| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 01/05/2012 | WO2012001325A2 Method for the surface treatment of a fluid product dispensing device |
| 01/05/2012 | WO2012001321A2 Method for treating an elastomeric surface of a device for dispensing a fluid product |
| 01/05/2012 | WO2011133417A3 Coated graphite article and reactive ion etch manufacturing and refurbishment of graphite article |
| 01/05/2012 | DE10358182B4 Vorrichtung zur Beschichtung einer Probe An apparatus for coating a sample |
| 01/05/2012 | DE102011078515A1 Vergrösserungsbetrachtungsvorrichtung Enlargement viewing device |
| 01/05/2012 | DE102011078514A1 Vergrösserungsbetrachtungsvorrichtung Enlargement viewing device |
| 01/04/2012 | EP2402980A2 Methods of arc detection and suppression during rf sputtering of a thin film on a substrate |
| 01/04/2012 | EP2402979A2 Projection lens arrangement |
| 01/04/2012 | EP2402978A1 Charged particle beam device and method for correcting position with respect to charged particle beam |
| 01/04/2012 | EP2402977A1 Method of electron diffraction tomography |
| 01/04/2012 | EP2402976A1 Method of electron diffraction tomography |
| 01/04/2012 | EP2401896A1 Atmospheric low-temperature micro plasma jet device for bio-medical application |
| 01/04/2012 | EP1771211B1 Device for plasma coating/sterilization |
| 01/04/2012 | CN202103008U Probe for plasma diagnosis in glow discharge surface treatment |
| 01/04/2012 | CN1640832B Apparatus and method for manufacturing a preform by plasma chemical vapour deposition |
| 01/04/2012 | CN102308359A Modifiable magnet configuration for arc vaporization sources |
| 01/04/2012 | CN102308358A Closed drift magnetic field ion source apparatus containing self-cleaning anode and a process for substrate modification therewith |
| 01/04/2012 | CN102308357A Charged particle radiation device |
| 01/04/2012 | CN102308356A Multiple nozzle gas cluster ion beam system and method |
| 01/04/2012 | CN102306602A Electrode fixing structure |
| 01/04/2012 | CN101877300B Sputter magnetron device |
| 01/04/2012 | CN101419907B High temperature cathode for plasma etching |
| 01/04/2012 | CN101162679B Ion injector |
| 01/04/2012 | CN101064987B Plasma processing apparatus and apparatus for supplying RF power |
| 01/03/2012 | US8089056 Projection lens arrangement |
| 01/03/2012 | US8089052 Ion source with adjustable aperture |
| 01/03/2012 | US8089044 Method for correcting astigmatism in electron emission spectromicroscopy imaging |
| 01/03/2012 | US8089026 Methods for control of plasma transitions in sputter processing systems using a resonant circuit |
| 12/29/2011 | WO2011163488A1 Thermal control of a proximity mask and wafer during ion implantation |
| 12/29/2011 | WO2011162813A1 Bimetallic target |
| 12/29/2011 | WO2011162325A1 Sample stage device |
| 12/29/2011 | WO2011160990A1 Apparatus for structuring solid surfaces using ion beams from an ion beam spectrum |
| 12/29/2011 | WO2011160749A1 Method and device for coating a surface |
| 12/29/2011 | WO2011019828A3 Masked ion implantation with fast-slow scan |
| 12/29/2011 | US20110315893 Contact lens storage case surface disinfection |
| 12/29/2011 | US20110315876 Blocking Member for Use in the Diffraction Plane of a TEM |
| 12/29/2011 | DE102010030608A1 Device useful for plasma-assisted substrate treatment, comprises a hollow-cathode electrode, a transport device for a substrate in a relative motion to each other, a gas inlet system and a gas removal system |
| 12/29/2011 | DE102004008425B4 Gasführungsanordnung in einer Vakuumbeschichtungsanlage mit einer längserstreckten Magnetronanordnung Gas guide assembly in a vacuum coating plant with an elongated magnetron |
| 12/28/2011 | EP2400524A2 Method of processing of an object |
| 12/28/2011 | EP2400523A1 Blocking member for use in the diffraction plane of a TEM |
| 12/28/2011 | EP2400522A1 Blocking member for use in the diffraction plane of a TEM |
| 12/28/2011 | EP2399279A1 Substrate support structure, clamp preparation unit, and lithography system |
| 12/28/2011 | EP2399275A1 Plasma reactor |
| 12/28/2011 | EP2399274A1 Plasma reactor |
| 12/28/2011 | EP2399273A1 Charged particle lithography apparatus and method of generating vacuum in a vacuum chamber |
| 12/28/2011 | EP2399272A1 A method and arrangement for realizing a vacuum in a vacuum chamber |
| 12/28/2011 | EP2399271A1 Lithography machine and substrate handling arrangement |
| 12/28/2011 | EP2399270A1 Charged particle lithography apparatus and method of generating vacuum in a vacuum chamber |
| 12/28/2011 | EP2398933A1 Process to deposit diamond like carbon as protective coating on inner surface of a shaped object. |
| 12/28/2011 | CN202094079U Ion source arc chamber |
| 12/28/2011 | CN202094078U 离子注入装置用石墨部件及离子注入装置 Ion implantation apparatus graphite components and ion implantation apparatus |
| 12/28/2011 | CN102300342A 一种载板加热装置及应用该装置的等离子体处理设备 A carrier board heating device and application of plasma processing apparatus of the device |
