Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
10/2011
10/06/2011US20110240852 Automated slice milling for viewing a feature
10/06/2011DE102010013324A1 Producing optoelectronic device e.g. solar cell, comprises supplying substrate into coating chamber, supplying gas into coating chamber, generating plasma in gas by supply energy via to electrodes, and depositing material for layer
10/05/2011EP2372744A1 Device for supporting a rotatable target and sputtering installation
10/05/2011EP2372743A2 Charged particle beam system with an ion generator
10/05/2011EP2372351A1 Method for producing images of a specimen
10/05/2011EP2372337A2 Automated Slice Milling for Viewing a Feature
10/05/2011EP2371992A1 End-block and sputtering installation
10/05/2011EP2052360B1 Method and electron microscope for measuring the similarity of two-dimensional images
10/05/2011EP1892742B1 Diamond electron emission cathode, electron emission source, electron microscope, and electron beam exposure device
10/05/2011EP1892740B1 Diamond electron emission cathode, electron emission source, electron microscope, and electron beam exposure device
10/05/2011EP1863947B1 Hard material layer
10/05/2011EP1543537B1 Plasma apparatus with device for reducing polymer deposition on a substrate and method for reducing polymer deposition
10/05/2011CN202003945U Adjustable multi-area gas distribution device
10/05/2011CN1966770B Method for coating metals
10/05/2011CN102209425A Diagnostic device of radio frequency discharge plasma
10/05/2011CN102208322A Plasma processing apparatus and semiconductor device manufacturing method
10/05/2011CN102208321A Method and apparatus for laser to induce plasma to inject into substrate
10/05/2011CN102208320A Ion implant method and implanter by using a variable aperture
10/05/2011CN101546134B Electron beam writing apparatus and method
10/05/2011CN101510505B Ion implantation method and apparatus
10/04/2011US8030625 Electron beam writing method, fine pattern writing system, method for manufacturing uneven pattern carrying substrate, and method for manufacturing magnetic disk medium
10/04/2011US8030624 Photoluminescent coating for vehicles
10/04/2011US8030622 Specimen holder, specimen inspection apparatus, and specimen inspection method
10/04/2011US8030614 Charged particle beam apparatus and dimension measuring method
10/04/2011US8028655 Plasma processing system with locally-efficient inductive plasma coupling
10/04/2011US8028652 Batch-type remote plasma processing apparatus
09/2011
09/29/2011WO2011118744A1 Composite charged-particle-beam apparatus
09/29/2011WO2011117253A1 Lithography system, sensor, converter element and method of manufacture
09/29/2011WO2011117064A1 Process and apparatus for deposition of multicomponent semiconductor layers
09/29/2011WO2011117057A1 Active thermoprobe
09/29/2011WO2011116991A1 Apparatus and method for treating substrates
09/29/2011WO2011116990A1 Electrode arrangement
09/29/2011WO2011080659A4 Inline coating installation
09/29/2011US20110238225 Method and system for automating sample preparation for microfluidic cryo tem
09/29/2011US20110233431 Implant method and implanter by using a variable aperture
09/29/2011US20110233402 Phase-shifting element and particle beam device having a phase-shifting element
09/29/2011US20110232846 Magnetic field generator for magnetron plasma
09/29/2011DE102011015263A1 Vorrichtung und Verfahren zum Behandeln von Substraten Apparatus and method for processing substrates
09/28/2011EP2369031A1 Coating on a NiAL2O4 basis in spinel structure
09/28/2011EP2369028A1 Method for nitriding metal alloys and device for carrying out said method
09/28/2011EP2368258A1 Rf sputtering arrangement
09/28/2011EP2368257A2 Closed drift magnetic field ion source apparatus containing self-cleaning anode and a process for substrate modification therewith
09/28/2011EP2201148B1 Application of hipims to through silicon via metallization in three-dimensional wafer packaging
09/28/2011EP1941528B9 Particle-optical arrangement with particle-optical component
09/28/2011EP1892741B1 Diamond electron emission cathode, electron emission source, electron microscope, and electron beam exposure device
09/28/2011CN201994322U 太阳能电池沉积用放电电极板阵列 Solar panel array discharge electrode deposition
09/28/2011CN1914714B Substrate processing system and process for fabricating semiconductor device
09/28/2011CN1754128B Method for producing resist substrates
09/28/2011CN102203856A Ion implanting apparatus
