| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 02/02/2011 | EP2280407A2 Sputtering apparatus including cathode with rotatable targets, and related methods |
| 02/02/2011 | EP2279518A2 Combinatorial plasma enhanced deposition techniques |
| 02/02/2011 | EP2279515A1 Projection lens arrangement |
| 02/02/2011 | EP1763592B1 Fastening unit for ignition units, and device for eliminating carbon |
| 02/02/2011 | EP1521297B1 Plasma processing equipment |
| 02/02/2011 | CN101964295A Impedance matching method and plasma processing equipment |
| 02/02/2011 | CN101964294A Particle beam microscopy system and method for operating the same |
| 02/02/2011 | CN101964293A Metallographical microstructural image processing method |
| 02/02/2011 | CN101964292A Graphene sheet-carbon nanotube film composite structure and preparation method thereof |
| 02/02/2011 | CN101964291A Micro grid of transmission electron microscope and preparation method thereof |
| 02/02/2011 | CN101964289A Method for manufacturing acceleration pole for transmission electron microscope and ceramic rings thereof |
| 02/02/2011 | CN101582367B Pulse type large beam spot electronic beam generating device |
| 02/02/2011 | CN101201595B Plasma reactor control by translating desired values of plasma parameters to values of n chamber parameters |
| 02/01/2011 | US7880403 Method of detecting an arc in a glow-discharge device and apparatus for controlling a high-frequency arc discharge |
| 02/01/2011 | US7880152 Device and method for producing resist profiled elements |
| 02/01/2011 | US7880144 Liquid medium for preventing charge-up in electron microscope and method of observing sample using the same |
| 02/01/2011 | US7880143 Electron beam apparatus |
| 02/01/2011 | US7880142 Extended electron tomography |
| 02/01/2011 | US7879186 Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor |
| 02/01/2011 | US7879185 Dual frequency RF match |
| 02/01/2011 | US7879182 Shower plate, plasma processing apparatus, and product manufacturing method |
| 02/01/2011 | US7879179 Processing apparatus with a chamber having therein a high-corrosion-resistant sprayed film |
| 02/01/2011 | US7879151 Mask etch processing apparatus |
| 02/01/2011 | US7878145 Monitoring plasma ion implantation systems for fault detection and process control |
| 01/27/2011 | WO2011011661A2 Method and apparatus for the monitoring of sample milling in a charged particle instrument |
| 01/27/2011 | WO2011011659A2 Variable-tilt tem specimen holder for charged-particle beam instruments |
| 01/27/2011 | WO2011011278A1 Emitter exit window |
| 01/27/2011 | WO2011011133A2 Cleaning device for transmission electron microscopes |
| 01/27/2011 | WO2011011049A2 Method and apparatus for inductive amplification of ion beam energy |
| 01/27/2011 | WO2011009209A1 Nanofluidic cell |
| 01/27/2011 | US20110019332 Methods And Apparatus For Generating Strongly-Ionized Plasmas With Ionizational Instabilities |
| 01/27/2011 | US20110019201 Determining endpoint in a substrate process |
| 01/27/2011 | US20110017927 Method and apparatus for the monitoring of sample milling in a charged particle instrument |
| 01/27/2011 | US20110017921 Carbon nanotube film composite structure, transmission electron microscope grid using the same, and method for making the same |
| 01/27/2011 | DE112009000322T5 Verfahren und Vorrichtung zum Anpassen der Plasmaprozessleistung Method and apparatus for adjusting the plasma process performance |
| 01/27/2011 | DE102009033546A1 Supply endblock to supply sputter cathode with coolant, comprises housing with connection opening, fastening area for introducing housing on first supporting surface and bearing opening, supporting component, shaft, and supporting unit |
| 01/27/2011 | DE102009032759A1 Vorrichtung zur Vermeidung von parasitären Schwingungen in Elektronenstrahlröhren Device for avoiding parasitic oscillations in electron tubes |
| 01/27/2011 | DE102009024826A1 Kompensation elektromagnetischer Störfelder Compensation of electromagnetic interference |
| 01/27/2011 | CA2768873A1 Nanofluidic cell |
| 01/26/2011 | EP2278608A2 Plasma apparatus, gas distribution assembly for a plasma apparatus and processes therewith |
| 01/26/2011 | EP2278607A2 Chraged particle beam device with an aperture unit and method for regulating a beam current in a charged particle beam device |
| 01/26/2011 | EP2278307A1 Method for inspecting a sample |
| 01/26/2011 | EP2278306A1 Method for inspecting a sample |
| 01/26/2011 | EP2278047A1 Plasma discharge treatment apparatus, and method of manufacturing gas barrier film |
| 01/26/2011 | EP2277188A1 Plasma generator and method for controlling a plasma generator |
| 01/26/2011 | EP2174339B1 Method for operating at least one inverter in a plasma power supply device, and a plasma power supply device |
| 01/26/2011 | EP1130948B1 Inner-electrode plasma processing apparatus and method of plasma processing |
| 01/26/2011 | CN1979751B Method for determining the aberration coefficients of the aberration function of a particle-optical lens |
