Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
07/2010
07/07/2010CN101770922A Capacitance coupling type radiofrequency plasma source
07/06/2010US7752001 Method of correcting coordinates, and defect review apparatus
07/06/2010US7750324 Charged particle beam lithography apparatus and charged particle beam lithography method
07/06/2010US7750323 Ion implanter and method for implanting a wafer
07/06/2010US7750322 Ion implanter for photovoltaic cell fabrication
07/06/2010US7750321 Positioning device for positioning an aperture plate in an ion beam
07/06/2010US7750318 Working method by focused ion beam and focused ion beam working apparatus
07/06/2010US7750313 Ion source
07/06/2010US7750297 Carbon nanotube collimator fabrication and application
07/06/2010US7750295 Extractor for an microcolumn, an alignment method for an extractor aperture to an electron emitter, and a measuring method and an alignment method using thereof
07/06/2010US7749353 High aspect ratio etch using modulation of RF powers of various frequencies
07/06/2010US7748344 Segmented resonant antenna for radio frequency inductively coupled plasmas
07/01/2010WO2010073478A1 Charged particle radiation device and image capturing condition determining method using charged particle radiation device
07/01/2010WO2010073360A1 Pattern measuring apparatus and pattern measuring method
07/01/2010WO2010073207A1 Rf sputtering arrangement
07/01/2010WO2010072875A1 Sample holder for x-ray microanalysis using scanning electron microscopy
07/01/2010WO2010072850A1 Arc evaporator amd method for operating the evaporator
07/01/2010WO2010049158A3 Vhf assembly
07/01/2010US20100163756 Single event upset (SEU) testing system and method
07/01/2010US20100163725 Charged particle analyser and method
07/01/2010US20100163405 Method and device for producing three-dimensional objects
07/01/2010DE112008002249T5 Plasmabearbeitungsvorrichtung The plasma processing apparatus
07/01/2010DE10000365B4 Spannungskontrastverfahren zum Nachweis von Defekten in einem strukturiertem Substrat Voltage contrast method for detecting defects in a textured substrate
06/2010
06/30/2010EP2202776A1 Measuring method and device for a plasma supply device
06/30/2010EP2202775A2 Silicon drift X-ray detector
06/30/2010EP2201593A2 Method of treating a surface of at least one part by means of individual sources of an electron cyclotron resonance plasma
06/30/2010EP2201148A2 Application of hipims to through silicon via metallization in three-dimensional wafer packaging
06/30/2010EP1236275B1 Variable load switchable impedance matching system
06/30/2010CN201518309U Plasma discharge and atomizing grafting device
06/30/2010CN201517132U PECVD trolly recognizing system
06/30/2010CN101764056A Novel plasma shower set
06/30/2010CN101764044A Method for pretreating technical cavity of plasma device
06/30/2010CN101764042A Air sucking device and semiconductor processing device
06/30/2010CN101764040A Control method for plasma etching
06/30/2010CN101764033A Novel reduced-vacuum implantation dose compensation method for ion implantation apparatus
06/30/2010CN101764032A Numerical control scanning waveform generator
06/30/2010CN101764031A Novel magnetic quadrupole lens pipeline
06/30/2010CN101764030A System and method for controlling ion implantation dosage
06/30/2010CN101764029A Method and device for accurately detecting and correcting parallelism of ion beam
06/30/2010CN101764028A Wafer implanting transition clamp for implanter
06/30/2010CN101762751A GLITCH detection circuit
06/29/2010US7745804 Ion implantation method and application thereof
06/29/2010US7745803 Ion doping apparatus, ion doping method, semiconductor device and method of fabricating semiconductor device
06/29/2010US7745802 Specimen holder, specimen inspection apparatus, specimen inspection method, and method of fabricating specimen holder
06/29/2010US7745787 Electron beam device
06/29/2010US7745786 Method and apparatus allowing simultaneous direct observation and electronic capture of scintillation images in an electron microscope
06/29/2010US7745784 Electron beam apparatus and method of manufacturing semiconductor device using the apparatus
06/29/2010US7745782 Electrostatic charge measurement method, focus adjustment method, and scanning electron microscope
06/29/2010US7745073 Method for manufacturing a semiconductor device, stencil mask and method for manufacturing a the same
06/29/2010US7744735 Ionized PVD with sequential deposition and etching
06/29/2010US7744721 Plasma processing apparatus
