Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
02/2011
02/24/2011DE102009028182B3 High frequency-photoelectron source has semiconducting cavity resonator system that has cathode, choke cell and gun cell
02/23/2011EP2287886A1 Plasma treatment system
02/23/2011EP2287885A2 Vacuum plasma processor including control in response to DC bias voltage
02/23/2011EP2287884A2 Gas flow sputter source
02/23/2011EP2287883A2 Apparatus and method for investigating or modifying a surface with a beam of charged particles
02/23/2011EP2287356A1 Sputter target, method and apparatus for manufacturing sputter targets
02/23/2011EP2286643A1 Device and method for high-performance pulsed gas flow sputtering
02/23/2011EP2286436A1 Method and apparatus for plasma surface treatment of moving substrate
02/23/2011EP2286275A1 Sensor head for an x-ray detector and x-ray detector containing said sensor head
02/23/2011EP2286001A1 Method of coating inner and outer surfaces of pipes for thermal solar and other applications
02/23/2011EP1612853B1 Cooling device for vacuum treatment device
02/23/2011EP0913074B1 Plasma etch reactor and method of etching a wafer
02/23/2011CN201751976U Processing device with plasma
02/23/2011CN1967224B Spectrometer for surface analysis and method therefor
02/23/2011CN101981651A XRF system having multiple excitation energy bands in highly aligned package
02/23/2011CN101981650A Electrostatic lens for charged particle radiation
02/23/2011CN101979706A Vaporizer
02/22/2011US7893411 Charged-particle beam writing apparatus and charged-particle beam writing method
02/22/2011US7892357 Gas distribution plate assembly for plasma reactors
02/17/2011WO2011019276A1 Method of manufacturing a micro unit and a micro unit for use in a microscope
02/17/2011WO2011018932A1 Charged particle beam device and image display method
02/17/2011US20110039403 Method for Implanting Ions In Semiconductor Device
02/17/2011US20110037000 Method And Apparatus for Uniformly Implanting A Wafer With An Ion Beam
02/17/2011DE202010015818U1 Vorrichtung zum Behandeln eines Substrats mittels eines Plasmas An apparatus for treating a substrate by means of a plasma
02/17/2011DE202010014805U1 Heissrandring mit geneigter oberer Oberfläche Hot edge ring with an inclined upper surface
02/16/2011EP2284864A1 Electron beam lithography system and method for electron beam lithography
02/16/2011EP2284524A2 Microcalorimetry for X-ray spectroscopy
02/16/2011EP2283511A1 A system for analysing plasma
02/16/2011EP2283510A1 Plasma treatment apparatus and method for plasma-assisted treatment of substrates
02/16/2011EP2283509A1 Control of particles on semiconductor wafers when implanting boron hydrides
02/16/2011EP1784932B1 Integrated ewp-stm spin resonance microscope
02/16/2011EP1235251B1 Electron beam apparatus
02/16/2011CN1777974B Critical dimension variation compensation across a wafer by means of local wafer temperature control
02/16/2011CN101978461A Method for controlling ion energy in radio frequency plasmas
02/16/2011CN101978241A Microstructure inspection method, microstructure inspection apparatus, and microstructure inspection program
02/16/2011CN101974735A Inductively coupled plasma processing apparatus
02/16/2011CN101410931B Coating apparatus
02/16/2011CN101390186B Aberration-correcting cathode lens microscopy instrument
02/15/2011US7888662 Ion source cleaning method and apparatus
02/15/2011US7888661 Methods for in situ surface treatment in an ion implantation system
02/15/2011US7888660 Controlling the characteristics of implanter ion-beams
02/15/2011US7888652 Ion implantation apparatus
02/15/2011US7888642 Electron beam apparatus and method of manufacturing semiconductor device using the apparatus
02/15/2011US7888641 Electron microscope with electron spectrometer
02/15/2011US7888640 Scanning electron microscope and method of imaging an object by using the scanning electron microscope
02/15/2011US7888639 Method and apparatus for processing a micro sample
02/15/2011US7887637 Method for cleaning treatment chamber in substrate treating apparatus and method for detecting endpoint of cleaning
02/10/2011WO2011017618A1 Cold implant for optimized silicide formation
02/10/2011WO2011017314A2 Closed drift ion source with symmetric magnetic field
02/10/2011WO2011016208A1 Scanning electron microscope and sample observation method
02/10/2011WO2011016182A1 Charged-particle microscope
