Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
12/2010
12/29/2010CN101930890A Electrode component for plasma treatment, internal components for plasma treatment and manufacturing and separating method thereof
12/29/2010CN101930889A Gas input device and plasma processing equipment
12/29/2010CN101506885B Drawing method, drawing apparatus, and information recording medium
12/29/2010CN101471395B Reaction chamber structure of solar battery edge-engraving machine
12/29/2010CN101276748B Plasma doping apparatus
12/28/2010US7858937 Mass spectrometer
12/23/2010WO2010147997A2 Workpiece handling system
12/23/2010WO2010147641A1 Uv sterilization system
12/23/2010WO2010147104A1 Charged-particle microscope device, and method of controlling charged-particle beams
12/23/2010WO2010146833A1 Charged particle radiation device
12/23/2010WO2010146790A1 Charged particle radiation device
12/23/2010WO2010146044A1 Low-interference sensor head for a radiation detector, as well as a radiation detector which contains this low-interference sensor head
12/23/2010US20100323507 Substrate processing apparatus and producing method of device
12/23/2010US20100320396 Sample holder for electron microscope
12/23/2010US20100320385 Scanning electron microscope
12/23/2010US20100320382 High throughput sem tool
12/23/2010US20100319813 Bare aluminum baffles for resist stripping chambers
12/22/2010EP2264739A2 Drive system for ion scanning a workpiece
12/22/2010EP2264738A1 Electron gun used in a particle beam device
12/22/2010EP2263248A1 Gas field ion source with coated tip
12/22/2010EP1741124B1 Segmented baffle plate assembly for a plasma processing system
12/22/2010EP1642313B1 Detector system for a scanning electron microscope and scanning electron microscope with a corresponding detector system
12/22/2010EP1200988B1 Method for milling a target area in a charged particle beam system
12/22/2010CN201681788U Reaction chamber part and plasma processing device employing same
12/22/2010CN1743859B Detection and suppression circuit and method of electrical arcing
12/22/2010CN1715862B Apparatus for evacuating a sample
12/22/2010CN101925982A Improved high tilt implant angle performance using in-axis tilt
12/22/2010CN101925975A Apparatus, carrier and method for plasma treatment of molds
12/22/2010CN101924006A Shield usable in a sputtering plasma reactor
12/22/2010CN101924005A Homogeneous beam spot method for electron beam surface treatment
12/22/2010CN101924004A Electrode connection structure and plasma device
12/22/2010CN101924003A Electrode structure and plasma device
12/22/2010CN101924002A Heating device and plasma treatment equipment using same
12/22/2010CN101461032B A vacuum treatment apparatus, a bias power supply and a method of operating a vacuum treatment apparatus
12/22/2010CN101404242B Method and apparatus for cleaning a substrate
12/22/2010CN101379584B Particle-optical component
12/22/2010CN101019203B Charged particle beam exposure system
12/22/2010CN101019201B Charged particle gun
12/21/2010US7855373 Charged particle gun
12/21/2010US7855363 Inspection method and apparatus using an electron beam
12/21/2010US7854213 Modulated gap segmented antenna for inductively-coupled plasma processing system
12/16/2010WO2010144273A2 A masking apparatus for an ion implanter
12/16/2010WO2010143479A1 Ion beam irradiation apparatus and method for suppressing ion beam spread
12/16/2010WO2010122450A3 A magnetic bearing, a rotary stage, and a reflective electron beam lithography apparatus
12/16/2010US20100317140 Techniques for forming thin films by implantation with reduced channeling
12/16/2010US20100316815 Plasma cvd method
12/16/2010US20100314542 Semiconductor device inspection apparatus
12/16/2010DE102010023288A1 Verfahren zur Herstellung von Verbundkörpern unter Anwendung einer Diffusionsverbindung A process for the production of composite bodies using a diffusion bonding
12/16/2010DE102008062888B4 Teilchenoptische Vorrichtung mit Magnetanordnung Particle-optical apparatus with magnetic arrangement
12/15/2010EP2261948A2 Plasma discharge film-forming apparatus and method
