Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
06/2010
06/17/2010DE102008058528A1 Endblock für eine Magnetronanordnung mit einem rotierenden Target End block for a magnetron with a rotating target
06/17/2010DE102008057342A1 Gas discharge chamber, has pole shoe lens completely arranged outside gas discharge region or deeply in neck of intermediate electrode such that magnetic field on rotational axis attains maximum value within narrow point of discharge region
06/17/2010DE102005004801B4 Massenspektrometer, Ionenquelle und Verfahren zur Ionisierung einer Probe Mass spectrometer ion source and method for ionizing a sample
06/16/2010EP2197019A2 X-ray detector for electron microscope
06/16/2010EP2197018A1 Method for determining distortions in a particle-optical apparatus
06/16/2010EP2197017A2 Method for determining distortions in a particle-optical apparatus
06/16/2010EP2197016A2 Electron beam apparatus and method of operating the same
06/16/2010EP2197015A1 Electron source and electron beam apparatus
06/16/2010EP2197014A2 System for exposure of a substrate with several individually shaped charged particle beams for high resolution lithography of structured patterns
06/16/2010EP2195828A2 Exhaust unit, exhaust method using the exhaust unit, and substrate processing apparatus including the exhaust unit
06/16/2010EP2195827A1 Showerhead, substrate processing apparatus including the showerhead, and plasma supplying method using the showerhead
06/16/2010EP2195826A2 Substrate processing apparatus
06/16/2010EP2195822A2 Ionisation detector for environmental scanning electron microscope
06/16/2010EP2195821A2 Device for deflecting or guiding in a particle beam
06/16/2010EP2195820A1 Deposition of active films
06/16/2010EP2195643A1 System for analysing a low pressure gas by optical emission spectroscopy
06/16/2010EP2195472A1 Device for very high frequency plasma assisted cvd under atmospheric pressure, and applications thereof
06/16/2010CN201508820U Electron bombardment ion source discharge chamber
06/16/2010CN1956138B Adjustable electrode assembly for use in processing substrates of differing widths in a plasma processing system
06/16/2010CN1947326B Reciprocating drive system for scanning a workpiece
06/16/2010CN1886819B RF metrology characterization for field installation and serviceability for the plasma processing system
06/16/2010CN1875452B Electron beam treatment apparatus
06/16/2010CN1858895B Non-uniform ion implantation apparatus and method thereof
06/16/2010CN1759465B Apparatus for generating a plurality of beamlets
06/16/2010CN1754978B Methods and apparatus for reducing arcing during plasma processing
06/16/2010CN1732558B Method and device for plasma-etching organic material film
06/16/2010CN1689132B Method and apparatus for producing uniform processing rates
06/16/2010CN101743620A Sealing between vacuum chambers
06/16/2010CN101743610A Treatment system for flat substrates
06/16/2010CN101740448A Plasma processing equipment and substrate support plate thereof
06/16/2010CN101740340A Reaction chamber and semiconductor processing device
06/16/2010CN101740336A Cavity window and plasma process cavity
06/16/2010CN101740335A manufacturing equipment and method for etching semiconductor structure
06/16/2010CN101740329A 等离子处理装置及处理方法 Plasma processing apparatus and processing method
06/16/2010CN101740303A plasma processing apparatus
06/16/2010CN101740302A Plasma etching apparatus and etching method
06/16/2010CN101740301A Ion implanter and ion implantation method
06/16/2010CN101740300A Electro static chuck assembly with structure for lengthening cover ring's life time and improving etching performance of plasma reactor
06/16/2010CN101740299A Cathode insulating block for realizing complete positioning of filament clip
06/16/2010CN101740298A Plasma processing apparatus and constituent part thereof
06/16/2010CN101740297A Ring-shaped member and method for manufacturing same
06/16/2010CN101738529A High-voltage power supply output sampling device and plasma device
06/16/2010CN101192499B Ion implantation apparatus
06/16/2010CN101165867B Monitoring substrate processing using reflected radiation
06/16/2010CN101145508B Plasma processing device and method
06/16/2010CN101144150B Two dimensional magnetron scanning for sputtering onto flat panels
06/16/2010CN101044586B An end-block for a rotatable target sputtering apparatus
