Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
10/2010
10/06/2010CN101855699A Method for depositing electrically insulating layers
10/06/2010CN101855698A Device for the plasma treatment of workpieces
10/06/2010CN101855534A Method and apparatus of automatic scanning probe imaging
10/06/2010CN101853770A Substrate processing apparatus and substrate processing method using same
10/06/2010CN101853769A Plasma treating apparatus and electrode member therefor and electrode member manufacturing and recycling method
10/06/2010CN101853768A Cylindrical plasma resonant cavity
10/06/2010CN101853767A Substrate processing apparatus
10/06/2010CN101853766A Plasma processing apparatus and plasma processing method
10/06/2010CN101853765A Plasma processing apparatus and plasma processing method
10/06/2010CN101853764A Plasma processing apparatus
10/06/2010CN101853763A Plasma processing apparatus and plasma processing method
10/06/2010CN101238539B Dose cup located near bend in final energy filter of serial implanter for closed loop dose control
10/06/2010CN101207003B Inner lining of wafer processing chamber and wafer processing chamber containing said inner lining
10/05/2010US7808651 Determining endpoint in a substrate process
10/05/2010US7808184 Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilities
10/05/2010US7807986 Ion implanter and method for adjusting ion beam
10/05/2010US7807984 Ion implanters
10/05/2010US7807983 Technique for reducing magnetic fields at an implant location
10/05/2010US7807965 Corrector for axial and off-axial beam paths
10/05/2010US7807961 Techniques for ion implantation of molecular ions
10/05/2010US7807030 Small scanned magentron
10/05/2010US7807019 Radial antenna and plasma processing apparatus comprising the same
10/05/2010US7806983 Substrate temperature control in an ALD reactor
10/05/2010US7806981 Method for the treatment of a web-type material in a plasma-assisted process
10/05/2010US7806078 Plasma treatment apparatus
10/05/2010CA2414253C Improved dielectric heating using inductive coupling
09/2010
09/30/2010WO2010109297A2 Device for generating plasma and for directing an flow of electrons towards a target
09/30/2010WO2010108852A1 Method and apparatus for generating three-dimensional image data
09/30/2010WO2010108847A1 Inductive plasma applicator
09/30/2010WO2010044641A3 Electron beam generator having adjustable beam width
09/30/2010US20100248166 Deflector Array, Exposure Apparatus, and Device Manufacturing Method
09/30/2010US20100243911 Charged particle irradiation system and irradiation planning equipment
09/30/2010US20100243889 Forming an image while milling a work piece
09/30/2010US20100243888 Apparatus and Method for Inspecting Samples
09/30/2010US20100243879 High mass resolution low aberration analyzer magnet for ribbon beams and the system for ribbon beam ion implanter
09/30/2010US20100243618 Temperature control method for heating apparatus
09/30/2010US20100243440 Mechanism for continuously varying radial position of a magnetron
09/30/2010US20100243431 Ion radiation damage prediction method, ion radiation damage simulator, ion radiation apparatus and ion radiation method
09/30/2010DE102009001910A1 Verfahren und Vorrichtung zur Erzeugung dreidimensionaler Bilddaten Method and apparatus for generating three-dimensional image data
09/29/2010EP2234140A2 Plasma processing apparatus
09/29/2010EP2233907A1 Forming an image while milling a work piece
09/29/2010EP2233906A1 Forming an image while milling a work piece
09/29/2010EP2233606A2 Plasma discharge apparatus
09/29/2010EP2232961A1 Interrupted particle source
09/29/2010EP2232521A1 Method for manufacturing large-area vacuum plasma treated substrates and vacuum plasma treatment apparatus
09/29/2010EP2232224A2 Ionization gauge having electron multiplier cold emmission source
09/29/2010EP1393601B1 Method for improving the effectiveness of medical devices by adhering drugs to the surface thereof
09/29/2010CN1985344B Apparatus for shielding a charged particle beam
09/29/2010CN1906751B System and method for stress free conductor removal
09/29/2010CN1813332B Sidewall magnet improving uniformity of inductively coupled plasma
09/29/2010CN1802722B Plasma ashing apparatus and endpoint detection process
09/29/2010CN101849275A Plasma electron flood for ion beam implanter
09/29/2010CN101847560A Plasma processing apparatus
09/29/2010CN101847559A Faraday device used for detecting implantation dose of plasma
09/29/2010CN101847558A Plasma processing device and plasma processing method
09/29/2010CN101844374A Forming an image while milling work piece
09/29/2010CN101461028B Scan pattern for an ion implanter
