Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
12/2010
12/08/2010CN101584017B Techniques for confining electrons in an ion implanter
12/08/2010CN101515538B Sealing structure for processing reaction chamber by semiconductor
12/08/2010CN101488468B Wafer retaining system and semiconductor processing apparatus applying the system
12/08/2010CN101393947B Process and device for coating silver on molybdenum foil used for solar cell paddle of aerospace aircraft
12/08/2010CN101326613B Middling pressure plasma system for removing surface layer without losing substrate
12/08/2010CN101308754B Kaufman ion source of novel magnetic circuit structure
12/08/2010CN101290873B Hollow anode plasma reactor and method
12/08/2010CN101151700B Method of measuring ion beam angle
12/08/2010CN101066000B Plasma nozzle array for providing uniform scalable microwave plasma generation
12/07/2010US7847273 Carbon nanotube electron gun
12/07/2010US7847272 Electron beam exposure mask, electron beam exposure method, and electron beam exposure system
12/07/2010US7847271 Ion implanting apparatus
12/07/2010US7847267 Scanning electron microscope having multiple detectors and a method for multiple detector based imaging
12/07/2010US7847250 Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor device
12/07/2010US7847209 Method of forming a metal oxide film and microwave power source device used for the above method
12/07/2010US7846293 Plasma processing apparatus and method
12/07/2010US7846291 Processing apparatus with a chamber having therein a high-corrosion-resistant sprayed film
12/02/2010WO2010137476A1 Liquid metal ion gun
12/02/2010WO2010137257A1 Charged particle beam device and sample observation method
12/02/2010WO2010136464A1 Plasma deposition source and method for depositing thin films
12/02/2010WO2010136319A1 Correlative optical and particle beam microscopy
12/02/2010WO2010135830A1 Mass selector
12/02/2010WO2010112827A3 Method and apparatus for producing three dimensional nano and micro scale structures
12/02/2010US20100305747 Method and apparatus for sample extraction and handling
12/02/2010US20100304046 Plasma generator, plasma control method and method of producing substrate
12/02/2010US20100302520 Cluster e-beam lithography system
12/02/2010US20100301236 Shorten Temperature Recovery Time of Low Temperature Ion Implantation
12/02/2010US20100301211 Dual beam system
12/02/2010DE102010018340A1 Radio frequency high voltage supply, for a multi-pole ion store in mass spectrometry, uses a variable gap in the transformer ferrite core for stepless high voltage frequency adjustment
12/01/2010EP2257136A1 Plasma generator
12/01/2010EP2256792A1 Plasma processing apparatus
12/01/2010EP2256782A1 Plasma deposition source and method for depositing thin films
12/01/2010EP2256781A1 Toroidal Plasma Chamber
12/01/2010EP2256780A2 Transmission electron microscope and method of displaying spectral image
12/01/2010EP2256779A2 Dual beam system
12/01/2010CN1795530B Plasma apparatus, gas distribution assembly for a plasma apparatus and processes therewith
12/01/2010CN101903971A Method for manufacturing large-area vacuum plasma treated substrates and vacuum plasma treatment apparatus
12/01/2010CN101903970A Double plasma ion source
12/01/2010CN101903969A Linear electron source, evaporator using linear electron source, and appliccations of electron sources
12/01/2010CN101903960A Insulated conducting device with multiple insulation segments
12/01/2010CN101901734A Multimode ion implantation machine system and implantation regulating method
12/01/2010CN101901733A Ion implanter and method for adjusting ion beam
12/01/2010CN101582366B Nonmagnetic bimetallic strip driver used in transmission electron microscope
12/01/2010CN101567304B Gas distributing device and semiconductor processing device applying same
12/01/2010CN101488390B Nested type magnet
12/01/2010CN101310360B Systems and methods that mitigate contamination and modify surface characteristics during ion implantation processes through the introduction of gases
12/01/2010CN101137764B Single, right-angled end-block
11/2010
11/30/2010US7844941 Charged particle beam exposure method and charged particle beam exposure device
11/30/2010US7842935 Raster frame beam system for electron beam lithography
11/30/2010US7842931 Extraction electrode manipulator
11/30/2010US7842930 Charged particle detector assembly, charged particle beam apparatus and method for generating an image
11/30/2010US7842920 Methods and systems of performing device failure analysis, electrical characterization and physical characterization
