| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 06/23/2011 | WO2010134018A3 Pattern data conversion for lithography system |
| 06/23/2011 | US20110152810 Elastic fiber containing an anti-tack additive |
| 06/23/2011 | US20110151597 Analysis method for semiconductor device |
| 06/23/2011 | US20110147587 Diagnosis device of recipe used for scanning electron microscope |
| 06/23/2011 | US20110147586 Charged Particle Beam Device |
| 06/23/2011 | US20110147585 Charged particle energy analysers |
| 06/23/2011 | US20110147200 Ion Beam Generator, and Substrate Processing Apparatus and Production Method of Electronic Device Using The Ion Beam Generator |
| 06/23/2011 | US20110146911 Plasma processing system with locally-efficient inductive plasma coupling |
| 06/22/2011 | EP2336830A1 Lithography system |
| 06/22/2011 | EP2336384A1 Film-forming method |
| 06/22/2011 | EP2122657B8 Method for controlling ion energy in radio frequency plasmas |
| 06/22/2011 | EP1557869B1 Exposure transfer mask and exposure transfer mask pattern exchange method |
| 06/22/2011 | CN201877401U Lower electrode thimble of chip etching equipment |
| 06/22/2011 | CN1909147B Emitter for an ion source and method of producing same |
| 06/22/2011 | CN1691505B Plasma power generator |
| 06/22/2011 | CN1638014B Ion beam monitoring arrangement |
| 06/22/2011 | CN102105960A Imaging system |
| 06/22/2011 | CN102104016A Substrate holder and clipping device |
| 06/22/2011 | CN102103968A Particle beam passable nonmetal vacuum isolation window |
| 06/22/2011 | CN102103967A Particle-optical component |
| 06/22/2011 | CN102103966A Particle-optical component |
| 06/22/2011 | CN101620972B Plasma processing apparatus |
| 06/22/2011 | CN101587813B A loading station mechanism, a plasma processing apparatus and a pressure exertion method |
| 06/22/2011 | CN101582364B Double cup cover ion source filament seat structure for preventing metal spraying |
| 06/22/2011 | CN101529551B Method and apparatus for preventing instabilities in radio-frequency plasma processing |
| 06/22/2011 | CN101276724B Transmission electron microscope micro grid and preparing method thereof |
| 06/22/2011 | CN101110334B Beam stop for an ion implanter |
| 06/21/2011 | US7964845 Charged particle beam device |
| 06/21/2011 | US7964844 Sample inspection apparatus |
| 06/21/2011 | US7964135 Method and apparatus for imprinting energy ray-setting resin, and discs and semiconductor devices with imprinted resin layer |
| 06/16/2011 | WO2011071579A2 Photon induced near field electron microscope and biological imaging system |
| 06/16/2011 | WO2011071015A1 Electron beam biprism device and electron beam device |
| 06/16/2011 | WO2011071008A1 Transmission electron microscope and test sample observation method |
| 06/16/2011 | WO2011070890A1 Inspection device and inspection method |
| 06/16/2011 | WO2011070727A1 Focused ion beam device and focused ion beam processing method |
| 06/16/2011 | WO2011070704A1 Electron microscope |
| 06/16/2011 | WO2011070309A1 X-ray analyser |
| 06/16/2011 | WO2011070156A2 Device and method for the ion beam modification of a semiconductor substrate |
| 06/16/2011 | WO2011069908A1 Ecr plasma source with coating protection and use of the coating protection |
| 06/16/2011 | WO2011069493A1 Deflecting device for electron beams, magnetic deflecting unit for such a deflecting device, and device for vapor coating a planar substrate using such a deflecting device |
| 06/16/2011 | US20110143527 Techniques for generating uniform ion beam |
| 06/16/2011 | US20110140007 Semiconductor manufacturing apparatus |
| 06/16/2011 | US20110140006 Method and apparatus for specimen fabrication |
| 06/16/2011 | US20110139979 Isotope ion microscope methods and systems |
| 06/16/2011 | US20110139613 Repeller structure and ion source |
| 06/16/2011 | DE102009057486A1 Ablenkvorrichtung für Elektronenstrahlen, magnetische Ablenkeinheit für eine solche Ablenkvorrichtung und Vorrichtung zum Bedampfen eines flächigen Substrates mit einer solchen Ablenkvorrichtung For deflecting electron beams, magnetic deflection unit for deflecting and such a device for the vapor deposition of a planar substrate with such deflector |
| 06/16/2011 | DE102009051374A1 Vorrichtung zum Refelektieren beschleunigter Elektronen Apparatus for efficiently reflect accelerated electrons |
| 06/15/2011 | EP2333809A1 Electron microscope |
| 06/15/2011 | EP2333808A1 Charged particle beam device, method of operating a charged particle beam device |
| 06/15/2011 | EP2332164A1 Low pressure high frequency pulsed plasma reactor for producing nanoparticles |
| 06/15/2011 | EP2332163A1 Radiofrequency plasma reactor and method for manufacturing vacuum process treated substrates |
| 06/15/2011 | EP2332162A2 High accuracy beam placement for local area navigation |
| 06/15/2011 | EP2331946A2 Ion beam stabilization |
