Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
08/2010
08/11/2010EP1442471B1 System and method for fast focal length alterations
08/11/2010CN201549466U Thin film deposition device
08/11/2010CN1929070B Electron source and surface light source employing same
08/11/2010CN1751375B Adjustable implantation angle workpiece support structure for an ion beam implanter utilizing a linear scan motor
08/11/2010CN1666101B Charged particle beam apparatus and method for inspecting samples
08/11/2010CN101802965A a scanning electron microscope
08/11/2010CN101802964A Techniques for terminal insulation in an ion implanter
08/11/2010CN101802963A Terminal structures of an ion implanter having insulated conductors with dielectric fins
08/11/2010CN101802259A Device for very high frequency plasma assisted CVD under atmospheric pressure, and applications thereof
08/11/2010CN101801518A Methods and apparatus for the production of group IV nanoparticles in a flow-through plasma reactor
08/11/2010CN101800161A Plasma etching method and plasma etching apparatus
08/11/2010CN101800149A Plasma processing device
08/11/2010CN101800148A Tile type power electrode of large-area VHF-PECVD reaction chamber capable of obtaining uniform electric field
08/11/2010CN101800147A High-voltage coil fixing device of plasma etcher
08/11/2010CN101546702B Plasma processing device and insulation cover plate
08/11/2010CN101441970B Sample platform for observing silicon chip sample of scanning electron microscope
08/11/2010CN101393092B Method for making scanning electron microscope example for assembling nanometer line array in aluminum oxide template
08/11/2010CN101312143B Carrying bench and plasma treating device using the same
08/11/2010CN101290869B Plasma treatment apparatus
08/11/2010CN101241846B Techniques for improving etch rate uniformity
08/10/2010US7772576 Shielding assembly for semiconductor manufacturing apparatus and method of using the same
08/10/2010US7772575 Stencil design and method for cell projection particle beam lithography
08/10/2010US7772572 Apparatus for producing secondary electrons, a secondary electrode, and an acceleration electrode
08/10/2010US7772571 Implant beam utilization in an ion implanter
08/10/2010US7772568 Micro sample heating probe and method of producing the same, and analyzer using the micro sample heating probe
08/10/2010US7772553 Scanning electron microscope
08/10/2010US7771607 Plasma processing apparatus and plasma processing method
08/10/2010US7771574 Sputtering cathode for coating processes
08/10/2010US7771562 Etch system with integrated inductive coupling
08/10/2010US7771561 Apparatus and method for surface treatment to substrate
08/10/2010CA2585176C Ion source with substantially planar design
08/05/2010WO2010087149A1 Charged particle beam device
08/05/2010WO2010058930A3 Apparatus of electron cyclotron resonance ion source and manufacturing method thereof
08/05/2010WO2010051546A3 Measurement and endpointing of sample thickness
08/05/2010WO2010044641A9 Electron beam generator having adjustable beam width
08/05/2010WO2009154953A4 Sample inspection methods, systems and components
08/05/2010US20100197125 Technique for processing a substrate
08/05/2010US20100194237 Mems devices and systems actuated by an energy field
08/05/2010US20100193687 Field emission type electron gun comprising single fibrous carbon electron emitter and operating method for the same
08/05/2010US20100193686 Electron Beam Exposure Or System Inspection Or Measurement Apparatus And Its Method And Height Detection Apparatus
08/05/2010US20100193472 Multiple nozzle gas cluster ion beam processing system and method of operating
08/05/2010DE202007019099U1 Vorrichtung zur Plasmabehandlung An apparatus for plasma treatment
08/05/2010DE112008002223T5 Plasmabearbeitungsvorrichtung und Plasmaentladungszustand-Überwachungsvorrichtung The plasma processing apparatus and plasma discharge condition monitoring apparatus
08/04/2010EP2214199A1 A method of plasma etching and carriers for use in such methods
08/04/2010EP2214194A1 Method for producing a multi-beam deflector array device having electrodes
08/04/2010EP2213765A1 Stray coating prevention device, coating chamber device for coating substrates, and method of coating
08/04/2010EP2213763A2 Target/backing plate constructions, and methods of forming target/backing plate constructions
