| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 09/15/2011 | WO2011110162A1 Method and device for plasma-treating workpieces |
| 09/15/2011 | WO2009149526A8 Plasma process and reactor for treating metallic pieces |
| 09/15/2011 | US20110223755 Method for removing oxides |
| 09/15/2011 | US20110220796 Methods and devices for high throughput crystal structure analysis by electron diffraction |
| 09/15/2011 | US20110220795 Twin beam charged particle column and method of operating thereof |
| 09/15/2011 | US20110220793 Detection device and particle beam device having a detection device |
| 09/15/2011 | US20110220491 Electron-assisted deposition |
| 09/15/2011 | DE102011013571A1 Plasmaätzverfahren und Plasmaätzvorrichtung Plasma etching and plasma etching |
| 09/15/2011 | DE102010012501A1 Verfahren und Vorrichtung zur Plasmabehandlung von Werkstücken Method and apparatus for plasma treatment of workpieces |
| 09/15/2011 | DE102010010981A1 Method for spatially resolved analyzing electron spin-polarization in optical path of e.g. parallel illustrating electron microscope, involves arranging filter in radiation path between lenses and detector in radiation direction |
| 09/15/2011 | DE102010002754A1 Plasmaversorgungsanordnung mit Quadraturkoppler Plasma supply arrangement with quadrature |
| 09/15/2011 | DE102010002753A1 Plasmaversorgungsanordnung mit mehreren Leistungskopplungsstufen Plasma supply arrangement with multiple deliverables coupling steps |
| 09/14/2011 | EP2365515A1 Rotatable target, backing tube, sputtering installation and method for producing a rotatable target |
| 09/14/2011 | EP2365514A1 Twin beam charged particle column and method of operating thereof |
| 09/14/2011 | EP2365513A1 Protective envelope for an ion beam gun, vacuum deposition device using evaporation and including such a protective envelope and material deposition process |
| 09/14/2011 | EP2365512A2 Inspection system by charged particle beam |
| 09/14/2011 | EP2365511A1 Feedback loop for emitter flash cleaning |
| 09/14/2011 | EP2365321A2 Sample inspection apparatus, sample inspection method, and sample inspection system |
| 09/14/2011 | EP2365093A2 Method for sequencing nucleic acid molecules |
| 09/14/2011 | EP1401014B1 Plasma processing device, and method of cleaning the same |
| 09/14/2011 | CN201975363U 阳离子源装置 Cation source device |
| 09/14/2011 | CN1959416B Stage assembly, particle-optical apparatus comprising such a stage assembly, and method of treating sample |
| 09/14/2011 | CN102187743A Low-power gaseous plasma source |
| 09/14/2011 | CN102187424A Charged particle beam lithography system and target positioning device |
| 09/14/2011 | CN102184842A Method for patterning sapphire by combining wet etching and dry etching |
| 09/14/2011 | CN102184830A Plasma processing apparatus and plasma processing method |
| 09/14/2011 | CN102184829A Ventilation device of high-voltage box for electron microscope |
| 09/14/2011 | CN102184828A Second condenser lens for electron microscope |
| 09/14/2011 | CN102183509A Plasma monitoring method and plasma monitoring device |
| 09/14/2011 | CN101764042B Air sucking device and semiconductor processing device |
| 09/14/2011 | CN101692417B Control method of platform |
| 09/14/2011 | CN101689469B Power source arrangement for multiple-target sputtering system |
| 09/14/2011 | CN101667524B Reaction chamber and plasma treatment device applying same |
| 09/14/2011 | CN101656194B Plasma cavity and temperature control method thereof |
| 09/14/2011 | CN101620989B Dry etching apparatus |
| 09/14/2011 | CN101584019B Magnetic monitoring of a faraday cup for an ion implanter |
| 09/14/2011 | CN101501813B Process and apparatus for the modification of surfaces |
| 09/14/2011 | CN101484968B Sputter target assemblies having a controlled solder thickness |
| 09/14/2011 | CN101452821B Plasma treatment apparatus and shield ring thereof |
| 09/14/2011 | CN101361409B Work piece processing system and plasma body generating apparatus |
| 09/14/2011 | CN101361153B Ion sources, systems and methods |
| 09/14/2011 | CN101346030B Controllable multi-component cathode arc plasma forming apparatus and method |
| 09/14/2011 | CN101147431B Device for gaseous plasma sterilization |
| 09/13/2011 | US8017922 Ion implantation method and apparatus |
| 09/13/2011 | US8017920 Spin polarized ion beam generation apparatus and scattering spectroscopy apparatus using the spin polarized ion beam and specimen processing apparatus |
| 09/13/2011 | US8017918 Charged-particle beam instrument |
| 09/13/2011 | US8017516 Method for stress free conductor removal |
| 09/13/2011 | US8017197 Plasma processing method and plasma processing apparatus |
