| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 01/13/2011 | WO2011006109A2 High efficiency low energy microwave ion/electron source |
| 01/13/2011 | WO2011005582A1 Plasma grid implant system for use in solar cell fabrications |
| 01/13/2011 | WO2011005469A2 Charged particle detectors |
| 01/13/2011 | WO2011005277A1 Methods and apparatus for protecting plasma chamber surfaces |
| 01/13/2011 | WO2011004533A1 Charged particle beam device |
| 01/13/2011 | WO2010134026A3 Dual pass scanning |
| 01/13/2011 | WO2010126698A3 Modeling critical-dimension (cd) scanning-electron-microscopy (cd-sem) cd extraction |
| 01/13/2011 | WO2010108042A3 Non-coherent light microscopy |
| 01/13/2011 | US20110006209 Electron Beam Apparatus |
| 01/13/2011 | US20110006204 High density faraday cup array or other open trench structures and method of manufacture thereof |
| 01/13/2011 | DE112008003378T5 Schichtbildende Behandlungsschablone, Plasma-CVD-Vorrichtung, Metallplatte und Osmiumschicht-Bildungsverfahren Film-forming treatment jig, plasma CVD apparatus, metal plate and osmium-forming method |
| 01/13/2011 | DE10208043B4 Materialbearbeitungssystem und Materialbearbeitungsverfahren Material processing system and material handling processes |
| 01/12/2011 | EP2273529A2 Electrode device and apparatus for generating plasma |
| 01/12/2011 | EP2273528A1 Transmission electron microscope, and method of observing specimen |
| 01/12/2011 | EP2272080A2 Device and method for pretreating and coating bodies |
| 01/12/2011 | EP2044609B1 Ion deposition apparatus |
| 01/12/2011 | CN1652283B Field emitting electronic source device and its preparing process |
| 01/12/2011 | CN1537318B Sputtering magnetron arrangements with adjustable magnetic field strength |
| 01/12/2011 | CN101515545B Plasma processing apparatus and plasma processing method |
| 01/12/2011 | CN101441983B Plasma confinement apparatus and semiconductor processing equipment applying the same |
| 01/12/2011 | CN101359613B Tft array detection device |
| 01/12/2011 | CN101296553B Plasma processing apparatus |
| 01/12/2011 | CN101095209B Ion implantation machine and its magnet pole, analyzing magnet and method for charge neutralization |
| 01/11/2011 | US7870616 Probe arrangement |
| 01/11/2011 | US7869725 Method and device for measuring surface potential distribution, method and device for measuring insulation resistance, electrostatic latent image measurement device, and charging device |
| 01/11/2011 | US7868308 Electron beam writing method, fine pattern writing system, and manufacturing method of uneven pattern carrying substrate |
| 01/11/2011 | US7868307 Charged particle beam exposure system |
| 01/11/2011 | US7868306 Thermal modulation of implant process |
| 01/11/2011 | US7868305 Technique for ion beam angle spread control |
| 01/11/2011 | US7867356 Apparatus for reducing polymer deposition on a substrate and substrate support |
| 01/11/2011 | US7866188 PCVD apparatus with a choke defined within a microwave applicator |
| 01/06/2011 | WO2011002875A1 Improved gas-cluster-jet generator and gas-cluster ion-beam apparatus utilizing an improved gas-cluster-jet generator |
| 01/06/2011 | WO2011002688A1 System and method for selectively controlling ion composition of plasmas |
| 01/06/2011 | WO2011002513A1 Use of beam scanning to improve uniformity and productivity of a 2d mechanical scan implantation system |
| 01/06/2011 | WO2011001797A1 Gas field ionization ion source device and scanning charged particle microscope equipped with same |
| 01/06/2011 | WO2011001611A1 Charged particle gun and charged particle beam device |
| 01/06/2011 | WO2011001600A1 Ion microscope |
| 01/06/2011 | WO2011001586A1 Charged particle beam apparatus and method for stably obtaining charged particle beam image |
| 01/06/2011 | WO2010126958A4 Voltage contrast imaging |
| 01/06/2011 | US20110001060 Germicidal fixture and methods |
| 01/06/2011 | US20110001059 Use of Beam Scanning to Improve Uniformity and Productivity of a 2D Mechanical Scan Implantation System |
| 01/05/2011 | EP2270837A2 Improvement of Beam Quality in FIB Systems |
| 01/05/2011 | EP2270836A2 Particle-optical component |
| 01/05/2011 | EP2270835A2 Particle-optical component |
| 01/05/2011 | EP2270834A2 Particle-optical component |
| 01/05/2011 | EP2270833A2 Particle-optical component |
| 01/05/2011 | EP2270832A1 Spin polarized electron source |
| 01/05/2011 | EP1839324B1 Dual-mode electron beam column |
| 01/05/2011 | CN201698989U Cross section observation platform of scanning electron microscope |
| 01/05/2011 | CN1910726B Gas distribution plate assembly for plasma reactors |
| 01/05/2011 | CN101939813A Multiple grooved vacuum coupling |
