H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof

Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
10/2011
10/26/2011	CN1774787B Toroidal low-field reactive gas and plasma source having a dielectric vacuum vessel
10/26/2011	CN101802964B Techniques for terminal insulation in an ion implanter
10/26/2011	CN101630624B Dual frequency RF match
10/26/2011	CN101552183B Plasma processing apparatus
10/26/2011	CN101484967B Methods and apparatus for beam density measurement in two dimensions
10/26/2011	CN101088138B Weakening focusing effect of acceleration-deceleration column of ion implanter
10/25/2011	US8044375 Apparatus and method for ion beam implantation using scanning and spot beams
10/25/2011	US8044374 Ion implantation apparatus
10/25/2011	US8044352 Electron microscopy
10/25/2011	US8043971 Plasma processing apparatus, ring member and plasma processing method
10/25/2011	US8043488 Rotatable sputter target
10/20/2011	WO2011130100A2 Ion beam sample preparation apparatus and methods
10/20/2011	WO2011130099A2 Ion beam sample preparation apparatus and methods
10/20/2011	WO2011130098A2 Ion beam sample preparation thermal management apparatus and methods
10/20/2011	WO2011130097A2 Ion beam sample preparation apparatus and methods
10/20/2011	WO2011129364A1 Pattern inspection device and pattern inspection method
10/20/2011	WO2011129315A1 Ion beam apparatus and ion-beam processing method
10/20/2011	WO2011128393A1 Lithography method with combined optimisation of radiated energy and design geometry
10/20/2011	WO2011128391A1 Large-mesh cell- projection electron-beam lithography method
10/20/2011	WO2011128383A1 Electron-beam lithography method with correction of line ends by insertion of contrast patterns
10/20/2011	WO2011128348A1 Method of electron-beam lithography with correction of corner roundings
10/20/2011	WO2011128044A1 Device for coating a substrate inside a vacuum chamber by means of plasma-assisted chemical vapor deposition
10/20/2011	WO2011128004A1 Target for spark vaporization with physical limiting of the propogation of the spark
10/20/2011	WO2011127504A1 Coating source and process for the production thereof
10/20/2011	WO2011024174A9 Penetrating plasma generating apparatus for high vacuum chambers
10/20/2011	WO2010147872A3 Cooled charged particle systems and methods
10/20/2011	US20110256426 Vacuum arc evaporation apparatus and method, and magnetic recording medium formed thereby
10/20/2011	US20110256378 Cross linking membrane surfaces
10/20/2011	US20110253892 Electron-beam exposure apparatus and method of manufacturing device
10/20/2011	US20110253673 Plasma processing method and apparatus with control of plasma excitation power
10/20/2011	US20110253671 Determining endpoint in a substrate process
10/20/2011	DE102010015495A1 Vorrichtung zum Erzeugen von UV-Licht Apparatus for producing UV-light
10/20/2011	CA2793736A1 Coating source and process for the production thereof
10/19/2011	EP2378538A2 Ring cathode for use in a magnetron sputtering device
10/19/2011	EP2378537A1 A charged particle beam device and a method of operating a charged particle beam device
10/19/2011	EP1476891B1 Device and method of coating a substrate with magnetic or magnetisable material
10/19/2011	DE202010004332U1 Plasmaquellen-Array zur Behandlung von Freiformflächen Plasma source array for the treatment of free-form surfaces
10/19/2011	CN1979749B Uniform magnetic-field parallel beam lens system
10/19/2011	CN102224561A RF sputtering arrangement
10/19/2011	CN102223765A Substrate processing apparatus and method
10/19/2011	CN102222595A Ion injection method and ion injection device
10/19/2011	CN101681784B Method for forming a film with a graded bandgap by deposition of an amorphous material from a plasma
10/18/2011	US8040068 Radio frequency power control system
10/18/2011	US8039821 Ion implantation systems
10/18/2011	US8039807 Exposure apparatus, exposure method, and method for producing device
10/18/2011	US8038835 Processing device, electrode, electrode plate, and processing method
10/18/2011	US8038833 Plasma processing apparatus
10/18/2011	CA2634106C Point-of-use water treatment system
10/13/2011	WO2011127394A1 Improved ion source
10/13/2011	WO2011127327A2 Combination laser and charged particle beam system
10/13/2011	WO2011126919A1 Apparatus for controlling the temperature of an rf ion source window
