| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 04/28/2010 | EP2180501A1 Rotatable sputter target base, rotatable sputter target, coating installation, method of producing a rotatable sputter target, target base connection means, and method of connecting a rotatable target base device for sputtering installations to a target base support |
| 04/28/2010 | EP2180500A1 Rotatable sputter target backing cylinder, rotatable sputter target, methods of producing and restoring a rotatable sputter target, and coating installation |
| 04/28/2010 | EP2180499A2 Method for substrate-protecting removal of hard coatings |
| 04/28/2010 | EP2179437A1 Transmission electron microscope |
| 04/28/2010 | EP2179327A1 Lithography system, method of clamping and wafer table |
| 04/28/2010 | EP2178631A1 Methods and apparatus for the production of group iv nanoparticles in a flow-through plasma reactor |
| 04/28/2010 | CN1871685B Plasma processing system with locally-efficient inductive plasma coupling |
| 04/28/2010 | CN1806063B Deflection magnetic field type vacuum arc vapor deposition device |
| 04/28/2010 | CN1667791B Ion implant dose control |
| 04/28/2010 | CN1479175B Method for etching surface material with induced chemical reaction by focused electron beam on surface |
| 04/28/2010 | CN1451181B Method and device for transferring spin-polarized charge carriers |
| 04/28/2010 | CN101699613A A method of cooling a wafer support at a uniform temperature in a plasma reactor |
| 04/27/2010 | USRE41266 Composite electrode for plasma processes |
| 04/27/2010 | US7705330 Electron beam irradiation device |
| 04/27/2010 | US7705329 Charged particle beam processing apparatus |
| 04/27/2010 | US7705328 Broad ribbon beam ion implanter architecture with high mass-energy capability |
| 04/27/2010 | US7705327 Beam shot position correction coefficient computation/updating technique for ultrafine pattern fabrication using variable shaped beam lithography |
| 04/27/2010 | US7705324 Sample holder |
| 04/27/2010 | US7705322 Charged-particle beam writing method |
| 04/27/2010 | US7705321 Charged particle beam writing apparatus and method |
| 04/27/2010 | US7705303 Defect inspection and charged particle beam apparatus |
| 04/27/2010 | US7705302 Scanning electron microscope |
| 04/27/2010 | US7705300 Charged particle beam adjusting method and charged particle beam apparatus |
| 04/27/2010 | US7705298 System and method to determine focus parameters during an electron beam inspection |
| 04/22/2010 | WO2010044669A1 A method and an apparatus for cleaning and/or sterilization of an object provided in a sealed enclosure |
| 04/22/2010 | WO2010044641A2 Electron beam generator having adjustable beam width |
| 04/22/2010 | WO2010043831A1 Low-power gaseous plasma source |
| 04/22/2010 | WO2010008924A3 Increasing current in charged particle sources and systems |
| 04/22/2010 | US20100096568 Substrate processing apparatus and cleaning method of the same |
| 04/22/2010 | US20100095891 Method and apparatus for cleaning a cvd chamber |
| 04/22/2010 | DE112007003536T5 Ladungsteilchenstrahl-Untersuchungsgerät und einen Ladungsteilchenstrahl verwendendes Untersuchungsverfahren A charged particle inspection apparatus and a charged-use test methods |
| 04/22/2010 | DE112007000045T5 Elektronenkanone, Elektronenstrahl-Bestrahlungsgerät und Bestrahlungsverfahren Electron gun, electron beam irradiation device and irradiation method |
| 04/21/2010 | EP2178106A2 Apparatus for generating remote plasma |
| 04/21/2010 | EP2177234A1 A method and an apparatus for cleaning and/or sterilization of an object provided in an enclosure |
| 04/21/2010 | EP2176877A2 Device for providing a high energy x-ray beam |
| 04/21/2010 | EP0902960B1 Universal vacuum chamber including equipment modules such as a plasma generating source, vacuum pumping arrangement and/or cantilevered substrate support |
| 04/21/2010 | CN1484712B Boron nitride/yttria composite components of semiconductor processing equipment and method of manufacturing thereof |
| 04/21/2010 | CN101308773B System for manufacturing flat display |
| 04/21/2010 | CN101179000B Plasma source and uses thereof |
| 04/21/2010 | CN101026080B Particle-optical apparatus equipped with a gas ion source |
| 04/20/2010 | US7703147 Method for fabricating SPM and CD-SPM nanoneedle probe using ion beam and SPM and CD-SPM nanoneedle probe thereby |
| 04/20/2010 | US7701230 Method and system for ion beam profiling |
| 04/20/2010 | US7700931 Ion beam processing apparatus |
| 04/20/2010 | US7700927 Heating stage for a micro-sample |
| 04/20/2010 | US7700925 Techniques for providing a multimode ion source |
| 04/20/2010 | US7700918 Sample electrification measurement method and charged particle beam apparatus |
| 04/20/2010 | US7700917 Specimen holder with integral ion beam screen and in situ adjustment |