06/24/2010WO2010070837A1 Electron beam device and electron beam application device using the same
06/24/2010WO2010070815A1 Scanning electron microscope
06/24/2010WO2010069594A1 Process and apparatus for coating articles by means of a low-pressure plasma
06/24/2010WO2010049866A3 Apparatus for generating an electron beam
06/24/2010WO2010008924A4 Increasing current in charged particle sources and systems
06/24/2010US20100155624 Focused ion beam apparatus, sample processing method using the same, and computer program for focused ion beam processing
06/24/2010US20100155623 Ion implantation with diminished scanning field effects
06/24/2010US20100155620 Tem grids for determination of structure-property relationships in nanotechnology
06/24/2010US20100155597 Particle optical device with magnet assembly
06/24/2010US20100155223 Electromagnet array in a sputter reactor
06/24/2010US20100154707 Process chamber cleaning method in substrate processing apparatus, substrate processing apparatus, and substrate processing method
06/24/2010DE102008062450A1 Anordnung zur Beleuchtung eines Substrats mit mehreren individuell geformten Partikelstrahlen zur hochauflösenden Lithographie von Strukturmustern Arrangement for illuminating a substrate having a plurality of individually shaped particle beams for high-resolution lithography of structural patterns
06/23/2010EP2198447A2 Device for the plasma treatment of workpieces
06/23/2010EP1497849B1 Method of manufacturing a silicon electrode for plasma reaction chambers
06/23/2010EP0839383B1 Tapered structure suitable for microthermocouples microelectrodes, field emission tips and micromagnetic sensors with force sensing capabilities
06/23/2010CN201514924U Plasma confinement device and plasma treatment device utilizing the same
06/23/2010CN101755322A Plasma reactor
06/23/2010CN101754568A Plasma treatment device and radio frequency device thereof
06/23/2010CN101754567A Matching device and plasma equipment
06/23/2010CN101754566A Impedance matching box, impedance matching method and plasma processing system
06/23/2010CN101754565A Electrode component and plasma treatment equipment using electrode component
06/23/2010CN101754564A Plasma processing device
06/23/2010CN101754563A Shell and injection-type plasma system thereof
06/23/2010CN101752214A Semiconductor processing cavity part and production method thereof, as well as semiconductor processing equipment
06/23/2010CN101752173A Vacuum processing apparatus, vacuum processing system and processing method
06/23/2010CN101752172A Plasma process apparatus
06/23/2010CN101752171A Cathode discharge device
06/23/2010CN101752170A Discharging electrode of combined type discharging plasma reactor and method for regulating structure thereof
06/23/2010CN101750874A Extreme ultraviolet photomask and methods and apparatuses for manufacturing the extreme ultraviolet photomask
06/23/2010CN101748393A Heating control method of production line equipment and device
06/23/2010CN101308771B Gas flow diffuser
06/23/2010CN101174534B Ion implanter
06/23/2010CN101128908B Stage mechanism
06/23/2010CN101114564B Transfer mechanism for transferring a specimen
06/23/2010CN101080801B Scan beam irradiation device
06/22/2010US7741621 Apparatus and method for focused electric field enhanced plasma-based ion implantation
06/22/2010US7741601 Testing apparatus using charged particles and device manufacturing method using the testing apparatus
06/22/2010US7740991 Beam dose computing method and writing method and record carrier body and writing apparatus for determining an optimal dose of a charged particle beam
06/22/2010US7740739 Plasma processing apparatus and method
06/22/2010US7740738 Inductively coupled antenna and plasma processing apparatus using the same
06/22/2010US7740280 Substrate labeling system
06/17/2010WO2010067512A1 Transmission electron microscope having electron spectrometer
06/17/2010WO2010066667A1 Disinfecting device for body areas
06/17/2010WO2010039300A3 Microchannel plate devices with tunable resistive films
06/17/2010WO2010036429A3 Microchannel plate devices with tunable resistive films
06/17/2010WO2010025317A3 Single-channel optical processing system for energetic-beam microscopes
06/17/2010US20100151687 Apparatus including showerhead electrode and heater for plasma processing
06/17/2010US20100148089 Ion implantation ion source, system and method
06/17/2010DE112006003027B4 Sputter-Target mit Vorrichtung zum Kühlen des Targets Sputtering target with a device for cooling the target
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