Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
12/2011
12/06/2011CA2487333C Radial pulsed arc discharge gun for synthesizing nanopowders
12/05/2011DE202009018474U1 Einrichtung für die Lichtbogenbehandlung der Oberfläche von Metallerzeugnissen Means for the electric arc treatment of the surface of metal products
12/01/2011WO2011149607A1 Molecular ion generation
12/01/2011WO2011149546A1 Heated rotary seal and bearing for chilled ion implantation system
12/01/2011WO2011149542A1 Active dew point sensing and load lock venting to prevent condensation of workpieces
12/01/2011WO2011149001A1 Transmission interference microscope
12/01/2011WO2011148975A1 Image processing device, charged particle beam device, charged particle beam device adjustment sample, and manufacturing method thereof
12/01/2011WO2011148073A1 Adjustable cathodoluminescence detection system and microscope employing such a system
12/01/2011WO2011148072A1 Flexible cathodoluminescence detection system and microscope employing such a system
12/01/2011US20110291022 Post Implant Wafer Heating Using Light
12/01/2011US20110291010 Charged particle radiation device
12/01/2011US20110291007 Movable Detector for Charged Particle Beam Inspection or Review
12/01/2011US20110290183 Plasma Uniformity Control By Gas Diffuser Hole Design
12/01/2011DE112009002442T5 Linearantriebsvorrichtung Linear drive device
11/2011
11/30/2011EP2390898A2 Plasma processing apparatus and processing gas supply structure thereof
11/30/2011EP2390897A2 Plasma processing apparatus
11/30/2011EP2390896A1 Electron gun, lithography apparatus, method of manufacturing article, and electron beam apparatus
11/30/2011EP2390380A1 Sputtering equipment, sputtering method and method for manufacturing an electronic device
11/30/2011EP2390012A2 Plasma Deposition Apparatus
11/30/2011EP2389680A1 Enhanced low energy ion beam transport in ion implantation
11/30/2011EP2389679A1 Ion beam angle calibration and emittance measurement system for ribbon beams
11/30/2011EP2279515B1 Projection lens arrangement
11/30/2011EP1502486B1 Method of forming a plasma using a plasma catalyst
11/30/2011CN202058689U 一种用于等离子处理器的加热装置 Heating apparatus for ion processor etc.
11/30/2011CN1977352B 用于差错检测和工艺控制的等离子体离子注入监视系统 Plasma ions used for error detection and process control monitoring system injection
11/30/2011CN1734501B 用于消除图像中的不均匀亮度的方法和设备 Method and apparatus for the elimination of uneven brightness in the image
11/30/2011CN102265376A 可旋转溅射靶材座、可旋转溅射靶材、涂覆设备、制造可旋转溅射靶材的方法、靶材座连接装置、以及将用于溅射设备的可旋转溅射靶材座装置连接至靶材座支撑件的方法 Rotatable sputter target holder, a rotatable sputtering target, the coating apparatus, the manufacturing method for a rotatable sputtering target, the target base connecting means, and a rotatable seat to be used for the sputtering target of the sputtering apparatus The method of the target device is connected to the seat support member
11/30/2011CN102265375A 射频溅射配置 RF sputtering configuration
11/30/2011CN102263026A 等离子体处理装置和方法 The plasma processing apparatus and method
11/30/2011CN102263001A 等离子体处理装置和方法 The plasma processing apparatus and method
11/30/2011CN102263000A Plasma microwave cavity
11/30/2011CN102262999A 等离子体处理装置 The plasma processing apparatus
11/30/2011CN102262998A 离子注入装置 Ion implantation apparatus
11/30/2011CN102262997A 同时电子检测 Meanwhile electronic detection
11/30/2011CN102262996A 透射电镜用双轴倾转的原位力、电性能综合测试样品杆 In situ TEM biaxially tilting force, the electrical properties of the comprehensive test sample rod
11/30/2011CN101484965B 用于加速离子束的设备 A device for accelerating the ion beam
11/30/2011CN101389179B 等离子体处理装置和等离子体处理方法 Plasma processing apparatus and plasma processing method
11/29/2011US8067753 Electron beam writing apparatus and method
11/29/2011US8067749 Cleanable helical modules
11/29/2011US8067084 Electromagnetic-wave shielding and light transmitting plate, manufacturing method thereof, and display panel
11/29/2011CA2476320C Apparatus and method for arc detection
11/24/2011WO2011146084A1 Method and system for 4d tomography and ultrafast scanning electron microscopy
11/24/2011WO2011145645A1 Electron microscope
11/24/2011WO2011145292A1 Scanning electron microscope
11/24/2011WO2011145290A1 Scanning electron microscope
11/24/2011WO2011145273A1 Electron microscope, and method for adjusting optical axis of electron microscope
11/24/2011WO2011144759A1 Non-continuous bonding of sputtering target to backing material
11/24/2011US20110284759 Method for adjusting optical axis of charged particle radiation and charged particle radiation device
11/24/2011US20110284746 Charged particle beam device
