Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
10/2010
10/27/2010CN1716539B Doping device
10/27/2010CN101874283A Low impedance plasma
10/27/2010CN101872731A Lifting device and plasma processing equipment applying same
10/27/2010CN101179005B Exhaust air system, semi-conductor manufacturing installation for manufacturing thin film by the same and method thereof
10/27/2010CN101133473B Data processing method for scanning beam device
10/27/2010CN101023506B Electrostatic lens for ion beams
10/26/2010US7820988 Implant uniformity control
10/26/2010US7820986 Techniques for controlling a charged particle beam
10/26/2010US7820982 Grid for transmission electron microscopy tomography and method of fabricating the same
10/26/2010US7820981 Method and apparatus for extending equipment uptime in ion implantation
10/26/2010US7820007 Silicon electrode plate for plasma etching with superior durability
10/26/2010US7819082 Plasma processing apparatus
10/26/2010US7819081 Plasma film forming system
10/21/2010WO2010120238A1 Optical probing in electron microscopes
10/21/2010US20100268478 Sequencing Nucleic Acid Polymers with Electron Microscopy
10/21/2010US20100266100 Charged particle cancer therapy beam path control method and apparatus
10/21/2010US20100264335 Pattern writing on a rotating substrate
10/21/2010US20100264330 Charged particle beam application apparatus
10/21/2010US20100264309 Method for estimation of probe shape in charged particle beam instruments
10/21/2010US20100264303 Ion implanter for photovoltaic cell fabrication
10/21/2010US20100263796 Plasma Processing Apparatus
10/21/2010US20100263593 Substrate processing apparatus and reaction container
10/21/2010DE102010011155A1 Schreibverfahren mit geladenem Partikelstrahl, Verfahren zum Erfassen der Position einer Referenzmarkierung für ein Beschreiben mit geladenem Partikelstrahl, und eine Schreibvorrichtung mit geladenem Partikelstrahl The writing method with a charged particle beam method for detecting the position of a reference mark for describing a charged particle beam, and a writing device with a charged particle beam
10/21/2010DE102009017841A1 Sterilization device is provided with predetermined number of jet heads having vacuum housing, in which electron source is arranged
10/21/2010DE102009016861A1 Teilchenstrahlmikroskop Particle beam
10/20/2010EP2242092A1 Plasma processing method and plasma processing system
10/20/2010EP2242088A2 Arc electrodes for synthesis of carbon nanostructures
10/20/2010EP2242084A1 Manufacturing method of electron source
10/20/2010EP2241651A1 Plasma processing apparatus
10/20/2010EP2240957A2 Gas modulation to control edge exclusion in a bevel edge etching plasma chamber
10/20/2010EP2240811A2 Specimen mount for microscopy
10/20/2010CN1833296B Antenna for producing uniform process rates
10/20/2010CN101866810A Plasma processor responsive to multiple RF frequencies
10/20/2010CN101866809A Plasma processor responsive to multiple RF frequencies
10/20/2010CN101866808A Plasma processor responsive to multiple RF frequencies
10/20/2010CN101866807A Plasma processor responsive to multiple RF frequencies
10/20/2010CN101866806A Plasma processing device
10/20/2010CN101866805A Preparation method of TEM micro grid
10/20/2010CN101866804A TEM micro grid
10/20/2010CN101866803A TEM micro grid
10/20/2010CN101866802A Ion source loading and unloading device
10/20/2010CN101866801A Plasma arrestor insert
10/20/2010CN101477944B Plasma processing apparatus, electrode for plasma processing apparatus, and electrode manufacturing method
10/19/2010US7816866 Photocathode comprising a plurality of openings on an electron emission layer
10/19/2010US7816656 Method of implanting ion species into microstructure products by concurrently cleaning the implanter
10/19/2010US7816655 Reflective electron patterning device and method of using same
10/19/2010US7816648 Electron interferometer or electron microscope
10/19/2010US7816272 Process of cleaning a semiconductor manufacturing system and method of manufacturing a semiconductor device
10/19/2010US7815767 Plasma processing apparatus
10/14/2010WO2010117551A1 Method for modifying a material layer using gas cluster ion beam processing
10/14/2010WO2010116428A1 Specimen preparation device, and control method in specimen preparation device
10/14/2010WO2010115873A1 Detector, device, and method for the simultaneous, energy-dispersive recording of backscattered electrons and x-ray quanta
10/14/2010WO2010115816A1 Process chamber having modulated plasma supply
10/14/2010US20100258739 Charged particle beam apparatus