09/29/2010CN101441986B Surface treatment device and manufacture method of lower electrode assembly body of the device
09/29/2010CN101371327B Technique and device for improving uniformity of a ribbon beam
09/29/2010CN101315860B Dosage accuracy monitoring systems of implanters
09/29/2010CN101299416B Substrate support, substrate processing device and method of placing a substrate
09/29/2010CN101207061B Substrate mounting table and method for manufacturing same, substrate processing apparatus, and fluid supply mechanism
09/29/2010CN101192497B 离子源 Ion source
09/29/2010CN101192490B Surface conductive electronic emission element and electronic source applying same
09/29/2010CN101167153B Apparatus and methods for two-dimensional ion beam profiling
09/29/2010CN101114565B Analyzing electromagnet
09/29/2010CN101051596B Carbon nano tube field transmitting electronic source and its producing method
09/29/2010CN101013649B Particle-optical apparatus with a predetermined final vacuum pressure
09/28/2010US7805023 Image evaluation method and microscope
09/28/2010US7804076 Insulator for high current ion implanters
09/28/2010US7804073 Liquid metal ion gun
09/28/2010US7804068 Determining dopant information
09/28/2010US7804067 Method of observing and method of working diamond stylus for working of atomic force microscope
09/28/2010US7803255 arc discharge plasma source and generator for generate a magnetic field in a vapor deposition zone between an evaporator and a movable substrate, are aligned perpendicular to a movement direction of the substrate and parallel to a transport plane of the substrate; uniformity; simple and cost-effective
09/23/2010WO2010108042A2 Non-coherent light microscopy
09/23/2010WO2010107981A1 Method of high-energy particle imaging by computing a difference between sampled pixel voltages
09/23/2010WO2010106791A1 Polarized electron gun and method for generating polarized electron beam
09/23/2010WO2010106248A1 Electronic lithography method with cathodoluminescence imaging
09/23/2010WO2010106240A1 Method for determining the surface radius and/or particle density of a powder
09/23/2010WO2010105585A1 Substrate processing system and substrate processing method
09/23/2010US20100241386 Method of Correcting Coordinates, and Defect Review Apparatus
09/23/2010US20100239782 Insulating film forming method, insulating film forming apparatus, and plasma film forming apparatus
09/23/2010US20100239319 Method and device for measuring surface potential distribution, method and device for measuring insulation resistance, electrostatic latent image measurement device, and charging device
09/23/2010US20100237469 Photomask, semiconductor device, and charged beam writing apparatus
09/23/2010US20100237261 Charged particle beam writing apparatus
09/23/2010US20100237260 Ion implantation systems
09/23/2010US20100237256 Charged particle beam writing method, method for detecting position of reference mark for charged particle beam writing, and charged particle beam writing apparatus
09/23/2010US20100237253 Charged particle beam drawing method and apparatus
09/23/2010US20100237243 Testing apparatus using charged particles and device manufacturing method using the testing apparatus
09/23/2010US20100237241 Electrostatic Charge Measurement Method, Focus Adjustment Method, and Scanning Electron Microscope
09/23/2010US20100237232 Apparatus & method for ion beam implantation using scanning and spot beams with improved high dose beam quality
09/23/2010US20100237231 Apparatus and method for ion beam implantation using scanning and spot beams
09/23/2010DE19812558B4 Vorrichtung zur Erzeugung linear ausgedehnter ECR-Plasmen Apparatus for generating linear extended ECR plasmas
09/23/2010DE102009015178A1 Vorrichtung und Verfahren für die plasmagestützte Oberflächenmodifizierung von Substraten im Vakuum Device and method for the plasma-assisted surface modification of substrates in vacuum
09/23/2010DE102009011960A1 Verfahren zur Überwachung von Plasma-Entladungen A method for monitoring plasma discharges
09/23/2010DE102006035793B4 Elektronenstrahlanlage zur Materialbearbeitung und Stromaddieranordnung zur schnellen Ansteuerung einer Induktivität Electron beam facility for material processing and Stromaddieranordnung for rapid activation of an inductor
09/22/2010EP2230681A1 Drive system for scanning a workpiece with an ion beam
09/22/2010EP2229466A1 Plasma activated chemical vapour deposition method and apparatus therefor
09/22/2010CN201590396U Multifunctional compound type sample table support
09/22/2010CN201590395U Support for multi-unit nail-shaped sample table
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