Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
07/2010
07/27/2010US7763231 carbon plasma generation; stabilization; deposits; electrical resistance heating; electron beam vaporization of hydrocarbon feedstock
07/27/2010US7763150 Monitoring the coating area density of a predetermined layer thickness in a simple manner with the aid of the integral measuring technique, x-ray fluorescence, of an an auxiliary substrate arranged between the first coating source and an area into which a substrate to be coated is to be received
07/27/2010US7762209 Plasma processing apparatus
07/22/2010WO2010082489A1 Charged particle radiation device provided with aberration corrector
07/22/2010WO2010082477A1 Charged beam device
07/22/2010WO2010082466A1 Ion beam device
07/22/2010WO2010082451A1 Charged particle beam applied apparatus
07/22/2010WO2010081803A1 Tomographic atom probe with flight-time mass spectrometer including an electrostatic device
07/22/2010WO2010081465A2 Molding compound-enclosed power semiconductor element
07/22/2010US20100181501 Apparatus for sub-zero degree c ion implantation
07/22/2010US20100181500 Method and system for low temperature ion implantation
07/22/2010US20100181482 Transmission electron microscope micro-grid
07/22/2010US20100181481 Phase contrast electron microscope
07/22/2010US20100181479 Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
07/22/2010US20100181478 Charged particle beam adjusting method and charged particle beam apparatus
07/22/2010US20100181476 Spectrometer for Surface Analysis and Method Therefor
07/22/2010DE112008001663T5 Plasmaverarbeitungsvorrichtung und Verfahren zum Überwachen des Plasmaentladungszustands in einer Plasmaverarbeitungsvorrichtung The plasma processing apparatus and method for monitoring the condition of plasma discharge in a plasma processing apparatus
07/21/2010EP2209132A1 Charged particle beam PVD device, shielding device, coating chamber for coating substrates, and method of coating
07/21/2010EP2209047A1 Deposition of a protective layer by charged particle beam sputtering and processing of the layer by a charged particle beam
07/21/2010EP2208218A1 Method and device for the plasma treatment of running metal substrates
07/21/2010EP2208217A2 Method and device for the plasma-aided treatment of surfaces
07/21/2010EP2208216A1 Method for depositing electrically insulating layers
07/21/2010EP2207911A1 Apparatus and method for producing epitaxial layers
07/21/2010CN201530859U Carrying trolley of magnetic control sputtering device
07/21/2010CN201530858U Cathode cooling device of magnetic control sputtering device
07/21/2010CN201530857U Battery bracket box of magnetic control sputtering device
07/21/2010CN201530856U Mechanical transmission device on magnetic control sputtering product line
07/21/2010CN201530855U Solar battery heating device before magnetron sputtering and coating
07/21/2010CN201530854U Magnetron sputtering chamber capable of automatically reducing temperature
07/21/2010CN1988107B Ion beam irradiating apparatus and method of adjusting uniformity of a beam
07/21/2010CN1964620B Control of steam from solid subliming
07/21/2010CN1953129B Method of operating ion source and ion implanting apparatus
07/21/2010CN1909760B Vacuum reaction chamber and processing method
07/21/2010CN101785080A Plasma processing device
07/21/2010CN101783281A Plasma etching device and etching method of grid electrode
07/21/2010CN101346796B Method and installation for the vacuum polishing of a metal strip by means of magnetron sputtering
07/21/2010CN101312122B Workpiece processing apparatus
07/21/2010CN101226120B Micro drafting device for testing test piece material nano metric mechanical properties
07/20/2010US7759954 Semiconductor probe having resistive tip and method of fabricating the same
07/20/2010US7759660 Electron beam lithography system
07/20/2010US7759658 Ion implanting apparatus
07/20/2010US7759657 vaporizing and ionizing polyhedral borane cluster molecules to form plasma, extracting through aperture to form ion beam, mass analyzing via magnet, transporting drift of ion beam and/or optionally applying additional acceleration or deceleration potentials to set final energy, implanting
07/20/2010US7759656 Dual air particle sample cassette and methods for using same
07/20/2010US7759653 Electron beam apparatus
07/20/2010US7759642 Pattern invariant focusing of a charged particle beam
07/20/2010US7758731 High voltage, alternating current; pulsed direct current; fluid flow of dielectric over electrode
07/20/2010US7757633 Method, apparatus and magnet assembly for enhancing and localizing a capacitively coupled plasma