| 12/28/2011 | CN102299067A Substrate processing method and substrate processing apparatus |
| 12/28/2011 | CN102299037A 在tem的衍射平面中使用的阻挡部件 Blocking member used in the diffraction plane tem |
| 12/28/2011 | CN101688295B 具有分离电极的静电卡盘 Having a separate electrode electrostatic chuck |
| 12/28/2011 | CN101604654B 基板支撑装置和等离子体处理设备 Substrate support means and the plasma processing apparatus |
| 12/28/2011 | CN101361160B 用于离子注入系统的离子束角度测量系统和方法 An ion implantation system for ion beam angle measurement systems and methods |
| 12/28/2011 | CN101268538B 空心体内面的等离子体处理的方法和设备 The method and apparatus of the hollow inner surface of a plasma processing |
| 12/28/2011 | CN101194340B 使用电极片独立运动的蚀刻率均一性的改进 Using an electrode sheet of the independence movement of the etching rate of an improvement |
| 12/27/2011 | US8084751 Detection arrangements in mass spectrometers |
| 12/27/2011 | US8083892 Apparatus for generating gas plasma, gas composition for generating plasma and method for manufacturing semiconductor device using the same |
| 12/27/2011 | US8083891 Plasma processing apparatus and the upper electrode unit |
| 12/27/2011 | US8083889 Apparatus and method for plasma etching |
| 12/27/2011 | US8083853 Plasma uniformity control by gas diffuser hole design |
| 12/24/2011 | CA2743374A1 Electron microscope device |
| 12/22/2011 | WO2011158739A1 Charged particle device |
| 12/22/2011 | WO2011158579A1 Objective lens system and electron microscope |
| 12/22/2011 | WO2011158458A1 Charged particle beam device and soundproofing cover |
| 12/22/2011 | WO2011157425A1 Apparatus for the continuous plasma treatment and/or plasma coating of a piece of material |
| 12/22/2011 | WO2011157424A1 Apparatus for the continuous plasma treatment and/or plasma coating of a piece of material |
| 12/22/2011 | WO2011156877A1 Plasma processing device |
| 12/22/2011 | US20110309263 Dual Beam System |
| 12/22/2011 | US20110308461 Electron Beam Enhanced Nitriding System (EBENS) |
| 12/22/2011 | DE102010030372A1 Vorrichtung zur Strukturierung von Festkörperflächen mit Ionenstrahlen aus einem Ionenstrahlspektrum Device for patterning of solid surfaces with ion beams from an ion beam spectrum |
| 12/22/2011 | DE102010024625A1 Verfahren zum Bearbeiten eines Objekts A method for processing an object |
| 12/22/2011 | DE102010024543A1 Verfahren und Vorrichtung zum Beschichten einer Oberfläche Method and apparatus for coating a surface |
| 12/22/2011 | DE102010024244A1 Anordnung und Verfahren für die dropletarme Beschichtung Apparatus and method for coating dropletarme |
| 12/22/2011 | DE102010024135A1 Vorrichtung zur kontinuierlichen Plasmabehandlung und/oder Plasmabeschichtung eines Materialstücks Device for the continuous plasma treatment and / or plasma coating a piece of material |
| 12/22/2011 | DE102010024086A1 Vorrichtung zur kontinuierlichen Plasmabehandlung und/oder Plasmabeschichtung eines Materialstücks Device for the continuous plasma treatment and / or plasma coating a piece of material |
| 12/22/2011 | DE102010023119A1 Vorrichtung zur Plasmabehandlung von Werkstücken Apparatus for plasma treatment of workpieces |
| 12/21/2011 | EP2398043A1 Thin film forming apparatus and thin film forming method |
| 12/21/2011 | EP2398037A1 Assembly and method for low droplet coating of substrates with a vacuum arc vaporizer |
| 12/21/2011 | EP2398036A1 Electron beam device and sample holding device for electron beam device |
| 12/21/2011 | EP2397906A2 Lithography apparatus and device manufacturing method |
| 12/21/2011 | EP2396804A1 Apparatus for large area plasma processing |
| 12/21/2011 | EP2396645A1 Discharge lamp for gds with an axial magnetic field |
| 12/21/2011 | EP2396449A1 Plasma deposition |
| 12/21/2011 | EP1554634B1 Lithography system |
| 12/21/2011 | EP1552544B1 Method for the production of a substrate with a magnetron sputter coating and unit for the same |
| 12/21/2011 | EP1441576B1 Method for detecting an arc in a glow discharg apparatus and high-frequency arc discharge suppressor |
| 12/21/2011 | CN1795531B 磁控管溅射阴极 Magnetron sputtering cathodes |
| 12/21/2011 | CN102293067A 辐射管以及带有辐射管的粒子加速器 Radiant tube and particle accelerators with radiant tube |
| 12/21/2011 | CN102292792A 离子注入中的增强型低能离子束传输 Low energy ion beam transport enhanced ion implantation |
| 12/21/2011 | CN102292791A 用于带状束的离子束角度校准和发射度测量系统 Ion beam angle for the ribbon beam alignment and emission measurement system |
| 12/21/2011 | CN102292790A 电子显微镜 Electron microscope |
| 12/21/2011 | CN102290328A 干蚀刻装置 Dry etching apparatus |
| 12/21/2011 | CN102290314A 产生中性粒子束的装置及方法 Apparatus and method for generating a neutral particle beam |
| 12/21/2011 | CN102290313A 一种非金属真空腔室结构 A vacuum chamber structure nonmetallic |
| 12/21/2011 | CN102290312A 一种平板电极固定结构 A flat electrode fixed structure |
| 12/21/2011 | CN101740340B 反应腔室及半导体加工设备 The reaction chamber and a semiconductor processing equipment |