| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 03/24/2011 | US20110067814 Multi-part electrode for a semiconductor processing plasma reactor and method of replacing a portion of a multi-part electrode |
| 03/24/2011 | DE102009041826A1 System zum Schweißen von Metallen System for welding metals |
| 03/24/2011 | DE102009041383A1 Method for connecting open hollow bodies such as tubes through electron beam welding for the production of towers or pipings, comprises forming an airtight chamber through mounting sealing element and through hollow body walls |
| 03/23/2011 | EP2299789A1 Plasma generating apparatus and plasma processing apparatus |
| 03/23/2011 | EP2299468A1 Methods and systems for using phase plates |
| 03/23/2011 | EP2298958A1 Plasma discharge treatment apparatus, and method of manufacturing gas barrier film |
| 03/23/2011 | EP2297768A1 Arrangement for coating tape-shaped film substrates |
| 03/23/2011 | EP2297767A1 Apparatus and method for wafer level arc detection |
| 03/23/2011 | EP2297766A1 Writing strategy |
| 03/23/2011 | EP2297763A2 Charged particle detection system and method |
| 03/23/2011 | EP1941528B1 Particle-optical arrangement with particle-optical component |
| 03/23/2011 | EP1890319B1 METHOD FOR FLATTENING a SOLID SURFACE |
| 03/23/2011 | CN1782690B Method and apparatus for sample formation and microanalysis in a vacuum chamber |
| 03/23/2011 | CN1661363B Electro-probe micro analyzer |
| 03/23/2011 | CN101990630A Ionization gauge with operational parameters and geometry designed for high pressure operation |
| 03/23/2011 | CN101989525A Plasma processing cavity and switchable matching network with switchable offset frequency |
| 03/23/2011 | CN101989524A Impedance matcher and plasma processing equipment |
| 03/23/2011 | CN101988197A Deep silicon etching method, plasma processing method and system |
| 03/23/2011 | CN101643895B Plasma reaction chamber pretreatment method |
| 03/23/2011 | CN101604609B Vacuum isolating valve |
| 03/23/2011 | CN101587820B Plasma etching method and device for improving depth difference of grooves |
| 03/23/2011 | CN101416270B Ion implanter |
| 03/23/2011 | CN101248507B Selection of wavelength for end point in a time division multiplexed process |
| 03/22/2011 | US7911120 Source for providing an electron beam of settable power |
| 03/22/2011 | US7910895 Luminous body, electron beam detector using the same, scanning electron microscope, and mass analysis device |
| 03/22/2011 | US7910887 Electron-beam device and detector system |
| 03/22/2011 | US7910886 Sample dimension measuring method and scanning electron microscope |
| 03/22/2011 | US7910885 System and method for determining a cross sectional feature of a structural element using a reference structural element |
| 03/22/2011 | US7910884 Apparatus and method for inspection and measurement |
| 03/22/2011 | US7910013 Method of controlling a chamber based upon predetermined concurrent behavior of selected plasma parameters as a function of source power, bias power and chamber pressure |
| 03/17/2011 | WO2011030508A1 Signal processing method for charged particle beam device, and signal processing device |
| 03/17/2011 | WO2010080069A3 Shielding and protecting elements for plasma doping and their maintainance |
| 03/17/2011 | US20110065267 Plasma Doping Method and Plasma Doping Apparatus |
| 03/17/2011 | US20110061814 Microwave introducing mechanism, microwave plasma source and microwave plasma processing apparatus |
| 03/17/2011 | DE202010014257U1 Am Rand festgeklemmte und mechanisch befestigte innere Elektrode einer Gasverteilungselektrodenanordnung Clamped at the edges and mechanically fastened inner electrode of a gas distribution electrode assembly |
| 03/16/2011 | EP2296166A2 Plasma apparatus comprising a heat sink |
| 03/16/2011 | EP2296027A1 Optical microscope |
| 03/16/2011 | EP2294599A1 Plasma stamp, plasma treatment device, method for plasma treatment and method for producing a plasma stamp |
| 03/16/2011 | EP2294598A1 Plasma process and reactor for treating metallic pieces |
| 03/16/2011 | EP1358623B1 Method and apparatus for inspecting a substrate |
| 03/16/2011 | CN101985747A Substrate processing apparatus |
| 03/16/2011 | CN101321427B DC magnetic filtering cathode vacuum arc plasma source |
| 03/15/2011 | US7906762 Compact scanning electron microscope |
| 03/15/2011 | US7906760 Inspection method and reagent solution |
| 03/15/2011 | US7906033 Plasma etching method and apparatus |
| 03/15/2011 | US7905995 Alternating current rotatable sputter cathode |
| 03/15/2011 | US7905982 Antenna for plasma processor apparatus |
| 03/10/2011 | WO2011028857A2 High-probability heralded single-photon source and related method |
| 03/10/2011 | WO2011026607A2 Particle beam processing device such as an electron beam processing device |
| 03/10/2011 | WO2011005469A3 Charged particle detectors |
| 03/10/2011 | DE102009039621A1 Particle beam processing device comprises a vacuum chamber that has a chamber wall with a first opening that is formed in the chamber wall, and a cover that is adapted to cover the opening and to rotate a rotation axis |
