optical path behind beam source and deflecting beam, such that beam impinges on sample at pointed angle and sensor device detects radiation |
| 02/10/2010 | EP2151855A1 Plasma-processing device and method of manufacturing adhesion-preventing member |
| 02/10/2010 | EP2151849A1 Vacuum pumping system comprising a plurality of sputter ion pumps |
| 02/10/2010 | EP2151848A1 Method of machining a work piece with a focused particle beam |
| 02/10/2010 | EP2151847A1 Method of machining a work piece with a focused particle beam |
| 02/10/2010 | EP2151509A1 Reactive gas distributor, reactive gas treatment system, and reactive gas treatment method |
| 02/10/2010 | EP1697555B1 Method and device for magnetron sputtering |
| 02/10/2010 | EP1018135B1 Vacuum plasma processor having coil with added conducting segments to its peripheral part |
| 02/10/2010 | CN101647085A Improved particle beam generator |
| 02/10/2010 | CN101645387A Process endpoint detection in processing chambers |
| 02/10/2010 | CN101645386A Device and method for plasma treating hollow bodies |
| 02/10/2010 | CN100589675C Plasma generation power supply apparatus |
| 02/10/2010 | CN100589228C Stepped upper electrode for plasma processing uniformity |
| 02/10/2010 | CN100589225C Ion implantation device |
| 02/10/2010 | CN100589224C Method of measuring ion beam and device for implanting ions |
| 02/09/2010 | US7659526 Apparatus and method for controlled particle beam manufacturing |
| 02/09/2010 | US7659508 Method for measuring dimensions of sample and scanning electron microscope |
| 02/09/2010 | US7659507 Automatic method of axial adjustments in electron beam system |
| 02/09/2010 | US7659489 Toroidal low-field reactive gas and plasma source having a dielectric vacuum vessel |
| 02/09/2010 | US7658799 Plasma film-forming apparatus and plasma film-forming method |
| 02/09/2010 | CA2476184C Method of cleaning the surface of a material coated with an organic substance and a generator and device for carrying out said method |
| 02/09/2010 | CA2387432C Method and apparatus for etching and deposition using micro-plasmas |
| 02/04/2010 | WO2010014850A2 Apparatus and method including a direct bombardment detector and a secondary detector for use in electron microscopy |
| 02/04/2010 | WO2010014252A2 Grid holder for stem analysis in a charged particle instrument |
| 02/04/2010 | WO2010013331A1 Electron beam device |
| 02/04/2010 | WO2010012293A1 Arrangement and method for generating a plasma having a defined and stable ionization state |
| 02/04/2010 | WO2009150226A3 Apparatus and method for the treatment of semiconductor substrates |
| 02/04/2010 | US20100025596 Fastening apparatus |
| 02/04/2010 | US20100025580 Grid holder for stem analysis in a charged particle instrument |
| 02/04/2010 | US20100025578 Dual Beam System |
| 02/04/2010 | US20100024983 Plasma etching unit |
| 02/04/2010 | DE10214620B4 Verfahren zur plasmalosen Gasphasenätzung eines Siliziumwafers und Vorrichtung zu deren Durchführung Method for plasma-free gas-phase etching of a silicon wafer and device for its implementation |
| 02/04/2010 | DE102009034230A1 Frequenzeinstellvorrichtung Frequency setting |
| 02/03/2010 | EP2149897A1 Method for milling and end-pointing a sample |
| 02/03/2010 | EP2149145A2 Magnetic deflector for an electron column |
| 02/03/2010 | EP1345703B1 Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof |
| 02/03/2010 | CN100588305C Method for forming plasma |
| 02/03/2010 | CN100588102C Method for generating output DC voltage and plasma processing DC voltage power supply |
| 02/03/2010 | CN100587895C Ion beam irradiation device |
| 02/03/2010 | CN100587894C Non-uniform magnetic-field parallel-beam lens system |
| 02/03/2010 | CN100587893C Igniter electrode assembly of plasma generator |
| 02/03/2010 | CN100587892C Impedance matching method and device |
| 02/03/2010 | CN100587107C Pulse type magnetron sputtering deposition with preionization |
| 02/03/2010 | CN100587104C Silicon film forming equipment |
| 02/02/2010 | US7655933 Techniques for temperature-controlled ion implantation |
| 02/02/2010 | US7655931 Techniques for improving the performance and extending the lifetime of an ion source with gas mixing |
| 02/02/2010 | US7655930 Ion source arc chamber seal |
| 02/02/2010 | US7655929 Ion beam measuring method and ion implanting apparatus |
| 02/02/2010 | US7655928 Ion acceleration column connection mechanism with integrated shielding electrode and related methods |
| 02/02/2010 | US7655924 Front plate for an ion source |