09/28/2011CN102203591A Counting inclusions on alloys by image analysis
09/28/2011CN102203315A King charles edmund
09/28/2011CN102201321A Ion implantation system and method
09/28/2011CN101452805B Processing container and plasma processing device
09/27/2011US8026495 Charged particle beam exposure system
09/27/2011US8025775 Vacuum plasma generator
09/27/2011US8025731 Gas injection system for plasma processing
09/27/2011US8025676 Bioabsorbable implantable structure
09/22/2011WO2011116039A1 Method and system for modifying substrate patterned features using ion implantation
09/22/2011WO2011115834A1 Process chamber liner with apertures for particle containment
09/22/2011WO2011114832A1 Electron generation method
09/22/2011WO2011114403A1 Sem type defect observation device and defect image acquiring method
09/22/2011WO2011113927A1 Coating based on nial2o4 in spinel structure
09/22/2011WO2011062810A3 High-sensitivity and high-throughput electron beam inspection column enabled by adjustable beam-limiting aperture
09/22/2011US20110226949 Inspection System
09/22/2011US20110226948 Sample processing and observing method
09/22/2011US20110226947 Composite charged particle beam apparatus and sample processing and observing method
09/22/2011DE102010014552A1 Coating a substrate surface using a plasma beam or plasma beams, comprises directing a beam of an atmospheric low-temperature plasma to the substrate surface according to respective plasma coating nozzle in opposition to thermal injection
09/22/2011DE102010011898A1 Inspektionssystem Inspection system
09/22/2011DE102010011592A1 Hohlkathoden-Plasmaquelle sowie Verwendung der Hohlkathoden-Plasmaquelle Hollow cathode plasma source and use of the hollow cathode plasma source
09/22/2011DE102009050039B4 ICR-Messzelle mit parabolischem Trappingprofil ICR cell with parabolic Trappingprofil
09/21/2011EP2367199A2 Plasma etching method, plasma etching apparatus, and computer-readable storage medium
09/21/2011EP2367196A1 Hollow cathode plasma source and use of hollow cathode plasma source
09/21/2011EP2367195A2 Measurement and endpointing of sample thickness
09/21/2011EP2366429A2 Line scanning apparatus
09/21/2011EP1812960B1 Dry etching apparatus and methods of forming an electric device using the same
09/21/2011CN201985070U 电极载具及双面等离子体工艺装置 Electrode carrier and double-sided plasma process equipment
09/21/2011CN102197453A Rotatable sputter target backing cylinder, rotatable sputter target, method of producing a rotatable sputter target, and coating installation
09/21/2011CN102194664A Plasma etching method and plasma etching apparatus
09/21/2011CN102194639A Plasma treatment device and plasma treatment method
09/21/2011CN102194638A Treating device
09/21/2011CN102194637A Ion implantation system and method
09/21/2011CN102194636A Ion implantation system and method
09/21/2011CN102194635A Ion implanting system and method
09/21/2011CN102194634A Focusing ring and substrate carrying system
09/21/2011CN102194633A Microgrid of transmissive electron microscope
09/21/2011CN102194623A Preparation method of transmission electron microscope microgrid
09/21/2011CN101529550B Method of controlling electron beam focusing of pierce type electron gun and control device therefor
09/21/2011CN101383261B Scanning electron microscope
09/21/2011CN101300657B Magnetically enhanced capacitive plasma source for ionized physical vapor deposition
09/21/2011CN101236892B Ion beam apparatus having plasma sheath controller
09/20/2011US8022376 Method for manufacturing semiconductor device or photomask
09/20/2011US8022365 Charged particle beam equipments, and charged particle beam microscope
09/20/2011US8022364 Electron spin detector, and spin polarized scanning electron microscope and spin-resolved x-ray photoelectron spectroscope using the electron spin detector
09/20/2011US8022362 Ionization device
09/20/2011US8020514 Batch-type remote plasma processing apparatus
09/15/2011WO2011112614A2 Device for holding electron microscope grids and other materials
09/15/2011WO2011112038A2 Apparatus for generating electron beams, and method for manufacturing same
09/15/2011WO2011111852A1 Image processing method
09/15/2011WO2011111343A1 Ion-beam generating apparatus, and substrate processing apparatus and method of manufacturing electronic device using same
09/15/2011WO2011110410A1 Rotatable target, backing tube, sputtering installation and method for producing a rotatable target
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