| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 04/08/2010 | US20100084580 Thermal modulation of implant process |
| 04/08/2010 | US20100084576 Hybrid scanning for ion implantation |
| 04/08/2010 | US20100084569 Ion deposition apparatus |
| 04/08/2010 | US20100084568 Method and system for counting secondary particles |
| 04/08/2010 | US20100084566 Electron Column Using A Magnetic Lens Layer Having Permanent Magnets |
| 04/08/2010 | US20100084555 Preparation method for an electron tomography sample with embedded markers and a method for reconstructing a three-dimensional image |
| 04/08/2010 | US20100083982 Particle removal apparatus and method and plasma processing apparatus |
| 04/08/2010 | DE102008049655A1 Particle beam system e.g. transmission electron microscope, in semiconductor industry, has source and particle beam formation elements formed for producing electron beam and arranged together with gas supply system in inner chamber |
| 04/08/2010 | DE102008049654A1 Elektronenstrahlquelle und Verfahren zur Herstellung derselben Electron source and method of manufacturing the same |
| 04/08/2010 | DE102008009410B4 Elektronenstrahlvorrichtung und Verfahren zum Justieren eines Elektronenstrahls An electron beam apparatus and method for adjusting an electron beam |
| 04/08/2010 | DE102007062054B4 Röhre, insbesondere Elektronenröhre, mit Mitteln zur Messung der Elektrodentemperatur und Schutz hierfür Tube, in particular electron tube for this purpose with means for measuring the electrode temperature and protection |
| 04/08/2010 | DE102005017632B4 Verfahren zur Modifikation der Oberfläche einer Probe mittels eines gepulsten Ionenstrahls oder mittels eines ionenstrahlgenerierten Teilchenstrahls mit homogen oder gaußförmig verteilter Stromdichte A method of modifying the surface of a sample by means of a pulsed ion beam or ion beam generated by a particle beam with homogeneously distributed, or Gaussian current density |
| 04/07/2010 | EP2172960A2 Chromatic aberration corrector for charded particle beam system and correction method therefor |
| 04/07/2010 | CN1558424B Gold thin film substrate making method for scanning probe microscope |
| 04/07/2010 | CN101692417A Control method of platform |
| 04/07/2010 | CN101692369A Mass analyzing magnet for broadband ion beam and implanter system |
| 04/07/2010 | CN101140860B Apparatus for treating plasma |
| 04/06/2010 | US7692779 Apparatus and method for testing defects |
| 04/06/2010 | US7692167 High-fidelity reflection electron beam lithography |
| 04/06/2010 | US7692166 Charged particle beam exposure apparatus |
| 04/06/2010 | US7692165 Charged particle beam device with a gas field ion source and a gas supply system |
| 04/06/2010 | US7692164 Dose uniformity correction technique |
| 04/06/2010 | US7692163 Charged particle beam apparatus, defect correcting method, etching method, deposition method, and charge preventing method |
| 04/06/2010 | US7692144 Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus |
| 04/06/2010 | US7692139 Techniques for commensurate cusp-field for effective ion beam neutralization |
| 04/06/2010 | US7692131 Imaging system and methodology with projected pixels mapped to the diffraction limited spot |
| 04/06/2010 | US7691277 Quartz component for plasma processing apparatus and restoring method thereof |
| 04/06/2010 | US7691243 Internal antennae for plasma processing with metal plasma |
| 04/01/2010 | WO2010035621A1 Method for controlling charging of sample and scanning electron microscope |
| 04/01/2010 | WO2010035416A1 Charged particle beam device |
| 04/01/2010 | WO2010035386A1 Charged particle beam apparatus and geometric aberration measuring method employed therein |
| 04/01/2010 | WO2010034781A2 Radiation-cured coatings |
| 04/01/2010 | WO2010017065A3 Capacitance displacement and rotation sensor |
| 04/01/2010 | WO2010014850A3 Apparatus and method including a direct bombardment detector and a secondary detector for use in electron microscopy |
| 04/01/2010 | WO2010014252A3 Grid holder for stem analysis in a charged particle instrument |
| 04/01/2010 | WO2009003552A9 Treatment system for flat substrates |
| 04/01/2010 | US20100078554 Structure and Method for Determining a Defect in Integrated Circuit Manufacturing Process |
| 04/01/2010 | US20100078130 creping adhesive and modifier comprises polyethylene; for use on cylinder such as a Yankee dryer |
| 03/31/2010 | EP2169702A1 Abberation corrector and charged particle beam system equipped therewith |
| 03/31/2010 | EP2168691A1 Radiation cured coatings |
| 03/31/2010 | EP2168491A1 Breast holder with sample container for a breast examination device |
| 03/31/2010 | EP2168138A2 Magnetron co-sputtering device |
| 03/31/2010 | EP2168136A2 Ionic emission micronic source |
| 03/31/2010 | EP2167529A1 Protein layers and their use in electron microscopy |
| 03/31/2010 | EP2167270A1 Gas distributor comprising a plurality of diffusion-welded panes and a method for the production of such a gas distributor |
| 03/31/2010 | EP1614138B1 High frequency plasma jet source and method for irradiating a surface |
| 03/31/2010 | EP1410418B1 Method and apparatus for micro-jet enabled, low energy ion generation and transport in plasma processing |