| 01/05/2011 | CN101939812A Toroidal plasma chamber for high gas flow rate process |
| 01/05/2011 | CN101939029A Device and method for treating formed parts by means of high-energy electron beams |
| 01/05/2011 | CN101935827A Device and method for precipitating film layer of thin-film solar cell |
| 01/05/2011 | CN101584020B Method of forming a film by deposition from a plasma |
| 01/05/2011 | CN101051609B High voltage protective interlock for ion injector |
| 01/04/2011 | US7864829 Dropping model electrostatic levitation furnace |
| 01/04/2011 | US7863565 Electron beam inspection method and electron beam inspection apparatus |
| 01/04/2011 | US7863168 Plasma doping method and plasma doping apparatus |
| 01/04/2011 | US7862959 For character-projection (CP) type of electron-beam exposure where a mask defect can be corrected or a pattern changed without making a new mask as part of or all the cells can be exchanged at the mask portion as the mask is made up of blocks of cells in polygon shape |
| 01/04/2011 | US7862766 improved toughness, electroconductivity, thermoconductivity; filtration, vaporization |
| 01/04/2011 | US7861668 Batch-type remote plasma processing apparatus |
| 01/04/2011 | US7861667 Multi-part electrode for a semiconductor processing plasma reactor and method of replacing a portion of a multi-part electrode |
| 12/30/2010 | US20100329965 Diamond material |
| 12/30/2010 | US20100327191 Ion Implanter, Internal Structure of Ion Implanter and Method of Forming A Coating Layer in the Ion Implanter |
| 12/30/2010 | US20100327190 Ion implantation apparatus and a method |
| 12/30/2010 | US20100327189 Ion implantation apparatus and a method for fluid cooling |
| 12/30/2010 | US20100327181 Ion implantation apparatus |
| 12/30/2010 | US20100327178 Ion source assembly for ion implantation apparatus and a method of generating ions therein |
| 12/30/2010 | US20100327159 Ion Source Cleaning End Point Detection |
| 12/30/2010 | US20100327085 Gas injection system for plasma processing |
| 12/30/2010 | US20100326815 High Power Pulse Ionized Physical Vapor Deposition |
| 12/30/2010 | US20100326601 Plasma processing apparatus |
| 12/30/2010 | DE202007019184U1 Vorrichtung zur Behandlung oder Beschichtung von Oberflächen Apparatus for the treatment or coating of surfaces |
| 12/30/2010 | DE112008002044T5 Vorrichtung zur räumlichen Darstellung von Proben in Echtzeit Apparatus for spatial representation of samples in real time |
| 12/30/2010 | DE102010029858A1 Selbstjustierende schwebende Ionenoptik-Komponenten Self-adjusting floating ion optics components |
| 12/30/2010 | DE102010018415A1 Single wafer air-to-air microwave plasma treatment plant, where the wafer is transported in and out of an endless metal band in vacuum plant by a steady process, which is carried out by plasma heads standing in rows |
| 12/30/2010 | DE102007027097B4 Flüssigmetall-Ionenquelle zur Erzeugung von Lithium-Ionenstrahlen Liquid metal ion source for the generation of lithium-ion beams |
| 12/29/2010 | WO2010151810A1 Method for discrimination of backscattered from incoming electrons in imaging electron detectors with a thin electron-sensitive layer |
| 12/29/2010 | WO2010151523A1 Ion source cleaning end point detection |
| 12/29/2010 | WO2010148423A1 An imaging detector for a scanning charged particle microscope |
| 12/29/2010 | EP2267756A1 Vacuum plasma sources |
| 12/29/2010 | EP2267755A2 Particle-optical component |
| 12/29/2010 | EP2267754A2 Particle-optical component |
| 12/29/2010 | EP2267753A2 Particle-optical component |
| 12/29/2010 | EP2267752A2 Charged particle inspection method and charged particle system |
| 12/29/2010 | EP2267751A2 Particle-optical component |
| 12/29/2010 | EP2267747A1 Lithography system comprising dispenser cathode |
| 12/29/2010 | EP2266128A2 Low contamination, low energy beamline architecture for high current ion implantation |
| 12/29/2010 | EP2266127A1 Ion source with adjustable aperture |
| 12/29/2010 | EP1864312B1 Method of measuring beam angle |
| 12/29/2010 | EP1627414B1 Magnetron sputter cathode comprising a cooling plate |
| 12/29/2010 | EP1305816B1 Collection of secondary electrons through the objective lens of a scanning electron microscope |
| 12/29/2010 | CN201689860U Multi-unit cylindrical sample platform bracket |
| 12/29/2010 | CN1934913B Plasma generating equipment |
| 12/29/2010 | CN1871695B High aspect ratio etch using modulation of RF powers of various frequencies |
| 12/29/2010 | CN101933225A Radio frequency power delivery system |
| 12/29/2010 | CN101933116A A method for performing electron beam lithography |
| 12/29/2010 | CN101930892A Electrostatic chuck and plasma device |
| 12/29/2010 | CN101930891A Reaction chamber and lining device |