| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 05/11/2011 | CN201829449U Special scanning electron microscope clamp for inlaying samples |
| 05/11/2011 | CN1812687B Atmospheric radio-frequency discharging high-speed cold plasma array generator |
| 05/11/2011 | CN102054650A Plasma processing apparatus |
| 05/11/2011 | CN102054649A Plasma processing apparatus and plasma processing method |
| 05/11/2011 | CN102054648A Dual mode inductively coupled plasma reactor with adjustable phase coil assembly |
| 05/11/2011 | CN101625954B Repairing method of electrostatic sucking electrode |
| 05/11/2011 | CN101625302B Method for preparing transmission electron microscope sample |
| 05/11/2011 | CN101609790B Processing device |
| 05/11/2011 | CN101410930B Insulator system for a terminal structure of an ion implantation system |
| 05/11/2011 | CN101365289B Device and method for injecting ion on inner surface of hollow cathode coupling positive voltage bias voltage tube |
| 05/10/2011 | US7940383 Method of detecting defects on an object |
| 05/10/2011 | US7940009 Plasma processing apparatus |
| 05/10/2011 | US7939906 Preparation method for an electron tomography sample with embedded markers and a method for reconstructing a three-dimensional image |
| 05/10/2011 | US7939813 E-beam exposure apparatus |
| 05/10/2011 | US7939812 Ion source assembly for ion implantation apparatus and a method of generating ions therein |
| 05/10/2011 | US7939801 Electron beam observation device using pre-specimen magnetic field as image-forming lens and specimen observation method |
| 05/10/2011 | US7939800 Arrangement and method for compensating emitter tip vibrations |
| 05/10/2011 | US7938990 Pattern drawing method, method of manufacturing a master disk for manufacturing information recording media, and method of manufacturing an information recording medium |
| 05/05/2011 | WO2011052489A1 Charged particle radiation apparatus, and method for displaying three-dimensional information in charged particle radiation apparatus |
| 05/05/2011 | WO2011052333A1 Scanning charged particle beam device and method for correcting chromatic spherical combination aberration |
| 05/05/2011 | WO2011052070A1 Pattern measuring apparatus and pattern measuring method |
| 05/05/2011 | WO2011051409A1 Method of plasma etching and plasma chamber cleaning using f2 and cof2 |
| 05/05/2011 | WO2011051305A1 Charged particle multi-beamlet lithography system, with modulation device |
| 05/05/2011 | WO2011051304A1 Modulation device and charged particle multi-beamlet lithography system using the same |
| 05/05/2011 | WO2011051301A1 Charged particle multi-beamlet lithography system, modulation device, and method of manufacturing thereof |
| 05/05/2011 | WO2011051294A1 Sputter deposition system and method |
| 05/05/2011 | WO2011050875A1 Device for reflecting accelerated electrons |
| 05/05/2011 | WO2011034428A4 Charged particle optical system with multiple beams |
| 05/05/2011 | WO2011030156A3 Collection of electromagnetic radiation emitted from particle-irradiated samples |
| 05/05/2011 | WO2010129398A3 Multi-feed rf distribution systems and methods |
| 05/05/2011 | US20110104830 Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former |
| 05/05/2011 | US20110104381 Plasma Treatment of Large-Scale Components |
| 05/05/2011 | US20110101249 Substrate holder and clipping device |
| 05/05/2011 | US20110101219 Luminous body, electron beam detector using the same, scanning electron microscope, and mass analysis device |
| 05/05/2011 | US20110101213 Method and system for increasing beam current above a maximum energy for a charge state |
| 05/05/2011 | US20110100800 Rectangular Filtered Vapor Plasma Source and Method of Controlling Vapor Plasma Flow |
| 05/05/2011 | US20110100798 Charged Particle Extraction Device And Method Of Design There for |
| 05/05/2011 | DE102009051056A1 Method for restoring operating state of magnetron discharge during magnetron sputtering, involves conductively switching insulated gate bipolar transistor for time periods when voltage at anode exceeds threshold values, respectively |
| 05/04/2011 | EP2317830A2 Inductively-coupled plasma device |
| 05/04/2011 | EP2317537A1 Sputter deposition system and method |
| 05/04/2011 | EP2317536A2 Detection device and particle beam device having a detection device |
| 05/04/2011 | EP2317535A2 Pattern definition device with multiple multibeam array |
| 05/04/2011 | EP2316565A1 A micro-reactor for observing particles in a fluid |
| 05/04/2011 | EP2316253A2 A composite showerhead electrode assembly for a plasma processing apparatus |
| 05/04/2011 | EP2316123A1 Arrangement and method for generating a plasma having a defined and stable ionization state |
| 05/04/2011 | CN201820737U Scanning electronic microscope sample stage and scanning electronic microscope |
| 05/04/2011 | CN201820736U Replaceable upper chamber part of plasma processing equipment |
| 05/04/2011 | CN102047376A Control of particles on semiconductor wafers when implanting boron hydrides |
| 05/04/2011 | CN102047375A Electrostatic multipole lens |
| 05/04/2011 | CN101740335B manufacturing equipment of semiconductor and method for etching semiconductor structure |
| 05/04/2011 | CN101191776B Focused ion beam microscope sample stage and method of use thereof |