| 06/15/2011 | EP1803141B1 Microreactor for a transmission electron microscope and heating element and method for the manufacture thereof |
| 06/15/2011 | EP1316104B1 Bulk gas delivery system for ion implanters |
| 06/15/2011 | CN201868389U Etching device for effective controlling critical size of edge part of wafer |
| 06/15/2011 | CN1809911B A high density plasma reactor |
| 06/15/2011 | CN1668915B Method and apparatus for determining characteristics of structural element interface having sub-micron cross-sectional area |
| 06/15/2011 | CN102099891A Plasma process and reactor for treating metallic pieces |
| 06/15/2011 | CN102099890A Method and apparatus for measurement of beam angle in ion implantation |
| 06/15/2011 | CN102099889A Electron beam emitter with slotted gun |
| 06/15/2011 | CN102097273A Apparatus and method for controlling plasma density profile |
| 06/15/2011 | CN102097270A Magnet group for magnetron sputtering electrode and sputtering apparatus |
| 06/15/2011 | CN101667533B Plasma processing method and plasma processing apparatus |
| 06/15/2011 | CN101661862B Ion source |
| 06/15/2011 | CN101652498B Plasma generation device, and method and apparatus for forming film using the same |
| 06/15/2011 | CN101378031B Substrate carrier plateform and substrate processing device |
| 06/15/2011 | CN101251463B Control system for micro-nano sample in electronic microscope |
| 06/15/2011 | CN101223624B Ion source and plasma processing device |
| 06/14/2011 | US7960709 Ion implantation device and a method of semiconductor manufacturing by the implantation of boron hydride cluster ions |
| 06/14/2011 | US7960703 Charged-particle beam lithography apparatus and device manufacturing method |
| 06/14/2011 | US7960696 Method for inspecting and measuring sample and scanning electron microscope |
| 06/09/2011 | WO2011068101A1 Filament supporting method, electron gun, and processing apparatus |
| 06/09/2011 | WO2011068056A1 Method for defect inspection and apparatus for defect inspection |
| 06/09/2011 | WO2011068011A1 Charged particle beam device and image quality improvement method therefor |
| 06/09/2011 | WO2011047142A3 A technique for processing a substrate having a non-planar surface |
| 06/09/2011 | WO2011017314A3 Closed drift ion source with symmetric magnetic field |
| 06/09/2011 | US20110133082 Scanning electron microscope |
| 06/09/2011 | US20110133066 Pattern inspection device and method |
| 06/09/2011 | DE202011002844U1 Erweiterungselektrode einer Plasmaschrägkantenätzvorrichtung Extension electrode of a Plasmaschrägkantenätzvorrichtung |
| 06/09/2011 | DE102009057357A1 Electron emitter for producing planar radiation field to sterilize polyethylene terephthalate preforms used in e.g. food industry, has grid element including positionally varying electron penetrability to apply intensity profile to field |
| 06/09/2011 | DE102009057334A1 Electron radiating unit for generating radiation field, has grid arrangement with grid elements for distributing and accelerating electrons from cathode, where one of elements has electron-permeable recesses with any preset geometrical form |
| 06/09/2011 | DE102009056241A1 Stützeinrichtung für eine Magnetronanordnung mit einem rotierenden Target Support device for a magnetron with a rotating target |
| 06/09/2011 | DE102009056240A1 Antriebsendblock für eine Magnetronanordnung mit einem rotierenden Target Drive end block for a magnetron with a rotating target |
| 06/09/2011 | DE102009052807A1 Verfahren und Vorrichtung zum thermischen Bearbeiten von Werkstoffen Method and apparatus for thermally processing materials |
| 06/09/2011 | DE10066358B4 Einrichtung zur Behandlung von Werkstücken mit Elektronenstrahlen Apparatus for the treatment of work pieces using electron beams |
| 06/08/2011 | EP2329521A2 Adjustable thermal contact between an electrostatic chuck and a hot edge ring by clocking a coupling ring |
| 06/08/2011 | EP2329510A1 Plasma power supply arrangement |
| 06/08/2011 | EP2033206B1 Slider bearing for use with an apparatus comprising a vacuum chamber |
| 06/08/2011 | CN201859831U Dielectric window of plasma etching reactor |
| 06/08/2011 | CN1983518B Plasma processing apparatus and method |
| 06/08/2011 | CN102089848A Remote plasma cleaning method and apparatus for applying said method |
| 06/08/2011 | CN101469887B Air conditioner |
| 06/08/2011 | CN101194339B Gas controlling device |
| 06/08/2011 | CN101131909B Focused ion beam apparatus and sample section forming and thin-piece sample preparing methods |
| 06/08/2011 | CN101018884B Plasma processing apparatus including gas distribution member supplying process gas and radio frequency (RF) power |
| 06/07/2011 | US7956336 Focused ion beam apparatus |
| 06/07/2011 | US7956324 Charged particle beam apparatus for forming a specimen image |
| 06/07/2011 | US7955986 Capacitively coupled plasma reactor with magnetic plasma control |
| 06/03/2011 | WO2011065240A1 Scanning electron microscope |