| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
|---|
| 06/08/2010 | US7732765 Scanning electron microscope |
| 06/08/2010 | US7732764 Field emission electron gun and electron beam applied device using the same |
| 06/08/2010 | US7732763 Pattern inspection method, pattern inspection apparatus, semiconductor device manufacturing method, and program |
| 06/08/2010 | US7732325 Plasma-enhanced cyclic layer deposition process for barrier layers |
| 06/08/2010 | US7732227 Method and apparatus for wall film monitoring |
| 06/08/2010 | US7732010 Method for supporting a glass substrate to improve uniform deposition thickness |
| 06/03/2010 | WO2010061516A1 Image formation method and image formation device |
| 06/03/2010 | WO2010004275A3 Sample holder |
| 06/03/2010 | US20100133449 Ion implantation apparatus, substrate clamping mechanism, and ion implantation method |
| 06/03/2010 | US20100133446 Ion beam focusing lens method and apparatus used in conjunction with a charged particle cancer therapy system |
| 06/03/2010 | US20100133444 Charged particle cancer therapy patient positioning method and apparatus |
| 06/03/2010 | US20100133232 Determining endpoint in a substrate process |
| 06/02/2010 | EP2192607A2 Vapor deposition electron beam current control |
| 06/02/2010 | EP1738394B1 Method for reciprocating a workpiece through an ion beam |
| 06/02/2010 | EP1322796B1 High purity sputter targets with target end-of-life indication and method of manufacture |
| 06/02/2010 | DE102008059741A1 Vorrichtung zur Bearbeitung von Werkstücken unter Vakuum Apparatus for machining of workpieces under vacuum |
| 06/02/2010 | CN201495286U Switching device of silicon wafer carrier used for PECVD |
| 06/02/2010 | CN201495285U Conversion device of silicon wafer carrier used for PECV |
| 06/02/2010 | CN1839214B Control system for a sputtering system |
| 06/02/2010 | CN1830053B A method for manufacturing a lens assembly of microcolumn and a lens assembly of microcolumn manufactured by the same |
| 06/02/2010 | CN1656373B Element-specific x-ray fluorescence microscope and method of operation |
| 06/02/2010 | CN101720493A Multitarget sputter source and method for the deposition of multi-layers |
| 06/02/2010 | CN101720163A Medium barrier glow discharge reactor at atmospheric pressure |
| 06/02/2010 | CN101719480A Static cartridge and plasma device |
| 06/02/2010 | CN101719462A Process chamber, plasma device and chamber state detecting method |
| 06/02/2010 | CN101719457A Superconducting coil-based high-intensity magnetic field magnetic control sputtering cathode |
| 06/02/2010 | CN101452816B Ion injection monitoring method |
| 06/02/2010 | CN101371328B Methods and apparatus for ion beam angle measurement in two dimensions |
| 06/02/2010 | CN101339895B Gas distribution device and plasma processing apparatus applying the same |
| 06/02/2010 | CN101320679B Plasma processing system |
| 06/02/2010 | CN101315880B Gas distribution device and plasma processing apparatus adopting the same |
| 06/02/2010 | CN101315877B Substrate processing sytstem and apparatus |
| 06/02/2010 | CN101256942B Dosimetry using optical emission spectroscopy/residual gas analyzer in conjunction with ion current |
| 06/02/2010 | CN101231943B Plasma processing apparatus |
| 06/02/2010 | CN101183566B Semiconductor probe having resistive tip and method of fabricating the same |
| 06/02/2010 | CN101179010B Process chamber having gate slit opening and closing apparatus |
| 06/02/2010 | CN101162685B Apparatus and method of semiconductor plasma process |
| 06/02/2010 | CN101127300B Monitoring substrate processing using reflected radiation |
| 06/02/2010 | CN101060074B Method for etching wafer in plasma etching cell |
| 06/01/2010 | US7728312 Apparatus and method for partial ion implantation |
| 06/01/2010 | US7728311 Charged particle radiation therapy |
| 06/01/2010 | US7728308 Apparatus for blanking a charged particle beam |
| 06/01/2010 | US7728295 Method and apparatus for detecting surface and subsurface properties of materials |
| 06/01/2010 | US7728294 Semiconductor wafer inspection tool and semiconductor wafer inspection method |
| 05/27/2010 | WO2010059252A2 Front end of line plasma mediated ashing processes and apparatus |
| 05/27/2010 | WO2010058930A2 Apparatus of electron cyclotron resonance ion source and manufacturing method thereof |
| 05/27/2010 | WO2010058645A1 Ion implantation device and deflection electrode |
| 05/27/2010 | WO2010058366A1 Rf sputtering arrangement |