07/15/2010WO2010080097A1 Ion implantation with diminished scanning field effects
07/15/2010WO2010079220A1 Plasma source electrode
07/15/2010WO2010059252A3 Front end of line plasma mediated ashing processes and apparatus
07/15/2010WO2010046636A3 Vacuum processing apparatus
07/15/2010WO2010034781A3 Radiation-cured coatings
07/15/2010WO2010025211A4 Ion beam stabilization
07/15/2010US20100178776 Heat treatment apparatus and method for heating substrate by light-irradiation
07/15/2010US20100178602 Charged particle beam writing apparatus and device production method
07/15/2010US20100176306 Implantation quality improvement by xenon/hydrogen dilution gas
07/15/2010US20100176297 Ion beam processing apparatus
07/15/2010US20100176296 Composite focused ion beam device, and processing observation method and processing method using the same
07/15/2010DE10313593B4 Verfahren zum Betrachten einer Probe mittels eines Transmissionselektronenmikroskops und entsprechendes Transmissionselektronenmikroskop A method of observing a specimen by means of a transmission electron microscope and transmission electron microscope corresponding
07/15/2010DE10236738B9 Elektronenmikroskopiesystem und Elektronenmikroskopieverfahren Electron system and electron microscopy methods
07/14/2010EP2206138A1 Method for manufacturing a treated surface and vacuum plasma sources
07/14/2010EP2206137A1 Plasma electron flood for ion beam implanter
07/14/2010EP1654395B1 Target/backing plate constructions, and methods of forming them
07/14/2010CN201527960U Changeable gradient accelerating tube
07/14/2010CN201527959U Changeable gradient accelerating tube
07/14/2010CN101777481A hybrid magnetic/electrostatic deflector for ion implantation systems
07/13/2010US7755300 Method and apparatus for preventing instabilities in radio-frequency plasma processing
07/13/2010US7755067 Ion implantation apparatus and method of converging/shaping ion beam used therefor
07/13/2010US7755066 Techniques for improved uniformity tuning in an ion implanter system
07/13/2010US7755065 Focused ion beam apparatus
07/13/2010US7755045 Scanning electron microscope
07/13/2010US7755042 Auger electron spectrometer with applied magnetic field at target surface
07/13/2010US7755039 3-dimensional differential pumping system and method thereof
07/13/2010US7754997 Apparatus and method to confine plasma and reduce flow resistance in a plasma
07/13/2010US7754995 Plasma processing apparatus and plasma processing method
07/08/2010WO2010077659A2 Closed drift magnetic field ion source apparatus containing self-cleaning anode and a process for substrate modification therewith
07/08/2010WO2010076136A1 Nanoprobing an integrated circuit device structure
07/08/2010US20100172954 Irradiated implantable bone material
07/08/2010US20100172229 Drawing method, drawing device, and information recording medium
07/08/2010US20100171048 Ion implanting apparatus
07/08/2010US20100171047 Particle beam irradiation apparatus and particle beam irradiation method
07/08/2010US20100171046 Lithography system and projection method
07/08/2010US20100171044 Vapor Compression Refridgeration Chuck for Ion Implanters
07/08/2010US20100171037 Compact scanning electron microscope
07/08/2010US20100170787 Filtered Cathodic Arc Deposition Method and Apparatus
07/08/2010US20100170781 Filtered Cathodic Arc Deposition Method and Apparatus
07/08/2010US20100170440 Surface treatment apparatus
07/08/2010DE102009001587A1 Verfahren zur Einstellung eines Betriebsparameters eines Teilchenstrahlgeräts sowie Probenhalter zur Durchführung des Verfahrens Method for adjusting an operating parameter of a particle beam and specimen holder for carrying out the method
07/08/2010DE102008062888A1 Teilchenoptische Vorrichtung mit Magnetanordnung Particle-optical apparatus with magnetic arrangement
07/07/2010EP2204469A1 Magnetron unit, magnetron sputtering apparatus and method for manufacturing electronic device
07/07/2010EP2203928A1 Double plasma ion source
07/07/2010EP1925016B1 Plasma processing apparatus
07/07/2010EP1812949B1 Impedance matching of a capacitively coupled rf plasma reactor suitable for large area substrates
07/07/2010CN201523001U Focused ion beam machine added with optical inspection functions
07/07/2010CN201522986U 放电设备 Discharge Equipment
07/07/2010CN201522985U Sensor for quantitatively testing force-electricity property and microstructure
07/07/2010CN101772253A Plasma generating device
07/07/2010CN101770973A Plasma process equipment and static chuck device
07/07/2010CN101770933A Plasma process equipment and gas distribution device thereof
07/07/2010CN101770923A Method for loading plasma enhanced chemical vapor deposition equipment and glass panel