| 05/04/2011 | CN101147910B Ion ultrasonic cleaning device |
| 05/04/2011 | CN101039544B Plasma processor with electrode simultaneously responsive to plural frequencies |
| 05/03/2011 | US7935943 Focused ion beam processing system and method |
| 05/03/2011 | US7935942 Technique for low-temperature ion implantation |
| 05/03/2011 | US7935940 Measuring in-situ UV intensity in UV cure tool |
| 05/03/2011 | US7935937 Method of forming TEM sample holder |
| 05/03/2011 | US7935927 Method and apparatus for observing a specimen |
| 05/03/2011 | US7935925 Charged particle beam scanning method and charged particle beam apparatus |
| 05/03/2011 | US7935924 Batch fabricated rectangular rod, planar MEMS quadrupole with ion optics |
| 05/03/2011 | US7935923 Performance enhancement through use of higher stability regions and signal processing in non-ideal quadrupole mass filters |
| 04/28/2011 | WO2011049740A1 Method and system for forming a pattern on a surface using charged particle beam lithography |
| 04/28/2011 | WO2011049735A2 Method for fracturing a pattern for writing with a shaped charged particle beam writing system using dragged shots |
| 04/28/2011 | WO2011049477A1 Method for modifying surface characteristics of materials and apparatus |
| 04/28/2011 | WO2011048946A1 Charged particle beam device, position specification method used for charged particle beam device, and program |
| 04/28/2011 | WO2011011661A3 Method and apparatus for the monitoring of sample milling in a charged particle instrument |
| 04/28/2011 | WO2011011659A3 Variable-tilt tem specimen holder for charged-particle beam instruments |
| 04/28/2011 | US20110095185 Semiconductor inspecting apparatus |
| 04/28/2011 | US20110094680 Vacuum apparatus including a particle monitoring unit, particle monitoring method and program, and window member for use in the particle monitoring |
| 04/28/2011 | US20110094679 Electrode assembly for the removal of surface oxides by electron attachment |
| 04/28/2011 | DE112009001537T5 Vorrichtung mit geladenem Teilchenstrahl und Verfahren zum Steuern der Vorrichtung Charged particle device and method for controlling the apparatus |
| 04/28/2011 | DE102009050521A1 Thermisches Materialbearbeitungsverfahren Thermal material processing methods |
| 04/28/2011 | DE102009049787A1 Method for determining parameters of proximity-function for correction of proximity-effects, during electron beam-lithography, involves representing periodic structure as patterns, during finding of parameter with Fourier-series-evolution |
| 04/28/2011 | DE102009045774A1 Superconducting magnet configuration useful e.g. for generating homogeneous magnetic field in an examination volume, comprises main field coil, a shielding coil, a ferromagnetic field formation device, and a ferromagnetic shielding body |
| 04/27/2011 | EP2315232A2 Transmission electron microscope and method for observing specimen image with the same |
| 04/27/2011 | EP2315231A2 Electromagnetic field application system |
| 04/27/2011 | EP2314410A1 Thermal material processing method with an electron beam with compensation of geometrical and magnetical errors of the positioning of the electron beam on a workpiece |
| 04/27/2011 | EP2313908A1 Charged particle beam lithography system and target positioning device |
| 04/27/2011 | EP2313253A1 Method for separating two articles that are bonded to each other via at least one adhesive layer |
| 04/27/2011 | EP1751783B1 Charged particle gun |
| 04/27/2011 | CN201813579U Electronic gun for electron beam melting furnace |
| 04/27/2011 | CN201812790U Full spectrum stereoscopic electron microscope |
| 04/27/2011 | CN102034666A Side gas injector for plasma reaction chamber |
| 04/27/2011 | CN102034665A An ion implantation device and a method of semiconductor manufacturing by the implantation of boron hydride cluster ions |
| 04/27/2011 | CN101740448B Plasma processing equipment and substrate support plate thereof |
| 04/27/2011 | CN101634016B Modifying device of silicon wafer loading devices for PECVD |
| 04/27/2011 | CN101629282B Conversion device of silicon wafer carrier for PECVD |
| 04/27/2011 | CN101457338B Cleaning of native oxide with hydrogen-containing radicals |
| 04/27/2011 | CN101375366B Improved sputter target utilization |
| 04/27/2011 | CN101373702B Cavity inner lining and reaction cavity |
| 04/26/2011 | US7932678 Magnetic mirror plasma source and method using same |
| 04/26/2011 | US7932495 Fast wafer inspection system |
| 04/26/2011 | US7932190 Flow control of photo-polymerizable resin |
| 04/26/2011 | US7931787 Energetic vapor deposition means are addressed through the introduction of a novel means of vapor deposition, namely, an Electron-Assisted Deposition (EAD) process and apparatus. The EAD mode of film growth disclosed is generally achieved by |
| 04/26/2011 | US7931748 Systems and methods for the production of highly tetrahedral amorphous carbon coatings |
| 04/26/2011 | US7930992 Plasma processing equipment |
| 04/21/2011 | WO2011047367A1 Motorized stage |
| 04/21/2011 | WO2011046989A1 Generalization of shot definitions for mask and wafer patterning tools |
| 04/21/2011 | WO2011046216A1 Electron microscope |
| 04/21/2011 | WO2011046116A1 Gas field ionization ion source and ion beam device |