10/13/2011	WO2011126538A2 In-vacuum beam defining aperture cleaning for particle reduction
10/13/2011	WO2011126041A1 Compound microscope device
10/13/2011	WO2011124467A1 A device for sealing a chamber inlet or a chamber outlet for a flexible substrate, substrate processing apparatus, and method for assembling such a device
10/13/2011	WO2011124352A1 Charged particle detection system and multi-beamlet inspection system
10/13/2011	WO2011123923A1 Manipulator carrier for electron microscopes
10/13/2011	WO2011071579A3 Photon induced near field electron microscope and biological imaging system
10/13/2011	US20110249885 Mask inspection apparatus and image generation method
10/13/2011	US20110248164 Combination Laser and Charged Particle Beam System
10/13/2011	DE102011001986A1 Maskenbetrachtungsgerät und Maskenbetrachtungsverfahren Mask viewer and mask observation method
10/13/2011	DE102011001984A1 Maskenuntersuchungsgerät und Bilderzeugungsverfahren Mask inspection apparatus and image forming method
10/12/2011	EP2375436A1 Transmission electron microscope having electron spectrometer
10/12/2011	EP2375289A2 Moving/guiding apparatus and exposure apparatus using the same
10/12/2011	EP2374914A1 A device for sealing a chamber inlet or a chamber outlet for a flexible substrate; substrate processing apparatus, and method for assembling such a device
10/12/2011	EP2374147A2 Techniques for maintaining a substrate processing system
10/12/2011	EP2087502B1 Method for forming an amorphous silicon film by deposition from a plasma
10/12/2011	EP2041770B1 Method and device for machining workpieces
10/12/2011	EP1763707B1 method for producing resist profiles
10/12/2011	EP1579471B1 Vacuum sputtering cathode
10/12/2011	EP1392200B1 Method for improving the effectiveness of artificial joints by the application of gas cluster ion beam technology
10/12/2011	EP1346085B1 Method for producing group iii metal nitride based materials
10/12/2011	CN202008614U Control system for radio frequency power of etching machine
10/12/2011	CN102217029A Ignition apparatus for arc sources
10/12/2011	CN102217028A Particle trap for a plasma source
10/12/2011	CN102212798A Showerhead mounting to accommodate thermal expansion
10/12/2011	CN101752172B Plasma process apparatus
10/12/2011	CN101490793B Plant for plasma treatment of endless materials
10/12/2011	CN101465284B Substrate processing appratus
10/12/2011	CN101385114B Cathode for a vacuum sputtering system
10/12/2011	CN101277579B Plasma processing device and plasma processing method
10/11/2011	US8036845 Method of correcting coordinates, and defect review apparatus
10/11/2011	US8035087 Open-ended electromagnetic corrector assembly and method for deflecting, focusing, and controlling the uniformity of a traveling ion beam
10/11/2011	US8035082 Projection electron beam apparatus and defect inspection system using the apparatus
10/11/2011	US8035080 Method and system for increasing beam current above a maximum energy for a charge state
10/11/2011	US8034212 Magnetron plasma processing apparatus
10/06/2011	WO2011123184A1 Multi-channel radio frequency generator
10/06/2011	WO2011122687A1 Liquid metal ion source, method for manufacturing liquid metal ion source, and ion beam emission instrument
10/06/2011	WO2011122171A1 Electron microscope
10/06/2011	WO2011122139A1 Electron beam interference device
10/06/2011	WO2011121875A1 Electron beam irradiation method and scanning electron microscope
10/06/2011	WO2011121302A1 Electrically charged particle energy analysers
10/06/2011	WO2011120783A1 Device for supporting a rotatable target and sputtering installation
10/06/2011	WO2011120782A2 End-block and sputtering installation
10/06/2011	WO2011056598A3 Membrane filter system and apparatus
10/06/2011	WO2011025998A4 Pattern modification schemes for improved fib patterning
10/06/2011	US20110240889 In-Vacuum Beam Defining Aperture Cleaning for Particle Reduction
10/06/2011	US20110240878 Temperature controlled ion source
10/06/2011	US20110240877 Temperature controlled ion source
10/06/2011	US20110240855 Electron beam device and electron beam application device using the same
10/06/2011	US20110240854 Transmission electron microscope having electron spectrometer

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