11/24/2011US20110284744 Method and system for 4d tomography and ultrafast scanning electron microscopy
11/24/2011US20110284743 Method for Characterizing a Membrane in a Wet Condition By Positron Annihilation Spectrometer and Sample Holder Thereof
11/24/2011DE102010029212A1 Potential separation assembly for use in flow guiding coolant pipelines to guide cold water from coolant source to coolant sink of e.g. pipe magnetron of vacuum coating system, has inner mantle surface formed as non-conductive part
11/23/2011EP2388801A1 Multi-column electron beam lithography system and electron beam orbit adjusting method thereof
11/23/2011EP2388796A1 Simultaneous electron detection
11/23/2011EP2388795A2 Spherical aberration corrector and method of spherical aberration correction
11/23/2011EP2388575A1 Sample holder, inspection apparatus and inspection method
11/23/2011EP2195822B1 Ionisation detector for environmental scanning electron microscope
11/23/2011EP1634316B1 A hybrid magnetic/electrostatic deflector for ion implantation systems
11/23/2011CN202049922U Portable manual adjusting type fixed-focus electron microscope
11/23/2011CN1777691B Method and apparatus for reducing substrate backside deposition during processing
11/23/2011CN102257593A Simultaneous measurement of beams in lithography system
11/23/2011CN102257592A Ion implantation with diminished scanning field effects
11/23/2011CN102256432A Plasma processing device and method
11/23/2011CN102256431A Plasma processing device and method
11/23/2011CN102254778A Method for realizing high power pulse magnetic control discharge
11/23/2011CN102254777A Substrate processing apparatus
11/23/2011CN102254776A Linear microwave plasma source with eccentric slot variable medium wave guide tube
11/23/2011CN102254775A Magnetic field reinforced type linear ion source
11/23/2011CN102254774A Generating device of active gas flow and method for generating active gas flow
11/23/2011CN101728206B Vacuum processing chamber for very large area substrates
11/23/2011CN101361157B Ion sources, systems and methods
11/22/2011US8065637 Semiconductor device
11/22/2011US8063389 Method of performing ion implantation
11/22/2011US8063388 Ion implantation apparatus, substrate clamping mechanism, and ion implantation method
11/22/2011US8062717 RF current return path for a large area substrate plasma reactor
11/22/2011US8062473 Plasma processing apparatus and method
11/22/2011US8061299 Formation of photoconductive and photovoltaic films
11/17/2011WO2011143331A1 Methods and apparatus for applying periodic voltage using direct current
11/17/2011WO2011142054A1 Electron source
11/17/2011WO2011141513A1 Chamber for physical vapor deposition
11/17/2011WO2011141035A1 Device and method for gas flow sputtering
11/17/2011WO2011117057A4 Active thermoprobe
11/17/2011WO2011089439A3 A miniature low- energy electron beam generator
11/17/2011US20110282021 Apparatus and Method for Modifying Physical Properties of Nanostructure Using Focused Electron Beam, and Nano-Barcode and Serial-Junction Nanowire Fabricated Thereby
11/17/2011US20110281743 Systems and methods for isolating cells in cell colonies in culture
11/17/2011US20110279121 Method of Detecting Arc Discharge in a Plasma Process
11/17/2011US20110278478 Method and implanter for implanting a workpiece
11/17/2011US20110278454 Scanning electron microscope
11/17/2011US20110278452 Pattern check device and pattern check method
11/17/2011DE102010027619B3 Microwave plasma source of microwave distribution system used during plasma treatment process of substrate, has inner tube and conduit that are arranged in coaxial manner, and guard portion arranged in conduit is contacted with inner tube
11/17/2011DE102010020591A1 Plasmagenerator sowie Verfahren zur Erzeugung und Anwendung eines ionisierten Gases Plasma generator and method for generating and applying an ionized gas
11/16/2011EP2387062A1 Simultaneous electron detection
11/16/2011EP2387035A1 Method for mastering grooves on a rotating disc by utilizing an electron beam and recordable disc
11/16/2011EP2386111A1 Plasma source electrode
11/16/2011EP1611592B1 Adjustable implantation angle workpiece support structure for an ion beam implanter utilizing a linear scan motor
11/16/2011EP1332510B1 Real time monitoring for simultaneous imaging and exposure in charged particle beam systems
11/16/2011CN202042452U Hollow cathode ion source
11/16/2011CN1947216B Multi-piece baffle plate assembly for a plasma processing system
11/16/2011CN1662114B Plasma antenna
11/16/2011CN102246258A High accuracy beam placement for local area navigation
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