12/15/2010EP2261947A1 Diffraction image capturing method and charged particle beam device
12/15/2010EP2261393A2 Plasma uniformity control by gas diffuser hole design
12/15/2010EP2261387A1 Electron beam vapor deposition apparatus for depositing multi-layer coating
12/15/2010EP2260500A1 Method of fabricating microchannel plate devices with multiple emissive layers
12/15/2010EP2260499A1 Projection lens arrangement
12/15/2010EP2260286A1 Specimen holder used for mounting samples in electron microscopes
12/15/2010CN1914351B Selectable dual position magnetron
12/15/2010CN1822305B Scanning electron microscope
12/15/2010CN101919022A Deposition of active films
12/15/2010CN101917165A Electron beam system, image generator, and amplifier of high-speed driving inductor
12/15/2010CN101916740A In-situ dry clean chamber for front end of line fabrication
12/15/2010CN101916715A In-situ dry clean chamber for front end of line fabrication
12/15/2010CN101916706A Sample platform of scanning electronic microscope and scanning electronic microscope
12/15/2010CN101248505B Apparatus and method for controlled particle beam manufacturing
12/14/2010US7851773 Ion beam apparatus and method employing magnetic scanning
12/14/2010US7851772 Ion implantation apparatus and ion implantation method
12/14/2010US7851755 Apparatus for detecting backscattered electrons in a beam apparatus
12/14/2010US7850819 Plasma reactor with high productivity
12/14/2010US7850174 Plasma processing apparatus and focus ring
12/14/2010US7849815 Plasma processing apparatus
12/14/2010US7849814 Plasma generating device
12/09/2010WO2010140649A1 Charged particle beam device and evaluation method using the charged particle beam device
12/09/2010WO2010139788A1 Plasma generation device with electron cyclotron resonance
12/09/2010US20100310180 Pattern Inspection Method and Pattern Inspection System
12/09/2010US20100308237 Optical element processing method
12/09/2010US20100308236 Masking apparatus for an ion implanter
12/09/2010US20100308215 System and Method for Ion Implantation with Improved Productivity and Uniformity
12/09/2010US20100307687 Internal member of a plasma processing vessel
12/09/2010DE102009022912A1 Korrelative optische und Teilchenstrahl-Mikroskopie Correlative optical and particle-beam microscopy
12/08/2010EP2259663A2 Plasma generator, plasma control method and method of producing substrate
12/08/2010EP2257964A1 Reactive sputtering with hipims
12/08/2010EP2257963A2 Specimen holder assembly
12/08/2010EP2257962A2 Microchannel plate devices with multiple emissive layers
12/08/2010EP2257853A2 Method for processing an object with miniaturized structures
12/08/2010EP1949406B1 Plasma etching method and etching chamber
12/08/2010EP1797746B1 Microwave plasma apparatus with vorticular gas flow
12/08/2010EP1695370B1 Apparatus and method for plasma processing
12/08/2010EP1557885B1 Image pickup device
12/08/2010CN1961401B Reciprocating drive for scanning a workpiece through an ion beam
12/08/2010CN1894763B Method and apparatus for prolonging normal operation time of equipment in ion implantation process
12/08/2010CN1879188B Method and apparatus for rapid sample preparation in a focused ion beam microscope
12/08/2010CN101911245A Ion source gas reactor
12/08/2010CN101908496A Substrate transmitting device and semiconductor processing equipment
12/08/2010CN101908473A Method of manufacturing CMOS devices by the implantation of N- and P-type cluster ions and negative ions
12/08/2010CN101908461A Ion beam surface treatment equipment and method for suppressing secondary electron emission
12/08/2010CN101908460A Plasma processing apparatus and plasma processing method
12/08/2010CN101908459A Loading stage mechanism and plasma processing apparatus using the same
12/08/2010CN101908458A Rectangular etching ion gun
12/08/2010CN101609771B Method for preparing transmission electron microscope micro-grids
12/08/2010CN101584018B Ion implantation device with a dual pumping mode and method thereof
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