H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof

Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
11/2011
11/16/2011	CN102243979A Power source arrangement for multiple-target sputtering system
11/16/2011	CN102243978A Power source arrangement for multiple-target sputtering system
11/16/2011	CN102243977A Plasma processing apparatus and method of manufacturing semiconductor device
11/16/2011	CN102243976A Plasma processing equipment
11/16/2011	CN101812675B Vacuum processing apparatus
11/16/2011	CN101359583B Plasma processing apparatus of batch type
11/15/2011	USRE42917 RF power control device for RF plasma applications
11/15/2011	US8058626 Method and apparatus for modifying a ribbon-shaped ion beam
11/15/2011	US8057634 Method and apparatus for plasma processing
11/15/2011	US8057600 Method and apparatus for an improved baffle plate in a plasma processing system
11/15/2011	US8056504 Voltage non-uniformity compensation method for high frequency plasma reactor for the treatment of rectangular large area substrates
11/15/2011	US8056503 Plasma procesor and plasma processing method
11/10/2011	WO2011140200A1 Gas cluster ion beam system with rapid gas switching apparatus
11/10/2011	WO2011139587A1 Small form factor plasma source for high density wide ribbon ion beam generation
11/10/2011	WO2011139340A1 Throughput enhancement for scanned beam ion implanters
11/10/2011	WO2011138853A1 Scanning electron microscope and sample observation method
11/10/2011	WO2011138451A1 Device analysis
11/10/2011	WO2011138239A1 Plasma reactor
11/10/2011	WO2011137967A1 Method for spark deposition using ceramic targets
11/10/2011	WO2011081463A3 Lens control apparatus of tem for easily obtaining ped pattern
11/10/2011	WO2011078544A3 Ion injector, mass spectrometer comprising the same and method for focusing ions using the same
11/10/2011	US20110272594 Gas cluster ion beam system with rapid gas switching apparatus
11/10/2011	US20110272593 Gas cluster ion beam system with cleaning apparatus
11/10/2011	US20110272578 Charged particle radiation device provided with aberration corrector
11/10/2011	US20110272577 Electron beam device with dispersion compensation, and method of operating same
11/10/2011	US20110272567 Throughput Enhancement for Scanned Beam Ion Implanters
11/10/2011	DE102010034184A1 Eine mikrowellenangeregte Plasma Quelle linearer Art, welche einen geschlitzten, rechteckigen Wellenleiter als Plasma Erreger benutzt A microwave-excited plasma source of linear type which uses a slotted rectangular waveguide as a plasma excitation
11/09/2011	EP2385542A1 Electron beam device with dispersion compensation, and method of operating same
11/09/2011	EP2384374A1 Tube target
11/09/2011	EP2243149B1 Multiple grooved vacuum coupling
11/09/2011	EP2095391B1 Particle-optical arrangement
11/09/2011	EP1777729B1 Scanning type electron microscope
11/09/2011	CN202035209U Surface treatment equipment for plasma discharge
11/09/2011	CN202034341U Low-temperature plasma device
11/09/2011	CN102237247A Plasma reactor
11/09/2011	CN102237246A Exhaust plate and plasma processing equipment
11/09/2011	CN102237245A Ion implantation device and adjustment method of beam current density distribution
11/09/2011	CN102237244A Method for setting beam current density distribution and ion implantation device
11/09/2011	CN102237243A Ion implantation system and method
11/09/2011	CN101837943B Sensor for quantitatively measuring mechanical and electrical properties and microstructure and manufacturing method thereof
11/09/2011	CN101414537B Tunable multi-zone gas injection system
11/08/2011	US8053992 Plasma reactor and plasma reaction apparatus
11/08/2011	US8053726 Inspection system by charged particle beam and method of manufacturing devices using the system
11/08/2011	US8053725 Beam quality in FIB systems
11/08/2011	US8053724 Real-time S-parameter imager
11/08/2011	US8053338 Plasma CVD apparatus
11/08/2011	US8053037 Device and method for patterning structures on a substrate
11/08/2011	US8052887 Substrate processing apparatus
11/08/2011	US8052798 Particle removal apparatus and method and plasma processing apparatus