| 09/09/2011 | WO2011109115A1 Method for improving implant uniformity during photoresist outgassing |
| 09/09/2011 | WO2011108402A1 Charged particle beam microscope |
| 09/09/2011 | WO2011108368A1 Scanning electron microscope and inspection method using same |
| 09/09/2011 | WO2011108045A1 Circuit pattern inspection device and inspection method for same |
| 09/09/2011 | WO2011108042A1 Method for displaying superimposed electron microscope image and optical image |
| 09/09/2011 | WO2011074962A3 Support and positioning structure, semiconductor equipment system and method for positioning |
| 09/09/2011 | WO2011070156A3 Device and method for the ion beam modification of a semiconductor substrate |
| 09/08/2011 | US20110217849 Device and method for producing dielectric layers in microwave plasma |
| 09/08/2011 | US20110217653 Intermediate transfer belt for image forming apparatus, method of preparing the belt, and image forming method and apparatus using the belt |
| 09/08/2011 | US20110215263 Ion implantation method and ion implantation apparatus |
| 09/08/2011 | US20110215262 Method for Improving Implant Uniformity During Photoresist Outgassing |
| 09/08/2011 | US20110215243 Method for inspecting and measuring sample and scanning electron microscope |
| 09/08/2011 | US20110215242 Particle beam device and method for operation of a particle beam device |
| 09/08/2011 | US20110215241 Charged Particle Beam Detection Unit with Multi Type Detection Subunits |
| 09/08/2011 | US20110214813 Plasma processing method and apparatus |
| 09/07/2011 | EP2363875A1 Method for multi-beam exposure on a target |
| 09/07/2011 | CN201966174U Vacuum pipeline type beam regulator |
| 09/07/2011 | CN101248506B Method of treating a gas stream |
| 09/06/2011 | US8013311 Dual beam system |
| 09/06/2011 | US8013301 Measurement system and a method |
| 09/01/2011 | WO2011105908A1 Apparatus and method for reactive ion etching |
| 09/01/2011 | WO2011105898A1 Method and device for layer deposition |
| 09/01/2011 | WO2011105015A1 Scanning electron microscope optical condition setting method and scanning electron microscope |
| 09/01/2011 | WO2011104801A1 Electron microscope and sample holder |
| 09/01/2011 | WO2011076430A3 Method and apparatus for forming a dielectric layer on a substrate |
| 09/01/2011 | US20110210250 Calibration standard member, method for manufacturing the member and scanning electronic microscope using the member |
| 09/01/2011 | US20110210249 Transmission Electron Microscope |
| 09/01/2011 | US20110210248 Charged particle beam instrument comprising an aberration corrector |
| 09/01/2011 | US20110210247 Vacuumed device and a scanning electron microscope |
| 09/01/2011 | US20110209828 Method and apparatus for plasma processing |
| 09/01/2011 | DE102011012736A1 Transmissionselektronenmikroskop Transmission electron microscope |
| 08/31/2011 | EP2362411A1 Apparatus and method for reactive ion etching |
| 08/31/2011 | EP2362410A2 Plasma igniter for an inductively coupled plasma ion source |
| 08/31/2011 | EP2362001A1 Method and device for layer deposition |
| 08/31/2011 | EP2361321A2 Vacuum processing apparatus |
| 08/31/2011 | EP2102886B1 Electron microscope and a method for measuring the defocus spread or the infromation limit |
| 08/31/2011 | EP1376649B1 Magnetic field applying sample observing system |
| 08/31/2011 | EP1340242B1 Arc electrodes for synthesis of carbon nanostructures |
| 08/31/2011 | CN201956317U 离子注入机中靶室的一种高效加热装置 An ion implanter target chamber and efficient heating apparatus |
| 08/31/2011 | CN1745453B Method and apparatus for plasma treatment of surface in vacuum |
| 08/31/2011 | CN102169912A Mo/Ag laminated metal matrix composite for solar cell interconnected sheet and preparation process thereof |
| 08/31/2011 | CN102169790A First collecting mirror of electron microscope |
| 08/31/2011 | CN102169789A Automatic matching unit and plasma processing apparatus |
| 08/31/2011 | CN102169145A Detection and suppression of electrical arcing |
| 08/31/2011 | CN101261952B Substrate carrying bench and substrate treatment device |
| 08/31/2011 | CN101248707B Method and apparatus for creating a plasma |
| 08/31/2011 | CN101246964B Stainless steel double-polar plate surface modifying method for proton exchange film fuel battery |
| 08/31/2011 | CN101076221B Multiple radiation sources plasma generating and processing |
| 08/30/2011 | US8008639 System for processing an object |
| 08/30/2011 | US8008637 High-temperature ion implantation apparatus and methods of fabricating semiconductor devices using high-temperature ion implantation |
| 08/30/2011 | US8008636 Ion implantation with diminished scanning field effects |
| 08/30/2011 | US8008635 Method for sample preparation |