08/04/2010EP2212901A2 Equipment for producing semiconductors and corresponding pumping device and substrate holder
08/04/2010EP2212900A1 Method and device for producing a homogeneous discharge on non-insulating substrates
08/04/2010EP2057629B1 Drawing method and drawing device
08/04/2010EP1738393B1 Drive system for scanning a workpiece with an ion beam
08/04/2010EP1378000B1 Conductive collar surrounding semiconductor workpiece in plasma chamber
08/04/2010CN101796213A Sputtering system
08/04/2010CN101794694A Process for manufacturing novel TEM sample supporting film (silicon nitride window)
08/04/2010CN101006339B Integrated optic ionized sensor
08/03/2010US7767986 Method and apparatus for controlling beam current uniformity in an ion implanter
08/03/2010US7767977 Ion source
08/03/2010US7767962 Method for SEM measurement of features using magnetically filtered low loss electron microscopy
08/03/2010US7767053 Substrate processing apparatus and substrate processing method
08/03/2010US7767024 Method for front end of line fabrication
07/2010
07/29/2010WO2010085351A1 Ion beam angle calibration and emittance measurement system for ribbon beams
07/29/2010WO2010085349A1 Enhanced low energy ion beam transport in ion implantation
07/29/2010WO2010084860A1 Electron microscope
07/29/2010WO2010084020A1 Method and assembly for generating an electron beam
07/29/2010WO2010083915A1 Radiant tube and particle accelerator having a radiant tube
07/29/2010WO2010042916A3 High accuracy beam placement for local area navigation
07/29/2010WO2010042629A3 4d imaging in an ultrafast electron microscope
07/29/2010WO2010039339A4 Aligning charged particle beams
07/29/2010US20100190349 Method for backside polymer reduction in dry-etch process
07/29/2010US20100189402 Method for Effective Refractive Index Trimming of Optical Waveguiding Structures and Optical Waveguiding Structures
07/29/2010US20100187448 Arrangment and method for processing a substrate
07/29/2010US20100187447 Non-condensing thermos chuck
07/29/2010US20100187445 Ion bombardment method for reducing the porosity of metal deposits
07/29/2010US20100187433 Improved particle beam generator
07/29/2010US20100187416 Defect inspection and charged particle beam apparatus
07/29/2010DE10340751B4 Trockenätzvorrichtung, Trockenätzverfahren sowie dabei verwendete Platte Dry etching, dry etching, and thereby used plate
07/29/2010DE10141844B4 Hochfrequenz-Anpassungseinheit RF matching unit
07/28/2010EP2211369A1 Arrangement for working substrates by means of plasma
07/28/2010EP2211368A1 Particle-optical component
07/28/2010EP2211367A1 Particle beam device with reduced emission of undesired material
07/28/2010EP2211366A1 High resolution gas field ion column
07/28/2010EP2210626A1 Medical devices having drugs adhered to the surface thereof.
07/28/2010EP2210456A2 Method and generator circuit for production of plasmas by means of radio-frequency excitation
07/28/2010EP1949407B1 Method and apparatus of providing power to ignite and sustain a plasma in a reactive gas generator
07/28/2010EP1269529B1 Method for improving uniformity and reducing etch rate variation of etching polysilicon
07/28/2010CN201534875U 一种磁控溅射设备中的电池边沿保护装置 One kind of magnetron sputtering device battery edge protection device
07/28/2010CN1997773B Method for the plasma cleaning of the surface of a material coated with an organic substance and the installation for carrying out said method
07/28/2010CN1754409B Plasma processing system
07/28/2010CN101789354A Plasma treatment device with diffused dissociation
07/28/2010CN101788506A Real-time imaging device of transmission electron microscope
07/28/2010CN101787519A Process kit for substrate processing chamber
07/28/2010CN101499407B Gas dispensing device and semiconductor process plant employing the same
07/28/2010CN101410929B Ion implanter with variable scan frequency
07/28/2010CN101335192B Substrate processing apparatus and shower head
07/28/2010CN101236891B Plasma processing device
07/28/2010CN101170052B Apparatus for controlling plasma etching process
07/27/2010US7765607 Probes and methods of making probes using folding techniques
07/27/2010US7764824 Method for defect detection and process monitoring based on SEM images
07/27/2010US7763866 Charged particle beam device with aperture
07/27/2010US7763852 Scanning electron microscope having time constant measurement capability