| 03/31/2010 | CN101689488A Cathode having electron production and focusing grooves, ion source and related method |
| 03/31/2010 | CN101689469A Power source arrangement for multiple-target sputtering system |
| 03/31/2010 | CN101689468A Vacuum arc vaporization source, and an arc vaporization chamber with a vacuum arc vaporization source |
| 03/31/2010 | CN101689467A Charge transport materials for luminescent applications |
| 03/31/2010 | CN101689462A High voltage insulator for preventing instability in an ion implanter due to triple-junction breakdown |
| 03/31/2010 | CN101688295A Electrostatic chuck with separated electrodes |
| 03/31/2010 | CN101688291A Cooling shield for substrate processing chamber |
| 03/31/2010 | CN101685791A Substrate supporting device and method for discharging static electricity by using same |
| 03/31/2010 | CN101685772A Substrate processing apparatus and substrate processing method |
| 03/31/2010 | CN101685754A Method for correcting distortions in a particle-optical apparatus |
| 03/31/2010 | CN101685753A Ion source with gas buffer balancing function |
| 03/31/2010 | CN101685075A Variable rate scanning in an electron microscope |
| 03/30/2010 | US7687787 Profile adjustment in plasma ion implanter |
| 03/30/2010 | US7687786 Ion implanter for noncircular wafers |
| 03/30/2010 | US7687117 generally applicable to rectangular (or square) large area plasma processing equipment, which is used in but not limited to LCD, Plasma Display and Solar Cell production) or any other reactor using electromagnetic waves (RF, VHF) for processing |
| 03/30/2010 | US7687019 Refining apparatus for scrap silicon using an electron beam |
| 03/30/2010 | US7686926 A tantalum nitride/Ta barrier is first sputter deposited with high target power and wafer bias, argon etching is performed with even higher wafer bias. a flash step is applied with reduced target power and wafer bias; different magnetic field distributions |
| 03/30/2010 | US7686918 Magnetron plasma processing apparatus |
| 03/30/2010 | US7686917 Plasma processing system and apparatus and a sample processing method |
| 03/30/2010 | CA2483342C Coated articles having a protective coating and cathode targets for making the coated articles |
| 03/30/2010 | CA2386078C Uniform gas distribution in large area plasma source |
| 03/25/2010 | WO2010033199A1 Adjustable deflection optics for ion implantation |
| 03/25/2010 | WO2010032857A1 Pattern inspection device and method |
| 03/25/2010 | WO2010031421A1 Plasma power supply arrangement |
| 03/25/2010 | WO2010031307A1 A plasma treatment device |
| 03/25/2010 | WO2009148881A3 Electron detection systems and methods |
| 03/25/2010 | WO2009145556A3 Multipole lens for microcolumn |
| 03/25/2010 | US20100074807 Apparatus for generating a plasma |
| 03/25/2010 | US20100072402 Extraction electrode manipulator |
| 03/25/2010 | US20100072401 Hydrogen ion implanter using a broad beam source |
| 03/25/2010 | US20100072395 Vessel sterilization apparatus |
| 03/25/2010 | US20100072366 Method for correcting distortions in a particle-optical apparatus |
| 03/25/2010 | DE19646700B4 Vakuumbehandlungskammer, Vakuum-Zerstäubungsverfahren und Magnetronanordnung Vacuum processing chamber, vacuum magnetron sputtering and |
| 03/24/2010 | EP2166558A2 Electron microscope, pressure control method and recording medium |
| 03/24/2010 | EP2166557A1 Method for correcting distortions in a particle-optical apparatus |
| 03/24/2010 | EP2166556A1 Method for correcting distortions in a particle-optical apparatus |
| 03/24/2010 | EP2166345A1 Device and method for introducing gas for analysis device |
| 03/24/2010 | EP2166127A1 Electron beam vapor deposition apparatus and method |
| 03/24/2010 | CN201430158Y Solar cell glass substrate fixing device |
| 03/24/2010 | CN101682090A Circuit and method for reducing electrical energy stored in a lead inductance for fast extinction of plasma arcs |
| 03/24/2010 | CN101681820A Techniques for forming shallow junctions |
| 03/24/2010 | CN101681785A Apparatus and methods for improving treatment uniformity in a plasma process |
| 03/24/2010 | CN101681784A Method for forming a film with a graded bandgap by deposition of an amorphous material from a plasma |
| 03/24/2010 | CN101681783A Magnetic deflector for an electron column |
| 03/24/2010 | CN101681782A Techniques for improving the performance and extending the lifetime of an ion source with gas mixing |
| 03/24/2010 | CN101681781A Ion sources and methods of operating an electromagnet of an ion source |
| 03/24/2010 | CN101678497A Gas distributor comprising a plurality of diffusion-welded panes and a method for the production of such a gas distributor |
| 03/24/2010 | CN101677485A Plasma processing equipment, its radio frequency apparatus and radio frequency conveying method |
| 03/24/2010 | CN101677053A Electrostatic chuck and manufacturing method thereof |
| 03/24/2010 | CN100595885C Plasma processing apparatus |
| 03/24/2010 | CN100595883C Plasma processing device and medium window thereof |
| 03/24/2010 | CN100595872C Method for detecting plasma distribution density in responses chamber |
| 03/24/2010 | CN100595625C Modular manipulation system for manipulating a sample under study with a microscope |