| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 05/19/2010 | CN101207001B Exhaust device and reaction chamber containing the same |
| 05/19/2010 | CN101206999B Inner lining and reaction chamber containing the same |
| 05/19/2010 | CN101203933B Profile adjustment in plasma ion implanter |
| 05/19/2010 | CN101203932B Methods and apparatus for transient state interference recovery in stationary-beam ion implantation process |
| 05/19/2010 | CN101151702B Gas shower plate for plasma processing device |
| 05/19/2010 | CN101147227B Cathode and counter-cathode arrangement in an ion source |
| 05/19/2010 | CN101120427B Ion beam measurement apparatus and method |
| 05/18/2010 | US7718983 Sputtered contamination shielding for an ion source |
| 05/18/2010 | US7718980 Beam processing system and beam processing method |
| 05/18/2010 | US7718978 Ion source and method for operating same |
| 05/18/2010 | US7718961 Photoelectron microscope |
| 05/18/2010 | US7718042 Method for manufacturing sputter-coated substrates, magnetron source and sputtering chamber with such source |
| 05/14/2010 | WO2010053365A1 Simultaneous measurement of beams in lithography system |
| 05/14/2010 | WO2010052855A1 Pattern dimension measuring method and scanning electron microscope using same |
| 05/14/2010 | WO2010052854A1 Charged particle beam apparatus |
| 05/14/2010 | WO2010052840A1 Calibration standard member, method for manufacturing the member, and scanning electronic microscope using the member |
| 05/14/2010 | WO2010052435A1 Method and system for increasing the lifespan of a plasma |
| 05/14/2010 | WO2010052289A1 Methods and devices for high throughput crystal structure analysis by electron diffraction |
| 05/14/2010 | WO2010051982A1 Method and device for plasma treatment of a flat substrate |
| 05/14/2010 | WO2009155272A4 Cross-section systems and methods |
| 05/13/2010 | US20100117540 Method of detecting an arc in a glow-discharge device and apparatus for controlling a high-frequency arc discharge |
| 05/13/2010 | US20100116985 Laser atom probe methods |
| 05/13/2010 | US20100116983 Mass analysis magnet for a ribbon beam |
| 05/13/2010 | US20100116977 Measurement and endpointing of sample thickness |
| 05/13/2010 | US20100116790 Device and method for locally producing microwave plasma |
| 05/13/2010 | US20100116789 Substrate processing apparatus |
| 05/13/2010 | US20100116644 Device for carrying out a plasma-assisted process |
| 05/12/2010 | EP2183761A2 Pattern writing on a rotating substrate |
| 05/12/2010 | EP1619266B1 Method and apparatus for chemical plasma processing of plastic containers |
| 05/12/2010 | DE102008039664A1 Supply end block for supplying magnetrons to sputtering device, comprises pivoting bearing for mounting sputtering device, where electrical connections are provided for electrical voltage supply of sputtering device |
| 05/12/2010 | CN201465987U Plasma treatment device |
| 05/12/2010 | CN201465986U Block-shaped metal material scanning electron microscope sample stable |
| 05/12/2010 | CN1992169B Method for implanting a wafer with an ion beam |
| 05/12/2010 | CN1909193B Plasma etching apparatus |
| 05/12/2010 | CN1906729B Compact, distributed inductive element for large scale inductively-coupled plasma sources |
| 05/12/2010 | CN1896315B Ion beam etching method and ion beam etching apparatus |
| 05/12/2010 | CN1826679B RF current return path for a large area substrate plasma reactor |
| 05/12/2010 | CN1676662B Two dimensional magnetron scanning for planar sputtering |
| 05/12/2010 | CN1675406B Methods and apparatus for in situ substrate temperature monitoring by electromagnetic radiation emission |
| 05/12/2010 | CN1580751B Support and analyzing device including same |
| 05/12/2010 | CN101150909B Plasm restraint device |
| 05/12/2010 | CN101127293B Sample supporter for scanning electronic microscope |
| 05/12/2010 | CN101103432B Electron injection in ion implanter magnets |
| 05/12/2010 | CN101088137B Laser atom probes |
| 05/12/2010 | CN101073085B Methods for improving the stability of RF power delivery to a plasma load |
| 05/12/2010 | CN101017761B Metal gas mixing ion injector |
| 05/11/2010 | US7714309 Phantom for ion range detection |
| 05/11/2010 | US7714308 Variable shaped electron beam lithography system and method for manufacturing substrate |
| 05/11/2010 | US7714307 Method of designing a projection system, lithographic apparatus and device manufacturing method |
| 05/11/2010 | US7714299 Particle detector |
| 05/11/2010 | US7714298 Pattern definition device having distinct counter-electrode array plate |
| 05/11/2010 | US7714289 Charged particle beam apparatus |