| 04/20/2010 | US7700465 Plasma immersion ion implantation process using a plasma source having low dissociation and low minimum plasma voltage |
| 04/20/2010 | US7700367 ion beams simultaneously sputter etch; scanning ion microscope analysis; semiconductors |
| 04/20/2010 | US7700039 coaxial waveguides; for medical equipment and foods within plastic package |
| 04/20/2010 | CA2405387C High-precision method and apparatus for evaluating creep damage |
| 04/15/2010 | WO2010042916A2 High accuracy beam placement for local area navigation |
| 04/15/2010 | WO2010042629A2 4d imaging in an ultrafast electron microscope |
| 04/15/2010 | WO2010041663A1 Stage drive device |
| 04/15/2010 | WO2010041596A1 Pattern-searching condition determining method, and pattern-searching condition setting device |
| 04/15/2010 | WO2010041392A1 Scanning charged particle microscope |
| 04/15/2010 | WO2010040805A1 Ion beam extraction by discrete ion focusing |
| 04/15/2010 | US20100093022 Methods and apparatus for providing and processing sliced thin tissue |
| 04/15/2010 | US20100090131 Method of determining angle misalignment in beam line ion implanters |
| 04/15/2010 | US20100090109 Scanning electron microscope |
| 04/15/2010 | DE102008041815A1 Verfahren zur Analyse einer Probe A method for analyzing a sample |
| 04/15/2010 | DE102006020290B4 Plasmaquelle Plasma source |
| 04/14/2010 | EP2175473A1 Charged particle detection apparatus and detection method |
| 04/14/2010 | EP2175472A1 Electron source |
| 04/14/2010 | EP2175047A1 Apparatus for plasma treating substrates and method |
| 04/14/2010 | EP2175044A1 PVD coating method, device for carrying out the procedure and substances coated with the procedure |
| 04/14/2010 | EP2174707A1 Electrode for plasma generation |
| 04/14/2010 | EP2174339A1 Method for operating at least one inverter in a plasma power supply device, and a plasma power supply device |
| 04/14/2010 | EP2174338A1 Method for operation of a plasma supply device and a plasma supply device |
| 04/14/2010 | EP2174337A1 Plasma supply device |
| 04/14/2010 | EP1966815B1 Particle-optical component |
| 04/14/2010 | CN1698177B Method for toolmatching and troubleshooting a plasma processing system |
| 04/14/2010 | CN1670920B Vacuum processing apparatus |
| 04/14/2010 | CN101694829A Sensor of electromechanical performance and microscopic structure for transmission electronic microscope and manufacturing method thereof |
| 04/14/2010 | CN101693512A Compound cantilever beam needle point used for micro-nano microtechnique and manufacturing method thereof |
| 04/13/2010 | USRE41214 Bi mode ion implantation with non-parallel ion beams |
| 04/13/2010 | US7696497 Focusing system and method for a charged particle imaging system |
| 04/13/2010 | US7696496 Apparatus for ion beam fabrication |
| 04/13/2010 | US7696495 Method and device for adjusting a beam property in a gas cluster ion beam system |
| 04/13/2010 | US7696494 Beam angle adjustment in ion implanters |
| 04/13/2010 | US7696489 Emitter for an ion source and method of producing same |
| 04/13/2010 | US7695987 Method for automatic determination of semiconductor plasma chamber matching and source of fault by comprehensive plasma monitoring |
| 04/13/2010 | US7695763 Method for cleaning process chamber of substrate processing apparatus, substrate processing apparatus, and method for processing substrate |
| 04/13/2010 | US7695599 Discharging power source, sputtering power source, and sputtering device |
| 04/13/2010 | US7695590 Chemical vapor deposition plasma reactor having plural ion shower grids |
| 04/13/2010 | US7694651 High velocity method for deposing diamond films from a gaseous phase in SHF discharge plasma and device for carrying out said method |
| 04/08/2010 | WO2010039339A2 Aligning charged particle beams |
| 04/08/2010 | WO2010038859A1 Pattern matching method and image processing device |
| 04/08/2010 | WO2010038534A1 Electron microscope |
| 04/08/2010 | WO2010038369A1 Diagnosis device of recipe used for scanning electron microscope |
| 04/08/2010 | WO2010038368A1 Method for measuring sample and measurement device |
| 04/08/2010 | WO2010037832A2 Electrostatic lens structure |
| 04/08/2010 | WO2010037716A1 Radiofrequency plasma reactor and method for manufacturing vacuum process treated substrates |
| 04/08/2010 | WO2010037288A1 Magnetic path mechanism, magnetron sputtering cathode comprising the mechanism, and manufacturing method of the same |
| 04/08/2010 | WO2009151533A3 Electron beam emitter with slotted gun |
| 04/08/2010 | US20100088042 Apparatus And Method For Testing Defects |
| 04/08/2010 | US20100084584 Ion implanting apparatus |
| 04/08/2010 | US20100084583 Reduced implant voltage during ion implantation |
| 04/08/2010 | US20100084582 Method and apparatus for controlling beam current uniformity in an ion implanter |
| 04/08/2010 | US20100084581 Implant uniformity control |