| 03/10/2011 | DE102006043895B4 Elektronenmikroskop zum Inspizieren und Bearbeiten eines Objekts mit miniaturisierten Strukturen Electron microscope for inspecting and editing of an object with miniaturized structures |
| 03/09/2011 | EP2293320A2 Sputtering targets and methods for depositing a film containing tin and niobium |
| 03/09/2011 | EP2293319A1 Transmission electron microscope apparatus comprising electron spectroscope, sample holder, sample stage, and method for acquiring spectral image |
| 03/09/2011 | EP2293316A1 Dispenser cathode |
| 03/09/2011 | EP2050120B1 Ecr plasma source |
| 03/09/2011 | EP1033068B2 Plasma processing apparatus having rotating magnets |
| 03/09/2011 | CN201758113U Film deposition device |
| 03/09/2011 | CN101587156B Plasma monitoring method and apparatus |
| 03/08/2011 | US7902527 Apparatus and methods for ion beam implantation using ribbon and spot beams |
| 03/08/2011 | US7902521 Method for focusing electron beam in electron column |
| 03/08/2011 | US7902505 Charged particle beam apparatus |
| 03/08/2011 | US7902504 Charged particle beam reflector device and electron microscope |
| 03/08/2011 | US7901952 Plasma reactor control by translating desired values of M plasma parameters to values of N chamber parameters |
| 03/08/2011 | US7900580 Substrate processing apparatus and reaction container |
| 03/03/2011 | WO2011025998A2 Pattern modification schemes for improved fib patterning |
| 03/03/2011 | WO2011025795A1 Method and system for manufacturing a surface using charged particle beam lithography with variable beam blur |
| 03/03/2011 | WO2011025648A1 Ion plasma electron emitters for a melting furnace |
| 03/03/2011 | WO2011024174A1 Penetrating plasma generating apparatus for high vacuum chambers |
| 03/03/2011 | US20110053093 Method and system for manufacturing a surface using charged particle beam lithography with variable beam blur |
| 03/03/2011 | US20110049362 Pattern measuring apparatus and pattern measuring method |
| 03/03/2011 | US20110048643 Plasma processing apparatus and focus ring |
| 03/03/2011 | DE102009036701A1 Teilchenstrahlsystem und Untersuchungsverfahren hierzu Particle beam and investigation methods for this purpose |
| 03/03/2011 | DE102009028600A1 Method for adjusting position of bearing element, involves measuring orientation of translation axis relative to target translation axis, where orientation of another translation axis relative to another target translation axis is measured |
| 03/03/2011 | DE102009028013A1 Teilchenstrahlgerät mit einer Blendeneinheit und Verfahren zur Einstellung eines Strahlstroms in einem Teilchenstrahlgerät Particle beam with a diaphragm unit and method for adjusting a beam current in a particle beam |
| 03/03/2011 | DE102008058528B4 Endblock für eine Magnetronanordnung mit einem rotierenden Target End block for a magnetron with a rotating target |
| 03/03/2011 | CA2772178A1 Penetrating plasma generating apparatus for high vacuum chambers |
| 03/03/2011 | CA2769285A1 Ion plasma electron emitters for a melting furnace |
| 03/02/2011 | EP2290701A1 Apparatus for manufacturing thin film solar cell |
| 03/02/2011 | EP2289089A2 Cross-section systems and methods |
| 03/02/2011 | EP2289088A2 Low- inertia multi -axis multi -directional mechanically scanned ion implantation system |
| 03/02/2011 | EP2288906A2 Isotope ion microscope methods and systems |
| 03/02/2011 | EP2288905A2 Electron detection systems and methods |
| 03/02/2011 | EP2288904A2 Sample inspection methods, systems and components |
| 03/02/2011 | EP1702344B1 Stabilizing plasma and generator interactions |
| 03/02/2011 | CN101983413A Ion implanter, ion implantation method and program |
| 03/02/2011 | CN101982868A 电极结构 Electrode structure |
| 03/01/2011 | US7898238 Generating an output DC voltage with a boost converter having a controlled pulse-duty factor |
| 03/01/2011 | US7898160 Method and apparatus for modifying object with electrons generated from cold cathode electron emitter |
| 03/01/2011 | US7897945 Hydrogen ion implanter using a broad beam source |
| 03/01/2011 | US7897944 Method and apparatus for measurement of beam angle in ion implantation |
| 03/01/2011 | US7897943 Controlling the characteristics of implanter ion-beams |
| 03/01/2011 | US7897025 Method and apparatus for forming thin film |
| 02/24/2011 | WO2011022703A1 Method and system for manufacturing a surface using character projection lithography with variable magnification |
| 02/24/2011 | WO2011021957A1 Producing a three-dimensional image using a scanning electron microscope |
| 02/24/2011 | WO2010132221A3 Gas field ion microscopes having multiple operation modes |
| 02/24/2011 | US20110042579 Charged particle lithography apparatus and method of generating vacuum in a vacuum chamber |
| 02/24/2011 | US20110042578 Ion beam monitoring arrangement |
| 02/24/2011 | DE112009000768T5 Elektrostatische Linse für geladene Teilchenstrahlung Electrostatic lens for charged particle radiation |
| 02/24/2011 | DE112008003774T5 Strukturmessgerät und Strukturmessverfahren Structure gauge and structure measurement method |