| 05/11/2010 | US7714285 Spectrometer for surface analysis and method therefor |
| 05/11/2010 | US7713756 Apparatus and method for plasma etching |
| 05/11/2010 | US7713380 Method and apparatus for backside polymer reduction in dry-etch process |
| 05/11/2010 | US7713377 Apparatus and method for plasma treating a substrate |
| 05/11/2010 | US7712434 Apparatus including showerhead electrode and heater for plasma processing |
| 05/10/2010 | CA2669626A1 Apparatus and method for generating femtosecond electron beam |
| 05/06/2010 | WO2010051546A2 Measurement and endpointing of sample thickness |
| 05/06/2010 | WO2010051024A1 Facilitating adhesion between substrate and patterned layer |
| 05/06/2010 | WO2010050453A1 Ion implanting apparatus |
| 05/06/2010 | WO2010050452A1 Ion implanting apparatus |
| 05/06/2010 | WO2010050136A1 Method for observing sample and electronic microscope |
| 05/06/2010 | WO2010049640A1 Counting inclusions on alloys by image analysis |
| 05/06/2010 | WO2010049456A1 Device and method for producing and/or confining a plasma |
| 05/06/2010 | WO2010049158A2 Vhf assembly |
| 05/06/2010 | US20100108883 Characterization of nanoscale structures using an ultrafast electron microscope |
| 05/06/2010 | US20100107980 Method and apparatus for extracting ions from an ion source for use in ion implantation |
| 05/06/2010 | US20100107977 Film forming apparatus |
| 05/06/2010 | DE102007058443B4 Korrektor für axialen und außeraxialen Strahlengang und TEM damit Corrector for axial and off-axial beam path and thus TEM |
| 05/06/2010 | CA2741102A1 Counting inclusions on alloys by image analysis |
| 05/05/2010 | EP2182546A2 Scanning transmission electron microscope using gas amplification |
| 05/05/2010 | EP2182545A1 Charged-particle optical system with dual specimen loading options |
| 05/05/2010 | EP2182544A1 Charged-particle optical system with dual specimen loading options |
| 05/05/2010 | EP2182543A1 Method and device for improved alignment of a high brightness charged particle gun |
| 05/05/2010 | EP2182542A1 Dual mode gas field ion source |
| 05/05/2010 | EP2181755A2 Honeycomb structure and reactor using honeycomb structure |
| 05/05/2010 | CN1989588B Ion implanter power supply which is intended to limit the loading effect |
| 05/05/2010 | CN1829945B Modulator circuit |
| 05/05/2010 | CN1639638B Mask repair with electron beam-induced chemical etching |
| 05/05/2010 | CN1630030B Plasma processing device and semiconductor manufacturing device |
| 05/05/2010 | CN1604270B Particle removal apparatus and method and plasma processing apparatus |
| 05/05/2010 | CN101031989B Method for the production of magnetron-coated substrates and magnetron sputter source |
| 05/04/2010 | US7709820 Radiation window with coated silicon support structure |
| 05/04/2010 | US7709792 Three-dimensional imaging using electron beam activated chemical etch |
| 05/04/2010 | US7709062 Scanning ion beams; filling aperture; process control |
| 05/04/2010 | US7708860 Plasma processing apparatus |
| 04/29/2010 | WO2010047593A1 Apparatus and method for treating an object |
| 04/29/2010 | WO2010047378A1 Charged particle beam apparatus |
| 04/29/2010 | WO2010047060A1 Charged corpuscular beam apparatus |
| 04/29/2010 | WO2010046636A2 Vacuum processing apparatus |
| 04/29/2010 | WO2010046486A1 Rotatable sputter target backing cylinder, rotatable sputter target, method of producing a rotatable sputter target, and coating installation |
| 04/29/2010 | WO2010046485A1 Rotatable sputter target base, rotatable sputter target, coating installation, method of producing a rotatable sputter target, target base connection means, and method of connecting a rotatable target base device for sputtering installations to a target base support |
| 04/29/2010 | US20100102226 Patterning device holding apparatus and application thereof |
| 04/29/2010 | DE112008001790T5 Plasmareaktor Plasma reactor |
| 04/29/2010 | DE112008001482T5 Vorrichtung und Verfahren zur Verbesserung der Behandlungsgleichmäßigkeit in einem Plasmaprozess Apparatus and method for improving the uniformity of treatment in a plasma process |
| 04/29/2010 | DE102008052533A1 Ion beam source for use in ion beam grid system in e.g. lithography device for structuring target object, has accelerating grids for accelerating ion beam and arranged downstream of nozzle in beam direction |
| 04/29/2010 | CA2740450A1 Vacuum processing apparatus |
| 04/28/2010 | EP2180768A1 Apparatus and method for treating an object |
| 04/28/2010 | EP2180502A1 Rotatable sputter target backing cylinder, rotatable sputter target, method of producing a rotatable sputter target, and coating installation |