| 01/26/2011 | CN1938835B Method and apparatus for forming oxynitride film and nitride film, oxynitride film, nitride film and base material |
| 01/26/2011 | CN101960554A Ion source |
| 01/26/2011 | CN101370957B Cathode evaporator |
| 01/26/2011 | CN101296554B Plasma processing device and electric pole plate thereof |
| 01/26/2011 | CN101243535B Optical emission interferometry for PECVD using a gas injection hole |
| 01/26/2011 | CN101227790B Plasma jet apparatus |
| 01/26/2011 | CN101064238B Plasma reactor apparatus with independent capacitive and toroidal plasma sources |
| 01/25/2011 | US7875860 Charged particle beam profile measurement |
| 01/25/2011 | US7875850 Standard component for calibration and electron-beam system using the same |
| 01/25/2011 | US7875849 Electron beam apparatus and electron beam inspection method |
| 01/20/2011 | WO2011009065A2 Charged-particle energy analyzer |
| 01/20/2011 | WO2011008413A1 Ion implantation apparatus and method |
| 01/20/2011 | WO2011008288A1 Adjustable louvered plasma electron flood enclosure |
| 01/20/2011 | WO2011007546A1 Ion-beam generating device, substrate processing device, and manufacturing method of electronic device |
| 01/20/2011 | WO2011007517A1 Specimen potential measuring method, and charged particle beam device |
| 01/20/2011 | WO2011007516A1 Scanning electron microscope device and pattern dimension measuring method using same |
| 01/20/2011 | WO2011007492A1 Charged particle beam microscope and measuring method using same |
| 01/20/2011 | WO2011006802A1 Target backing tube, cylindrical target, and cylindrical target assembly |
| 01/20/2011 | WO2011006801A1 Target backing tube, cylindrical target assembly and sputtering system |
| 01/20/2011 | WO2011006799A1 Sputtering system, rotatable cylindrical target assembly, backing tube, target element and cooling shield |
| 01/20/2011 | WO2011006588A1 Device for preventing parasitic oscillations in electron beam tubes |
| 01/20/2011 | WO2010132265A3 Gas delivery in an ion microscope system |
| 01/20/2011 | WO2010125347A3 Inelastic scanning confocal electron microscopy |
| 01/20/2011 | US20110013874 Method for Effective Refractive Index Trimming of Optical Waveguiding Structures and Optical Waveguiding Structures |
| 01/20/2011 | US20110012034 Manufacturing method of semiconductor device, method for controlling ion beam, and ion implantation apparatus |
| 01/20/2011 | US20110012033 Adjustable Louvered Plasma Electron Flood Enclosure |
| 01/20/2011 | US20110012018 Magnetic Lens, Method for Focusing Charged Particles and Charged Particle Energy Analyzer |
| 01/19/2011 | EP2276055A1 Target backing tube, cylindrical target, and cylindrical target assembly |
| 01/19/2011 | EP2276054A1 Sputtering system, rotatable cylindrical target assembly, backing tube, target element and cooling shield |
| 01/19/2011 | EP2276053A1 Target backing tube, cylindrical target assembly and sputtering system |
| 01/19/2011 | EP2276052A2 Methods of igniting and cooling for a plasma source |
| 01/19/2011 | EP2276051A2 Particle beam microscopy system and method for operating the same |
| 01/19/2011 | EP2275797A1 Method of depositing protective structures |
| 01/19/2011 | EP2275697A1 A magnetic bearing, a rotary stage, and a reflective electron beam lithography apparatus |
| 01/19/2011 | EP2274764A1 Plasma processing apparatus and method for the plasma processing of substrates |
| 01/19/2011 | EP2274763A1 Method for manufacturing workpieces with ion-etched surface |
| 01/19/2011 | EP1390558B1 Penning discharge plasma source |
| 01/19/2011 | CN201717235U Vibration reduction device |
| 01/19/2011 | CN1985345B Cylindrical target obtained by hot isostatic pressing |
| 01/19/2011 | CN1879189B Voltage non-uniformity compensation method for high frequency plasma reactor for the treatment of rectangular large area substrates |
| 01/19/2011 | CN1820346B Testing apparatus using charged particles and device manufacturing method using the testing apparatus |
| 01/19/2011 | CN1751376B Power supply control unit |
| 01/19/2011 | CN101952703A Ionization gauge having electron multiplier cold emmission source |
| 01/19/2011 | CN101431009B Shower plate and substrate processing apparatus |
| 01/19/2011 | CN101414536B 电子束曝光系统 Electron beam exposure system |
| 01/18/2011 | US7874016 Scanning probe microscope and scanning method |
| 01/18/2011 | US7872247 Ion beam guide tube |
| 01/18/2011 | US7872242 Charged particle extraction device and method of design there for |
| 01/18/2011 | US7872239 Electrostatic lens assembly |
| 01/18/2011 | US7872230 Micro-sample processing method, observation method and apparatus |
| 01/18/2011 | US7871679 not encumbered with noble gas inclusions and is a deposition product from a noble-gas-free getter metal alloy plasma; high take-up capacity for residual gases and permits a high number of pumping cycles before the volume is filled with reactive residual gases; alloy of titanium, zirconium and vanadium |
| 01/18/2011 | US7871490 Inductively coupled plasma generation system with a parallel antenna array having evenly distributed power input and ground nodes and improved field distribution |