06/16/2010CN101038859B Plasma processing apparatus and electrode used therein
06/15/2010US7738976 Monitoring method of processing state and processing unit
06/15/2010US7737412 Electron microscope phase enhancement
06/15/2010US7736473 Magnetron having continuously variable radial position
06/10/2010WO2010065942A1 Arc recovery with over-voltage protection for plasma-chamber power supplies
06/10/2010WO2010065806A1 Delivered energy compensation during plasma processing
06/10/2010WO2010064360A1 Charged particle beam device
06/10/2010WO2010064099A1 Collimator magnet for ion implantation system
06/10/2010WO2010063436A1 Apparatus for machining workpieces under a vacuum, with a housing base which is rotatable in relation to the housing
06/10/2010WO2010063418A1 Method and device for measuring the relative local position error of one of the sections of an object that is exposed section by section
06/10/2010WO2010039339A3 Aligning charged particle beams
06/10/2010WO2010037832A3 Electrostatic lens structure
06/10/2010WO2010008455A3 Low- inertia multi -axis multi -directional mechanically scanned ion implantation system
06/10/2010US20100143188 Uv sterilizer
06/10/2010US20100140508 Coated graphite liners
06/10/2010US20100140497 Membrane supports with reinforcement features
06/10/2010US20100140224 Plasma Processing Apparatus And Plasma Processing Method
06/10/2010US20100140223 Plasma Treatment System
06/10/2010US20100140085 Magnetron plasma processing apparatus
06/10/2010US20100139863 Voltage non-uniformity compensation method for high frequency plasma reactor for the treatment of rectangular large area substrates
06/10/2010DE112006003026B4 Sputtergerät mit Kühlvorrichtung Sputtering with cooler
06/10/2010DE102008032333A1 Miniaturisierter nicht-radioaktiver Elektronenemitter Miniaturized non-radioactive electron emitter
06/10/2010DE102005004804B4 Ionenquelle und Verfahren zur Ionisierung einer Probe Ion source and method for ionizing a sample
06/09/2010EP2194566A1 Method for juging arc of glow discharger and high-frequency arc discharge suppressor
06/09/2010EP2194565A1 Dark field detector for use in a charged-particle optical apparatus
06/09/2010EP2194159A1 PVD coating with switchable bias voltage
06/09/2010EP2193360A2 Method, device and system for measuring nanoscale deformations
06/09/2010EP2192993A2 Method and system for coating a surface of a medical device with a therapeutic agent and drug eluting medical devices made thereby
06/09/2010EP1620876B1 Rf pulsing of a narrow gap capacitively coupled reactor
06/09/2010CN201503847U Plasma processing device
06/09/2010CN201503846U Ion-source arc body and fixing device thereof
06/09/2010CN201503845U Internal component for plasma processing chamber and gas spray nozzle component
06/09/2010CN1855365B Subsurface imaging using an electron beam
06/09/2010CN1777972B Deflecting acceleration/deceleration gap
06/09/2010CN1628381B System and method for inspecting charged particle responsive resist
06/09/2010CN101730921A Substrate cleaning chamber and components
06/09/2010CN101730374A Plasma system
06/09/2010CN101728206A Vacuum processing chamber for very large area substrates
06/09/2010CN101728205A Target disc cooling device
06/09/2010CN101728204A Novel control mode for molecular pump power source of ion implanter
06/09/2010CN101728203A High energy ion implanter accelerator designing mode
06/09/2010CN101728202A Voltage-equalizing structure of 360kV high-frequency and high-voltage multiplier
06/09/2010CN101728201A Charged-particle optical system with dual loading options
06/09/2010CN101728200A Cold-cathode Penning ion source capable of extracting high beam current metal ions
06/09/2010CN101416269B Architecture for ribbon ion beam ion implanter system
06/09/2010CN101359580B Substrate processing apparatus having a sensing unit
06/09/2010CN101300658B Redundant anode sputtering method and system
06/09/2010CN101246809B Monitoring coupon and monitoring method for ion implantation technique
06/09/2010CN101131910B Multi-directional scanning of movable element and its ion beam monitoring device
06/09/2010CN101022075B Scanning electron microscope and apparatus for detecting defect
06/08/2010US7735147 Probe system comprising an electric-field-aligned probe tip and method for fabricating the same
06/08/2010US7732792 Pattern measurement apparatus
06/08/2010US7732787 Ion implantation ion source, system and method
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