| 05/27/2010 | WO2010058281A1 Method and apparatus for producing thin films on a substrate via a pulsed- electron deposition process |
| 05/27/2010 | WO2009154954A4 Isotope ion microscope methods and systems |
| 05/27/2010 | WO2009154953A3 Sample inspection methods, systems and components |
| 05/27/2010 | US20100127185 Method for maskless particle-beam exposure |
| 05/27/2010 | US20100126965 Molded body, method for producing the body and use thereof |
| 05/26/2010 | EP2190004A2 Method and apparatus for generating a plasma and semiconductor device fabrication method and apparatus |
| 05/26/2010 | EP2190003A2 Constant current multi-beam patterning |
| 05/26/2010 | EP2190002A1 Apparatus for detecting a fine geometry and device manufacturing method |
| 05/26/2010 | EP2188411A2 Sputtering system |
| 05/26/2010 | EP1813693B1 Sputtering target backing plate assembly and film deposition system |
| 05/26/2010 | CN201490209U Coating steel hook of crystalline silicon solar cell |
| 05/26/2010 | CN1996546B The real-time control system and control method for the ion source in gas |
| 05/26/2010 | CN1983504B Ion source and mould polisher therewith |
| 05/26/2010 | CN1878887B Vacuum coating system for coating elongate substrates |
| 05/26/2010 | CN1720532B Method and apparatus for monitoring a material processing system |
| 05/26/2010 | CN1638015B Improvements relating to ion implantation |
| 05/26/2010 | CN1630925B Device for applying electromagnetic microwave radiation in a plasma cavity |
| 05/26/2010 | CN1582487B Plasma processing device and method |
| 05/26/2010 | CN1577722B Image correcting method ,system and mask, semiconductor producing method and semiconductor device |
| 05/26/2010 | CN101714491A Apparatus for investigating or modifying a surface with a beam of charged particles |
| 05/26/2010 | CN101713920A 半导体器件 Semiconductor devices |
| 05/26/2010 | CN101243534B Microwave plasma reactor |
| 05/26/2010 | CN101038849B Plasma processing apparatus, plasma processing method and focus ring |
| 05/25/2010 | US7723706 Horizontal and vertical beam angle measurement technique |
| 05/25/2010 | US7723705 Techniques for measuring ion beam emittance |
| 05/25/2010 | US7723700 Controlling the flow of vapors sublimated from solids |
| 05/25/2010 | US7723699 Cathode having electron production and focusing grooves, ion source and related method |
| 05/25/2010 | US7723682 Transmission electron microscope provided with electronic spectroscope |
| 05/25/2010 | US7723218 Plasma CVD apparatus |
| 05/25/2010 | US7722925 Showerhead mounting to accommodate thermal expansion |
| 05/25/2010 | US7722818 For scanning or transmission electron microscope; having tilting axis perpendicular to ion beam; quality angle etching |
| 05/25/2010 | US7722738 Semiconductor device manufacturing unit and semiconductor device manufacturing method |
| 05/20/2010 | WO2010055724A1 Ion implantation method, and ion implantation apparatus |
| 05/20/2010 | WO2010055610A1 Pattern check device and pattern check method |
| 05/20/2010 | WO2010054726A1 Ignition apparatus for arc sources |
| 05/20/2010 | WO2010025211A3 Ion beam stabilization |
| 05/20/2010 | US20100124799 Technique for manufacturing a solar cell |
| 05/20/2010 | US20100123077 Passive pixel direct detection sensor |
| 05/20/2010 | DE102008053180A1 Teilchenstrahlschreibverfahren, Teilchenstrahlschreibvorrichtung und Wartungsverfahren für selbige Teilchenstrahlschreibverfahren, Teilchenstrahlschreibvorrichtung and maintenance procedures for selbige |
| 05/20/2010 | DE102006037144B4 ECR-Plasmaquelle ECR plasma source |
| 05/20/2010 | CA2742870A1 Ignition apparatus for arc sources |
| 05/19/2010 | EP2187427A2 Method for maskless particle-beam exposure |
| 05/19/2010 | EP2186108A2 Low impedance plasma |
| 05/19/2010 | EP1013792B1 Power supply unit for sputtering device |
| 05/19/2010 | CN201478255U Ion source of ion implanter |
| 05/19/2010 | CN201478252U Heating type cathode for metal steam vacuum arc ion source |
| 05/19/2010 | CN201473588U Hook of silicon wafer carrier for PECVD |
| 05/19/2010 | CN201473587U Silicon wafer carrier refitting device for PECVD |
| 05/19/2010 | CN101371326B Ion sources, systems and methods |
| 05/19/2010 | CN101346795B Method and installation for the vacuum polishing of a metal strip by means of magnetron sputtering |
| 05/19/2010 | CN101331579B Method and apparatus of providing power to ignite and sustain a plasma in a reactive gas generator |
| 05/19/2010 | CN101218658B Wafer-scanning ion implanter having fast beam deflection apparatus for beam glitch recovery |