11/03/2011	WO2011136851A1 Magnetic scanning system with improved efficiency
11/03/2011	WO2011136317A1 Standard sample for calibration of electron beam-excited vacuum ultraviolet emission spectrometer
11/03/2011	WO2011135775A1 Method for checking ion implantation state, and method for manufacturing semiconductor wafer
11/03/2011	WO2011134978A1 Electrode for a dbd plasma process
11/03/2011	WO2011100434A3 Aberration-correcting dark-field electron microscopy
11/03/2011	WO2011078968A3 Method and system for fracturing a pattern, and for charged particle beam lithography with multiple exposure passes
11/03/2011	US20110268363 Method for evaluating superimposition of pattern
11/03/2011	US20110266950 Cathode shielding for deuterium lamps
11/03/2011	US20110266466 Method for modifying a material layer using gas cluster ion beam processing
11/03/2011	US20110266456 Magnetic Scanning System with Improved Efficiency
11/03/2011	US20110266439 Method of Using a Direct Electron Detector for a TEM
11/02/2011	EP2383769A1 Method of using a direct electron detector for a TEM
11/02/2011	EP2383768A1 SEM imaging method
11/02/2011	EP2383767A1 Method of imaging an object
11/02/2011	EP2382648A1 Rf sputtering arrangement
11/02/2011	CN202025712U Evenly-tuning equipment of electric field of plasma processing device
11/02/2011	CN202025711U Showerhead electrode assemblies and gasket for showerhead electrode assemblies
11/02/2011	CN102232243A Front end of line plasma mediated ashing processes and apparatus
11/02/2011	CN102232237A Electrostatic lens structure
11/02/2011	CN102231355A Isolation device for observation room of electron microscope
11/02/2011	CN102231354A Ventilating device for electron gun of electron microscope
11/02/2011	CN102229023A Laser processing system, object mount and laser processing method
11/02/2011	CN101606217B Ion implanting apparatus
11/02/2011	CN101563751B Techniques for low temperature ion implantation
11/02/2011	CN101435075B Plasma processing gas supply member
11/02/2011	CN101399147B Ion implantation method
11/01/2011	US8049182 Charged particle filter
11/01/2011	US8048328 Method for shaping a magnetic field in a magnetic field-enhanced plasma reactor
11/01/2011	US8048327 Plasma processing apparatus and control method thereof
11/01/2011	US8048326 Method and apparatus for determining an etch property using an endpoint signal
11/01/2011	US8048260 Magnetic neutral line discharge plasma processing system
11/01/2011	US8047158 Substrate processing apparatus and reaction container
10/2011
10/27/2011	WO2011133417A2 Coated graphite article and reactive ion etch manufacturing and refurbishment of graphite article
10/27/2011	WO2011132767A1 Gas field ionization source and ion beam device
10/27/2011	WO2011131981A1 Characteristic determination
10/27/2011	WO2011131921A1 High density plasma source
10/27/2011	WO2011131769A1 Sensing of plasma process parameters
10/27/2011	WO2011131171A1 Apparatus for coating substrates using the eb/pvd method
10/27/2011	WO2011059504A3 Method and apparatus for cleaning residue from an ion source component
10/27/2011	US20110263130 Methods for rf pulsing of a narrow gap capacitively coupled reactor
10/27/2011	US20110260057 Charged particle beam apparatus
10/27/2011	US20110260056 Auxiliary stage and method of utilizing auxiliary stage
10/27/2011	US20110260055 Dynamic Focus Adjustment with Optical Height Detection Apparatus in Electron Beam system
10/27/2011	US20110260054 Atom probe pulse energy
10/27/2011	US20110260047 Silaborane implantation processes
10/26/2011	EP2381462A2 Electron-beam exposure apparatus and method of manufacturing device
10/26/2011	EP2381007A1 Preparation of atomizing gas, method and equipment of forming novel material by atomizing gas discharging
10/26/2011	EP2380902A1 Protein layers and their use in X-ray crystallography
10/26/2011	EP2188411B1 Sputtering system
10/26/2011	EP2141725B1 Surface emission type electron source and drawing device
10/26/2011	EP2057661B1 Apparatus for the modification of surfaces

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