11/25/2010WO2010135444A2 Simultaneous sample modification and monitoring
11/25/2010WO2010135075A1 Scan method
11/25/2010WO2010134259A1 Electron gun
11/25/2010WO2010134026A2 Dual pass scanning
11/25/2010WO2010134017A1 Method of generating a two-level pattern for lithographic processing and pattern generator using the same
11/25/2010WO2010109297A3 Device for generating plasma and for directing an flow of electrons towards a target
11/25/2010US20100297836 Plasma doping apparatus and method, and method for manufacturing semiconductor device
11/25/2010US20100294932 Magnetic Domain Imaging System
11/25/2010US20100294929 Sample Electrification Measurement Method and Charged Particle Beam Apparatus
11/25/2010US20100294648 Magnetically Enhanced, Inductively Coupled Plasma Source for a Focused Ion Beam System
11/25/2010DE4345602B4 Verfahren zum Zünden und Betreiben einer Niederspannungs-Bogenentladung, Vakuumbehandlungsanlage und Kathodenkammer hierfür sowie Verwendung des Verfahrens Method for starting and operating a low-voltage arc discharge, vacuum treatment plant and cathode chamber for this and using the method
11/25/2010DE19628952C5 Vorrichtung zur Erzeugung von Plasma A device for generating plasma
11/24/2010EP2253008A1 Plasma system
11/24/2010EP2253007A1 Low stray field magnetic traps and x-ray detectors comprising them
11/24/2010EP2253006A1 An electron beam unit and method for adjusting electron beams generated by an electron beam unit
11/24/2010EP2253005A1 Large area, atmospheric pressure plasma for downstream processing
11/24/2010EP2252869A1 Ionization gauge with operational parameters and geometry designed for high pressure operation
11/24/2010CN201655739U Plasma processing equipment
11/24/2010CN1846292B Unipolar electrostatic quadrupole lens and switching methods for charged beam transport
11/24/2010CN101896636A Application of hipims to through silicon via metallization in three-dimensional wafer packaging
11/24/2010CN101896033A Plasma processing apparatus and electrode for same
11/24/2010CN101894720A Preparation method for micro-grids of transmission electron microscope (TEM)
11/24/2010CN101892463A Methods for stable and repeatable plasma ion implantation
11/24/2010CN101271859B Plasma processing apparatus and structure therein
11/23/2010US7838849 Ion implanters
11/23/2010US7838842 Dual mode ion source for ion implantation
11/23/2010US7838840 Charged particle beam apparatus
11/23/2010US7838839 Hybrid multibeam electronic emission device with controlled divergence
11/23/2010US7838832 Electron beam apparatus and inspection method using dual illumination beams with dynamically controllable offsets
11/23/2010US7838828 Semiconductor device inspection apparatus
11/23/2010US7838827 Monochromator and scanning electron microscope using the same
11/23/2010US7838430 Plasma control using dual cathode frequency mixing
11/23/2010US7838086 gas flows through gap adjacent to confinement ring to provide physical confinement of plasma
11/23/2010US7837828 Substrate supporting structure for semiconductor processing, and plasma processing device
11/23/2010CA2453523C Thin-channel electrospray emitter
11/18/2010WO2010132265A2 Gas delivery in a microscope system
11/18/2010WO2010132221A2 Gas field ion microscopes having multiple operation modes
11/18/2010WO2010132069A1 Particle beam isotope generator apparatus, system, and method
11/18/2010WO2010132068A1 Ecr particle beam source apparatus, system and method
11/18/2010WO2010130639A1 Microscopy of an object using a sequence of optical microscopy and particle beam microscopy
11/18/2010WO2010105585A8 Substrate processing system and substrate processing method
11/18/2010US20100290992 Nanoparticle nucleic acid binding compound conjugates forming i-motifs
11/18/2010US20100288939 Method of determining main deflection settling time for charged particle beam writing, method of writing with charged particle beam, and apparatus for writing with charged particle beam
11/18/2010US20100288938 Multi-beam deflector array means with bonded electrodes
11/18/2010US20100288925 High-density FIB-SEM tomography via real-time imaging
11/18/2010US20100288924 Composite focused ion beam device, process observation method using the same,and processing method
11/18/2010US20100288399 Device and method for remelting metallic surfaces
11/18/2010US20100288097 Blade member, and edge working apparatus for the blade member
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