02/10/2011US20110033788 Charged particle beam drawing apparatus and method
02/10/2011US20110031657 Electron Beam Irradiation of Bulk Material Solids
02/10/2011US20110031397 Method for stem sample inspection in a charged particle beam instrument
02/10/2011US20110031395 Transmission electron microscope and method for observing specimen image with the same
02/10/2011US20110031387 Charged particle beam writing apparatus and method thereof
02/10/2011US20110030898 Plasma Processing Apparatus and the Upper Electrode Unit
02/10/2011DE202010014528U1 Einrichtung zur visuellen Kontrolle der Positionsjustierung der Kathode einer elektronischen Kanone für ein Elektronenmikroskop (Rastermikroskop) Means for visually checking the position adjustment of the cathode of an electronic gun for an electron microscope (microscope)
02/10/2011DE19816914B4 Abtastmikroskop Scanning tunneling microscope
02/10/2011DE102008057342B4 Gasentladungskammer mit Glühkathode und Polschuhlinse Gas discharge chamber with hot cathode and Polschuhlinse
02/09/2011EP2282197A2 Particle beam systems and methods
02/09/2011EP2281296A2 Beamlet blanker arrangement
02/09/2011EP2178631B1 Methods and apparatus for the production of group iv nanoparticles in a flow-through plasma reactor
02/09/2011EP1790201B1 Plasma nozzle array for providing uniform scalable microwave plasma generation
02/09/2011EP1754243B1 Device and method for sputtering with the aid of a displaceable planar target
02/09/2011EP1287548B1 Plasma etching equipment
02/09/2011CN201741661U Ion implantation dosage detection controller of plasma immersion implanter
02/09/2011CN1969365B Charge neutralization device
02/09/2011CN1838386B Plasma processing device
02/09/2011CN1342340B Power supplies having protection circuit
02/09/2011CN101971714A Method and generator circuit for production of plasmas by means of radio-frequency excitation
02/09/2011CN101971289A A method of magnetron sputtering and a method for determining a power modulation compensation function for a power supply applied to a magnetron sputtering source
02/09/2011CN101971288A Plasma system
02/09/2011CN101971287A Electrode arrangement with movable shield
02/09/2011CN101971286A In-vacuum protective liners
02/09/2011CN101969016A Plasma processing apparatus and plasma processing method
02/09/2011CN101685753B Ion source with gas buffer balancing function
02/09/2011CN101488391B Composite magnet with edge field amendment
02/08/2011US7884336 Sponge sanitizing enclosure
02/08/2011US7884321 Method and system for non-destructive distribution profiling of an element in a film
02/08/2011US7884302 Plasma processing installation, influenced by a magnetic field, for processing a continuous material or a workpiece
02/08/2011US7883831 Method for translating a structured beam of energetic particles across a substrate in template mask lithography
02/08/2011US7883779 Vacuum apparatus including a particle monitoring unit, particle monitoring method and program, and window member for use in the particle monitoring
02/08/2011US7883633 Method for shaping a magnetic field in a magnetic field-enhanced plasma reactor
02/08/2011US7883630 FIB milling of copper over organic dielectrics
02/08/2011US7883602 Electrode assembly for the removal of surface oxides by electron attachment
02/08/2011US7882800 Ring mechanism, and plasma processing device using the ring mechanism
02/03/2011WO2011014779A1 A mask health monitor using a faraday probe
02/03/2011WO2011013650A1 Charged-particle-beam device
02/03/2011WO2011013342A1 Pattern evaluation method, device therefor, and electron beam device
02/03/2011WO2011013323A1 Scanning electron microscope
02/03/2011WO2011013311A1 Ion milling device
02/03/2011WO2011012255A1 Plasma stamp and method for plasma treating a surface
02/03/2011WO2011012185A1 Cleaning of a process chamber
02/03/2011WO2010144273A3 A masking apparatus for an ion implanter
02/03/2011US20110029117 Ion implanter, ion implantation method and program
02/03/2011US20110025340 Semiconductor device analyzer and semiconductor device analysis method
02/03/2011US20110024622 System and method for material analysys of a microscopic element
02/03/2011US20110024621 Scanning electron microscope control device, control method, and program
02/03/2011DE102009033319A1 Partikelstrahl-Mikroskopiesystem und Verfahren zum Betreiben desselben Of the same particle beam microscopy system and method for operating
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