10/14/2010US20100258724 Tip-sharpened carbon nanotubes and electron source using thereof
10/14/2010US20100258723 Scanning Electron Microscope Having Time Constant Measurement Capability
10/14/2010US20100258721 Dark field detector for use in an electron microscope
10/14/2010US20100258719 Particle-beam microscope
10/14/2010US20100258530 Substrate processing apparatus and producing method of device
10/14/2010US20100258432 Sputtering apparatus, sputter deposition method, and analysis apparatus
10/14/2010DE112004002106B4 Fehlerkennungs- und Steuerungsverfahren für Ionenimplantationsprozesse, und System zum Ausführen davon Fehlerkennungs- and control method for ion implantation processes, and system for executing them
10/14/2010DE102009025422A1 Controlling a radio frequency-generator for magnetron in a vacuum coating system, comprises determining the characteristics of the radio frequency-generator that identifies arc-discharge, and scanning the occurrence of such characteristics
10/13/2010EP2239760A1 Device and method for plasma-supported surface modification of substrates in a vacuum
10/13/2010EP2239759A2 Substrate treatment apparatus, substrate treatment method, preliminary electrode structure, measuring electrode structure, and process electrode structure
10/13/2010EP2239758A2 Particle-beam microscope
10/13/2010EP2238606A2 Scanning charged particle beams
10/13/2010EP1614770B1 Microwave plasma processing method
10/13/2010EP1560943B1 High deposition rate sputtering
10/13/2010EP1129466B1 Device and method for generating a local plasma by micro-structure electrode discharges with microwaves
10/13/2010CN1922707B Modulating ion beam current
10/13/2010CN1425187B Method and apparatus for ionized physical vapor deposition
10/13/2010CN101414545B Faraday apparatus for angle measurement of parallel beam
10/13/2010CN101300373B Method for monitoring a plasma, device for carrying out this method, use of this method for depositing a film onto a PET hollow body
10/13/2010CN101167154B Ion source for use in an ion implanter
10/12/2010US7812325 Implanting with improved uniformity and angle control on tilted wafers
10/12/2010US7812310 Charged particle beam apparatus and specimen holder
10/12/2010US7811941 Device and method for etching a substrate using an inductively coupled plasma
10/12/2010US7811429 Target support assembly
10/12/2010US7811428 Method and apparatus for an improved optical window deposition shield in a plasma processing system
10/12/2010US7811421 increased sputtering yield increases the deposition rate; without an occurrence of arcing between the anode and the cathode assembly; increase density of ions in the strongly ionized plasma
10/12/2010US7811409 Bare aluminum baffles for resist stripping chambers
10/12/2010US7810449 Plasma processing system with locally-efficient inductive plasma coupling
10/07/2010WO2010114117A1 Method and device for creating composite image
10/07/2010WO2010112827A2 Method and apparatus for producing three dimensional nano and micro scale structures
10/07/2010US20100252734 Power supply for electron gun and electron microscope having the same
10/07/2010US20100252733 Method for maskless particle-beam exposure
10/07/2010US20100252068 Plasma Generation Method, Cleaning Method, and Substrate Processing Method
10/07/2010DE19822877B4 Elektrische Steckverbindung für Beschichtungsanlagen Electrical connector for coating systems
10/07/2010DE112006003022B4 Sputtergerät mit gekühlter Targetröhre Sputtering with cooled target tube
10/07/2010DE102009015737A1 Magnetron-Beschichtungsmodul sowie Magnetron-Beschichtungsverfahren Magnetron coating module and magnetron coating process
10/07/2010DE102009015075A1 Device for performing microscopy on biological sample, has double-cone-like device provided in inner cone formed at angle of more than ten degrees, where biological sample is dissolved into sample with specific size
10/06/2010EP2237306A1 Material characterization system using an electron beam
10/06/2010EP2236644A2 Sputtering target backing plate assembly and film deposition system
10/06/2010EP2236643A2 Electron beam vapor deposition apparatus and method of coating
10/06/2010EP2235735A1 Method and apparatus for plasma surface treatment of a moving substrate
10/06/2010EP1402316B1 Mask repair with electron beam-induced chemical etching
10/06/2010CN1977350B Laser atom probe methods
10/06/2010CN1886818B Method and device for ion beam processing of surfaces
10/06/2010CN1669121B Transfer mask for exposure and pattern exchanging method of the same
10/06/2010CN1515018B Plasma processor
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